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7595862 |
Exposure apparatus and method of manufacturing device
An exposure apparatus includes a light source; an illumination optical system that illuminates an original with the light; a substrate stage that holds and moves a substrate; a projection optical...
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7580116 |
Exposure apparatus and device fabrication method
The present invention provides an exposure apparatus including a position detection apparatus that detects at least one of a position of a reticle and a position of a substrate. The position...
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7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam
An ion beam irradiating apparatus has: a beam profile monitor 14 which measures a beam current density distribution in y direction of an ion beam 4 in the vicinity of a target 8; movable...
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7525638 |
Lithographic apparatus and device manufacturing method
A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first...
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7521700 |
Raster frame beam system for electron beam lithography
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a...
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7466396 |
Lithography apparatus and method utilizing pendulum interferometer system
Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the...
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7432492 |
Image reading apparatus capable of reading infrared and visible images
An image reading apparatus includes a light source with a first luminescent portion that outputs light with a first wavelength range and a second luminescent portion that outputs light with a...
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7417709 |
Method and apparatus for exposing semiconductor substrates
Provided are methods and apparatus for exposing multiple substrates within a single exposing apparatus using only a single light source wherein a first substrate is exposed in a series of steps or...
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7403263 |
Exposure apparatus
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between...
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7375353 |
Lithographic apparatus and device manufacturing method
An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus....
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7324187 |
Illumination system and exposure apparatus
Disclosed is an illumination optical system and an exposure apparatus having the same, and specifically, as an aspect of the invention, an illumination optical system for illuminating a surface to...
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7317506 |
Variable illumination source
An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable...
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7265815 |
System and method utilizing an illumination beam adjusting system
A method and system are used to control a characteristic of a beam. The system comprises an illumination system, at least one optical element, a fluid source, and a pressure and/or fluid...
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7230220 |
Method of determining optical properties and projection exposure system comprising a wavefront detection system
A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating...
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7209218 |
Exposure apparatus and method for manufacturing device using the exposure apparatus
At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting...
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7187431 |
Lithographic apparatus, method of determining properties thereof and computer program
A system is disclosed that includes an interferometric sensor for measuring the wavefront of a radiation beam at, the interferometric sensor having a detector; an actuator for displacing the...
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7161660 |
Photolithography system and method of monitoring the same
A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a...
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7158232 |
Substrate processing apparatus
In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented...
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7130021 |
Exposure apparatus, and device manufacturing method
Disclosed is a scan type exposure apparatus for exposing a substrate, placed on an exposure plane, to a pattern of a mask with light from a light source. In one preferred embodiment, the apparatus...
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7113261 |
Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby
A radiation system includes a radiation generator to generate radiation, a source, and an illumination system configured to receive the radiation and provide a beam of radiation. The illumination...
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6980276 |
Luminous source apparatus, image projecting apparatus and image projection converting apparatus
A photosensor detecting light-emission quantity from a light-emission lamp is set up, in order to regulate the current supplied with the light-emission lamp from a power according to a...
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6956640 |
Light energy detecting apparatus for exposure condition control in semiconductor manufacturing apparatus
A light energy inspecting apparatus provides an optimum exposure condition in photolithographic apparatus by sensing the energy levels of light passing through the aperture of a diaphragm. The...
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6934007 |
Method for photolithography using multiple illuminations and a single fine feature mask
A method forms a feature pattern on a substrate by exposing the substrate, using a mask having a pattern of features thereon, with illumination having a first set of settings. The substrate is...
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6919952 |
Direct write lithography system
The mask-less lithography system has a converter that includes an array of light controllable electron sources. Each electron source is arranged for converting light into an electron beam and has...
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6903800 |
Film-processing method and film-processing apparatus
A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to...
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6894764 |
Illumination optical system, exposure apparatus having the same, and device fabricating method
An illumination optical system for illuminating a reticle using light from a light source includes an illumination-light generating mechanism for generating a light amount distribution on a plane...
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6888618 |
Exposure apparatus and exposure method
A scan type exposure apparatus wherein a pattern of an original is lithographically transferred to a substrate sequentially while the original and the substrate are scanningly moved relative to...
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6875971 |
Wafer edge exposure apparatus, and wafer edge exposure method
A wafer edge exposure apparatus is provided with an optical section for radiating exposure light onto the edge of a semiconductor wafer. The optical section is provided with a focus sensor for...
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6870603 |
Lithographic apparatus and method to determine beam characteristics
A lithographic apparatus is provided that has an aperture, a detector configured to detect an intensity of a radiation beam directed through the aperture and a processor configured to vary the...
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6856378 |
Method of photolithographic exposure dose control as a function of resist sensitivity
A predictive method is used to compensate for intermediate batch sensitivities which inevitably occur during resist batch changeover. The compensation is applied to historical dose levels to arrive...
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6844913 |
Optical exposure apparatus for forming an alignment layer
A system for processing a multilayer liquid crystal film display material, with multiple irradiation apparatus ( 60 ) for applying a zone of polarized UV irradiation onto a substrate fed from a web...
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6839126 |
Photolithography process with multiple exposures
A photolithography process with multiple exposures is provided. A photomask is placed and aligned above a wafer having a photoresist formed thereon at a predetermined distance. Multiple exposures...
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6825481 |
Exposure apparatus, control method thereof, and device manufacturing method using the same
EUV exposure apparatus for transferring a pattern on a reticle to a wafer, includes an illumination optical system having a plurality of illumination system mirrors for directing EUV light to the...
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6803991 |
Exposure amount control method in exposure apparatus
An exposure amount control method includes steps of illuminating an original with exposure light, emitted from a light source, through one or more light intensity uniforming optical systems, so...
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6801296 |
Image processing method, image processing apparatus and image recording apparatus
An image processing method to conduct an image processing on image signals indicating an image obtained through photographing by a photographing apparatus for generating image signals for output....
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6798495 |
Exposure apparatus, exposure method and device production method
An exposure apparatus comprising a light source which emits a light including a main light having a wavelength to expose a substrate and sub light having a different wavelength from that of the...
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6765648 |
Image sensor unit and image reader using the same
An image reader for optically reading an image on an original and an image sensor unit for mounting to the image reader. The image sensor unit is provided with a shaft used for rotatably mounting...
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6741326 |
Methods, apparatus, and systems for detecting partial-shading encodement filtering
In a photography method, a determination is made that a set of captured images includes one or more encoded captured images having a partial shading encodement. The encodement has a predetermined...
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6721033 |
Exposure apparatus and exposure method
A photolithography exposure apparatus exposes a substrate to a pattern image formed on a mask to transfer the pattern onto the substrate. The apparatus includes a substrate stage on which the...
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6717652 |
Exposure apparatus, exposure method and semiconductor device fabricated with the exposure method
An exposure apparatus and an exposure method according to the present invention comprise an average illuminance operation unit for averaging illuminance values obtained from four illuminance meters...
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6680775 |
Substrate treating device and method, and exposure device and method
The mask guiding device of the present invention has a mask guiding device that guides a substrate received from the outside. The mask guiding device is provided with a plurality of receiving...
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6642994 |
Optical exposure apparatus and photo-cleaning method
Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic...
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6624878 |
Laser writer
A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device...
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6583853 |
Method of measuring exposure condition in projection exposure apparatus
A method of obtaining an optimum exposure condition of a step-and-scan exposure apparatus, the step-and-scan exposure apparatus synchronously moving a mask and a substrate relative to an...
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6570642 |
Method and apparatus for placing identifying mark on semiconductor wafer
A tool for placing an identifying mark on a semiconductor wafer has a bundle of optical fibers that can be illuminated in a pattern representing an identifying character. Light from the fibers is...
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6559923 |
Image reproducing apparatus which performs the same processing on image data to be displayed as image data to be printed
An image reproducing apparatus to reproduce input image data supplied from an image data supply source as a visible image, which comprises a display, a printer, and an image processing device which...
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6542222 |
Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system
The present invention relates to a beam output control method in which an output from a pulse energy source that emits pulses of exposure beam used in an exposure apparatus is controlled. This...
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6538723 |
SCANNING EXPOSURE IN WHICH AN OBJECT AND PULSED LIGHT ARE MOVED RELATIVELY, EXPOSING A SUBSTRATE BY PROJECTING A PATTERN ON A MASK ONTO THE SUBSTRATE WITH PULSED LIGHT FROM A LIGHT SOURCE, LIGHT SOURCES THEREFOR, AND METHODS OF MANUFACTURING
In a scanning exposure apparatus and method, a pattern formed on a mask is transferred onto a substrate by scanning the mask and the substrate synchronously with respect to pulsed light emitted...
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6538722 |
Projection exposure method, projection exposure apparatus, and methods of manufacturing and optically cleaning the exposure apparatus
A laser beam emitted from an exposure laser beam source has a uniform illuminance distribution after passing through a fly-eye lens selected according to the aperture stop. The exposure light is...
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6535829 |
System for calculating exposure energy
The present invention provides a system, comprising an exposure apparatus and a control mean electrically connected to the exposure apparatus, for calculating exposure energy (E e ). The control...
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