|
Match
|
Document |
Document Title |
|
|
7619738 |
Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus
A marker structure on a substrate for optical alignment of the substrate includes a plurality of first structural elements and a plurality of second structural elements. In use, the marker...
|
|
|
7619737 |
Method of measurement, an inspection apparatus and a lithographic apparatus
Radiation is projected onto a plurality of targets on a substrate. By assuming that the overlay error derivable from asymmetry varies smoothly across the substrate, the number of targets measured...
|
|
|
7616313 |
Apparatus and methods for detecting overlay errors using scatterometry
Embodiments of the invention include a scatterometry target for use in determining the alignment between substrate layers. A target arrangement is formed on a substrate and comprises a plurality of...
|
|
|
7612882 |
Optical gratings, lithography tools including such optical gratings and methods for using same for alignment
Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the...
|
|
|
7612881 |
Method of alignment of an optical module and an optical module using thereof
The present invention provides a method for high precision alignment of a surface emitting laser and a lens in an optical module in which optical coupling between a surface emitting laser and other...
|
|
|
7608468 |
Apparatus and methods for determining overlay and uses of same
Disclosed are techniques and apparatus are provided for determining overlay error or pattern placement error (PPE) across the field of a scanner which is used to pattern a sample, such as a...
|
|
|
7602492 |
Overlay measuring method and related semiconductor fabrication equipment management system
Embodiments of the invention provide an overlay measuring method and a semiconductor fabrication equipment management system adapted to perform the method. In one embodiment, the method comprises...
|
|
|
7602491 |
Optical gain approach for enhancement of overlay and alignment systems performance
A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final...
|
|
|
7599064 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods
An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between...
|
|
|
7599063 |
Method for checking alignment accuracy using overlay mark
A method for checking the alignment accuracy using an overlay mark is provided. The overlay mark includes an inner mark and an outer mark formed on a wafer. The outer mark is formed in a lower...
|
|
|
7586609 |
Method for analyzing overlay errors
A method for analyzing overlay errors in lithography is described. Interfield sampling and intrafield sampling are first conducted to sample multiple positions on each of the wafers, and then the...
|
|
|
7586608 |
Wafer-level testing of optical and optoelectronic chips
This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light from top of the wafer.
|
|
|
7580131 |
Angularly resolved scatterometer and inspection method
In an angularly resolved scatterometer, an aperture plate including at least one obscuration extending into the image of the pupil plane is provided. Defocus values of a target pattern are...
|
|
|
7576859 |
Alignment apparatus and alignment method
An alignment apparatus, which is used when positioning and joining a plurality of workpieces relative to each other, each workpiece having a plurality of alignment marks for alignment, the...
|
|
|
7576858 |
Position detecting method
A method for calculating a position of an image of an alignment mark formed on an object to be detected includes the steps of obtaining first information indicative of a center position in the...
|
|
|
7573584 |
Method and apparatus for angular-resolved spectroscopic lithography characterization
Both the 1 st and 0 th diffraction orders are detected in a scatterometer. The 1 st diffraction orders are used to detect the overlay error. The 0 th diffraction order is then used to flag if...
|
|
|
7573580 |
Optical position measuring system and method using a low coherence light source
An optical position measuring system (e.g., an interferometer) includes a superluminescent device (SLD) (e.g., a laser diode having at least one anti-reflective coated surface) and a detector. The...
|
|
|
7573574 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology...
|
|
|
7564556 |
Method and apparatus for lens contamination control
The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an...
|
|
|
7564554 |
Wafer-based optical pattern recognition targets using regions of gratings
Pattern recognition targets including regions of one or more layers of gratings are used for semiconductor fabrication wafer alignment. Grates of the gratings are below the resolution limit of the...
|
|
|
7564534 |
Alignment system and method
An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where...
|
|
|
7561282 |
Techniques for determining overlay and critical dimension using a single metrology tool
Disclosed are semiconductor targets for measuring with a metrology tool having at least two incident beam modules and techniques for measuring the same. In one embodiment, the target includes an...
|
|
|
7557921 |
Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools
Disclosed are apparatus and methods for monitoring a characteristic associated with a product feature on a semiconductor product. A proxy target formed from at least one substructure that...
|
|
|
7547884 |
Pattern defect inspection method and apparatus thereof
In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam....
|
|
|
7545497 |
Alignment routine for optically based tools
A method is provided for using a point of interest as a starting point where an alignment is automatically selected by recognition software for a patterned substrate. The method includes disposing...
|
|
|
7545480 |
Reticle, exposure apparatus, and methods for measuring the alignment state thereof
A reticle and an exposure apparatus using the reticle are provided. The reticle includes alignment marks having a plurality of segments along coordinate directions corresponding to a plurality of...
|
|
|
7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam
An ion beam irradiating apparatus has: a beam profile monitor 14 which measures a beam current density distribution in y direction of an ion beam 4 in the vicinity of a target 8; movable...
|
|
|
7535001 |
Method and system for focusing a charged particle beam
A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample...
|
|
|
7528954 |
Method of adjusting optical imaging system, positional deviation detecting mark, method of detecting positional deviation, method of detecting position, position detecting device and mark identifying device
A method of adjusting optical imaging system is provided to finely adjust arrangement of optical elements with sensitivity. Illumination light with a predetermined wavelength band is irradiated to...
|
|
|
7528953 |
Target acquisition and overlay metrology based on two diffracted orders imaging
In one embodiment, a system includes a beam generator for directing at least one incident beam having a wavelength λ towards a periodic target having structures with a specific pitch p. A...
|
|
|
7525671 |
Registration method and apparatus therefor
The present invention relates to a method to determine a position of at least one mark provided on a substrate, comprising the actions of: detecting a first mark on said substrate by using a first...
|
|
|
7522262 |
Method for determining position of reference point
A method for determining a position of a reference point in which there is no influence of aberration of a camera lens or the like, but an error caused by a failure in shape of an alignment mark...
|
|
|
7518726 |
Compact optical detection system for a microfluidic device
An optical detection system for a microfluidic device and a dry-focus microfluidic device compatible with the compact optical detection system are described. The system includes an LED; means for...
|
|
|
7511817 |
Reticle, reticle inspection method and reticle inspection apparatus
A method by which necessity of correction of any defect detected in inspection of a product reticle can exactly be judged is proposed, in which device patterns are formed in an exposure area on a...
|
|
|
7508515 |
System and method for manufacturing printed circuit boards employing non-uniformly modified images
A system and method for fabricating an electrical circuit in which a digital control image ( 46 ) is generated by non-uniformly modifying ( 44 ) a representation of an electrical circuit ( 40 ),...
|
|
|
7495780 |
Position measurement apparatus, imaging apparatus, exposure apparatus, and Device manufacturing method
An exposure apparatus performs a relative alignment between a reticle and a substrate, and exposes the substrate to light via a pattern formed on the reticle. The exposure apparatus includes a...
|
|
|
7486397 |
Device for aligning substrate with mask and method using the same
A device for aligning a substrate and a mask, and a method using the same, where the device includes aligning marks in unused portions of the substrate and the mask, a sensing unit for determining...
|
|
|
7477403 |
Optical position assessment apparatus and method
An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A...
|
|
|
7477390 |
Exposure method and apparatus, and device manufacturing method
An exposure method of exposing a substrate arranged on a stage, which holds the substrate and moves, to light through an original and a projection optical system. A first measurement is performed...
|
|
|
7474401 |
Multi-layer alignment and overlay target and measurement method
A target system for determining positioning error between lithographically produced integrated circuit fields on at least one lithographic level. The target system includes a first target pattern...
|
|
|
7468795 |
Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same
A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment...
|
|
|
7466414 |
Position detection apparatus and method
A position detection method of detecting a position of a detection mark. The method includes a matching step of calculating a value of a correlation using a template for an image including the...
|
|
|
7466413 |
Marker structure, mask pattern, alignment method and lithographic method and apparatus
A mask pattern for imaging a marker structure on a substrate with a lithographic apparatus, the marker structure being configured to determine optical alignment or overlay, includes constituent...
|
|
|
7466412 |
Method of detecting displacement of exposure position marks
Exposure position marks are reliably recognized and the displacement of an exposure position is correctly and efficiently detected based on measurement results produced by recognizing the marks....
|
|
|
7463337 |
Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatus
A substrate table is provided with an optical system that includes a first window and a second window arranged to allow radiation to pass into an optical arm. At least two mirrors are provided...
|
|
|
7460231 |
Alignment tool for a lithographic apparatus
An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a...
|
|
|
7459247 |
Lithographic apparatus and device manufacturing method
A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component...
|
|
|
7456967 |
Mark position detection apparatus
A mark position detection apparatus has an illumination optical system for illuminating a measurement mark with illumination light and an imaging optical system for converging light reflected from...
|
|
|
7453570 |
Mark position measuring method and apparatus
A method of measuring a position of a mark in a chamber, a pressure inside the chamber being different from a pressure outside the chamber. The method includes a first detection step of...
|
|
|
7449265 |
Scatterometry target for determining CD and overlay
The invention can provide a method of processing a wafer using segmented multi-dimensional targets that can be used in Double-Patterning (D-P) procedures.
|