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7368876 |
Plasma processing apparatus
A low-cost plasma processing apparatus which permits reduction of the cost, as well as reduction of the loss of transmitted power. The plasma processing apparatus 1 has an apparatus main body 2 ...
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7367196 |
Spinning cold plasma apparatus and methods relating thereto
Disclosed herein is an apparatus for generating a spinning cold plasma. A preferred embodiment of the spinning cold plasma apparatus is portable and includes a vortex tube having an inner wall to...
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7359177 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias power comprising first and second frequency components, f( 1 ), f( 2 ), respectively, and an RF power path...
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7345429 |
Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode...
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7345428 |
Transducer package for process control
A system ( 10 ) is provided herein for monitoring the harmonic content of the RF signal delivered to an RF powered device ( 13 ). The system comprises (a) a voltage transducer ( 16 ) adapted to...
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7342361 |
Plasma source
A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes...
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7342198 |
Method and apparatus for generating an electrical arc
A method of generating an electrical arc includes steps of providing a first electrode and a second electrode, determining a dielectric strength of a gap region between the electrodes, determining...
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7338581 |
Sputtering apparatus
A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30 , substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a...
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7329884 |
Exposure apparatus and exposure method
An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting...
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7327089 |
Beam plasma source
A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending...
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7323821 |
Device for generating and/or influencing electromagnetic radiation from a plasma
A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects...
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7319295 |
High-frequency power supply structure and plasma CVD device using the same
A radio frequency power supply structure and a plasma CVD device comprising the same are provided in which reflection of radio frequency power at a connecting portion where an RF cable connects to...
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7317171 |
Method and apparatus for generating an electric arc
A method and apparatus for reducing the gap resistance between two electrodes, such as the electrodes used fusion splicing one optical fiber to another, by injecting negative ions into the gas or...
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7313451 |
Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium
With analysis data in the prior art, it is difficult to find out if a change regarded as a judgmental standard of the completion of seasoning has come from a change due to the seasoning, namely,...
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7312579 |
Hall-current ion source for ion beams of low and high energy for technological applications
A Hall-current ion source for generation of low and high energy ion beams with selection of magnetic fields and emission currents, where there are utilized low magnetic fields and high emission...
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7309961 |
Driving frequency modulation system and method for plasma accelerator
A plasma accelerator ( 300 ) is disclosed that has three separate sections of coils ( 301 - 316 ) disposed outside the plasma chamber ( 321 ). The separate sections of coils include an initial...
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7304435 |
Device for confinement of a plasma within a volume
A device of a plasma ( 5 ) for confinement of a plasma within a housing ( 1 ), comprising creation means for creating a magnetic field, said means being a series of permanent magnets ( 3 ) for...
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7294969 |
Two-stage hall effect plasma accelerator including plasma source driven by high-frequency discharge
Disclosed is a high-frequency discharge plasma generation-based two-stage Hall-effect plasma accelerator, which comprises an annular acceleration channel having a gas inlet port, a high-frequency...
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7291985 |
External resonator/cavity electrode-less plasma lamp and method of exciting with radio-frequency energy
Described is a plasma electrode-less lamp. The device comprises an electromagnetic resonator and an electromagnetic radiation source conductively connected with the electromagnetic resonator. The...
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7288204 |
Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
Method for generating an atmospheric pressure glow plasma (APG), wherein said plasma is generated in a discharge space between a plurality of electrodes. A dielectric is present on at least one of...
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7285916 |
Multi chamber plasma process system
A multi-chamber plasma process system includes a plurality of process chambers, each of which has an inductively coupled plasma generator. The inductively coupled plasma generator is electrically...
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7279845 |
Plasma processing method and apparatus
A method and apparatus for processing a target substance by using atmospheric-pressure plasma produced by a composite waveform generated by superimposing a high-frequency sine wave and a...
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7276135 |
Vacuum plasma processor including control in response to DC bias voltage
A plasma processor chamber includes a bottom electrode and a top electrode assembly having a center electrode surrounded by a grounded electrode. RF excited plasma between the electrodes induces a...
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7273995 |
Plasma generator
A microfabricated plasma generator and a method of generating a plasma, the plasma generator comprising: a substrate chip; a chamber defined by the substrate chip, the chamber including an inlet...
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7262555 |
Method and system for discretely controllable plasma processing
A method and system for plasma generation and processing includes a plurality of beam generators each locally controllable and configured for operation upon a single substrate. A control circuit...
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7262384 |
Reaction vessel and method for synthesizing nanoparticles using cyclonic gas flow
A reaction vessel and a method for efficiently producing and collecting nanoparticles in the reaction vessel using cyclonic gas flow. Gas is injected through an inlet tangentially positioned...
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7259378 |
Closed drift ion source
A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and...
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7256134 |
Selective etching of carbon-doped low-k dielectrics
The present invention includes a process for selectively etching a low-k dielectric material formed on a substrate using a plasma of a gas mixture in a plasma etch chamber. The gas mixture...
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7245084 |
Transformer ignition circuit for a transformer coupled plasma source
An apparatus includes a vacuum chamber, an electrical transformer that surrounds the vacuum chamber to induce an electromagnetic field within the vacuum chamber, and an ignition circuit. The...
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7230202 |
Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
Disclosed herein is a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a...
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7220462 |
Method and electrode assembly for non-equilibrium plasma treatment
A method and electrode assembly for treating a substrate with a non-equilibrium plasma in which the electrode assembly has two or more spaced barrier electrodes and a ground electrode spaced apart...
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7204921 |
Vacuum apparatus and vacuum processing method
A vacuum apparatus which can easily regenerate plasma is provided. A matching box used in the vacuum apparatus can vary the impedance thereof by varying the magnitudes of the inductance of variable...
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7196283 |
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
An overhead gas distribution electrode forming at least a portion of the ceiling of a plasma reactor has a bottom surface facing a processing zone of the reactor. The electrode includes a gas...
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7190119 |
Methods and apparatus for optimizing a substrate in a plasma processing system
An arrangement for processing a semiconductor substrate in a plasma processing system is disclosed. The arrangement includes providing a RF coupling structure having a first terminal and a second...
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7186314 |
Plasma processor and plasma processing method
A plasma processor includes a table on which a target object is to be placed, a vessel which accommodates the table and in which a plasma is to be generated by a high-frequency electromagnetic...
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7183715 |
Method for operating a semiconductor processing apparatus
A method for operating a semiconductor processing apparatus that plasma-processes a semiconductor wafer mounted on a stage placed in a container using a plasma generated therein. The method...
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7183514 |
Helix coupled remote plasma source
A remote plasma source employs a helical coil slow wave structure to couple microwave energy to a flowing gas to produce plasma for downstream substrate processing, such as photoresist stripping,...
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7180243 |
Plasma accelerator with closed electron drift
The closed electron drift plasma accelerator comprises an annular ionization chamber, an acceleration chamber on the same axis as the ionization chamber, an annular anode, a hollow cathode, a first...
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7176634 |
Coaxial type impedance matching device and impedance detecting method for plasma generation
A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the...
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7176402 |
Method and apparatus for processing electronic parts
An electronic part processing method for peeling off a resin coating of an electronic part having a terminal section. The method includes a step of irradiating, with plasma, a coated wire having...
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7173211 |
Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator
A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active...
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7171919 |
Diamond film depositing apparatus using microwaves and plasma
Disclosed herewith is a diamond film depositing apparatus using microwaves and plasma. The apparatus comprises a rectangular wave guide ( 125 ), a mode transition coupler ( 120 ), an antenna rod (...
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7157857 |
Stabilizing plasma and generator interactions
An approach for stabilizing the interactions between a plasma and the generator powering the plasma is provided. Reactive elements disposed between the power generator and plasma operate to modify...
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7157721 |
Coupled ionization apparatus and methods
Apparatus for generating ions in a gaseous medium, the apparatus including two electrodes separated by a dielectric material and a means for generating radio frequency pulses. The electrodes are of...
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7157659 |
Plasma processing method and apparatus
In a state that a plate-shaped insulator is disposed adjacent to a plate-shaped electrode, a discharge gas containing an inert gas is supplied to a vicinity of a processing object from one gas...
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7156047 |
Apparatus for fabricating semiconductor device using plasma
Provided is an apparatus for fabricating a semiconductor device using plasma, whereby a semiconductor device fabricating process using plasma provides significantly greater uniformity. The...
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7156046 |
Plasma CVD apparatus
A plasma CVD apparatus in which microwave power is supplied into a reaction chamber provided inside an annular waveguide through an antenna provided on the inner peripheral part of the waveguide to...
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7153444 |
Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor
Provided is a method and apparatus for controlling a bias voltage over a wide range and for de-coupling dual radio frequency (RF) currents to allow for independent control of plasma density and ion...
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7150780 |
Electrostatic air cleaning device
An electrostatic air cleaning device includes an array of electrodes. The electrodes include corona electrodes connected to a suitable source of high voltage so as to generate a corona discharge....
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7140321 |
Plasma processing apparatus and method
A plasma processing apparatus includes a vacuum chamber that accommodates an object to be processed, and provides a plasma process to the object in a vacuum or reduced pressure environment, a...
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