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8184261 |
Exposure apparatus
An exposure apparatus includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages which can be...
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8179529 |
Alignment systems and methods
Method and systems for aligning a first component with a second component are disclosed. For example, a first component may be aligned with a second component during an assembly process, with a...
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8164758 |
Internal inspection system and method
In some embodiments, an inspection system for measuring at least a portion of the threaded surface of an internally threaded component includes at least one measuring probe, a component retention...
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8164752 |
Alignment apparatus for aligning multi-layer structures
An exemplary alignment apparatus can align a first layer with a second layer. The first layer has a first alignment pattern. The second layer has a second alignment pattern. The alignment apparatus...
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8164753 |
Alignment mark arrangement and alignment mark structure
An alignment mark arrangement includes: a first alignment pattern comprising a plurality of parallel first stripes on a substrate, wherein each of the first stripes includes a first dimension; and...
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8159673 |
Light amount detector, misalignment amount detector, and image density detector
A light amount detector includes a light emitter, a light receiver, and a light amount detection unit. The light emitter emits light on a detection pattern formed on a detection surface of an image...
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8159674 |
Exposure method and exposure device
An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes...
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8149404 |
Method for aligning wafer and alignment apparatus using the method
A method of aligning a wafer includes recognizing images of the wafer accommodated on a work table and a notch of the wafer using a camera, designating at least one notch point of the notch in a...
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8139217 |
Alignment systems and methods for lithographic systems
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining...
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8139219 |
Apparatus and method for semiconductor wafer alignment
An apparatus for aligning semiconductor wafers includes equipment for positioning a first surface of a first semiconductor wafer directly opposite to a first surface of a second semiconductor wafer...
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8139216 |
Optical package alignment systems and protocols
Methods of positioning an optical unit in an optical package are provided. According to one method, a partially assembled optical package is provided. The wavelength conversion device within the...
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8139218 |
Substrate distortion measurement
A substrate distortion measurement apparatus comprising one or more optical detectors arranged to measure the locations of pits or holes provided in a substrate, a memory arranged to store...
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8134779 |
3D image display, aligning system and method thereof
Disclosed is a system for aligning a 3D image display device. The system for aligning the 3D image display device comprises: a display panel showing a left eye image and a right eye image, and...
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8134708 |
Method of measuring numerical aperture of exposure machine, control wafer, photomask, and method of monitoring numerical aperture of exposure machine
A method of measuring a numerical aperture of an exposure machine is described. A control wafer having vernier marks thereon and an aberration mask having pinholes therein are provided, wherein...
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8133418 |
Pattern transfer method and imprint device
In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are...
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8125652 |
Wafer center finding with charge-coupled devices
A device for handling a substantially circular wafer is provided. The device includes an interior accessible through a plurality of entrances, and a plurality of sensors consisting of two sensors...
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8125613 |
Exposure apparatus, exposure method, and device manufacturing method
An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical...
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8125642 |
Process to optically align a photoreceiver with a laser transmitter source in a laser rangefinder system
A process for optically aligning a laser rangefinder that includes the steps of providing a laser rangefinder having a laser source, a photodetector lens and a photodetector, providing a fiber...
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8111398 |
Method of measurement, an inspection apparatus and a lithographic apparatus
According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with...
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8099875 |
Method and system for verifying alignment of power transmission pulleys
A method and system for verifying the spatial and coplanar alignment of a number of power transmission pulleys, particularly as used with an automotive internal combustion engine. A planar light...
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8094309 |
Line of sight adjustment method for optical systems
A line of sight adjustment device (LSAD) employs a simple yet robust structure and method to adjust the line of sight (or boresight) of a telescope, clip-on night sight, night vision sight, day...
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8089638 |
Stage with displacement magnification mechanism for measuring
The present invention relates to a stage with a displacement measuring means capable of measuring a displacement, and more particularly, to a stage provided with a displacement magnification means...
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8085400 |
Alignment device and method for optical system
An alignment device is provided for aligning a primary mirror with a secondary mirror in an optical system having the primary mirror and the secondary mirror arranged so as to face each other along...
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8054465 |
Position measurement method
A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a...
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8049890 |
System and method for passive alignment of components in an optical bench
A system and method for facilitating passive alignment of an optical component in an optical bench. A groove is etched into the optical bench. The groove has two sections. The first section is...
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8045164 |
Position finding system and method for use in aligning laser device with an optical fiber
A position finding system and method may be used to find an alignment position of a laser device relative to an optical fiber such as an angled optical fiber. The laser device may be positioned...
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8031344 |
Z-stage configuration and application thereof
A stage configuration is provided, wherein a ceramic plate is used as the z-stage body to decrease the use of the metal plates in the conventional configuration, so that the compact structure of...
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8027813 |
Method and system for reconstructing aberrated image profiles through simulation
A system and method of calculating estimated image profiles. The system and method includes providing lens characteristic data and performing simulation calculations for various levels of...
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8004678 |
Wafer level alignment structures using subwavelength grating polarizers
In one embodiment, a wafer alignment system, comprises a radiation source to generate radiation, a radiation directing assembly to direct at least a portion of the radiation onto a surface of a...
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7986409 |
Method for determining the centrality of masks
A method for determining the centrality of masks is disclosed. The mask is positioned in a coordinate measuring device on a measurement table displaceable in a direction perpendicular to the...
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7969553 |
Exposure device with mechanism for forming alignment marks and exposure process conducted by the same
The present invention relates to an exposure device for transferring circuit patterns of a mask to a roll-film-shaped object. The exposure device includes a supply reel rotation section that is...
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7965390 |
Automatic sample alignment system and method of use
A system which automatically reduces change in effective angle and plane of incidence of a reflected focused beam of electromagnetic radiation entering a detector, via use of a detector with...
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7945087 |
Alignment of printed circuit board targets
A method for micromachining a material, including configuring an optical system to provide illumination of an illumination wavelength to a site via a given element of the optical system, the...
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7940391 |
Pre-aligned metrology system and modules
A Pre-Aligned Metrology System comprising a number of Pre-Aligned Metrology Assemblies and Pre-Aligned Metrology Modules for measuring a target on a wafer. The Pre-Aligned Metrology Assemblies and...
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7916297 |
Method and apparatus for testing a test object
A method of testing a test object, comprising the steps of arranging the test object at a deformable contact element of a holding device, wherein the contact element is at least partially deformed...
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7911612 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every nth structure is different from the rest of the structures. The periodic...
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7901854 |
Wafer edge exposure unit
A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common...
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7880880 |
Alignment systems and methods for lithographic systems
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining...
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7872751 |
Fast sample height, AOI and POI alignment in mapping ellipsometer or the like
A sample investigation system (ES) in functional combination with an alignment system (AS), and methodology of enabling very fast, (eg. seconds), sample height, angle-of-incidence and...
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7859685 |
Wafer center finding with charge-coupled devices
A device having a robotic arm within a robot chamber. The robotic arm includes an end effector adapted to handle a wafer. A linear array of charge-coupled devices are provided within the interior...
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7858404 |
Measurement of overlay offset in semiconductor processing
A method of semiconductor manufacturing including forming an overlay offset measurement target including a first feature on a first layer and a second feature on a second layer. The first feature...
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7847938 |
Alignment system for optical lithography
An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work...
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7838310 |
Tunable alignment geometry
An alignment target with geometry designs provides a desired alignment offset for processes (both symmetric and asymmetric) on a wafer substrate. The alignment target includes one or more...
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7835001 |
Method of aligning a substrate, mask to be aligned with the same, and flat panel display apparatus using the same
A method of aligning a substrate includes forming a first alignment hole in the substrate, preparing a mask with a second alignment hole narrower than the first alignment hole, modifying a surface...
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7830513 |
Optical interrogation system and microplate position correction method
An optical interrogation system and method are described herein that are capable of detecting and correcting a positional misalignment of a label independent detection (LID) microplate so that the...
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7821632 |
Sample traveling stage with flexure mechanism module to absorb the deformation of the slide
A sample traveling stage is used for inspection equipment or precision processing equipment for semiconductors or FPDs, (Flat Panel Displays). The sample traveling stage includes a moving part in...
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7821638 |
Alignment mark
An alignment mark on a substrate includes a first pattern and a second pattern. The first pattern has a substantially planar upper surface by which parallel light is specularly reflected. The...
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7804579 |
Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate...
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7804994 |
Overlay metrology and control method
An overlay method for determining the overlay error of a device structure formed during semiconductor processing is disclosed. The overlay method includes producing calibration data that contains...
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7804603 |
Measurement apparatus and method
A measurement apparatus disclosed that has a radiation source configured to provide a measurement beam of radiation such that an individually controllable element of an array of individually...
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