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7382098 |
Plasma producing apparatus and doping apparatus
An object of the present invention is to provide an apparatus for producing stable plasma. Another object of the present invention is to provide an apparatus having a long-lasting cathode electrode...
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7372059 |
Plasma-based EUV light source
Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme...
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7371991 |
Iron beam irradiation device and insulating spacer for the device
Disclosed is a structure aimed to reduce the frequency of replacement of an insulating spacer arranged between grids of an ion beam irradiation device. More specifically, disclosed is a so-called...
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7365347 |
Ion implantation apparatus for use in manufacturing of semiconductor device
Disclosed herein is an ion implantation apparatus for use in manufacturing of a semiconductor device, which has a software program including an option for selecting a manipulator, enabling a time...
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7365341 |
Gas cluster ion beam emitting apparatus and method for ionization of gas cluster
An emitting apparatus 50 has a gas cluster generation chamber 2 and a nozzle 3 as means for generating a gas cluster and emitting the gas cluster to a processing object 10 . A group of gas...
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7365339 |
Ion source
A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber with a tip of the cathode holder positioned outward from an inner wall surface of the...
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7361915 |
Beam current stabilization utilizing gas feed control loop
One or more aspects of the present invention pertain to stabilizing the current or density of an ion beam within an ion implantation system by selectively adjusting a lone parameter of feed gas...
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7361913 |
Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control
An ion implanter includes a source of a stationary, planar ion beam, a set of beamline components that steer the ion beam along a normal beam path as determined by first operating parameter values,...
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7342236 |
Fluid-cooled ion source
An ion source is cooled using a cooling plate that is separate and independent of the anode. The cooling plate forms a coolant cavity through which a fluid coolant (e.g., liquid or gas) can flow to...
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7321198 |
Ion source with uniformity of radial distribution of ion beam intensity
An ion source, comprising: a discharge chamber, in which is formed an opening; a coil, provided outside said discharge chamber, for generating plasma within said discharge chamber; an extraction...
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7312579 |
Hall-current ion source for ion beams of low and high energy for technological applications
A Hall-current ion source for generation of low and high energy ion beams with selection of magnetic fields and emission currents, where there are utilized low magnetic fields and high emission...
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7301160 |
Ion sources
The invention relates to methods of controlling the effect of ions of an ionisable source gas that can react with interior surfaces of an arc chamber, by introducing ions of a displacement gas into...
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7262555 |
Method and system for discretely controllable plasma processing
A method and system for plasma generation and processing includes a plurality of beam generators each locally controllable and configured for operation upon a single substrate. A control circuit...
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7256406 |
Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter
An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode...
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7250727 |
High power, long focus electron source for beam processing
Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus...
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7247993 |
Ion accelerator arrangement
The invention relates to an ion accelerator arrangement which uses a combination of a magnetic field having a cusp structure and a cross-section of an ionisation chamber that is extended in one...
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7241361 |
Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic...
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7241360 |
Method and apparatus for neutralization of ion beam using AC ion source
There is provided by this invention a unique ion source for depositing thin films on a substrate in a vacuum chamber that neutralizes the positive electric charges that develop on the substrate and...
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7235795 |
Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process
A particle monitor in the process chamber of a semiconductor device manufacturing apparatus provides a measure of a flux of contaminant particles in the chamber. The flux is measured whilst process...
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7223990 |
Ion beam irradiation device
Disclosed is an ion beam irradiation device including a holder supporting a substrate; and an ion beam source that is a predetermined distance from the substrate and inclined to be substantially...
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7223984 |
Helium ion generation method and apparatus
The invention provides methods and apparatus for generating helium ions. The methods involve providing a mixture of helium gas with a second gas in an ion source. The second gas has a lower...
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7220976 |
Ion source and ion implanter having the same
A filament includes a filament rod having an electron-emitting portion, a pair of leads, and a pair of connection portions. The electron-emitting portion is disposed in the arc chamber. The leads...
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7214950 |
Transition radiation apparatus
In one embodiment of the present invention, thermal deformation or bending of membranes in a transition radiation emitting structure can be reduced by providing flex regions in the membranes or the...
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7205552 |
Monatomic boron ion source and method
Monotomic boron ions for ion implantation are supplied from decaborane vapour. The vapour is fed to a plasma chamber and a plasma produced in the chamber with sufficient energy density to...
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7204921 |
Vacuum apparatus and vacuum processing method
A vacuum apparatus which can easily regenerate plasma is provided. A matching box used in the vacuum apparatus can vary the impedance thereof by varying the magnitudes of the inductance of variable...
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7199374 |
Corona discharge lamps
Excimers are formed in a gas ( 30,130 ) by applying a pulsed potential between a first electrode ( 14,114 ) and a counter electrode ( 26, 126 ) so that corona discharge occurs, substantially...
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7196337 |
Particle processing apparatus and methods
This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an...
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7190764 |
Electron accelerator and radiotherapy apparatus using same
A small and light-weighted electron accelerator ( 2, 40, 60 ) using a fixed-field alternating gradient of high electron beam intensity is provided with a vacuum container ( 10 ), an electric magnet...
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7176469 |
Negative ion source with external RF antenna
A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically...
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7166965 |
Waveguide and microwave ion source equipped with the waveguide
A waveguide of the present invention comprises a waveguide main body made of a material selected from a boron nitride or an aluminum oxide, and a thin film made of a titanium nitride to cover an...
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7157857 |
Stabilizing plasma and generator interactions
An approach for stabilizing the interactions between a plasma and the generator powering the plasma is provided. Reactive elements disposed between the power generator and plasma operate to modify...
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7157721 |
Coupled ionization apparatus and methods
Apparatus for generating ions in a gaseous medium, the apparatus including two electrodes separated by a dielectric material and a means for generating radio frequency pulses. The electrodes are of...
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7156046 |
Plasma CVD apparatus
A plasma CVD apparatus in which microwave power is supplied into a reaction chamber provided inside an annular waveguide through an antenna provided on the inner peripheral part of the waveguide to...
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7138768 |
Indirectly heated cathode ion source
An indirectly heated cathode ion source includes an arc chamber housing that defines an arc chamber, an indirectly heated cathode and a filament for heating the cathode. The cathode may include an...
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7129504 |
Method and apparatus for generation and frequency tuning of modulated, high current electron beams
Generating and frequency tuning of modulated high current electron beams and a specific efficient, high current, frequency-tunable device for generating intense radio frequency (RF), microwave...
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7126138 |
Electron flood apparatus and ion implantation system
An electron flood apparatus 1 of the present invention comprises a chamber 22 having a first part 22 a made of conductive material and a second part 22 b made of insulating material, and...
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7122966 |
Ion source apparatus and method
The invention relates to a method and apparatus that can improve the lifetime and performance of an ion source in a cyclotron. According to one embodiment, the invention comprises an ion source...
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7119491 |
Magnetic and electrostatic confinement of plasma with tuning of electrostatic field
A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic...
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7109504 |
Extreme ultraviolet illumination source
According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner...
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7109480 |
Ion source and methods for MALDI mass spectrometry
Provided are MALDI ion sources, methods of forming ions and mass analyzer systems. In various embodiments, provided are MALDI ion sources configured to irradiate a sample on a sample surface with a...
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7107929 |
Ion implantation ion source, system and method
An ion source for an ion implantation system includes a vaporizer for producing a process gas; an electron source for generating an electron beam to ionize the process gas within a ionization...
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7102139 |
Source arc chamber for ion implanter having repeller electrode mounted to external insulator
An ion implanter has a source arc chamber including a conductive end wall at a repeller end of the arc chamber, the end wall having a central portion surrounding an opening. A ceramic insulator is...
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7084407 |
Ion beam extractor with counterbore
An extractor system for a plasma ion source has a single (first) electrode with one or more apertures, or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction...
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7081711 |
Inductively generated streaming plasma ion source
A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam....
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7078862 |
Beam source and beam processing apparatus
A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode...
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7068698 |
Room-temperature source of single photons based on a single molecule in a condensed matter host
A controllable single-photon source having a single illuminated molecule in a condensed phase host is provided. The single molecule is illuminated with a pulse of radiation having a wavelength such...
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7049736 |
Method of trapping accelerating electrons in plasma
Background plasma electrons in a laser wake field are trapped and accelerated using a sharp downward density transition. A short and intense laser pulse travels through low density plasma with a...
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7042160 |
Parallel plate electron multiplier with ion feedback suppression
An embodiment of the invention is an electron multiplier including a first plate having an electron emissive first interior surface. A second plate has an electron emissive second interior surface....
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7041984 |
Replaceable anode liner for ion source
A releasable anode liner that is fitted within the interior of the anode of an ion source. The cover permits electrons to be projected into the anode wherein any insulating deposits adhere to the...
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7034285 |
Beam source and beam processing apparatus
A beam source has a plasma generating chamber and a gas inlet port for introducing a gas into the plasma generating chamber. The beam source includes a plasma generator for generating...
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