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7417580 |
Object detection system and object detection method
An object detection system includes a radar detection means ( 2 ), an image detection means ( 3 ), and a collating means ( 4 ). The collating means ( 4 ) performs a collation between an object...
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7414713 |
Method of measuring focal point, instrument used therefor, and method of fabricating semiconductor device
A shape value of a pattern having a pivotal characteristic is measured (step S 1 ), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of...
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7411678 |
Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semiconductor device by exposure apparatus controlled by the same control method
An alignment apparatus which drives to a target position a stage capable of moving at least in a two-dimensional direction. A first measurement device and a second measurement device have a...
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7410880 |
Method for measuring bonding quality of bonded substrates, metrology apparatus, and method of producing a device from a bonded substrate
In a method for measuring the bonding quality of bonded substrates, such as bonded SOI wafers, a plurality of marks are created at a first side of a top substrate after, or before, the bonding of...
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7408642 |
Registration target design for managing both reticle grid error and wafer overlay
A combined overlay target and methods for its use are disclosed. The combined overlay target includes a grating-type overlay target and an image placement error target having substantially...
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7405388 |
Video centerscope for machine alignment
This invention can be attached to the head of a milling machine and performs the functions of a center scope and an edge finder. Unlike a center scope or an edge finder it does not have to be...
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7388663 |
Optical position assessment apparatus and method
A lithographic apparatus comprises a substrate table that supports a substrate having alignment marks on a surface thereof. The apparatus further comprises a frame moveable relative to the...
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7382448 |
Alignment system for observation instruments
A method and apparatus is disclosed for aligning an optical instrument with respect to a celestial coordinate system, the optical instrument having a field of view and an optical instrument...
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7375810 |
Overlay error detection
An overlay target with gratings thereon is illuminated and radiation scattered by the target is imaged onto detectors. A phase difference is then detected between the outputs of the detectors to...
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7375361 |
Optical alignment device for machine tool
The orientation of a machine 2 relative to a work-piece 10 is manually controlled by means of an alignment device 4 . The device 4 includes a light source 24 rigidly attached to a foot 12...
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7372569 |
Method of correcting alignment errors in a segmented reflective surface
An optical alignment apparatus comprising a plurality of subapertures and a plurality of detectors. The subapertures are optically coupled to a reflective surface which formed by a plurality of...
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7372029 |
Scanning transmission electron microscope and scanning transmission electron microscopy
A scanning transmission electron microscope for scanning a primary electron beam on a sample, detecting a transmitted electron from the sample by a detector, and forming an image of the transmitted...
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7369238 |
Lens blank alignment and blocking device and method
A lens blocking device is disclosed that includes a frame, a light source mounted on the frame, a carriage having a first end and a second end mounted on the frame for sliding movement between...
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7369237 |
Substrate processing apparatus and substrate processing system
It is an object of the present invention to provide a substrate processing apparatus, comprising a housing body mounting unit that is capable of mounting a plurality of housing bodies which can...
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7369214 |
Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors
A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled...
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7368206 |
Automated overlay metrology system
Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an...
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7359053 |
Optical array with beam alignment feature
An array of optical elements for processing a spatially dispersed optical beam including monitoring optical elements for determining the position of the optical beam in the array is disclosed. The...
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7355675 |
Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a...
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7339282 |
Topographically indexed support substrates
The present invention provides an indexed support substrate. The support substrate comprises at least one set of indexing features that are distinguishable from one another and from the surrounding...
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7333199 |
Aligning optical components with three degrees of translational freedom
The principles of the present invention relate to aligning optical components with three degrees of translational freedom. A lens pin, a lens base, and a molded package are aligned in a first...
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7332255 |
Overlay box structure for measuring process induced line shortening effect
The present invention enables the user to measure process line shortening (PLS) on an overlay tool. In an example embodiment ( 900 ), to obtain the PLS, the user applies a method to determine the...
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7315374 |
Real-time monitoring optically trapped carbon nanotubes
An embodiment of the present invention is a technique to monitor carbon nanotubes (CNTs). A carbon nanotube (CNT) is manipulated in a fluid by a laser beam. An illuminating light from a light...
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7315373 |
Wafer positioning method and device, wafer process system, and wafer seat rotation axis positioning method for wafer positioning device
In wafer positioning by moving a center point ( 0 ) of a wafer ( 21 ) to a given position and orienting a notch part ( 21 a ) of the wafer in a given direction, wafer seat drive means ( 2,3,8 , or ...
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7312871 |
Method and apparatus for alignment of components
A method and apparatus for measuring the relative positions of first and second components, comprising: mounting first and second measurement units on respective housings forming part of each...
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7312870 |
Optical alignment detection system
An optical alignment detection system for detecting the alignment of a first object relative to a second object is provided. One or more light sources and one or more light detectors, either or...
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7312864 |
Measurement device and process for determining the straightness of hollow cylindrical or hollow conical bodies and their orientation relative to one another
Device for determining the straightness of hollow cylindrical surfaces and partial surfaces thereof, and the three-dimensional orientation of several hollow cylindrical surfaces or partial surfaces...
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7310130 |
Lithographic apparatus and position measuring method
In a lithographic apparatus, a measurement of the position of an object in an ambient space by an object position measuring system which is influenced by pressure variations in the ambient space,...
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7307727 |
Method and apparatus for forming substrate for semiconductor or the like
In an apparatus which determines characteristics of a thin film according to the present invention, a temporal change in a refractive index n and an extinction coefficient k of a thin film in a...
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7304738 |
Method for actively aligning an optoelectronic device
A method for actively aligning the components of an optoelectronic device. The optoelectronic device includes a first portion containing a laser and a second portion containing an optical element....
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7301604 |
Method to predict and identify defocus wafers
A method and system for identifying a defocus wafer by mapping a topography of each wafer in a first wafer batch using a level sensor apparatus ( 100 ); calculating a focus spot deviation ( 402 )...
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7289212 |
Lithographic apparatus, device manufacturing method and device manufacturing thereby
The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are...
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7286230 |
Alignment system, device and method
A system for aligning an object with a target is disclosed. The system allows an operator to monitor the alignment of the object, either while the object is stationary or while the object is moving...
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7280211 |
Method of adjusting monitor axis
The invention relates to a method of adjusting a monitor having a radar and a camera and correcting the positions and orientations of their detection areas based on intensity of reflected light...
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7277185 |
Method of measuring overlay
In a method of measuring, in a lithographic manufacturing process using a lithographic projection apparatus, overlay between a resist layer, in which a mask pattern is to be imaged, and a...
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7277173 |
Active optical alignment using MEMS mirrors
An optical package includes one or more MEMS mirrors to provide alignment between internal optical components and the signal port(s) on the package (where one or more ports may include optical...
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7274451 |
Optical beam translation device and method utilizing a pivoting optical fiber
An alignment device and method for delivering a light beam to an optical application, such as an optical trap having a pair of lenses with overlapping focal regions for trapping a particle therein....
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7268877 |
Method and apparatus for orienting semiconductor wafers in semiconductor fabrication
Described are systems and methods for orienting a semiconductor wafer during semiconductor fabrication with the aid of an optical alignment system, the semiconductor wafer having an alignment mark...
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7265840 |
Coupling method for coupling high power optical beams into an optical waveguide
A method for determining an improved alignment to couple a beam having a high power level into a waveguide. The power of the beam is reduced to a minimum test power level. The reduced-power beam is...
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7265364 |
Level sensor for lithographic apparatus
A level sensor for a lithographic projection apparatus includes a light source configured to direct light onto a substrate to be measured, a detector configured to detect light reflected from the...
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7262850 |
Method for inspection of periodic grating structures on lithography masks
The invention relates to a method for inspection of periodic structures on lithography masks using a microscope with adjustable illumination and an operating element for movement of a mechanical...
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7261983 |
Reference wafer and process for manufacturing same
An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes....
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7256865 |
Methods and apparatuses for applying wafer-alignment marks
Embodiments of the invention provide methods and apparatuses for efficient and cost-effective imaging of alignment marks. For one embodiment, alignment mark imaging is accomplished separately from,...
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7256833 |
Method and apparatus for automatically optimizing optical contrast in automated equipment
Techniques for automatically adjusting and/or optimizing the color and/or intensity of the illuminating light used in a vision system is presented. The intensity of each of a plurality of...
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7248335 |
Exposure apparatus, device manufacturing method, stage apparatus, and alignment method
An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the...
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7244623 |
Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern
A method of manufacturing a semiconductor device and an apparatus of automatically adjusting a semiconductor pattern can precisely correct a difference in the shape or position of a pattern exposed...
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7242475 |
Method of determining aberration of a projection system of a lithographic apparatus
A method of determining aberration of a projection system of a lithographic includes projecting a reference test pattern, projecting a second test pattern, measuring relative displacements between...
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7242465 |
Device and process for quantitative assessment of the orientation of two machines relative to one another
A device for quantitative assessment of the orientation of two machines relative to one another has auxiliary devices in the form of extenders or holding devices ( 40, 50 ) on which displacement...
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7227144 |
Scanning transmission electron microscope and scanning transmission electron microscopy
A scanning transmission electron microscope which enhances correction accuracy of a de-scanning coil for canceling a transmitted-electron-beam position change on an electron detector. Here, this...
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7222414 |
Component transfer systems
A system for transferring electrical components. The system may comprise a plurality of electrical components. Each of the components may include leads and a physically asymmetric fiducial marker...
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7221178 |
Working system for circuit boards
In a working system for circuit boards such as, typically, as an electronic component mounting apparatus, an image pickup camera mainly for detecting the position of a reference mark on a circuit...
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