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7623218 |
Method of manufacturing a miniaturized device
A method of manufacturing a miniaturized device comprises disposing a patterning structure to be imaged in a region of an object plane of an imaging optics of the projection exposure system;...
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7619714 |
Immersion exposure technique
An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original through the projection optical system with a gap between the projection optical...
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7616383 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively...
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7612353 |
Lithographic apparatus, contaminant trap, and device manufacturing method
A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The...
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7609361 |
Substrate processing method and substrate processing system
A substrate processing method and a substrate processing system exclude wafers W provided with a protective film having surface defects that will cause components of a resist to dissolve in an...
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7604424 |
Substrate processing apparatus
A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing...
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7602472 |
Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a...
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7602471 |
Apparatus and method for particle monitoring in immersion lithography
The present disclosure provides an immersion lithography system. The system includes an imaging lens having a front surface; a substrate stage positioned underlying the front surface of the imaging...
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7602470 |
Lithographic apparatus and device manufacturing method
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at...
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7598507 |
Adjustable lithography blocking device and method
The present invention provides, in one embodiment, a method ( 100 ) of manufacturing a semiconductor device. A conventionally formed reticle is positioned over a resist located on a substrate ( 110...
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7595861 |
Exposure apparatus and method of manufacturing device
An exposure apparatus for transferring a pattern to a substrate by exposing the substrate to light via a reticle. The exposure apparatus includes an inspection unit to inspect the reticle, an...
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7593093 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the...
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7593092 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the...
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7589821 |
Exposure apparatus and device manufacturing method
A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes...
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7589820 |
Exposure apparatus and method for producing device
An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate...
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7586582 |
Exposure apparatus
At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any...
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7586113 |
EUV illumination system
An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV...
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7583361 |
System for controlling a dual mover assembly for an exposure apparatus
A precision assembly ( 210 ) for positioning a device ( 226 ) includes a stage ( 260 ) that retains the device ( 226 ), a dual mover assembly ( 228 ) that moves the stage ( 260 ), and the device (...
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7583358 |
Systems and methods for retrieving residual liquid during immersion lens photolithography
Systems and methods for retrieving residual liquid during immersion lens photolithography are disclosed. A method in accordance with one embodiment includes directing radiation along a radiation...
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7583357 |
Lithographic apparatus and device manufacturing method
In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate...
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7580112 |
Containment system for immersion fluid in an immersion lithography apparatus
A containment system contains an immersion fluid in an immersion area to fill a gap between a projection system and an object to be exposed with the immersion fluid. The containment system includes...
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7580111 |
Liquid for immersion exposure and immersion exposure method
An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation...
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7580109 |
Substrate supporting unit, and substrate temperature control apparatus and method
A substrate supporting unit includes a supporter for supporting a substrate, and a temperature controller for controlling the supporter. The supporter includes liquid supply openings opened at a...
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7576835 |
Substrate handler, lithographic apparatus and device manufacturing method
Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler...
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7576833 |
Gas curtain type immersion lithography tool using porous material for fluid removal
A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a...
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7573560 |
Supporting plate, stage device, exposure apparatus, and exposure method
An exposure apparatus exposes a pattern onto a substrate. The exposure apparatus includes a supporting plate having a surface, a substrate stage which holds the substrate and is movable over the...
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7570343 |
Microlithographic projection exposure apparatus
A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an...
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7570342 |
Radiation exposure apparatus comprising a gas flushing system
An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection...
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7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations
A lithographic scanning apparatus includes a light projection device for seamlessly and uniformly projecting a scanning light onto a light exposing area. The light projecting device further...
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7561251 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an...
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7561250 |
Lithographic apparatus having parts with a coated film adhered thereto
A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement...
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7561249 |
Exposure apparatus, exposure method, and device manufacturing method
An exposure apparatus for exposing a substrate to light via a reticle. The apparatus includes a projection optical system configured to project a pattern of the reticle onto the substrate, a stage...
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7561248 |
Immersion exposure technique
An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original via the projection optical system with a gap between the projection optical system...
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7561247 |
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H 2 containing gas and one or more additional compounds selected...
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7557900 |
Exposure apparatus, device manufacturing method, maintenance method, and exposure method
An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure...
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7554648 |
Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle
Blind devices and related methods for lithography systems are described. An exemplary system has a vacuum chamber with first and second chamber portions. In a member between the chambers is defined...
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7554107 |
Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus
A charged particle beam writing method includes measuring a topography of a backside of a substrate without an influence of a gravity sag, calculating a first positional deviation amount of a...
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7551265 |
Contact material and system for ultra-clean applications
Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out...
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7548304 |
Chuck plate assembly with cooling means
The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling...
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7545478 |
Lithographic apparatus, thermal conditioning system, and method for manufacturing a device
A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of...
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7542128 |
Exposure apparatus, exposure method, and method for producing device
An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which...
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7542127 |
Lithographic apparatus and method for manufacturing a device
A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate...
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7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam
An ion beam irradiating apparatus has: a beam profile monitor 14 which measures a beam current density distribution in y direction of an ion beam 4 in the vicinity of a target 8; movable...
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7538852 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes a projection optical system for projecting a pattern of an original onto a substrate, a stage for holding the substrate, a cover for substantially surrounding an...
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7530749 |
Coater/developer and coating/developing method
A coating and developing system prevents wetting its component units with water when the coating and developing system forms a resist film on a substrate and processes the substrate processed by...
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7528930 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto a substrate, the projection optical system including an optical element closest to the...
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7525635 |
Contamination barrier and lithographic apparatus
A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an...
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7522263 |
Lithographic apparatus and method
A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the...
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7522261 |
Lithographic apparatus and device manufacturing method
An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the...
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7522259 |
Cleanup method for optics in immersion lithography
An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an...
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