Matches 101 - 150 out of 788 < 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 >
Match Document Document Title
7420188 Exposure method and apparatus for immersion lithography  
A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography...
7420650 Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium  
In the present invention, in the photolithography process in which a certain processing condition has been already set, a resist film on a substrate is exposed to light using a mask, which reduces...
7420194 Lithographic apparatus and substrate edge seal  
A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the...
7417707 Introduction of an intermediary refractive layer for immersion lithography  
An intermediary layer is introduced between a lens and a wafer for an immersion lithography process. A non-supercritical gas is provided and condensed to form a layer of liquid between the lens and...
7414240 Particle remover, exposure apparatus having the same, and device manufacturing method  
A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting...
7414251 Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system  
A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting...
7414699 Lithographic apparatus and device manufacturing method  
In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
7411650 Immersion photolithography system and method using microchannel nozzles  
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the...
7411653 Lithographic apparatus  
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be...
7408620 Exposure apparatus  
An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto...
7405805 Lithographic apparatus and device manufacturing method  
In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as...
7403263 Exposure apparatus  
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between...
7403741 Exhaust system of image forming device  
A low-voltage power source circuit board is provided downstream in relation to the flow of air introduced through an intake hole and exhausted by a power source fan. Heat sinks are provided on the...
7399979 Exposure method, exposure apparatus, and method for producing device  
An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also...
7399978 Method and device for irradiating spots on a layer  
For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different...
7397056 Lithographic apparatus, contaminant trap, and device manufacturing method  
A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The...
7397532 Run-off path to collect liquid for an immersion lithography apparatus  
An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is...
7397040 Lithographic apparatus, device manufacturing method, and device manufactured thereby  
A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are...
7397534 Exposure apparatus and device manufacturing method  
The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system,...
7394520 Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock  
A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load...
7394521 Lithographic apparatus and device manufacturing method  
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier...
7391498 Technique of suppressing influence of contamination of exposure atmosphere  
An exposure apparatus includes a projection optical system which has a plurality of optical elements, and directs light from an original to an object to be exposed; a first stage which holds the...
7391503 System and method for compensating for thermal expansion of lithography apparatus or substrate  
To prevent a substrate from expanding significantly to generate overlay errors an exposure operation takes place in two parts. A first part exposes boundary areas and a second part exposes the...
7391495 Stage apparatus, exposure system using the same, and device manufacturing method  
A stage apparatus includes a base having a reference surface, a moving unit which moves along the reference surface, a static bearing which is provided in the moving unit and which supports the...
7391496 Exposure apparatus  
An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a...
7388649 Exposure apparatus and method for producing device  
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a...
7385674 Exposure apparatus and device manufacturing method  
An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said...
7385670 Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus  
A lithographic apparatus is disclosed. The apparatus includes a cleaning system for cleaning a component in the lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning...
7385673 Immersion lithography with equalized pressure on at least projection optics component and wafer  
An immersion lithography apparatus and method, and a lithographic optical column structure are disclosed for conducting immersion lithography with at least the projection optics of the optical...
7382434 Exposure apparatus and device manufacturing method  
An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a holder for holding the substrate and having a first channel for the fluid to flow,...
7378025 Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method  
A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration...
7379157 Exposure apparatus and method for manufacturing device  
An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the...
7379155 Lithographic apparatus and device manufacturing method  
A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured...
7379151 Exposure apparatus comprising cleaning apparatus for cleaning mask with laser beam  
An exposure apparatus for exposing a pattern of a mask onto a plate to be exposed, the exposure apparatus includes a cleaning apparatus for cleaning the mask. The cleaning apparatus includes an...
7375791 Laminar flow gas curtains for lithographic applications  
Laminar flow gas curtains for use in lithographic applications. In an embodiment, a gas curtain system includes a nozzle that enhances the fluidic purge process. The nozzle includes a first...
7372049 Lithographic apparatus including a cleaning device and method for cleaning an optical element  
An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication...
7372538 Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine  
An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical...
7367138 Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles  
Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a...
7367345 Apparatus and method for providing a confined liquid for immersion lithography  
A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable...
7369215 Laser crystallization apparatus  
A laser crystallization apparatus has a light source, a phase shifter which modulates a laser light from the light source, an illumination system which is provided between the light source and the...
7365828 Exposure apparatus, exposure method, and device manufacturing method  
An exposure apparatus which exposes a pattern of an original onto a substrate through a projection optical system with a space between the projection optical system and the substrate filled with...
7362414 Optical system having an optical element that can be brought into at least two positions  
There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element...
7362415 Lithographic apparatus and device manufacturing method  
A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is...
7362413 Uniformity correction for lithographic apparatus  
A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of...
7362412 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system  
A method and apparatus for reduction and prevention of residue formation and removal of residues formed in an immersion lithography tool. The apparatus including incorporation of a cleaning...
7359029 Lithographic apparatus and method of reducing thermal distortion  
A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the...
7352434 Lithographic apparatus and device manufacturing method  
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can...
7352437 Exposure apparatus  
An exposure apparatus configured to expose a substrate to light via a reticle. The apparatus includes a projection optical system configured to project a pattern of the reticle onto the substrate,...
7352433 Lithographic apparatus and device manufacturing method  
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the...
7349063 Reflection mirror apparatus, exposure apparatus and device manufacturing method  
A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a...
Matches 101 - 150 out of 788 < 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 >