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7078862 |
Beam source and beam processing apparatus
A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode...
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7071626 |
Plasma generator
Disclosed herein is a plasma generator, in which a plasma forming space, into which the air is introduced, is provided, band plate-like first and second electrodes are arranged in opposed relation...
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7061184 |
Plasma electron density measuring and monitoring device
The present invention discloses a device for measuring and monitoring electron density of plasma. The device includes a chamber filled with plasma having varying electron density; a frequency probe...
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7053576 |
Energy conversion systems
This invention relates to apparatus for the conversion of massfree energy into electrical or kinetic energy, which uses in its preferred form a transmitter and a receiver both incorporating Tesla...
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7049751 |
Termination of secondary frequencies in RF power delivery
There is provided a secondary reactive termination circuit connected between the output of the RF power generator and the input of the plasma chamber to allow the tight regulation or limiting of...
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7045793 |
Multi-grid ion beam source for generating a highly collimated ion beam
A multi-grid ion beam source has an extraction grid, an acceleration grid, a focus grid, and a shield grid to produce a highly collimated ion beam. A five grid ion beam source is also disclosed...
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7042159 |
Plasma reactor and purification equipment
In the plasma reactor of the present invention, streamer discharge is caused in a wide region so as to increase a plasma generation region without complicating the architecture of the plasma...
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7038389 |
Magnetron plasma source
A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid...
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7030390 |
Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like
An ion source is provided, which generates or emits an ion beam which may be used to deposit a layer on a substrate, or the perform other functions. The ion source includes at least one anode and...
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7000565 |
Plasma surface treatment system and plasma surface treatment method
A plasma surface treatment system for irradiating a surface of a substrate to be treated with a nitrogen plasma excited by a high-frequency electric field to introduce nitrogen into the surface of...
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6984941 |
Extreme UV radiation source and semiconductor exposure device
A usable 13.5 nm radiation source in which Sn is the radiation substance, in which rapid transport with good reproducibility is possible up to the plasma generation site and in which formation of...
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6977383 |
Method and apparatus for generating a membrane target for laser produced plasma
A method and apparatus for generating membrane targets for a laser induced plasma is disclosed herein. Membranes are advantageous targets for laser induced plasma because they are very thin and can...
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6975072 |
Ion source with external RF antenna
A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically...
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6972524 |
Plasma processing system control
A method of approximating an ion energy distribution function (IEDF) at a substrate surface of a substrate, the substrate being processed in a plasma processing chamber. There is included providing...
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6969953 |
System and method for inductive coupling of an expanding thermal plasma
A method is provided for generating plasma using a plasma generator system. The method includes the steps of introducing energy and a reactant to a plasma generation apparatus of the plasma...
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6969851 |
Ion-mobility spectrometry sensor for NOx detection
A sensor and detection methods are provided for detecting nitric oxides (NOx) in an exhaust gas based upon ion mobility spectrometry (IMS) technique. An ionization chamber having an interior...
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6967341 |
Method and device for the generation of far ultraviolet or soft x-ray radiation
In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes...
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6960887 |
Method and apparatus for tuning a plasma reactor chamber
A plasma reactor or vacuum processing apparatus is provided with an orifice plate assembly. The orifice plate assembly includes an upper plate and a lower plate. Each plate is configured with...
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6958630 |
High-frequency detection method and high-frequency detection circuit
A high frequency detection circuit detects information about a first high frequency power in a high frequency power source device supplying the first high frequency power having a first frequency...
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6946063 |
Deterioration resistant chambers for inductively coupled plasma production
In one aspect of the invention is a method to construct plasma chambers with improved wall resistance to deterioration. In one embodiment of the invention, a chamber is made of an aluminum alloy...
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6939813 |
Apparatus for improved low pressure inductively coupled high density plasma reactor
A plasma reactor comprises an electromagnetic energy source coupled to a radiator through first and second variable impedance networks. The plasma reactor includes a chamber having a dielectric...
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6933801 |
Distributed load transmission line matching network
An apparatus and method for maximizing ac energy delivered to a load by minimizing energy reflected from a load, such as an RF power source coupled to a plasma load for substrate processing...
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6929712 |
Plasma processing apparatus capable of evaluating process performance
A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a...
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6924600 |
Laser plasma generation method and structure thereof
In laser-plasma generation, a fluid of target material is jet out to form a jet tube target 21 having a diameter φ and a wall thickness τ with a shell and a hollow space within the shell by...
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6922019 |
Microwave ion source
A compact microwave ion source has a permanent magnet dipole field, a microwave launcher, and an extractor parallel to the source axis. The dipole field is in the form of a ring. The microwaves are...
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6919689 |
Method for toolmatching and troubleshooting a plasma processing system
A plasma processing system having a grounded chamber and an RF power feed connected to a bottom electrode is tested. A first capacitance between the bottom electrode and the grounded chamber is...
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6917165 |
Low power plasma generator
A low power plasma generator is provided which can be fabricated in micro-miniature size and which is capable of efficient portable operation. The plasma generator comprises a microwave stripline...
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6911779 |
Magnetic mirror plasma source
The preferred embodiments described herein provide a magnetic mirror plasma source. While the traditional magnetic/electrostatic confinement method is ideal for many applications, some processes...
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6911649 |
Particle generator
Energy tunable solid state sources of neutral particles are described. In a disclosed embodiment, a halogen particle source includes a solid halide sample, a photon source positioned to deliver...
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6909087 |
Method of processing a surface of a workpiece
A plasma generator generates positive ions and negative ions in a plasma. An ion extracting portion ( 4, 5 ) selectively extracts the generated positive ions and negative ions from the plasma, and...
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6909086 |
Neutral particle beam processing apparatus
A neutral particle beam processing apparatus comprises a workpiece holder ( 20 ) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber ( 3 ) by applying a...
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6909237 |
Production of stable, non-thermal atmospheric pressure rf capacitive plasmas using gases other than helium or neon
The present invention enables the production of stable, steady state, non-thermal atmospheric pressure rf capacitive α-mode plasmas using gases other than helium and neon. In particular, the...
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6900596 |
Capacitively coupled plasma reactor with uniform radial distribution of plasma
A plasma reactor for processing a semiconductor wafer includes a side wall and an overhead ceiling defining a chamber, a workpiece support cathode within the chamber having a working surface facing...
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6897615 |
Plasma process and apparatus
An apparatus and process for enhancing the ignition of a gas to form a plasma in a plasma tool. The apparatus and process includes the use of a plasma tube to locally enhance the applied electric...
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6897617 |
Method and apparatus to reduce ozone production in ion wind device
A method to limit ozone production in wind ion devices while simultaneously realizing incidents of high acceleration in such devices varies the high voltage potential across the array of emitter(s)...
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6888153 |
Capacitive shield for containing radiofrequency magnetic fields
RF magnetic shields which support tangential electric fields. The RF shields are particularly suited for use in magnetic resonance imaging (MRI) systems, but may also be used in other radio...
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6888313 |
Impedance matching network with termination of secondary RF frequencies
There is provided a secondary reactive termination circuit connected between the output of the RF power generator and the input of the plasma chamber to allow the tight regulation or limiting of...
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6888314 |
Electrostatic fluid accelerator
An electrostatic fluid accelerator having a multiplicity of closely spaced corona electrodes. The close spacing of such corona electrodes is obtainable because such corona electrodes are isolated...
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6885153 |
Plasma processing apparatus and method
A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed...
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6881971 |
Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma
The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation...
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6879109 |
Thin magnetron structures for plasma generation in ion implantation systems
A plasma generator for space charge neutralization of an ion beam is disclosed and resides within an ion implantation system operable to generate an ion beam and direct the ion beam along a...
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6876154 |
Plasma processing apparatus
This invention relates to plasma processing apparatus and in particular, but not exclusively, to inductively coupled plasma helicon or electron cyclotron resonance apparatus. A plasma generation...
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6876155 |
Plasma processor apparatus and method, and antenna
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. A matching network includes...
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6870321 |
High-frequency electron source
A high-frequency electron source includes a discharge chamber having at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons. The high-frequency electron...
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6867387 |
Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator
A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active...
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6864495 |
Device for generating an ion beam
An ion beam generation device including an ion source, an extraction mechanism for ions emitted by the source, an accelerating mechanism of the ions thus extracted, a selector for the ions thus...
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6864640 |
Plasma processing method and apparatus thereof
A plasma processing method includes introducing a gas into a vacuum chamber through a hole of a dielectric tube attached to a metal body fixed to the vacuum chamber while exhausting from the vacuum...
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6864636 |
Apparatus, method, and system for a laser-assisted field emission microwave signal generator
A source electrode is biased to lower the potential barrier of surface electrons. A laser radiates the source electrode, producing a tunneling electron current. The tunneling electron current...
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6861643 |
Neutral particle beam processing apparatus
A neutral particle beam processing apparatus comprises a process gas inlet port ( 11 ) for introducing a process gas into a vacuum chamber ( 1 ), a plasma generating chamber ( 2 ) for generating...
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6858988 |
Electrodeless excimer UV lamp
An electrodeless excimer UV lamp, comprising an enclosed chamber with a gas sealed within the enclosed chamber, wherein the gas is capable of being used to generate a plasma discharge, a first...
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