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7626684 |
Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration...
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7626680 |
Exposure apparatus and device fabrication method using the same
An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a...
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7623220 |
Source optimization for image fidelity and throughput
A system and method for optimizing an illumination source to print a desired pattern of features dividing a light source into pixels and determining an optimum intensity for each pixel such that...
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7605905 |
Method for distortion correction in a microlithographic projection exposure apparatus
For the correction of anamorphism in the case of a projection lens of an EUV projection exposure apparatus for wafers it is proposed to tilt the reticle bearing the pattern to be projected and...
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7604912 |
Local flare correction
A correction of a local flare generated at a time of exposure when manufacturing a semiconductor device, wherein a substantial numerical aperture to a pattern in a region to be exposed is...
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7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask
The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask ( 11 ) are calculated by first calculation unit ( 12 ) based on the relationship with...
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7593091 |
Imaging or exposure device, in particular for making an electronic microcircuit
The imaging or exposure device comprises a radiation source ( 1 ), a reticle ( 3 ) mounted between the radiation source and an optical projection system ( 4 ) for shaping the radiation downstream...
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7583356 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured...
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7538853 |
Exposure process and apparatus using glass photomasks
An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the...
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7535549 |
System and method for improvement of alignment and overlay for microlithography
The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
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7534552 |
Lithographic apparatus and device manufacturing method
In known lithographic apparatus the projection beam is symmetrical, while the process window can be asymmetrical. The invention addresses this problem by providing a lithographic apparatus...
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7532305 |
Lithographic apparatus and device manufacturing method using overlay measurement
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two...
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7522260 |
Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components
A method for correcting a field-constant astigmatism of a projection objective of a microlithography projection exposure apparatus, the projection objective having an arrangement composed of a...
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7495742 |
Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method
A method for measuring an optical performance of a projection optical system in an exposure apparatus that exposes a pattern on a reticle onto a substrate includes the steps of determining an pupil...
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7463333 |
Multi-exposure lithography system providing increased overlay accuracy
Multi-exposure lithography systems are provided for improved overlay accuracy. In one aspect, a method for multi-exposure lithography operates by determining overlay parameters corresponding to...
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7446852 |
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project
A projection exposure mask acceptance decision system includes assurance object measuring unit to measure quality assurance objects relating to projection exposure mask, first exposure...
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7443484 |
Method for exposing a semiconductor wafer by applying periodic movement to a component
A method of focus variation is described herein to achieve a one-step exposure of a wafer without the limitation of applying a complex y-tilt to a wafer stage. The position of the wafer surface to...
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7442474 |
Reticle for determining rotational error
A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of...
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7440083 |
Printing a mask with maximum possible process window through adjustment of the source distribution
A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined...
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7440080 |
Method and apparatus for automatic correction of direct exposure apparatus
An automatic correction method for a direct exposure apparatus illuminates two exposure elements, which are included in adjacent exposure heads separately and which are to expose an identical line...
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7440079 |
Lithographic apparatus, alignment system, and device manufacturing method
A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an...
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7436489 |
Device for testing an exposure apparatus
A device and a method for testing an exposure apparatus is disclosed. A testing device includes a substrate, and a plurality of block patterns, each of which has a top area varying with an area of...
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7426013 |
Exposure apparatus and device fabrication method
An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element,...
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7423726 |
Exposure apparatus and device manufacturing method
An exposure apparatus for exposing a substrate. A stage holds and moves the substrate, a measuring device measures a position of a surface of the substrate, and a controller defines an arrangement...
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7405803 |
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a...
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7405802 |
Large field of view 2X magnification projection optical system for FPD manufacture
An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The...
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7403264 |
Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration...
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7388652 |
Wave front sensor with grey filter and lithographic apparatus comprising same
A radiation distribution measurement system for measuring a phase distribution of a beam of radiation and/or a pupil distribution of a projection system includes a transparent carrier plate, a...
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7388216 |
Pattern writing and forming method
A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam...
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7379152 |
Exposure apparatus and exposure method
An exposure apparatus and method in which an image is formed on a recording medium mounted on a recording stage by irradiating a light beam based on image data from a recording head while the...
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7372539 |
Method for distortion correction in a microlithographic projection exposure apparatus
For the correction of anamorphism in the case of a projection lens of an EUV projection exposure apparatus for wafers it is proposed to tilt the reticle bearing the pattern to be projected and...
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7349066 |
Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
Model Based Optical Proximity Correction (MOPC) biasing techniques may be utilized for optimizing a mask pattern. However, conventional MOPC techniques do not account for influence from neighboring...
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7349065 |
Exposure apparatus and device fabrication method
An exposure apparatus according to one aspect of the present invention includes an illumination optical system for illuminating, in a slit-shaped illumination area, a pattern of a reticle with a...
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7345735 |
Apparatus for aberration detection and measurement
Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging a photoresist film with the system....
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7342643 |
Method of aligning wafer using database constructed of alignment data in a photolithography process
The aligning of a wafer with a reticle in photolithographic equipment is carried out using a feed forward method. In the method, a wafer is loaded onto an exposure apparatus, the wafer is aligned...
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7336341 |
Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator
A simulator of a lithography tool includes a correcting parameter memory storing a correcting scaling value to correct a focus error of a projection optical system in the lithography tool and a...
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7336340 |
Method of exposure error adjustment in photolithography for multiple products
A method of adjusting exposure error for multiple products is described. First, one Photo Feed Back System (PFBS) suited to host-product or miscellaneous product is chosen. Different standard...
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7330237 |
Exposure apparatus equipped with interferometer and method of using same
An exposure apparatus includes a projection optical system for projecting an exposure pattern, onto an object to be exposed, and a measuring apparatus for measuring, as an interference fringe,...
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7327436 |
Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product
A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate;...
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7317512 |
Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method
A lithographic apparatus comprises an illumination system having optical elements capable of conditioning a radiation beam to comprise in cross-section a first portion of linearly polarized...
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7298458 |
Optical error minimization in a semiconductor manufacturing apparatus
Provided are systems and methods for overcoming optical errors occurring from reticle and other hardware usage in a semiconductor fabrication apparatus. The systems and methods minimize optical...
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7286207 |
Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration
A semiconductor wafer is exposed with a pattern from a mask or reticle in an exposure tool. The exposure tool has an adjustable lens system and a light source, which is tunable in wavelength. A...
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7283202 |
In-situ interferometer arrangement
An in-situ interferometer includes an image modifying optic that produces light ray bundles. The light ray bundles are projected onto a reticle with a plurality of measurement fiducials encoded...
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7268917 |
Image correction processing method and apparatus for correcting image data obtained from original image affected by peripheral light-off
An image correction processing apparatus for correcting a pixel value of each pixel constituting image data obtained from an original image affected by the peripheral light-off is disclosed. The...
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7268360 |
Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
Techniques for determining wafer stage grid and yaw in a projection imaging tool are described. The techniques include exposing an overlay reticle onto a substrate having a recording media, thereby...
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7262832 |
Exposure apparatus and exposure method for performing high-speed and efficient direct exposure
In an exposure apparatus, in which exposure data necessary for direct exposure is sequentially supplied to an exposure engine having a plurality of exposure devices and, based on the supplied...
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7262831 |
Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus
A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of...
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7261985 |
Process for determination of optimized exposure conditions for transverse distortion mapping
A process for providing illumination source conditions for the accurate determination Zernike tilt coefficients in the presence of coma is described. Large feature-shift coma sensitivity is...
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7253884 |
Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method
In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a...
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7251016 |
Method for correcting structure-size-dependent positioning errors in photolithography
A method for correcting structure-size-dependent positioning errors during the photolithographic projection by an exposure apparatus and the use thereof includes providing an exposure apparatus for...
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