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7623220 |
Source optimization for image fidelity and throughput
A system and method for optimizing an illumination source to print a desired pattern of features dividing a light source into pixels and determining an optimum intensity for each pixel such that...
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7623219 |
Exposure apparatus, exposure method, device manufacturing method
An exposure method for exposing a pattern of a reticle which has a patterned area that has the pattern, and a light shielding area provided around the patterned area, said exposure method includes...
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7612867 |
Lithographic apparatus
A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a...
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7609362 |
Scanning lithographic apparatus and device manufacturing method
A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements....
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7602475 |
System and method for providing modified illumination intensity
A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection...
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7602474 |
Exposure apparatus
An exposure apparatus which exposes a substrate to light. An illumination optical system illuminates a mask with illumination light, and a projection optical system projects a pattern of the mask...
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7593095 |
System for reducing the coherence of laser radiation
The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial...
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7586113 |
EUV illumination system
An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV...
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7573563 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the...
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7554648 |
Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle
Blind devices and related methods for lithography systems are described. An exemplary system has a vacuum chamber with first and second chamber portions. In a member between the chambers is defined...
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7551263 |
Device for adjusting the illumination dose on a photosensitive layer
A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction...
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7548302 |
Lithographic apparatus and device manufacturing method
A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination...
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7545483 |
Optical element unit for exposure processes
An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected...
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7545478 |
Lithographic apparatus, thermal conditioning system, and method for manufacturing a device
A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of...
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7542127 |
Lithographic apparatus and method for manufacturing a device
A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate...
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7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam
An ion beam irradiating apparatus has: a beam profile monitor 14 which measures a beam current density distribution in y direction of an ion beam 4 in the vicinity of a target 8; movable...
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7538875 |
Lithographic apparatus and methods for use thereof
A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the...
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7538854 |
Measuring apparatus and exposure apparatus having the same
A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a...
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7532309 |
Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging...
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7532308 |
Lithographic apparatus and device manufacturing method
A uniformity controller is arranged to control a profile of a radiation intensity along the length of a target portion of a substrate so as to substantially compensate for irradiation-induced...
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7525642 |
Lithographic apparatus and device manufacturing method
A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable,...
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7525640 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element...
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7525635 |
Contamination barrier and lithographic apparatus
A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an...
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7518707 |
Exposure apparatus
An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a plate to be exposed. A pupil filter has a first area arranged on a light axis of the projection...
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7518706 |
Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly
The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a...
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7518705 |
Lithographic apparatus and device manufacturing method
The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam; a support constructed to support a first and a second patterning...
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7515248 |
Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment
An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the...
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7511886 |
Optical beam transformation system and illumination system comprising an optical beam transformation system
An optical beam transformation system has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light...
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7511884 |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive...
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7511799 |
Lithographic projection apparatus and a device manufacturing method
A lithographic apparatus wherein a dipole illumination mode used for printing a line pattern, is arranged to provide quadrupole illumination. Radiation emanating from the two additional poles and...
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7508598 |
Apparatus for measuring aerial images produced by an optical lithography system
At least one exemplary embodiment is directed to detection aperture array which includes a shield layer; and a plurality of apertures, where the plurality of apertures are formed in the shield...
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7508580 |
8-mirror microlithography projection objective
A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S 1 ),...
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7508493 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a...
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7505117 |
Polarizing element, method of manufacturing polarizing element, method of evaluating exposure apparatus, method of manufacturing semiconductor device, and exposure apparatus
A polarizing element is disclosed which includes a smooth glass substrate and a polarization layer formed thereon, the polarization layer having polarization characteristics for the incident light....
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7499148 |
Polarizer, projection lens system, exposure apparatus and exposing method
The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly...
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7495744 |
Exposure method, exposure apparatus, and method for producing device
When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid ( 1 ), an exposure method includes a determination of a liquid immersion...
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7492510 |
Optical element having antireflection film, and exposure apparatus
An optical element includes a substrate that transmits a light having a central wavelength in a wave range between 150 nm and 250 nm, and an n-layer antireflection film that is formed on the...
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7489387 |
Exposure apparatus and device fabrication method
An exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system configured to project a...
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7483122 |
Projection optical system, exposure apparatus, and exposure method
A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each...
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7483121 |
Microlithograph system
An optical system of a microlithographic exposure apparatus comprises at least one optical element (L 1 to L 16, 15, 16, 24 ) having a locally varying birefringence direction distribution that is...
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7482110 |
Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer
The invention relates to a method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer. An exposure device ( 5 )...
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7477357 |
Exposure apparatus and device manufacturing method
A scan exposure apparatus includes first and second light-shielding plates arranged within an illumination optical system for illuminating an original, the plates defining a region of the original...
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7471375 |
Correction of optical proximity effects by intensity modulation of an illumination arrangement
A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first...
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7471371 |
Exposure apparatus and device fabrication method
This exposure system projects a pattern image onto a substrate via a projection optical system and a liquid to expose the substrate, with a space between the projection optical system and the...
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7469058 |
Method and system for a maskless lithography rasterization technique based on global optimization
Provided are a method and system for determining states of spatial light modulator (SLM) pixels in a lithography system configured to print a desired pattern. The method includes determining...
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7468781 |
Exposure apparatus
An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a...
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7468238 |
Maskless photolithography for using photoreactive agents
The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using photoreactive chemicals. In an embodiment, the...
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7463418 |
Polarization element unit and polarization light emitting apparatus
In the present wire grid polarization element unit and polarized light emitting apparatus, it is possible to prevent non-polarized light, which has bad extinction ratio from leaking from end...
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7463413 |
Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement...
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7463335 |
Exposure apparatus, and device manufacturing method
An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a...
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