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7383156 |
Apparatus for inspecting wafer surface, method for inspecting wafer surface, apparatus for judging defective wafer, method for judging defective wafer, and apparatus for processing information on wafer surface
It is possible to inspect scratches and staining on a wafer surface on the basis of an LPD map obtained from a particle counter 11 , by providing a means 21 for detecting aggregation of...
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7379192 |
Optical metrology of single features
The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical...
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7379177 |
System and method for performing hard glass inspection
A system and method to inspect objects for a characteristic parameter. The system includes at least one electromagnetic source for emitting at least two separate wavelengths of electromagnetic...
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7379172 |
Method and apparatus for inspection of optical component
An inspection method for evaluating the performance of an optical component at high precision is provided. According to the inspection method, a first light beam 24 and a second light beam 26 ...
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7375362 |
Method and apparatus for reducing or eliminating stray light in an optical test head
An optical test head comprises one or more optical input paths by which a beam of light is communicated from a light source to a workpiece and one or more optical output paths by which light...
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7372558 |
Method and system for visualizing surface errors
A method and system for visualizing deviations on an actual surface 10, 30 from a nominal, or designed, surface 28 utilizes a system and method for mapping the spatial (e.g. x, y and z)...
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7372062 |
Defect inspection device and substrate manufacturing system using the same
A defect inspection device which inspects for surface defects in substrates, and which includes an illumination section that irradiates the substrate with illumination light having a variable...
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7369703 |
Method and apparatus for circuit pattern inspection
A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of...
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7369233 |
Optical system for measuring samples using short wavelength radiation
In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths...
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7369224 |
Surface inspection apparatus, surface inspection method and exposure system
A surface inspection apparatus includes an illumination means for illuminating a pattern formed through a predetermined pattern forming process containing a process of exposure of a resist layer...
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7369223 |
Method of apparatus for detecting particles on a specimen
An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an...
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7366343 |
Pattern inspection method and apparatus
A pattern inspection method and a pattern inspection apparatus, which has an improved precision in detecting and correcting the positional deviation of images for a die comparison, have been...
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7365836 |
High speed laser scanning inspection system
An optical inspection system rapidly evaluates a substrate by illumination of an area of a substrate larger than a diffraction-limited spot using a coherent laser beam by breaking temporal or...
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7365834 |
Optical system for detecting anomalies and/or features of surfaces
A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation...
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7362450 |
Specular surface flaw detection
An apparatus and a method for detecting low frequency specular surface flaws on coated substrates is disclosed. A method for detecting low frequency specular surface flaws may comprise: impinging...
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7362437 |
Vision inspection system device and method
A course material that is applied to a substrate during fabrication of a composite item is inspected by a system that includes a vision assembly. The vision assembly includes an area light, a line...
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7362423 |
Digital diagnostic apparatus and vision system with related methods
A high speed, low cost, apparatus and method of identification, examination of objects and quality control of manufactured parts and sheet materials, the apparatus including a comparator having...
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7359044 |
Method and apparatus for inspecting pattern defects
A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity...
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7356176 |
Mounting-error inspecting method and substrate inspecting apparatus using the method
When a component is replaced or replenished in a predetermined feeder, mounters 3 A and 3 B refer to mount data in accordance with the feeder number for the feeder and read out the mounting...
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7355693 |
Pattern inspection apparatus
The defect confirmation screen of a pattern inspection apparatus that allows the user to create a recipe and check defects easily and quickly includes a “map display part” where a wafer map is...
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7355690 |
Double inspection of reticle or wafer
During mask or reticle inspection, each region is scanned at least twice, using an overlap between each pair of consecutive frames. System contamination and camera blemishes have approximately...
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7355689 |
Automatic optical inspection using multiple objectives
Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical...
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7352456 |
Method and apparatus for inspecting a substrate using a plurality of inspection wavelength regimes
A surface inspection apparatus and method are disclosed. In particular, the method and apparatus are capable of inspecting a surface in two (or more) optical regimes thereby enhancing the defect...
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7345754 |
Fourier filters and wafer inspection systems
Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the...
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7345751 |
Material independent optical profilometer
A system and method for measuring defects, film thickness, contamination, particles and height of a thin film disk or a silicon wafer. The system includes a processor for determining height. In...
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7339664 |
System and method for inspecting a light-management film and method of making the light-management film
A method of inspecting a light-management film comprises reflecting light from an overhead light source off a first side of the light-management film and examining the light-management film for...
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7339663 |
Method and apparatus for classifying repetitive defects on a substrate
A method and apparatus of classifying repetitive defects on a substrate is provided. Defects of dies on the substrate are sequentially compared with a predetermined reference die. Sets of...
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7339661 |
Dark field inspection system
Apparatus for inspection of a sample includes a radiation source, which is adapted to direct optical radiation onto an area of a surface of the sample, and a plurality of image sensors. Each of the...
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7333192 |
Apparatus and method for inspecting defects
A defect inspection apparatus includes an irradiation optical system 20 , a detection optical system 30 , and an image processor 40 . In the irradiation optical system, a mirror 2603 is...
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7332731 |
Radiation system and lithographic apparatus
A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a...
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7330265 |
Appearance inspection apparatus and projection method for projecting image of sample under inspection
An object of the present invention is to provide an appearance inspection apparatus that can change the method of illumination, the shape of illumination light, and a spatial filter for the...
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7330250 |
Nondestructive evaluation of subsurface damage in optical elements
A non-destructive process for evaluating subsurface damage in an optical element focuses a microscope at points within the optical element and measures the intensity of reflected light. In one...
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7327450 |
Apparatus for inspection of a wafer
The invention concerns an apparatus for inspection of a wafer, encompassing at least two incident-light illumination devices that radiate a respective illuminating light beam which is incident...
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7324193 |
Measuring a damaged structure formed on a wafer using optical metrology
A method of measuring a damaged structure formed on a semiconductor wafer using optical metrology, the method includes obtaining a measured diffraction signal from a damaged periodic structure. A...
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7319518 |
Double side polished wafer scratch inspection tool
The invention is a method of inspecting a semiconductor wafer surface for scratches. The method includes positioning a semiconductor wafer for illumination by a radiation source and adjacent a...
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7319517 |
Wafer chuck illumination device for use in semiconductor manufacturing equipment
A wafer chuck illumination device for illuminating a light source to detect a position of foreign substances polluting a wafer chuck is provided. The device includes a lamp for generating a white...
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7319516 |
Measurement instrument for inspecting painted bodywork parts, the instrument being provided with an anti-damage device
The invention relates to an optical measurement instrument for inspecting the quality of paintwork at the outlet from a line for painting motor vehicle bodywork parts, the instrument including a...
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7317521 |
Particle detection method
A method for detecting on a substrate used in the fabrication of integrated devices comprises the steps of (1) contacting the substrate with a monomer, wherein the particle catalyzes the...
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7316322 |
Quality evaluation apparatus for fruits and vegetables
In order to provide a quality evaluation apparatus having excellent measurement accuracy in obtaining quality evaluation values of fruits and vegetables, transmitted light from one or more measured...
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7315365 |
System and methods for classifying anomalies of sample surfaces
Two or more defect maps may be provided for the same sample surface at different detection sensitivities and/or processing thresholds. The defect maps may then be compared for better...
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7315364 |
System for inspecting a surface employing configurable multi angle illumination modes
Apparatus for inspection of a surface, the apparatus including an objective having central and peripheral regions, which is positioned to focus an input beam through the central region in a normal...
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7315363 |
Inspection method and inspection apparatus
The present invention provides an inspection apparatus and inspection method. The inspection apparatus provided by the present invention comprises an illumination optical system which illuminates...
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7315361 |
System and method for inspecting wafers in a laser marking system
An illumination system is disclosed for use in a semiconductor wafer back side inspection assembly. The illumination system includes an illumination source that is configured to direct illumination...
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7312866 |
Methods and systems for substrate surface evaluation
A method for determining a surface quality of a substrate sample using a differential interference contrast microscope is described. The microscope includes an eyepiece, an eyepiece focus...
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7312865 |
Method for in situ monitoring of chamber peeling
A method for in situ monitoring of particles generated by a reaction by-product film peeling from an interior wall of a reaction chamber of a semiconductor fabrication apparatus to determine...
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7310141 |
Inspection device and inspection method for pattern profile, exposure system
Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The...
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7310140 |
Method and apparatus for inspecting a wafer surface
In a method and an apparatus for inspecting a wafer surface, a wafer is loaded into a chamber. An incident light including a first light for sensing a vertical position of the wafer and a second...
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7308127 |
Method for determining and evaluating defects in a sample surface
In this method, the surface to be investigated is first of all exposed to collimated light and the radiation rejected therefrom supplied to a position-resolving image processing means. Then, a mask...
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7307713 |
Apparatus and method for inspection of a wafer
The invention concerns an apparatus and a method for inspection of a wafer. The apparatus encompasses at least one stroboscopic incident-light illumination device for emitting a pulsed...
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7307712 |
Method of detecting mask defects, a computer program and reference substrate
A method of detecting mask defects in which a reference substrate is patterned by the mask immediately after manufacture of the mask is disclosed. The reference substrate is stored in clean...
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