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7414700 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus  
A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H 2 containing gas in at least part of the apparatus includes...
7414240 Particle remover, exposure apparatus having the same, and device manufacturing method  
A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting...
7411656 Optically polarizing retardation arrangement, and a microlithography projection exposure machine  
A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a...
7411651 PSM alignment method and device  
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern,...
7411650 Immersion photolithography system and method using microchannel nozzles  
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the...
7411202 Irradiating apparatus  
An irradiating apparatus includes a support member and a reflector supported by the support member to define a concave light energy reflector surface. A light source of radiating energy is disposed...
7408716 Refractive projection objective for immersion lithography  
A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative...
7408622 Illumination system and polarizer for a microlithographic projection exposure apparatus  
An illumination system for a microlithographic projection exposure apparatus includes a light source ( 1 ) for generating projection light, a masking arrangement ( 5 ) for masking a reticle (R) and...
7408621 Projection exposure system  
A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system...
7408616 Microlithographic exposure method as well as a projection exposure system for carrying out the method  
In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method,...
7405871 Efficient EUV collector designs  
A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light...
7405809 Illumination system particularly for microlithography  
An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of...
7405808 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus  
An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least...
7405807 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method  
An optical image is formed in a resist layer ( 5 ) by a number of subilluminations, in each of which an array of light valves ( 21 25 ) and a corresponding array ( 40 ) of light converging elements...
7405806 Imaging system and method employing beam folding  
A maskless lithography system is disclosed that includes a spatial light modulator, first and second imaging areas, and first folding optics. The spatial light modulator receives illumination from...
7405804 Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby  
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to...
7405413 Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation  
The invention is directed to an arrangement for providing target material for the generation of short-wavelength electromagnetic radiation, in particular EUV radiation. It is the object of the...
7405031 Lithographic apparatus and device manufacturing method  
A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a...
7403267 System and method for providing modified illumination intensity  
A system and method utilize a birefringence inducer to induce or change birefringence of an optical element to change an index of refraction within the optical element to produce a...
7403266 Maskless lithography systems and methods utilizing spatial light modulator arrays  
A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern...
7403265 Lithographic apparatus and device manufacturing method utilizing data filtering  
An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system...
7403264 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus  
A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration...
7403262 Projection optical system and exposure apparatus having the same  
A projection optical system used for an exposure apparatus to projecting a reduced size of an image of an object onto an image plane includes plural refractive elements that dispense with a...
7403236 Programmable mask and method of fabricating biomolecule array using the same  
The present invention relates to a programmable mask used in a photolithography process for fabricating a biomolecule array and a method of fabricating a biomolecule array using the same and, more...
7400699 Illumination system with raster elements of different sizes  
There is provided an illumination system for lithography with wavelengths of ≦193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first...
7400382 Light patterning device using tilting mirrors in a superpixel form  
A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength (λ). An array of reflective pixels patterns the beam, wherein the array...
7400381 Lithographic apparatus and device manufacturing method  
A lithographic apparatus comprises an illumination system for providing a projection beam of radiation. A support structure is provided for supporting a patterning device, the patterning device...
7400380 Two-dimensional light-modulating nano/micro aperture array and high-speed nano pattern recording system utilized with the array  
A two-dimensional light-modulating fine aperture array apparatus includes a spatial light-modulating unit for adjusting quantity of incident light by using a plurality of light amount adjusting...
7400379 Apparatus for measuring an exposure intensity on a wafer  
An apparatus for measuring an exposure intensity on a wafer is disclosed. According to one aspect, an apparatus for measuring an exposure intensity on a wafer includes an exposure device for...
7397538 Radiation system and lithographic apparatus  
The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet...
7397537 Exposure apparatus and exposure method  
An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs...
7397536 Projection image display apparatus  
A projection image display apparatus is equipped with a light shielding member for partially shielding the illumination light from the illuminating optical system so as to reduce the image...
7397535 Lithographic apparatus and device manufacturing method  
Lithographic apparatus includes an illumination system for conditioning a radiation beam, a support for supporting a patterning device for imparting a cross-sectional pattern to the radiation beam...
7394524 Lithographic apparatus, device manufacturing method, and device manufactured thereby  
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned...
7391501 Immersion liquids with siloxane polymer for immersion lithography  
Compositions for immersion liquid materials and associated immersion lithography systems and techniques. Examples of polymer or oligomer-based immersion liquids are described to exhibit superior...
7391499 Lithographic apparatus and device manufacturing method  
A lithographic apparatus for reducing the visibility of artifacts in the pattern is provided. The apparatus comprises an illumination system, a patterning device, a projecting system, and a...
7388653 Exposure mask and method for divisional exposure  
An exposure mask and a method for divisional exposure are provided to advantageously reduce or eliminate stitch defects in displays. In one embodiment, an exposure mask comprises a masking panel...
7388652 Wave front sensor with grey filter and lithographic apparatus comprising same  
A radiation distribution measurement system for measuring a phase distribution of a beam of radiation and/or a pupil distribution of a projection system includes a transparent carrier plate, a...
7388647 Method and system for real time uniformity feedback  
Provided are a method and system for projecting an illumination beam to an image plane. The method includes producing a sample of the illumination beam and projecting the sample to a secondary...
7385700 Management system, apparatus, and method, exposure apparatus, and control method therefor  
An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment...
7385677 Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam  
A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate...
7385676 Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer  
A mask set for the production of integrated circuit chips, wherein a first mask has first features that form inner cell regions and a second mask has second features that form outer non-cell...
7385672 Exposure apparatus and method  
An exposure apparatus for exposing a pattern of a reticle onto an object to be exposed, via a projection optical system, utilizing exposure light, includes an optical element for determining a...
7382438 Lithographic apparatus and device manufacturing method  
A lithographic apparatus having a controller that sets at least one lithographic apparatus parameter such that the difference between the critical dimension of pattern features formed on the...
7382437 Projection optical system, exposure apparatus and device fabricating method  
There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces...
7382436 Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby  
A mirror has a mirror surface, wherein the mirror surface includes a protrusion including a material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce,...
7382435 Exposure apparatus  
An exposure apparatus which irradiates a photosensitive agent applied to a substrate to form a latent image pattern on the photosensitive agent. The exposure apparatus includes a substrate stage...
7382434 Exposure apparatus and device manufacturing method  
An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a holder for holding the substrate and having a first channel for the fluid to flow,...
7379161 Printer and a method for recording a multi-level image  
A printer and method for recording a predefined multiple intensity level image on a substrate, the method includes the steps of: converting the predetermined image to multiple intensity level...
7379160 Optical integrator, illumination optical device, exposure apparatus, and exposure method  
An optical integrator having characteristics to reduce effects of manufacturing errors of many minute refraction surfaces integrally formed by, for example, etching on an illumination intensity...
Matches 1 - 50 out of 1917 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 >