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7078862 Beam source and beam processing apparatus  
A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode...
7071626 Plasma generator  
Disclosed herein is a plasma generator, in which a plasma forming space, into which the air is introduced, is provided, band plate-like first and second electrodes are arranged in opposed relation...
7061184 Plasma electron density measuring and monitoring device  
The present invention discloses a device for measuring and monitoring electron density of plasma. The device includes a chamber filled with plasma having varying electron density; a frequency probe...
7053576 Energy conversion systems  
This invention relates to apparatus for the conversion of massfree energy into electrical or kinetic energy, which uses in its preferred form a transmitter and a receiver both incorporating Tesla...
7049751 Termination of secondary frequencies in RF power delivery  
There is provided a secondary reactive termination circuit connected between the output of the RF power generator and the input of the plasma chamber to allow the tight regulation or limiting of...
7045793 Multi-grid ion beam source for generating a highly collimated ion beam  
A multi-grid ion beam source has an extraction grid, an acceleration grid, a focus grid, and a shield grid to produce a highly collimated ion beam. A five grid ion beam source is also disclosed...
7042159 Plasma reactor and purification equipment  
In the plasma reactor of the present invention, streamer discharge is caused in a wide region so as to increase a plasma generation region without complicating the architecture of the plasma...
7038389 Magnetron plasma source  
A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid...
7030390 Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like  
An ion source is provided, which generates or emits an ion beam which may be used to deposit a layer on a substrate, or the perform other functions. The ion source includes at least one anode and...
7000565 Plasma surface treatment system and plasma surface treatment method  
A plasma surface treatment system for irradiating a surface of a substrate to be treated with a nitrogen plasma excited by a high-frequency electric field to introduce nitrogen into the surface of...
6984941 Extreme UV radiation source and semiconductor exposure device  
A usable 13.5 nm radiation source in which Sn is the radiation substance, in which rapid transport with good reproducibility is possible up to the plasma generation site and in which formation of...
6977383 Method and apparatus for generating a membrane target for laser produced plasma  
A method and apparatus for generating membrane targets for a laser induced plasma is disclosed herein. Membranes are advantageous targets for laser induced plasma because they are very thin and can...
6975072 Ion source with external RF antenna  
A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically...
6972524 Plasma processing system control  
A method of approximating an ion energy distribution function (IEDF) at a substrate surface of a substrate, the substrate being processed in a plasma processing chamber. There is included providing...
6969953 System and method for inductive coupling of an expanding thermal plasma  
A method is provided for generating plasma using a plasma generator system. The method includes the steps of introducing energy and a reactant to a plasma generation apparatus of the plasma...
6969851 Ion-mobility spectrometry sensor for NOx detection  
A sensor and detection methods are provided for detecting nitric oxides (NOx) in an exhaust gas based upon ion mobility spectrometry (IMS) technique. An ionization chamber having an interior...
6967341 Method and device for the generation of far ultraviolet or soft x-ray radiation  
In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes...
6960887 Method and apparatus for tuning a plasma reactor chamber  
A plasma reactor or vacuum processing apparatus is provided with an orifice plate assembly. The orifice plate assembly includes an upper plate and a lower plate. Each plate is configured with...
6958630 High-frequency detection method and high-frequency detection circuit  
A high frequency detection circuit detects information about a first high frequency power in a high frequency power source device supplying the first high frequency power having a first frequency...
6946063 Deterioration resistant chambers for inductively coupled plasma production  
In one aspect of the invention is a method to construct plasma chambers with improved wall resistance to deterioration. In one embodiment of the invention, a chamber is made of an aluminum alloy...
6939813 Apparatus for improved low pressure inductively coupled high density plasma reactor  
A plasma reactor comprises an electromagnetic energy source coupled to a radiator through first and second variable impedance networks. The plasma reactor includes a chamber having a dielectric...
6933801 Distributed load transmission line matching network  
An apparatus and method for maximizing ac energy delivered to a load by minimizing energy reflected from a load, such as an RF power source coupled to a plasma load for substrate processing...
6929712 Plasma processing apparatus capable of evaluating process performance  
A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a...
6924600 Laser plasma generation method and structure thereof  
In laser-plasma generation, a fluid of target material is jet out to form a jet tube target 21 having a diameter φ and a wall thickness τ with a shell and a hollow space within the shell by...
6922019 Microwave ion source  
A compact microwave ion source has a permanent magnet dipole field, a microwave launcher, and an extractor parallel to the source axis. The dipole field is in the form of a ring. The microwaves are...
6919689 Method for toolmatching and troubleshooting a plasma processing system  
A plasma processing system having a grounded chamber and an RF power feed connected to a bottom electrode is tested. A first capacitance between the bottom electrode and the grounded chamber is...
6917165 Low power plasma generator  
A low power plasma generator is provided which can be fabricated in micro-miniature size and which is capable of efficient portable operation. The plasma generator comprises a microwave stripline...
6911779 Magnetic mirror plasma source  
The preferred embodiments described herein provide a magnetic mirror plasma source. While the traditional magnetic/electrostatic confinement method is ideal for many applications, some processes...
6911649 Particle generator  
Energy tunable solid state sources of neutral particles are described. In a disclosed embodiment, a halogen particle source includes a solid halide sample, a photon source positioned to deliver...
6909087 Method of processing a surface of a workpiece  
A plasma generator generates positive ions and negative ions in a plasma. An ion extracting portion ( 4, 5 ) selectively extracts the generated positive ions and negative ions from the plasma, and...
6909086 Neutral particle beam processing apparatus  
A neutral particle beam processing apparatus comprises a workpiece holder ( 20 ) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber ( 3 ) by applying a...
6909237 Production of stable, non-thermal atmospheric pressure rf capacitive plasmas using gases other than helium or neon  
The present invention enables the production of stable, steady state, non-thermal atmospheric pressure rf capacitive α-mode plasmas using gases other than helium and neon. In particular, the...
6900596 Capacitively coupled plasma reactor with uniform radial distribution of plasma  
A plasma reactor for processing a semiconductor wafer includes a side wall and an overhead ceiling defining a chamber, a workpiece support cathode within the chamber having a working surface facing...
6897615 Plasma process and apparatus  
An apparatus and process for enhancing the ignition of a gas to form a plasma in a plasma tool. The apparatus and process includes the use of a plasma tube to locally enhance the applied electric...
6897617 Method and apparatus to reduce ozone production in ion wind device  
A method to limit ozone production in wind ion devices while simultaneously realizing incidents of high acceleration in such devices varies the high voltage potential across the array of emitter(s)...
6888153 Capacitive shield for containing radiofrequency magnetic fields  
RF magnetic shields which support tangential electric fields. The RF shields are particularly suited for use in magnetic resonance imaging (MRI) systems, but may also be used in other radio...
6888313 Impedance matching network with termination of secondary RF frequencies  
There is provided a secondary reactive termination circuit connected between the output of the RF power generator and the input of the plasma chamber to allow the tight regulation or limiting of...
6888314 Electrostatic fluid accelerator  
An electrostatic fluid accelerator having a multiplicity of closely spaced corona electrodes. The close spacing of such corona electrodes is obtainable because such corona electrodes are isolated...
6885153 Plasma processing apparatus and method  
A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed...
6881971 Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma  
The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation...
6879109 Thin magnetron structures for plasma generation in ion implantation systems  
A plasma generator for space charge neutralization of an ion beam is disclosed and resides within an ion implantation system operable to generate an ion beam and direct the ion beam along a...
6876154 Plasma processing apparatus  
This invention relates to plasma processing apparatus and in particular, but not exclusively, to inductively coupled plasma helicon or electron cyclotron resonance apparatus. A plasma generation...
6876155 Plasma processor apparatus and method, and antenna  
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. A matching network includes...
6870321 High-frequency electron source  
A high-frequency electron source includes a discharge chamber having at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons. The high-frequency electron...
6867387 Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator  
A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active...
6864495 Device for generating an ion beam  
An ion beam generation device including an ion source, an extraction mechanism for ions emitted by the source, an accelerating mechanism of the ions thus extracted, a selector for the ions thus...
6864640 Plasma processing method and apparatus thereof  
A plasma processing method includes introducing a gas into a vacuum chamber through a hole of a dielectric tube attached to a metal body fixed to the vacuum chamber while exhausting from the vacuum...
6864636 Apparatus, method, and system for a laser-assisted field emission microwave signal generator  
A source electrode is biased to lower the potential barrier of surface electrons. A laser radiates the source electrode, producing a tunneling electron current. The tunneling electron current...
6861643 Neutral particle beam processing apparatus  
A neutral particle beam processing apparatus comprises a process gas inlet port ( 11 ) for introducing a process gas into a vacuum chamber ( 1 ), a plasma generating chamber ( 2 ) for generating...
6858988 Electrodeless excimer UV lamp  
An electrodeless excimer UV lamp, comprising an enclosed chamber with a gas sealed within the enclosed chamber, wherein the gas is capable of being used to generate a plasma discharge, a first...