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7426011 Method of calibrating a lithographic apparatus and device manufacturing method  
In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets...
7423732 Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane  
A lithography system comprises an illumination system that supplies radiation and a projection system comprising an optical system and a patterning device located at a pupil plane. The patterning...
7423728 Immersion exposure method and apparatus, and manufacturing method of a semiconductor device  
There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical...
7423721 Lithographic apparatus  
A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection...
7420655 Reticle-carrying container  
The present invention allows a reticle-carrying container 11 to be fastened in a reticle stocker 2 even if the reticle-carrying container 11 is wrongly oriented. The reticle-carrying...
7420654 Method of varying dimensions of a substrate during nano-scale manufacturing  
The present invention is directed toward a method to vary dimensions of a substrate supported by a chuck. The method includes applying compressive forces to the substrate with the actuator assembly...
7417714 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage  
A stage assembly ( 220 ) that moves a work piece ( 200 ) about a first axis and along a first axis includes a first stage ( 238 ), a second stage ( 240 ) that retains the work piece ( 200 ), a...
7417710 Lithographic apparatus and device manufacturing method  
A lithographic apparatus includes a liquid supply system to supply an immersion liquid between a downstream lens of a projection system of the lithographic apparatus and a substrate. The...
7413586 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles  
A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier...
7411658 Lithographic apparatus and device manufacturing method  
A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts...
7411657 Lithographic apparatus and device manufacturing method  
A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the...
7408625 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Safety mechanism for a lithographic patterning device  
A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of...
7408624 Lithographic apparatus and device manufacturing method  
A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to...
7408623 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Lithographic support structure  
The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a...
7408617 Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method  
A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an...
7405811 Lithographic apparatus and positioning apparatus  
A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference...
7403263 Exposure apparatus  
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between...
7400383 Environmental control in a reticle SMIF pod  
The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled...
7397539 Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof  
The invention relates to a transfer apparatus for transferring an object. The transfer apparatus comprises a gripper for either gripping the object at a first position and then releasing the object...
7394526 Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method  
A stage apparatus including: a movement member movable with a plate member placed on a placement surface; and a fixing apparatus that fixes said plate member to said placement surface in parallel...
7394525 Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method  
The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning...
7394524 Lithographic apparatus, device manufacturing method, and device manufactured thereby  
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned...
7391496 Exposure apparatus  
An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a...
7391495 Stage apparatus, exposure system using the same, and device manufacturing method  
A stage apparatus includes a base having a reference surface, a moving unit which moves along the reference surface, a static bearing which is provided in the moving unit and which supports the...
7385679 Lithographic apparatus and actuator  
A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate and includes an electromagnetic actuator to actuate a part of the lithographic apparatus in a...
7385678 Positioning device and lithographic apparatus  
A positioning device for positioning an object table relative to a reference frame with a drive unit including a first part connectable to the reference frame and a second part for holding the...
7385675 Lithographic apparatus and device manufacturing method  
A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
7385674 Exposure apparatus and device manufacturing method  
An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said...
7382440 Lithographic apparatus and device manufacturing method  
A transporter is provided for moving a substrate and a patterning device relative to one another in a lithographic apparatus. The transporter includes a beam, a driver, and a slide. The slide is...
7382435 Exposure apparatus  
An exposure apparatus which irradiates a photosensitive agent applied to a substrate to form a latent image pattern on the photosensitive agent. The exposure apparatus includes a substrate stage...
7379162 Substrate-holding technique  
A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus...
7379156 Lithographic apparatus and device manufacturing method  
A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a...
7375800 Non-contact pneumatic transfer for stages with small motion  
Methods and apparatus for enabling a fine stage to be moved using pneumatics such that disturbances associated with a pneumatic transfer system are not transmitted to the fine stage are disclosed....
7375797 Utilities transfer system in a lithography system  
Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques...
7375795 Lithographic apparatus, device manufacturing method, and device manufactured thereby  
Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements...
7375346 Positioning device and method of initializing a positioning device  
In order to realize initializing sequences with high accuracy and high reproducibility, a positioning device according includes an XY slider movable in directions X and Y, an object position...
7372549 Lithographic apparatus and device manufacturing method  
A lithographic apparatus is disclosed that has a support structure constructed to support a patterning object, the patterning object being capable of imparting a radiation beam with a pattern in...
7372049 Lithographic apparatus including a cleaning device and method for cleaning an optical element  
An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication...
7365830 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method  
There is disclosed a wafer flatness evaluation method includes measuring front and rear surface shapes of a wafer. The wafer front surface measured is divided into sites. Then, a flatness...
7365827 Lithographic apparatus and device manufacturing method  
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the...
7365513 Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device  
A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular...
7362412 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system  
A method and apparatus for reduction and prevention of residue formation and removal of residues formed in an immersion lithography tool. The apparatus including incorporation of a cleaning...
7359034 Exposure apparatus and device manufacturing method  
An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said...
7359032 Lithographic apparatus and device manufacturing method  
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second...
7359031 Lithographic projection assembly, load lock and method for transferring objects  
Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment...
7359030 Lithographic apparatus and device manufacturing method  
A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A...
7355676 Environmental system including vacuum scavenge for an immersion lithography apparatus  
An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near...
7355674 Lithographic apparatus, device manufacturing method and computer program product  
Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve...
7352440 Substrate placement in immersion lithography  
A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a...
7352438 Lithographic apparatus and device manufacturing method  
The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping...
Matches 1 - 50 out of 1106 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 >