|
Match
|
Document |
Document Title |
|
|
7528930 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto a substrate, the projection optical system including an optical element closest to the...
|
|
|
7525635 |
Contamination barrier and lithographic apparatus
A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an...
|
|
|
7522259 |
Cleanup method for optics in immersion lithography
An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an...
|
|
|
7522258 |
Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination
A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to...
|
|
|
7522263 |
Lithographic apparatus and method
A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the...
|
|
|
7522261 |
Lithographic apparatus and device manufacturing method
An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the...
|
|
|
7517639 |
Seal ring arrangements for immersion lithography systems
Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing...
|
|
|
7518128 |
Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a...
|
|
|
7514699 |
Method and device for irradiating spots on a layer
For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of...
|
|
|
7508490 |
Exposure apparatus and device manufacturing method
An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that...
|
|
|
7505111 |
Exposure apparatus and device manufacturing method
An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on...
|
|
|
7505115 |
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which...
|
|
|
7501226 |
Immersion lithography system with wafer sealing mechanisms
An immersion lithography system is disclosed to comprise a fluid containing feature for providing an immersion fluid for performing immersion lithography on a wafer, and a seal ring covering a...
|
|
|
7495743 |
Immersion optical lithography system having protective optical coating
An immersion lithography system is provided which includes an optical source operable to produce light having a nominal wavelength and an optical imaging system. The optical imaging system has an...
|
|
|
7492441 |
Lithographic apparatus and device manufacturing method incorporating a pressure shield
A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted...
|
|
|
7486378 |
Exposure apparatus
An exposure apparatus includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages, which can be...
|
|
|
7483117 |
Exposure method, exposure apparatus, and method for producing device
An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate...
|
|
|
7483118 |
Lithographic projection apparatus and device manufacturing method
A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The...
|
|
|
7480029 |
Exposure apparatus and method for manufacturing device
An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while...
|
|
|
7477353 |
Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device
A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of...
|
|
|
7476491 |
Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby
A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of...
|
|
|
7474379 |
Lithographic apparatus and device manufacturing method
An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two...
|
|
|
7474380 |
Projection optical system, exposure apparatus, and device fabrication method
The present invention provides a projection optical system which projects an image on a first object plane onto a second object plane, comprising a plurality of optical members inserted in turn...
|
|
|
7471374 |
Projection optical system, exposure apparatus, and exposure method
A projection optical system and exposure method for forming a reduced image of a first surface on a second surface, including forming a projection exposure of a reduced image of a pattern formed on...
|
|
|
7471371 |
Exposure apparatus and device fabrication method
This exposure system projects a pattern image onto a substrate via a projection optical system and a liquid to expose the substrate, with a space between the projection optical system and the...
|
|
|
7468780 |
Exposure apparatus and method
An exposure method including the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid...
|
|
|
7468779 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for...
|
|
|
7468521 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the...
|
|
|
7463331 |
Exposure apparatus and method for manufacturing device
An exposure apparatus used to expose a substrate includes an optical system which includes two optical elements and which is configured to guide light emitted from a light source to the substrate,...
|
|
|
7460207 |
Exposure apparatus and method for producing device
An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and...
|
|
|
7460206 |
Projection objective for immersion lithography
In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium...
|
|
|
7456929 |
Exposure apparatus and device manufacturing method
An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes first and second...
|
|
|
7453549 |
Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1 , thereby measuring the position of the reticle 1 . A...
|
|
|
7453071 |
Contamination barrier and lithographic apparatus comprising same
A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented...
|
|
|
7450217 |
Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
A coating for sensors and/or parts of an exposure apparatus, for example a sensor on a substrate table of a lithography apparatus, include a semiconductor, a photocatalyst, and/or a metal oxide.
|
|
|
7450215 |
Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning...
|
|
|
7446853 |
Exposure method, exposure tool and method of manufacturing a semiconductor device
An exposure method is disclosed, which includes forming on a substrate a resist film having first and second exposure fields arranged in a column direction, mounting the substrate on a scanning...
|
|
|
7446850 |
Lithographic apparatus and device manufacturing method
An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to...
|
|
|
7443482 |
Liquid jet and recovery system for immersion lithography
A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern...
|
|
|
7443483 |
Systems and methods for fluid flow control in an immersion lithography system
Systems and methods for controlling fluid flow in an immersion lithography system. The system includes a fluid flow path that allows fluid to flow from a source through a fluid retention hood and...
|
|
|
7440077 |
Exposure apparatus
The exposure apparatus of the invention includes a chamber 1 housing an exposure apparatus body 6 provided with an illumination optical system 2 , a reticle 3 , a projection lens 4 and a...
|
|
|
7440076 |
Lithographic apparatus, device manufacturing method and device manufactured thereby
A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate...
|
|
|
7436485 |
Lithographic apparatus, patterning assembly and contamination estimation method
A lithographic apparatus includes a pattern support to support a patterning device, the patterning device to impart a radiation beam with a pattern in its cross-section to form a patterned...
|
|
|
7428038 |
Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
A lithographic apparatus is disclosed that has a semi-permeable membrane, a liquid inlet adapted to supply liquid to a first side of the membrane, and a gas inlet adapted to supply to a second side...
|
|
|
7428037 |
Optical component that includes a material having a thermal longitudinal expansion with a zero crossing
There is provided an optical component. The optical component includes a material having a surface that heats to a maximum temperature (T max ) when subjected to radiation. The material has a...
|
|
|
7426014 |
Dynamic fluid control system for immersion lithography
A dynamic fluid control system and method capable of reducing dynamic forces from the fluid on the last optical element ( 20 ) and substrate stage ( 14 ) caused by the motion of the immersion...
|
|
|
7426012 |
Exposure device for immersion lithography and method for monitoring parameters of an exposure device for immersion lithography
A method for monitoring parameters of an exposure device for immersion lithography and an exposure device for immersion lithography are provided. In the course of the immersion lithography, the...
|
|
|
7423720 |
Lithographic apparatus and device manufacturing method
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an...
|
|
|
7423724 |
Exposure apparatus and device manufacturing method
An exposure apparatus exposes a substrate to light via a reticle in a vacuum. A projection optical system projects a pattern of the reticle onto the substrate, a stage holds the substrate and...
|
|
|
7423721 |
Lithographic apparatus
A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection...
|