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7495524 |
Impedance matching apparatus
An impedance matching apparatus has: a storing portion 70 for previously storing, for plural positions which can be taken by a movable portion of a variable impedance element, allowable power...
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7495241 |
Ion beam irradiation apparatus and insulating spacer for the same
The frequency of replacement of an insulating spacer disposed between grids of an ion beam irradiation apparatus is to be reduced. In addition, the intervals of the multiple grids in the ion beam...
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7491955 |
EUV light source, EUV exposure system, and production method for semiconductor device
An Sn—Ga type alloy having a composition in which the atomic % of Sn is 15% or less is accommodated inside a heated tank 4. The Sn alloy pressurized by the pressurizing pump is conducted to a...
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7489206 |
High-frequency power device and method for controlling high-frequency power
A high-frequency power device including: an oscillator; a high-frequency power supplier; a reflection coefficient calculator; a discharge signal output unit; and a frequency controller, wherein the...
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7486758 |
Combined plasma source and liner implosion system
A novel arrangement that combines in a single compact embodiment a plasma flow switch source of ultrahigh speed plasma and an electromagnetically-imploded cylindrical shell. The shell, known as a...
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7485881 |
Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system...
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7482757 |
Inductively coupled high-density plasma source
A high-density plasma source ( 100 ) is disclosed. The source includes an annular insulating body ( 300 ) with an annular cavity ( 316 ) formed within. An inductor coil ( 340 ) serving as an...
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7479645 |
Device for producing extreme UV radiation
An extreme UV radiation producing device in which adhesion of solid tin in the vacuum pump of an evacuation device is restricted, so that the maintenance period and the replacement period of the...
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7477718 |
Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic...
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7469654 |
Plasma processing device
A plasma processing apparatus includes a chamber for carrying out plasma processing inside, a top plate made of a dielectric material for sealing the upper side of this chamber, and an antenna...
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7470627 |
Wafer area pressure control for plasma confinement
A plasma processing chamber is provided which provides improved wafer area pressure control. The plasma processing chamber is a vacuum chamber with a device connected for generating and sustaining...
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7462335 |
Optical monitoring and control system and method for plasma reactors
A method of adjusting plasma processing of a substrate in a plasma reactor having an electrode assembly. The method includes the steps of positioning the substrate in the plasma reactor, creating a...
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7459858 |
Hall thruster with shared magnetic structure
A Hall thruster with a shared magnetic structure including a plurality of plasma accelerators each including an anode and a discharge zone for providing plasma discharge. An electrical circuit...
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7459899 |
Inductively-coupled RF power source
A system and method are disclosed for implementing a power source including a power amplifier that generates a radio-frequency power signal with an adjustable operating frequency. The power...
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7459704 |
Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms
Ion sources and methods for generating molecular ions in a cold operating mode and for generating atomic ions in a hot operating mode are provided. In some embodiments, first and second electron...
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7455030 |
Plasma generating apparatus
A plasma generating apparatus is provided with a plasma generating apparatus for ionizing gas by high frequency discharge within a plasma generating container to thereby generate a plasma and for...
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7455755 |
Vacuum plasma generator
The invention relates to a vacuum plasma generator for providing a plasma discharge ( 10 ) for treating work pieces ( 5 ) by way of a pulsed plasma process in a vacuum chamber ( 2 ). Said vacuum...
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7453191 |
Induction concentration remote atmospheric pressure plasma generating apparatus
The present invention relates, in general, to an induction concentration remote atmospheric pressure plasma generating apparatus, and more particularly, to an induction concentration remote...
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7446479 |
High-density plasma source
The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the...
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7445690 |
Plasma processing apparatus
A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for...
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7439678 |
Magnetic and electrostatic confinement of plasma with tuning of electrostatic field
A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic...
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7436122 |
Helicon hall thruster
Atoms of a propellant gas are ionized in a helicon plasma source, preferably in an annular area between inner and outer cylinders. The annular ionization area is aligned with an annular...
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7427766 |
Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation
A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a...
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7426900 |
Integrated electrostatic inductive coupling for plasma processing
An integrated electrostatic inductively-coupled (i-ESIC) device is provided for plasma processing that may be used as a primary or secondary source for generating a plasma to prepare substrates...
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7420191 |
Discharge radiation source, in particular UV radiation
The invention concerns a radiation source, comprising an anode ( 2 ), a cathode ( 3 ), an electric discharge gap ( 4 ) between the anode ( 2 ) and the cathode ( 3 ) and a gas input conduit ( 30 )...
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7415940 |
Plasma processor
This invention includes a first filter ( 27 ) connected between a susceptor ( 21 ) and ground and having a variable impedance, a sensor ( 28 ) for detecting an electrical signal based on the state...
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7411353 |
Alternating current multi-phase plasma gas generator with annular electrodes
A plasma generator for three phase mains alternating current operation has three plasma generation tubes interconnected with a nozzle, each plasma generation tube having a plasma initiator for...
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7411352 |
Dual plasma beam sources and method
A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam...
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7408303 |
Pulsed plasma accelerator and method
A pulsed plasma accelerator includes two electrodes ( 1 ) arranged between dielectric bars ( 2 ) made from an ablating material, a discharge channel with an open end part whose walls are defined by...
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7405411 |
Ion source with multi-piece outer cathode
In certain example embodiments of this invention, there is provided an ion source including an anode and a cathode. In certain example embodiments, a multi-piece outer cathode is provided. The...
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7404879 |
Ionized physical vapor deposition apparatus using helical self-resonant coil
Provided is an ionized physical vapor deposition (IPVD) apparatus having a helical self-resonant coil. The IPVD apparatus comprises a process chamber having a substrate holder that supports a...
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7405521 |
Multiple frequency plasma processor method and apparatus
A workpiece is processed with a plasma in a vacuum plasma processing chamber by exciting the plasma at several frequencies such that the excitation of the plasma by the several frequencies...
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7405410 |
Method and apparatus for confining, neutralizing, compressing and accelerating an ion field
An apparatus and method of use for injection, confinement, neutralization, acceleration and compression of an ion field using a solenoid having an axis of symmetry and supported within a vacuum...
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7403764 |
RF power delivery diagnostic system
An RF power delivery diagnostic system is provided herein. The system comprises an RF power source ( 303 ), an impedance matching network ( 305 ), a plasma reactor ( 307 ) in electrical contact...
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7397013 |
Plasma lineation electrode
A plasma spray device is provided. The plasma spray device includes a plasma chamber region for having a plasma formed and a throat region coupled to the plasma chamber region. The throat region...
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7394041 |
Apparatus for treating a waste gas using plasma torch
Disclosed is a waste gas treatment apparatus having a waste gas inlet for flowing a waste gas into a main combustion chamber provided in empty space inside a body, and a plasma torch configured to...
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7367196 |
Spinning cold plasma apparatus and methods relating thereto
Disclosed herein is an apparatus for generating a spinning cold plasma. A preferred embodiment of the spinning cold plasma apparatus is portable and includes a vortex tube having an inner wall to...
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7368876 |
Plasma processing apparatus
A low-cost plasma processing apparatus which permits reduction of the cost, as well as reduction of the loss of transmitted power. The plasma processing apparatus 1 has an apparatus main body 2 ...
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7359177 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias power comprising first and second frequency components, f( 1 ), f( 2 ), respectively, and an RF power path...
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7345429 |
Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode...
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7345428 |
Transducer package for process control
A system ( 10 ) is provided herein for monitoring the harmonic content of the RF signal delivered to an RF powered device ( 13 ). The system comprises (a) a voltage transducer ( 16 ) adapted to...
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7342361 |
Plasma source
A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes...
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7342198 |
Method and apparatus for generating an electrical arc
A method of generating an electrical arc includes steps of providing a first electrode and a second electrode, determining a dielectric strength of a gap region between the electrodes, determining...
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7338581 |
Sputtering apparatus
A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30 , substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a...
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7329884 |
Exposure apparatus and exposure method
An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting...
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7327089 |
Beam plasma source
A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending...
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7323821 |
Device for generating and/or influencing electromagnetic radiation from a plasma
A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects...
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7319295 |
High-frequency power supply structure and plasma CVD device using the same
A radio frequency power supply structure and a plasma CVD device comprising the same are provided in which reflection of radio frequency power at a connecting portion where an RF cable connects to...
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7317171 |
Method and apparatus for generating an electric arc
A method and apparatus for reducing the gap resistance between two electrodes, such as the electrodes used fusion splicing one optical fiber to another, by injecting negative ions into the gas or...
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7313451 |
Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium
With analysis data in the prior art, it is difficult to find out if a change regarded as a judgmental standard of the completion of seasoning has come from a change due to the seasoning, namely,...
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