|
Match
|
Document |
Document Title |
|
|
7580121 |
Focal point detection apparatus
A focal point detection apparatus enlarges a pull-in range of an auto-focus operation easily. The apparatus includes: illumination part illuminating an object plane via first visual field stop;...
|
|
|
7495753 |
Method and apparatus for contactless measurement of the radius of curvature of an ophthalmic article
The invention relates to a method and to apparatus for contactlessly measuring the curvature of an ophthalmic article ( 1 ) having a “front” face ( 1 B) that presents said curvature. The method...
|
|
|
7450225 |
Correction of optical metrology for focus offset
A metrology system performs optical metrology while holding a sample with an unknown focus offset. The measurements are corrected by fitting for the focus offset in a model regression analysis....
|
|
|
7414713 |
Method of measuring focal point, instrument used therefor, and method of fabricating semiconductor device
A shape value of a pattern having a pivotal characteristic is measured (step S 1 ), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of...
|
|
|
7369220 |
Measuring apparatus
A measuring apparatus which applies light, emitted from a light source, to a sample contained in a container, and detects light emitted from the sample to measure physical or chemical properties of...
|
|
|
7352451 |
System method and structure for determining focus accuracy
Within a lithography process having a critical dimension, a method, system and structure for determining a focus deviation value relative to an ideal focus position said is disclosed. By projecting...
|
|
|
7292324 |
Spherical aberration detection
The invention relates to an optical device in which a spherical aberration is detected. The optical device comprises means ( 206, 208 ) for focussing a first radiation beam ( 203 ) having a first...
|
|
|
7289198 |
Process compensation for step and scan lithography
A method of process variation compensation in step-and-scan lithography which comprises estimating a magnitude of a process error over a full imaged substrate surface and applying error correction...
|
|
|
7006208 |
Defect compensation of lithography on non-planar surface
In an embodiment in accordance with the present invention, methods for dynamic detection and correction of focus and tilt variations that occur during a specific product layer exposure is by focus...
|
|
|
6991906 |
Method and device for measuring, calibrating and using laser tweezers
To measure or exert optically-induced forces on at least one particle in the focus of an optical cage, the following steps are taken:
a) the focus is positioned in a microelectrode...
|
|
|
6987915 |
Apparatus and technique for determining placement of optical components in optical communication applications
An embodiment described herein provides a technique to determine a focus point of a lense. Light is directed from a light source through the lense and onto a target surface. The light source and...
|
|
|
6836372 |
Electrostatic corrector
An electrostatic corrector with a rectilinear optical axis has two corrective parts, which are arranged one behind the other along the optical axis and which have respective quadrupole fields and...
|
|
|
6831766 |
Projection exposure apparatus using wavefront detection
A projection exposure apparatus for imaging and printing a pattern, formed on a first object, upon a second object through a projection optical system. The projection exposure apparatus includes a...
|
|
|
6819413 |
Method and system for sensing and analyzing a wavefront of an optically transmissive system
An enhanced dynamic range wavefront sensing system includes a light source disposed on a first side of an optically transmissive device, a wavefront sensor disposed on a second side of an optically...
|
|
|
6750957 |
Method and device for analysing a highly dynamic wavefront
A device for the analysis of an optical wavefront includes an array (ML) of microlenses (L i ), and signal processing elements. Each mircolens (L i ) defines a subaperature (Sp i ), and focuses an...
|
|
|
6649863 |
Gemstone marking system with a focus sensing unit for sensing relative disposition between a marking surface of the gemstone and a focal plane of a laser beam
A gemstone marking system includes a focus sensing unit sensing relative disposition between the marking surface of the gemstone and the focal plane of the laser beam. The focus sensing unit...
|
|
|
6646728 |
Calibrating a focused beam of energy in a solid freeform fabrication apparatus by measuring the propagation characteristics of the beam
The invention relates in general to calibrating a focused beam of energy in a solid freeform fabrication apparatus, and, in particular, to a method of measuring the propagation characteristics of...
|
|
|
6609941 |
Vehicle lamp assembling apparatus
An vehicle lamp assembling apparatus including a jig which supports a lamp component, an apparatus main body having disposed thereon positioning and fastening mechanisms (plungers and engagement...
|
|
|
6597441 |
Apparatus and method for calibrating reflective lens
An apparatus and a method adapted to be used in manufacturing an image scanning apparatus for calibrating a reflective lens on a carriage are disclosed. A calibrating device has thereon a first set...
|
|
|
6597440 |
Wavefront measuring method and projection exposure apparatus
A method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern. The method includes storing information related to a light intensity...
|
|
|
6577386 |
Method and apparatus for activating semiconductor impurities
An impurity doped SiC substrate 1 and SiC thin film 2 are irradiated with a laser light 5 having a wavelength longer than such a wavelength that a band edge absorption of a semiconductor is...
|
|
|
6535280 |
Phase-shift-moiré focus monitor
An optical monitor includes a body having a first plurality of parallel, substantially opaque, spaced apart lines thereon, and the second plurality of parallel, substantially opaque, spaced apart...
|
|
|
6480267 |
Wavefront sensor, and lens meter and active optical reflecting telescope using the same
A wavefront sensor includes a plurality of lenses disposed in the same plane, and an area sensor that receives a bundle of rays of light collected through each of the lenses as a luminous point....
|
|
|
6459485 |
Optical system
An optical system used in an optical measuring apparatus for measuring optical characteristics of, for example, a liquid crystal display panel (LCD panel) guides rays emitted from the LCD panel and...
|
|
|
6441894 |
Optical autofocus for use with microtiter plates
A method and apparatus for autofocus on a target layer contained within a microplate well is provided. The instrument is capable of optically sensing a reference point on the underside of a...
|
|
|
6414366 |
Thin-film magnetic head wafer and manufacturing method of thin-film magnetic head
A thin-film magnetic head wafer with a surface to be exposed by means of an optical stepper includes a plurality of thin-film magnetic head elements formed on the surface, and distance check...
|
|
|
6304322 |
Method for quality assurance testing of fiber-optic laser modules
A method for testing the reliability of fiber-optic laser modules by determining the change in position over time of the focal point of the fiber tip relative to the laser, wherein the coupling...
|
|
|
6232999 |
Method for changing focus and angle of a multichannel printhead
The present invention is for a method for adjusting a focus of a multichannel printhead (500) for an imaging processing apparatus (10) performing the steps of establishing a home focus position and...
|
|
|
6229600 |
Spherical-aberration detection system and optical device using the same
The spherical aberration of an optical beam is determined by focusing the beam, and dividing its cross-section in at least two concentric zones. The sub-beams passing through the zones are focused...
|
|
|
6195159 |
Lens testing system
A system which determines one or more properties of a lens includes a light source and a target pattern illuminated by the light source illuminates and substantially positioned at a first conjugate...
|
|
|
6184975 |
Electrostatic device for correcting chromatic aberration in a particle-optical apparatus
Electron-optical rotationally symmetrical lenses inevitably suffer from chromatic aberration which often determines the resolution limit at low acceleration voltages. This lens defect cannot be...
|
|
|
6160925 |
Data symbol reader having an optical system
A non-contact type data symbol reader is provided which includes a light projecting system for projecting an optical image defining an area capable of being read onto a readout surface. When an...
|
|
|
6151109 |
Device for detecting and calculating the focus point position, shape and power distribution of a laser beam
Device for detecting and calculating focus point position (2), shape (3) and power distribution of a laser beam after a focussing lens, and which at least incorporates a laser source (10), the...
|
|
|
6028662 |
Adjustment of particle beam landing angle
The invention relates to a method and apparatus for measuring The landing angle of a particle beam is adjusted by scanning the beam over two cylindrical beam target surfaces that are positioned...
|
|
|
5999749 |
Light projector for camera and method of adjusting the same
A light projector for camera including a light emission lamp having a filament, a lamp mounting frame which holds the light emission lamp integrally therewith as well as has a pair of support...
|
|
|
5892578 |
Focus detection device
The invention relates to a multipoint focus detection device and is to provide a device which determines a sampling point of an output of a sensor in accordance with a movement speed distribution...
|
|
|
5862265 |
Separation apparatus and method for measuring focal plane
A computer receives image data from a star-shaped optical target in the object plane and calculates angle-dependent boundary sharpness. The horizontal, x-direction, amplitude derivative and the...
|
|
|
5748323 |
Method and apparatus for wafer-focusing
A method and apparatus wherein the height over the complete surface of interest on a wafer/material is scanned and mapped, using either a central or non-central focus system. The type of data...
|
|
|
5689331 |
Laser apparatus with wander correction
A laser apparatus includes a laser for emitting a laser beam which is reflected from a primary mirror through a primary lens in a primary optical path and focused at a primary spot. A portion of...
|
|
|
5675407 |
Color ranging method for high speed low-cost three dimensional surface profile measurement
The target of the present invention is to provide an automatic high speed, low-cost, multi-mode three-dimensional(3D) surface profile measurement method. This method exploits the projected energy...
|
|
|
5521374 |
Focused laser beam measurement system and method of beam location
A laser beam measurement device comprises a pinhole aperture spaced to one side of a power meter for measuring the power level of the laser beam. The positioning system of the laser system causes...
|
|
|
5514867 |
Apparatus for determining the radial intensity distribution of laser radiation
A waveguide is arranged in radial extension on a support mounted in rotary manner and whose pivot pin is parallel to the laser beam axis. The outer end thereof intersects the laser beam during a...
|
|
|
5496669 |
System for detecting a latent image using an alignment apparatus
The system comprises a latent image detection device comprising an alignment device which uses non-actinic radiation (10) and which is intended for aligning the mask pattern with respect to the...
|
|
|
5386257 |
Apparatus for aligning the optical system of a lamphouse and a movie projector
Apparatus for aligning the optical systems of a lamphouse and a movie projector in the form of a laser alignment tool having a single beam laser with a diffraction grating to split the beam into...
|
|
|
5343287 |
Integrated atmospheric transverse coherence length/laser radiation angle-of-arrival measurement system
The System is a test instrument used to measure the quality of the optical path through the atmosphere. The device measures the atmospheric transverse coherence length, also known as Fried's...
|
|
|
5257051 |
Method and apparatus for adjusting the optical alignment of a film projection system
A method and apparatus for adjusting the optical alignment of a film projection system of the type having a film gate with a central opening, a lens mount having lenses optically aligned along an...
|
|
|
5177343 |
Symbol reader using differentiating circuit for light beam focusing
A symbol reader for reading symbols on a symbol surface. An optical system including a laser, condensing lens and scanning mirror illuminate a symbol surface to be read with a laser beam, scanning...
|
|
|
4929083 |
Focus and overlay characterization and optimization for photolithographic exposure
The focus and overlay alignment of photolithographic exposure tools of the type wherein the location of the wafer is accurately tracked with respect to a baseline position, such as in step and...
|
|
|
4893926 |
Focusing for optical print heads
A device for generating printed output has an array of point light sources focused onto a photosensitive surface. The array is spaced from the surface substantially at the position of best focus by...
|
|
|
4798437 |
Method and apparatus for processing analog optical wave signals
Discrete segments of an analog optical wave signal are collected in individual waveguides of a waveguide array. In the waveguide array, the optical signal is processed to provide an analysis of the...
|