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7636149 |
Optical systems that correct optical irregularities, and projection-exposure systems and methods comprising same
An object of this invention is to reduce even slight irregularities in illumination that occur after assembly of an optical system. To this end, in an exemplary illumination-optical system, a light...
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7633073 |
Lithographic apparatus and device manufacturing method
In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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7630057 |
Projection optical system, exposure apparatus, and device manufacturing method
An 8-mirror reflecting type projection optical system. A first reflecting image forming optical system forms an intermediate image of a first surface and a second reflecting image forming optical...
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7630052 |
Exposure processing system, exposure processing method and method for manufacturing a semiconductor device
An exposure processing system comprises an exposure apparatus to expose a resist on a wafer, a heating apparatus comprising heating apparatus units, the heating apparatus heating the exposed resist...
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7630058 |
Exposure apparatus and device manufacturing method
This invention provides an exposure apparatus which exposes a substrate ( 51 ) with a pattern formed on a reticle ( 3 ), and includes a projection optical system ( 1 ) including an optical element...
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7626770 |
Illumination system with zoom objective
Illumination systems which are designed to illuminate a field in a field plane and simultaneously illuminate a pupil plane with radiation from a light source are disclosed.
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7623219 |
Exposure apparatus, exposure method, device manufacturing method
An exposure method for exposing a pattern of a reticle which has a patterned area that has the pattern, and a light shielding area provided around the patterned area, said exposure method includes...
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7623220 |
Source optimization for image fidelity and throughput
A system and method for optimizing an illumination source to print a desired pattern of features dividing a light source into pixels and determining an optimum intensity for each pixel such that...
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7619715 |
Coupling apparatus, exposure apparatus, and device fabricating method
An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate...
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7618755 |
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields
By automatically estimating the focus status of individual substrates or lots on the basis of focus-specific tool information obtained from the exposure tool, such as tilt angle ranges used during...
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RE40974 |
Apparatus for scanning documents in front of a document plate
The present invention provides a scanning device. The scanning device comprises a document plate for placing a document, at least a sliding guide placed at one side of the document plate, a...
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7612867 |
Lithographic apparatus
A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a...
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7612864 |
Exposure apparatus and method
An exposure apparatus includes an optical system generating light, a mask, a light-absorbing member and a substrate plate. The mask includes a mask body disposed at a path of the light, a first...
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7612865 |
Pattern writing apparatus and pattern writing method
Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror...
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7612866 |
Lithography system
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the...
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7609362 |
Scanning lithographic apparatus and device manufacturing method
A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements....
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7609363 |
Helical optical pulse stretcher
A lithographic system and method using an illumination system, a single pass pulse stretcher, an optical system, a patterning device and a projection system. The optical system is arranged around...
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7605906 |
Patterning systems using photomasks including shadowing elements therein
A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking...
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7602475 |
System and method for providing modified illumination intensity
A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection...
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7602474 |
Exposure apparatus
An exposure apparatus which exposes a substrate to light. An illumination optical system illuminates a mask with illumination light, and a projection optical system projects a pattern of the mask...
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7602473 |
Exposure apparatus and device manufacturing method using the same
An exposure apparatus includes an illumination optical system adapted to illuminate a reflection mask with light from an exposure light source, and a projection optical system adapted to project a...
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7595862 |
Exposure apparatus and method of manufacturing device
An exposure apparatus includes a light source; an illumination optical system that illuminates an original with the light; a substrate stage that holds and moves a substrate; a projection optical...
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7593094 |
Patterning device
A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device,...
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7593091 |
Imaging or exposure device, in particular for making an electronic microcircuit
The imaging or exposure device comprises a radiation source ( 1 ), a reticle ( 3 ) mounted between the radiation source and an optical projection system ( 4 ) for shaping the radiation downstream...
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7586113 |
EUV illumination system
An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV...
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7582414 |
Method and system for drying a substrate
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion liquid from the thin film is performed prior...
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7584162 |
Manufacture data analysis method and manufacture data analyzer apparatus
It is an object of the present invention to improve analysis accuracy of manufacture data with missing values. First, an analysis target explanatory variable is selected. The manufacture data...
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7583360 |
Method for photolithography using multiple illuminations and a single fine feature mask
A method forms a feature pattern on a substrate by exposing the substrate, using a mask having a pattern of features thereon, with illumination having a first set of settings. The substrate is...
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7580110 |
Exposure apparatus and exposure method
An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting...
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7580115 |
Exposure apparatus and method, and device manufacturing method
An exposure apparatus for exposing a substrate by scanning a reticle and the substrate relative to each other includes a projection optical system configured to project a pattern of the reticle...
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7572019 |
Adaptive-optics actuator arrays and methods for using such arrays
Actuator arrays for use in adaptive-optical elements and optical systems containing at least one such element are disclosed. The actuator arrays provide more precise control of the shape of the...
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7573562 |
Reflective optical element and exposure apparatus
An exposure apparatus includes (A) an illumination optical system that illuminates a reticle with illumination light from a light source, and (B) a projection optical system that includes a...
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7573561 |
Method and apparatus for maskless photolithography
A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system is provided. In an embodiment, the pattern generator comprises a...
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7573563 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the...
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7570345 |
Method of optimizing imaging performance
A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a...
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7567395 |
Lens module assembly and imaging system having same
A lens module assembly and an imaging system are disclosed. The imaging system includes the lens module assembly and an image sensor received in the assembly. The lens module assembly includes a...
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7566893 |
Best focus detection method, exposure method, and exposure apparatus
An aerial image of a measurement mark arranged on a measurement mask is conformed to a center in an X-axis direction of a slit arranged on a Z tilt stage. While illuminating the measurement mark...
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7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations
A lithographic scanning apparatus includes a light projection device for seamlessly and uniformly projecting a scanning light onto a light exposing area. The light projecting device further...
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7563562 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto...
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7561252 |
Interferometric lithography system and method used to generate equal path lengths of interfering beams
A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done...
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7561251 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an...
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7557902 |
Projection objective
A projection objective 1 for short wavelengths, in particular for wavelengths λ<157 nm is provided with a number of mirrors [M 1, M 2, M 3, M 4, M 5 and M 6] that are arranged...
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7554648 |
Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle
Blind devices and related methods for lithography systems are described. An exemplary system has a vacuum chamber with first and second chamber portions. In a member between the chambers is defined...
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7554649 |
Projection optical system, exposure apparatus and device fabricating method
There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces...
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7551263 |
Device for adjusting the illumination dose on a photosensitive layer
A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction...
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7551261 |
Illumination system for a microlithography projection exposure installation
An illumination system for a microlithography projection exposure apparatus has a light distribution device ( 21 ), which generates a two-dimensional intensity distribution from the light from a...
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7550251 |
Liquid transfer articles and method for producing the same using digital imaging photopolymerization
A liquid transfer article is provided including a support assembly and an imaged surface formed directly on the surface of the support assembly by digital photopolymerization. The support assembly...
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7548301 |
Maskless optical writer
A maskless pattern generating system for use in lithographic processing includes a liquid crystal pixel array. The system generates a light beam and applies a voltage level to each pixel of the...
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7548352 |
Illumination device, document reading device, adjusting device, and image forming apparatus
An illumination device for a reading device which irradiates light over a predetermined illumination width including a reading area having a predetermined reading width extending in a main scanning...
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7548302 |
Lithographic apparatus and device manufacturing method
A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination...
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