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6369874 |
Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography
A windowless system and apparatus are provided that prevent outgases from contaminating the projection optics of an in-vacuum lithography system. The outgassing mitigation apparatus comprises a...
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6359678 |
Exposure apparatus, method for producing the same, and exposure method
When an illumination light beam is radiated by an illumination system at a predetermined angle of incidence θ with respect to a pattern plane of a mask, the illumination light beam is reflected by...
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6356338 |
Semiconductor production system with an in-line subsystem
A semiconductor production system has an exposure apparatus, a coater-developer, and an in-line subsystem for connecting the exposure apparatus and the coater-developer. The in-line subsystem has a...
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6338582 |
Substrate delivery apparatus and coating and developing processing system
In an interface section, a transfer device is disposed to face a second cooling processing unit group in a processing station, and a thermal processing unit group in which thermal processing units...
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6332724 |
Substrate processing apparatus
Outside air taken in from the outside is cooled to a predetermined temperature by a cooler, and the air cooled by the cooler flows through a low temperature side flow path in a heat exchanger,...
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6327021 |
Mask inspection system and method of manufacturing semiconductor device
There is described a mask inspection system suitable for reliably removing dust particles from a mask. The system is intended for eliminating the necessity of repetition of dust particle inspection...
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6295118 |
Optical arrangement for exposure apparatus
An optical arrangement includes a diffractive optical element and a curvature control system for changing curvature of the diffractive optical element. The optical arrangement can be incorporated...
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6295121 |
Exposure apparatus
An exposure apparatus includes a light supplying device for supplying exposure light, an optical system for directing the exposure light to a substrate to be exposed, a cover for covering a...
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6287023 |
Processing apparatus and method
A processing apparatus includes a housing, a plurality of process units arranged within the housing for subjecting an object to a series of processes including coating of processing solution,...
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6288773 |
Method and apparatus for removing residual material from an alignment mark of a semiconductor wafer
A method of exposing an alignment mark defined in a first side of a semiconductor wafer includes the step of engaging a second side of the wafer with a wafer chuck. The method also includes the...
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6283645 |
Camera with film debris catching comb
A camera has a rear backframe (exposure) opening, including a pair of spaced opposite ends across which successive sections of a filmstrip are moved for each section of the filmstrip to be advanced...
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6279601 |
Liquid zone seal
A seal assembly that provides a means for establishing multiple pressure zones within a system. The seal assembly combines a plate extending from the inner wall of a housing or inner enclosure that...
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6278511 |
Method and apparatus for stacking and drying cut imaged media
A conventional imagesetting system includes an imagesetter for transferring an image onto media, a wet chemical processor for processing the imaged media, an enclosed dryer section for drying the...
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6253042 |
Method for controlling a fan of an electronic photo device
Disclosed is a method for controlling the operation of a fan in an electronic photo device including a developing device, a fan for keeping the temperature in the electronic photo device uniformly,...
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6239884 |
Scanner and method of controlling lighting cold-cathode tube thereof
A scanner according to the present invention includes a cold-cathode tube for radiating light on a manuscript reading position where an image on a manuscript is detected by an image sensor, a...
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6236419 |
Liquid electrophotographic imaging system
In a liquid electrophotographic imaging system including a photoreceptor medium, a laser scanning unit scans light onto the photoreceptor medium to form an electrostatic latent image on a...
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6226073 |
Stage system with driving mechanism, and exposure apparatus having the same
A driving system has a driving mechanism for producing a driving force, a drive controlling device for controlling the driving mechanism, and a temperature adjusting mechanism for collecting heat...
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6222609 |
Reduction projection aligner free from reaction product tarnishing photo-mask and method for transferring pattern image through the photo-mask
A reduction projection aligner has a light source accommodated in an air-tight vessel, an optical filter fitted in the air-tight vessel, a reticle provided outside of the air-tight vessel and a...
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6219128 |
Automatic processing apparatus and image recording device
A photosensitive material which has been exposed by an exposure device is fed into a processor, which is an automatic developing device, by a delivery section and processed. Within the exposure...
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6211943 |
Apparatus and method for improving print quality of high speed package printer
An apparatus and method relating to the print quality of a high speed package printer that produces photographs of varying size from film negatives. The high speed package printer includes a...
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6201594 |
Image recording apparatus and application device thereof
An image recording apparatus which effects digital exposure while aiming for compactness. An exposure unit digitally exposes a photosensitive material successively while moving above a stage. An...
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6191843 |
Exposure device, method of making and using same, and objects exposed by the exposure device
Even when a surface temperature of an illumination optical system becomes high, detection accuracy of a reticle alignment detection system is not negatively affected. An illumination optical system...
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6153877 |
Projection exposure apparatus
An object of a inventions of the present application is raising the pattern position precision by stabilizing the temperature of a reticle or a reduction lens in a projection aligner. The...
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6133982 |
Exposure apparatus
An exposure apparatus having an optical stand for supporting a projecting optical system and a reticle stage, and a base frame have a plurality of struts for supporting the optical stand via...
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6133981 |
Processing system
A processing system includes a coating/developing station for performing either a solution processing for processing a substrate using solution or a thermal processing for thermally processing the...
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6116794 |
Apparatus for cooling a thermally processed material
Disclosed is an apparatus for cooling a thermally processed, imaging material which has been heated to a first temperature by a thermal processor. The cooling apparatus includes a cooling article,...
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6097469 |
Method of processing resist onto substrate and resist processing apparatus
A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method...
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6088080 |
Exposure apparatus and device manufacturing method
An exposure apparatus includes a stage for holding a substrate at an exposure station, an arm mechanism for conveying a substrate to be exposed, onto the stage, and a sensor provided on one of the...
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6043906 |
Orginal reading apparatus having temperature detector and control method thereof
An original reading apparatus includes a thermistor that is arranged close to a reading position. When the output of the thermistor represents a warning temperature range, a CPU activates a cooling...
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6020950 |
Exposure method and projection exposure apparatus
In an exposure method of imaging/projecting, through a projection optical system, a pattern formed on a mask onto an object to be exposed, a mask is placed on an object plane side of the projection...
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6002987 |
Methods to control the environment and exposure apparatus
An exposure apparatus includes an exposure system which transfers a pattern of a mask onto a substrate; a chamber in which the exposure system is housed; an air-conditioner which is associated with...
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5997963 |
Microchamber
The invented apparatus is a relatively small-volumed chamber useful for processing a substrate. The apparatus includes a reference member with a substantially flat surface. The apparatus also...
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5983800 |
Machine for insulating and cooling photopolymer plates for flexographic printing
An improved machine for insolating photopolymer plates and comprising a device secured sidewise onto the frame and delivering a flow of cooling air tangentially to the top part of the frame of the...
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5973764 |
Vacuum assisted debris removal system
A vacuum manifold having a rectangular opening with vacuum access bores connected into the rectangular opening for an illumination field to be projected there through. A vacuum manifold is placed...
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5973863 |
Exposure projection apparatus
The exposure projection apparatus includes an illumination system which illuminates a mask with a light beam, and a optical projection system which projects the image of a pattern formed on the...
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5946078 |
Dust excluding mechanism for an image recording apparatus
According to the improved apparatus for recording images using exposing optics equipped with a dust excluding mechanism which prevents optical paths of light beams from being blocked by dust...
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5920377 |
Multi-hood system for correcting individual lens distortions
A multi-hood system for correcting individual lens distortions includes an air supply hood provided on an outer circumference of a lens; a plurality of air dividing partitions for dividing the air...
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5907390 |
Positioning apparatus, exposure apparatus and method of manufacturing semiconductor device
Positioning accuracy of a scanning stage is improved as a result of reducing error by reducing a non-uniformity in the temperature of air on an optical path of length measurement of the stage. An...
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5905565 |
Photographic exposure apparatus with improved exposure control
A photographic exposure apparatus includes an exposure lens, a lens carriage having a light shield region and a lens mount region, and a device to move the lens carriage selectively to a position...
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5894341 |
Exposure apparatus and method for measuring a quantity of light with temperature variations
A reticle and a wafer are relatively scanned in a scanning exposure type of projection exposure apparatus so that a pattern on the reticle is transferred onto the wafer by exposure. Heat exchangers...
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5876280 |
Substrate treating system and substrate treating method
The present invention provides a substrate treating system for successively treating a plurality of substrates W under an air-conditioned environment. The system comprises an outer casing provided...
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5877843 |
Exposure apparatus
A scanning type exposure apparatus, which is used to expose a wafer with an image of a pattern on a reticle by synchronously moving the reticle and the wafer, comprises a second gas conditioner for...
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5871587 |
Processing system for semiconductor device manufacture of otherwise
A processing system includes a processing chamber, a circulating device for purifying an inside ambience gas of the processing chamber and for circulating the purified gas back into the processing...
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5870197 |
Precision stage interferometer system with local single air duct
A local air duct directs a temperature-controlled stream of air across two perpendicular sets of interferometer beams which are used to measure the two dimension (X-Y) position of a precision stage...
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5864386 |
Exposure apparatus
An exposure apparatus includes a stage, a table mounted on the stage and having a fiduciary mark and a moving mirror, a holder mounted on the stage for holding a substrate, and a temperature...
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5844662 |
Resist processing apparatus and a resist processing method
The resist processing apparatus comprises a loader/unloader section provided with a plurality of cassettes, a first convey mechanism provided in the loader/unloader section, and for taking out an...
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5812242 |
Projection exposure apparatus including a temperature control system for the lens elements of the optical system
A projection exposure apparatus according to the present invention (in particular, an excimer stepper) includes a projection optical system, which may include a lens element of synthetic quartz and...
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5805273 |
Projection exposure apparatus and microdevice manufacturing method
A projection exposure apparatus includes a projection optical system for projecting a pattern of a first object onto a second object, and a correcting device for substantially correcting rotational...
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5796469 |
Exposure apparatus and device manufacturing method using the same
An exposure apparatus in which a portion of a pattern of a reticle is projected onto a wafer and in which the reticle and the wafer are scanned synchronously such that the pattern of the reticle is...
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5754275 |
Optical apparatus having lens-system drive device for temperature correction in direction of optical axis
A photographic printing apparatus for printing an image projected from a film on to a photosensitive material is disclosed. The apparatus has a lens system for forming the image of the film located...
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