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7623218 |
Method of manufacturing a miniaturized device
A method of manufacturing a miniaturized device comprises disposing a patterning structure to be imaged in a region of an object plane of an imaging optics of the projection exposure system;...
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7619718 |
Method and system for active purging of pellicle volumes
The present invention provides methods and systems for fast purging of pellicle volumes. A purge device has a base which is enclosed in a controlled environment filled with purge gas. The base has...
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7619717 |
Method for performing a focus test and a device manufacturing method
The invention relates to a method for a focus test. The method includes performing a first projection by using a radiation beam to project a first reference mark onto a substrate to generate a...
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7619716 |
Exposure method
An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on...
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7619715 |
Coupling apparatus, exposure apparatus, and device fabricating method
An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate...
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7619714 |
Immersion exposure technique
An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original through the projection optical system with a gap between the projection optical...
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7619330 |
Stage apparatus
A stage apparatus includes a movable stage; a magnetic unit including a first permanent magnet that is provided on the stage and magnetized in a direction perpendicular to a moving direction of the...
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7618755 |
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields
By automatically estimating the focus status of individual substrates or lots on the basis of focus-specific tool information obtained from the exposure tool, such as tilt angle ranges used during...
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7616383 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively...
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7616291 |
Lithographic processing cell and device manufacturing method
A double processing technique for device manufacture includes performing a first patterning step to form apertures in a resist layer which apertures are filled before the first resist layer is...
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7616290 |
Exposure apparatus and method
An exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical...
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7612868 |
Exposure apparatus and method of manufacturing device
An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, includes an input device, and a controller configured to periodically change a wavelength of the pulsed...
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7612866 |
Lithography system
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the...
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7609363 |
Helical optical pulse stretcher
A lithographic system and method using an illumination system, a single pass pulse stretcher, an optical system, a patterning device and a projection system. The optical system is arranged around...
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7609361 |
Substrate processing method and substrate processing system
A substrate processing method and a substrate processing system exclude wafers W provided with a protective film having surface defects that will cause components of a resist to dissolve in an...
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7608369 |
Photomask to which phase shift is applied and exposure apparatus
A problem of a decrease in transmissive light, which partly occurs at a boundary between two polarization modulation regions of a polarized phase shift mask, is solved. A photomask for use in an...
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7605907 |
Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method
The present invention provides a method for forming a substrate for use in calibrating a metrology tool in order to compensate for orientation-dependent variations within the metrology tool.
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7605905 |
Method for distortion correction in a microlithographic projection exposure apparatus
For the correction of anamorphism in the case of a projection lens of an EUV projection exposure apparatus for wafers it is proposed to tilt the reticle bearing the pattern to be projected and...
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7602489 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus includes a displacement measuring system to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least three...
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7602476 |
Substrate-holding technique
A substrate holding apparatus which contacts an undersurface of a substrate and holds the substrate, at least a portion of a top surface of the substrate being immersed in liquid. The apparatus...
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7602475 |
System and method for providing modified illumination intensity
A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection...
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7602473 |
Exposure apparatus and device manufacturing method using the same
An exposure apparatus includes an illumination optical system adapted to illuminate a reflection mask with light from an exposure light source, and a projection optical system adapted to project a...
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7602472 |
Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a...
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7602470 |
Lithographic apparatus and device manufacturing method
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at...
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7599043 |
Position measurement system and lithographic apparatus
A position measurement system includes a first position measurement unit configured to measure a position of an object in a first and a second direction, the first position measurement unit...
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7598507 |
Adjustable lithography blocking device and method
The present invention provides, in one embodiment, a method ( 100 ) of manufacturing a semiconductor device. A conventionally formed reticle is positioned over a resist located on a substrate ( 110...
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7595863 |
Lithographic apparatus, excimer laser and device manufacturing method
A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from...
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7595861 |
Exposure apparatus and method of manufacturing device
An exposure apparatus for transferring a pattern to a substrate by exposing the substrate to light via a reticle. The exposure apparatus includes an inspection unit to inspect the reticle, an...
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7593096 |
Lithographic apparatus and device manufacturing method
An article support constructed to support an article for lithographic processing purposes is described. The article support includes a channel configuration arranged to guide thermally stabilizing...
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7593095 |
System for reducing the coherence of laser radiation
The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial...
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7593094 |
Patterning device
A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device,...
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7593093 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the...
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7593092 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the...
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7593091 |
Imaging or exposure device, in particular for making an electronic microcircuit
The imaging or exposure device comprises a radiation source ( 1 ), a reticle ( 3 ) mounted between the radiation source and an optical projection system ( 4 ) for shaping the radiation downstream...
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7592760 |
Lithographic apparatus and device manufacturing method
A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged...
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7589822 |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage is...
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7589821 |
Exposure apparatus and device manufacturing method
A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes...
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7589820 |
Exposure apparatus and method for producing device
An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate...
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7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The...
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7589818 |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the...
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7586626 |
Measurement method, exposure method, exposure apparatus, and device fabrication method
A method for measuring a synchronization error between a first stage and a second stage in a scanning exposure apparatus including the first stage which supports a reticle, the second stage which...
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7586598 |
Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table...
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7586583 |
Nanolithography system
A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is...
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7586582 |
Exposure apparatus
At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any...
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7586113 |
EUV illumination system
An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV...
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7583361 |
System for controlling a dual mover assembly for an exposure apparatus
A precision assembly ( 210 ) for positioning a device ( 226 ) includes a stage ( 260 ) that retains the device ( 226 ), a dual mover assembly ( 228 ) that moves the stage ( 260 ), and the device (...
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7583358 |
Systems and methods for retrieving residual liquid during immersion lens photolithography
Systems and methods for retrieving residual liquid during immersion lens photolithography are disclosed. A method in accordance with one embodiment includes directing radiation along a radiation...
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7583357 |
Lithographic apparatus and device manufacturing method
In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate...
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7583356 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured...
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7580116 |
Exposure apparatus and device fabrication method
The present invention provides an exposure apparatus including a position detection apparatus that detects at least one of a position of a reticle and a position of a substrate. The position...
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