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7342640 |
Exposure apparatus and method
An exposure apparatus to expose a substrate to light with a space between a projection optical system and the substrate filled with liquid. The apparatus has a stage to hold the substrate and to...
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7339650 |
Immersion lithography fluid control system that applies force to confine the immersion liquid
A fluid control system for immersion lithography that uses an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a...
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7332731 |
Radiation system and lithographic apparatus
A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a...
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7330238 |
Lithographic apparatus, immersion projection apparatus and device manufacturing method
A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic...
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7327435 |
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical...
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7323698 |
Thermally insulated thermophoretic plate
A subsystem for an exposure apparatus has a thermophoretic plate and at least one shielding layer covering a first surface of the thermophoretic plate. The at least one shielding layer controls...
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7321419 |
Exposure apparatus, and device manufacturing method
A hydrostatic bearing is provided opposite to a wafer on a table. The hydrostatic bearing maintains the distance between the bearing surface and the wafer in the direction of the optical axis of a...
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7319505 |
Exposure apparatus and device fabrication method
In order to improve a responsiveness of the radiation cooling and to switch a cooling position, an exposure apparatus for exposing an object includes a cooling mechanism for radiation-cooling the...
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7319507 |
Apparatus and method for removing contaminant on original, method of manufacturing device, and original
At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to...
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7317505 |
Exposure apparatus and device manufacturing method
An exposure apparatus having a projection optical system and configured to expose a substrate to light via a pattern of a mask and the projection optical system. The apparatus includes a chamber to...
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7317504 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element...
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7315346 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of...
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7315033 |
Method and apparatus for reducing biological contamination in an immersion lithography system
Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting...
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7312848 |
Positioning apparatus, exposure apparatus, and device manufacturing method
This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the...
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7307141 |
Thermoresponsive sensor comprising a polymer solution
Methods and apparatus for measuring and/or controlling the temperature on the surface or inside of micro chips are provided, including using thermally responsive polymers.
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7307687 |
Lithographic apparatus, device manufacturing method and substrate
An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation...
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7304716 |
Method for purging an optical lens
By a unit for determining fractions of a substance in a gas or gas mixture, measurements are carried out on the gas or gas mixture for purging a lens in a projection apparatus for projecting...
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7304715 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The...
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7301602 |
Stage apparatus and exposure apparatus
A moving element to be propelled across a stator includes a coil unit, including coils, for generating a force to propel the moving unit, and a cooling unit for cooling the coil unit. A thermal...
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7295285 |
Exposure apparatus and device manufacturing method
An exposure apparatus which exposes a pattern of an original onto a substrate. The apparatus includes an optical system, including a reflective optical element, configured to conduct exposure...
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7295282 |
Exposure apparatus, cooling method, and device manufacturing method
Disclosed herein are an exposure apparatus and a cooling method usable therein, being effective to improve a mirror temperature-control precision and to suppress temperature changes in a certain...
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7295284 |
Optical system, exposure apparatus using the same and device manufacturing method
An exposure apparatus includes an optical system for guiding light with a central wavelength between 5 and 20 nm from a light source to an object to be exposed, the optical system including a first...
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7292313 |
Apparatus and method for providing fluid for immersion lithography
Systems and methods control the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between a lens and a substrate during the immersion...
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7292307 |
Cooling apparatus, optical element having the same, and exposure apparatus
A cooling apparatus for use with an optical element having a concave part includes a cooling mechanism, located in the concave part of the optical element, for cooling the optical element through...
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7286205 |
Closing disk for immersion head
A closing disk for an immersion head of an immersion lithography system is disclosed. The closing disk makes contact with the immersion head at the edges of the closing disk, but not the center,...
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7284917 |
Coating and developing system and coating and developing method
A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist...
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7283198 |
Reticle thermal detector
A reticle thermal detector for measuring a thermal condition and distortion of a reticle prior to photolithography is disclosed. The reticle thermal detector includes a mechanism for determining a...
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7274432 |
Radiation system, lithographic apparatus, device manufacturing method, and device manufactured thereby
A radiation system for multiplexing radiation includes two radiation sub-sources. The sub-sources each provide a certain amount of radiation. The system further includes a member with reflecting...
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7274433 |
Objective, optical analyzer, method of driving optical analyzer, and microscope
An objective having an apical lens and a lens frame which supports the apical lens, includes an elastic member which supports the lens frame by exerting a bias force in a central axial direction of...
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7274431 |
Lithographic projection apparatus and device manufacturing method
A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation,...
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7274430 |
Optical arrangement and projection exposure system for microlithography with passive thermal compensation
An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat...
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7271873 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the...
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7271878 |
Wafer cell for immersion lithography
An apparatus, system and method for use with a photolithographic system. In accordance with one embodiment, the photolithographic system of the present invention includes a workpiece support member...
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7265812 |
Cooling apparatus
A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature...
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7264853 |
Attaching a pellicle frame to a reticle
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be...
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7262830 |
Exposure apparatus, and device manufacturing method
An apparatus for exposing a wafer to light. The apparatus includes a light source unit having a light source for emitting light, a first cooling unit for cooling the light source unit, in which the...
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7262829 |
Coating and developing apparatus and coating and developing method
A coating and developing apparatus includes a process block which includes a unit block for coating-film formation which applies a resist, and a unit block for development which performs a...
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7259827 |
Diffuser unit, lithographic apparatus, method for homogenizing a beam of radiation, a device manufacturing method and device manufactured thereby
A lithographic apparatus is provided with a diffuser unit including a fluid that includes diffuser particles that are able to diffuse rays in a beam of radiation used to illuminate an object, for...
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7256863 |
Sealing assembly, a lithographic projection apparatus, and a device manufacturing method
A sealing assembly for sealing a slit between two regions in a lithographic apparatus is disclosed. The assembly includes a vacuum pumping device that extends substantially in a longitudinal slit...
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7256407 |
Lithographic projection apparatus and reflector assembly for use therein
A lithographic projection apparatus includes reflector assembly, a foil trap, and a housing that is constructed and arranged to contain the reflector assembly and the foil trap. The reflector...
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7256864 |
Liquid immersion lithography system having a tilted showerhead relative to a substrate
A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first...
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7256872 |
Purging gas from a photolithography enclosure between a mask protective device and a patterned mask
A method and apparatus are described for removing an initial gas from a gas-filled enclosure between the mask-protective device, such as a pellicle, and the patterned mask, such as a reticle, and...
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7256408 |
Gas supply unit, gas supply method and exposure system
A gas supply unit supplies gas to a certain space via a channel, and includes a first switch mechanism located in the channel for selectively changing the channel of the gas.
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7253879 |
Liquid immersion lithography system with tilted liquid flow
A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the...
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7253874 |
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Lithographic apparatus and device manufacturing method
A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element...
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7253876 |
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Lithographic apparatus and device manufacturing method
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier...
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7251013 |
Lithographic apparatus and device manufacturing method
In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space...
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7251012 |
Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning...
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7251014 |
Exposing method, exposing apparatus and device manufacturing method utilizing them
An exposing method which can effect the cleaning of an optical element so that throughput may not be substantially reduced when exposure using ultraviolet light is effected. The exposing method...
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7248332 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus is provided with a charged object on a projection system of the lithographic apparatus, a substrate table of the lithographic apparatus, or both that is configured to have...
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