Matches 501 - 550 out of 858 < 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 >
Match Document Document Title
5841235 Source for the generation of large area pulsed ion and electron beams  
In a source for the generation of large-area pulsed ion or electron beams from an anode discharge electrode which has openings receiving discharge electrodes forming a vacuum arc plasma source, the...
5841237 Production of large resonant plasma volumes in microwave electron cyclotron resonance ion sources  
Microwave injection methods for enhancing the performance of existing electron cyclotron resonance (ECR) ion sources. The methods are based on the use of high-power diverse frequency microwaves,...
5838111 Plasma generator with antennas attached to top electrodes  
A plasma generator operable in the UHF and VHF bands is adaptable to process substrates having different sizes and shapes. The device includes a plurality of electrodes, a power supply for...
5838120 Accelerator with closed electron drift  
The invention is related to a plasma technology field, in particular, to plasma accelerators, used in a space technology, in scientific researches and in industry. A technical result is that the...
5828176 Planar crossed-field plasma switch and method  
A cold-cathode, crossed field switch has a magnet system which generates a magnetic field that is radially-oriented about a switch axis and a planar electrode system which generates an...
5828175 Circuitry for operating a glow discharge path  
The circuitry for operating a glow discharge path (GES) comprises a bridge circuit (BC) comprising a polarity switch (S1) and an ignition pulse circuit (ZIS1) in a first bridge branch (B1) and a...
5827435 Plasma processing method and equipment used therefor  
A plasma processing method is provided which suppresses the charge accumulation on a processing object such as a semiconductor substrate. An alternating excitation signal in the form of pulses for...
5817218 Gas reactor using a plasma for cracking or synthesizing gases  
The gas reactor 10 has a first gas inlet 32, a second gas inlet 34, a gas outlet 36, a rotatable plate 22 and stationary plate 20 opposed to this rotatable plate, wherein a gap 24 is formed between...
5818173 Cylindrical antenna having means for generating a magnetic field in a vicinity of the antenna  
The invention relates to a microwave antenna having at least one tubular portion with a central axis, and magnets which are located within the tubular portion along the central axis. The magnets...
5815047 Fast transition RF impedance matching network for plasma reactor ignition  
An impedance matching network for an RF coupled plasma reactor having RF excitation apparatus receiving RF power through the impedance matching network from an RF generator for producing a plasma...
5803973 Apparatus for coating a substrate by chemical vapor deposition  
A source of alternating current (3), is connected to two magnetron cathodes (4, 5), one pole (8) of the a.c. current source (4) being connected to one of the cathodes (4), while the other pole (9)...
5804923 Plasma processing apparatus having a protected microwave transmission window  
A plasma processing apparatus includes a microwave introducing member, which is provided with a microwave transmission opening through which microwaves pass into a processing chamber. The microwave...
5804102 Plasma display filter  
A plasma display filter for efficiently cutting off near infrared rays radiated from a plasma display so that malfunction of electronic equipment located around the display making use of near...
5801489 Three-phase alternating current plasma generator  
A plasma generating system uses three electrodes inside a chamber, connected to a low voltage three-phase AC supply. A high voltage AC plasma generator produces an ionized oscillator gas which is...
5793162 Apparatus for controlling matching network of a vacuum plasma processor and memory for same  
A load including a plasma discharge in a vacuum plasma processing chamber is matched to an r.f. source that supplies sufficient power to the discharge to maintain the discharge. A matching network...
5789867 Apparatus and method for igniting plasma in a process module  
The invention provides apparatus and methods for improving systems that expose samples to reactive plasmas, and more particularly for igniting plasma within a process module. The systems are of the...
5777438 Apparatus for implanting metal ions in metals and ceramics  
A metal ion implanting apparatus according to the present invention includes a vacuum vessel also serving as an anode, a holder for holding a substrate to be processed, a plurality of arc...
5770922 Baseband V-I probe  
An RF probe for a plasma chamber picks up current and voltage samples of the RF power applied to an RF plasma chamber, and the RF voltage and current waveforms are supplied to respective mixers. A...
5767627 Plasma generation and plasma processing of materials  
A plasma generation system includes one or more pairs of electrode units. Each electrode unit emits a plasma carrying gas along a respective axis. Each pair of electrode units is connected to an...
5760496 Inverse-pinch voltage pulse generator  
A first magnetic flux field is produced in the vicinity of a generally cylindrical pulse generating coil arrangement and a plasma is abruptly and radially displaced outwardly toward the coil...
5751113 Closed electron drift hall effect plasma accelerator with all magnetic sources located to the rear of the anode  
A Hall effect plasma accelerator comprises an annular accelerating channel having closed and open ends. A source of magnetic field is positioned behind the closed end of the channel and has an axis...
5747917 Double-walled mircrowave plasma based applicator  
An improved plasma applicator uses a double-walled sapphire sleeve assembly to provide a high efficiency cooling mechanism that is adapted for use with high power applications and aggressive plasma...
5747935 Method and apparatus for stabilizing switch-mode powered RF plasma processing  
Circuitry and techniques designed to allow stable and continuous delivery of alternating power to a processing plasma with switch-mode power supply (16) include a variety of embodiments. Parallel,...
5736818 Resonant radiofrequency wave plasma generating apparatus with improved stage  
A plasma (56, 333) generating apparatus (10, 320, 450) wherein a stage (250, 300, 300A, 350, 400, 425) is constructed to keep the plasma on the substrate (S). A pair of electrically, non-conductive...
5717293 Strike enhancement circuit for a plasma generator  
A strike enhancement circuit for a dc power supply, which can be a switched half-bridge supply, creates a high voltage at high impedance to initiate a plasma in a plasma chamber or sputtering...
5717294 Plasma process apparatus  
A vacuum chamber contains a first electrode for supporting a wafer, and a second electrode opposing the first electrode. A supply system and an exhaustion system are connected to the vacuum...
5705931 Method for determining absolute plasma parameters  
In accordance with the method of the present invention, the radio frequency discharge current generated in a plasma reactor is measured in the form of analog signals at a portion of the reactor...
5703488 Instrument for measuring plasma excited by high-frequency  
This instrument can measure parameters of a plasma accurately and easily even though the plasma is exited by a high-frequency. The instrument for measuring parameters of a plasma generated in a...
5701057 Method of obtaining electric discharge and device for effecting same  
A method of obtaining an electric discharge effected by a device for obtang an electric discharge resides in that on the surface of a cathode (3) is formed a layer (4) of oxides from the cathode...
5698164 Low-temperature plasma generator  
The present invention provides a low-temperature plasma generator as an electric discharger which is used for discharging electricity in dry air, humid air or water, thereby removing an offensive...
5696428 Apparatus and method using optical energy for specifying and quantitatively controlling chemically-reactive components of semiconductor processing plasma etching gas  
An apparatus for producing a plasma suitable for semiconductor processing at pressures in the low millitorr range. The apparatus includes a vacuum chamber with a dielectric window, a generally...
5690745 Apparatus for plasma treatment of the inside surface of a fuel tank  
A treatment chamber (1) evacuable by vacuum pumps (13,13') has a mounting (26,26', . . .) bearing the hollow body (4) in the treatment chamber (1), and a line (9,9') for the admission of a process...
5677597 Electron flow accelerating method and apparatus which can generate a high-power beam  
In a plasm beam generating apparatus comprising a plasma source and an anode portion for receiving a plasma beam, a magnetic field generating device is arranged between the plasma source and the...
5666023 Device for producing a plasma, enabling microwave propagation and absorption zones to be dissociated having at least two parallel applicators defining a propogation zone and an exciter placed relative to the applicator  
The invention relates to a distribution device for distributing microwave power to excite a plasma inside an enclosure. According to the invention, the distribution device includes at least one...
5665167 Plasma treatment apparatus having a workpiece-side electrode grounding circuit  
A static chuck and a workpiece push-up pin are disposed on a susceptor which is one of opposed electrodes generating plasma. The push-up pin and the susceptor are electrically connected. A...
5650693 Plasma sterilizer apparatus using a non-flammable mixture of hydrogen and oxygen  
An apparatus for plasma sterilization of articles is provided that comprises a plasma generator and a sterilizing chamber. The plasma generator has an inlet for receiving a premixed gas mixture...
5648701 Electrode designs for high pressure magnetically assisted inductively coupled plasmas  
A plasma system is disclosed comprising a vessel suitable for containing a plasma at a pressure of at least about 100 mtorr, a plasma gas in the vessel at a pressure of at least 100 mtorr, an...
5646489 Plasma generator with mode restricting means  
A plasma processing apparatus has a waveguide along which microwaves are propagated from a microwave generator to a plasma-forming region in a low-pressure processing chamber. The waveguide has a...
5646488 Differential pumping stage with line of sight pumping mechanism  
An apparatus allows photons in the infrared, visible, ultraviolet, soft x-ray and hard x-ray energy ranges to pass freely along a line of sight path between two vacuum regions at different...
5637962 Plasma wake field XUV radiation source  
A XUV radiation source uses an interaction of electron beam pulses with a gas to create a plasma radiator. A flowing gas system (10) defines a circulation loop (12) with a device (14), such as a...
5637961 Concentric rings with different RF energies applied thereto  
A plasma generating apparatus comprises a chamber for containing an object to be treated, a pair of high frequency coils located concentric in the chamber and opposed to the object, to generate...
5633502 Plasma processing system for transmission electron microscopy specimens and specimen holders  
A plasma processing method and apparatus are disclosed in which a low energy, high frequency plasma is utilized to remove both amorphous damage resulting from various specimen preparation...
5627435 Hollow cathode array and method of cleaning sheet stock therewith  
An array of hollow cathodes can be made by mounting a housing connected to a source of plasma precursor gas and to a source of power in a vacuum chamber, said housing having a plurality of...
5625259 Microwave plasma applicator with a helical fluid cooling channel surrounding a microwave transparent discharge tube  
A fluid-cooled plasma applicator for microwave absorbing fluids is described. The applicator includes a discharge tube substantially transparent to microwave energy and a cooling member surrounding...
5619103 Inductively coupled plasma generating devices  
A broad area plasma lighting device in which a sealed gas envelope placed adjacent to a planar inductive coupling structure generates visible light. Representative planar inductive coupling...
5605640 Reactor for the treatment of particulate matter by electrical discharge  
A reactor and method for the treatment of matter by plasma action. A plurality of electrode structures are positioned to define a reaction zone associated with the inter-electrode space. The...
5592055 Radio-frequency plasma source  
A plasma source is described, comprising a discharge chamber (1) bounded by a base wall (5) and by a lateral wall (3), a system (7) for the admission of gas into said discharge chamber, a system of...
5589737 Plasma processor for large workpieces  
A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the...
5587093 Safe potential arc channel enhanced arc head  
A gas ionizable to produce a plasma is introduced into a arc head and a plasma discharge is initiated at voltages less than 50 V between a high resistance helix, impregnated with low work function...
5585696 High current density glow discharge switch  
The present invention is directed to a high current density glow discharge switch which is capable of preventing confinement of an electron current to the vicinity of the center of a flat electrode...
Matches 501 - 550 out of 858 < 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 >