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7626684 |
Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration...
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7623220 |
Source optimization for image fidelity and throughput
A system and method for optimizing an illumination source to print a desired pattern of features dividing a light source into pixels and determining an optimum intensity for each pixel such that...
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7619717 |
Method for performing a focus test and a device manufacturing method
The invention relates to a method for a focus test. The method includes performing a first projection by using a radiation beam to project a first reference mark onto a substrate to generate a...
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7619716 |
Exposure method
An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on...
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7618755 |
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields
By automatically estimating the focus status of individual substrates or lots on the basis of focus-specific tool information obtained from the exposure tool, such as tilt angle ranges used during...
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7612865 |
Pattern writing apparatus and pattern writing method
Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror...
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7609361 |
Substrate processing method and substrate processing system
A substrate processing method and a substrate processing system exclude wafers W provided with a protective film having surface defects that will cause components of a resist to dissolve in an...
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7605907 |
Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method
The present invention provides a method for forming a substrate for use in calibrating a metrology tool in order to compensate for orientation-dependent variations within the metrology tool.
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7602475 |
System and method for providing modified illumination intensity
A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection...
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7598507 |
Adjustable lithography blocking device and method
The present invention provides, in one embodiment, a method ( 100 ) of manufacturing a semiconductor device. A conventionally formed reticle is positioned over a resist located on a substrate ( 110...
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7589821 |
Exposure apparatus and device manufacturing method
A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes...
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7589820 |
Exposure apparatus and method for producing device
An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate...
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7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The...
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7583362 |
Stray light feedback for dose control in semiconductor lithography systems
A stray light feedback system and method for a lithography exposure tool. The stray light feedback helps control critical dimension (CD) within a stray light specification limit. A stray light dose...
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7583359 |
Reduction of fit error due to non-uniform sample distribution
A weighted fit based on a sample density of a plurality of samples is used to determine an alignment curve. A scan that produces the samples may include portions having greater and lesser sample...
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7583358 |
Systems and methods for retrieving residual liquid during immersion lens photolithography
Systems and methods for retrieving residual liquid during immersion lens photolithography are disclosed. A method in accordance with one embodiment includes directing radiation along a radiation...
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7580113 |
Method of reducing a wave front aberration, and computer program product
A method of reducing a wave front aberration is provided for a lithographic process whereby the reducing is based on the selected pattern to be printed and the selected illumination mode used for...
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7580112 |
Containment system for immersion fluid in an immersion lithography apparatus
A containment system contains an immersion fluid in an immersion area to fill a gap between a projection system and an object to be exposed with the immersion fluid. The containment system includes...
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7573560 |
Supporting plate, stage device, exposure apparatus, and exposure method
An exposure apparatus exposes a pattern onto a substrate. The exposure apparatus includes a supporting plate having a surface, a substrate stage which holds the substrate and is movable over the...
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7564556 |
Method and apparatus for lens contamination control
The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an...
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7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations
A lithographic scanning apparatus includes a light projection device for seamlessly and uniformly projecting a scanning light onto a light exposing area. The light projecting device further...
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7564534 |
Alignment system and method
An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where...
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7563562 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto...
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7561250 |
Lithographic apparatus having parts with a coated film adhered thereto
A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement...
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7557900 |
Exposure apparatus, device manufacturing method, maintenance method, and exposure method
An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure...
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7545497 |
Alignment routine for optically based tools
A method is provided for using a point of interest as a starting point where an alignment is automatically selected by recognition software for a patterned substrate. The method includes disposing...
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7544960 |
Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film...
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7542141 |
Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers
An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the...
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7538853 |
Exposure process and apparatus using glass photomasks
An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the...
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7525646 |
Multiple pattern generator integration with single post expose bake station
A system and method of operation for a lithographic system having multiple exposure stations sharing one or more post-expose bake station and a centralized control system that schedules work...
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7522261 |
Lithographic apparatus and device manufacturing method
An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the...
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7518703 |
Lithographic apparatus and method
A lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate using a projection system. The lithographic apparatus comprises: an illumination...
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7515249 |
Substrate carrying apparatus, exposure apparatus, and device manufacturing method
A substrate carrying apparatus, comprises: a first carrying mechanism that carries a substrate into an exposure processing unit that performs exposure processing via a projection optical system and...
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7515245 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning...
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7505113 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate includes a position measuring system configured to...
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7502097 |
Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
The invention is directed to a method for performing a tilted focus test that includes providing a target object, providing a projection beam of radiation using a radiation source, providing at...
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7499147 |
Generation method of light intensity distribution, generation apparatus of light intensity distribution, and light modulation element assembly
A generation method of a light intensity distribution uses a first light modulation element and a second light modulation element which are arranged to be apart from each other by a distance D and...
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7495745 |
Patterning method and computer readable medium therefor
A patterning method performed by a direct patterning apparatus, and a computer readable medium for controlling a computer of the direct patterning apparatus to perform the pattering method. The...
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7495742 |
Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method
A method for measuring an optical performance of a projection optical system in an exposure apparatus that exposes a pattern on a reticle onto a substrate includes the steps of determining an pupil...
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7486380 |
Wafer table for immersion lithography
Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus...
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7486379 |
Exposure apparatus, method applied to the apparatus, and device manufacturing method
An exposure apparatus for exposing a substrate to light via an original plate. A projection optical system projects a pattern of the original plate onto the substrate, a liquid immersion mechanism...
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7483117 |
Exposure method, exposure apparatus, and method for producing device
An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate...
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7482110 |
Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer
The invention relates to a method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer. An exposure device ( 5 )...
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7477403 |
Optical position assessment apparatus and method
An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A...
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7477390 |
Exposure method and apparatus, and device manufacturing method
An exposure method of exposing a substrate arranged on a stage, which holds the substrate and moves, to light through an original and a projection optical system. A first measurement is performed...
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7477370 |
Method of detecting incomplete edge bead removal from a disk-like object
A method of detecting incomplete edge bead removal from a disk-like object is disclosed. First a peripheral area of a disk-like reference object is imaged. Marks are then defined in the peripheral...
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7477353 |
Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device
A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of...
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7474386 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method
There is disclosed a wafer flatness evaluation method includes measuring front and rear surface shapes of a wafer. The wafer front surface measured is divided into sites. Then, a flatness...
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7474381 |
Exposure apparatus and device manufacturing method
An exposure apparatus configured to expose a substrate to radiant energy via an original plate while scanning of the original plate and the substrate are performed including a projection optical...
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7474379 |
Lithographic apparatus and device manufacturing method
An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two...
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