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7413951 Stacked capacitor and method for producing stacked capacitors for dynamic memory cells  
A method produces stacked capacitors for dynamic memory cells, in which a number of trenches ( 48 ) are formed in the masking layer ( 40 ), each trench ( 48 ) being arranged above a respective...
7368776 Semiconductor device comprising a highly-reliable, constant capacitance capacitor  
A semiconductor device, having a memory cell region and a peripheral circuit region, includes an insulating film, having an upper surface, formed on a major surface of a semiconductor substrate to...
7364967 Methods of forming storage capacitors for semiconductor devices  
Methods of forming a storage capacitor include forming an interlayer insulation layer having an opening therethrough on a semiconductor substrate, forming a contact plug in the opening, forming a...
7358557 Capacitor for semiconductor device and method of forming the same  
A capacitor for a semiconductor device includes a lower electrode, a dielectric layer formed on a lower electrode, and an upper electrode formed on the dielectric layer. The lower electrode...
7355234 Semiconductor device including a stacked capacitor  
A stacked capacitor formed in a capacitor hole includes a bottom electrode, capacitor insulation film and a top electrode. The bottom electrode includes a plurality of islands formed on an...
7348234 Methods of forming capacitor constructions  
The invention includes methods of electrochemically treating semiconductor substrates. The invention includes a method of electroplating a substance. A substrate having defined first and second...
7345333 Double sided container process used during the manufacture of a semiconductor device  
A method used during the formation of a semiconductor device comprises providing a wafer substrate assembly comprising a plurality of digit line plug contact pads and capacitor storage cell contact...
7344977 Method of electroplating a substance over a semiconductor substrate  
The invention includes methods of electrochemically treating semiconductor substrates. The invention includes a method of electroplating a substance. A substrate having defined first and second...
7344826 Method for forming a capacitor  
In a method for forming a photoresist pattern, a method for forming a capacitor, and a capacitor manufactured using the same, a light is selectively irradiated onto a selected portion of a...
7339220 Memory device with surface-channel peripheral transistors  
A method of forming a memory device (e.g., a DRAM) including array and peripheral circuitry. A plurality of undoped polysilicon gates 58 are formed. These gates 58 are classed into three...
7332761 Method for fabricating capacitor of semiconductor device  
The present invention relates to a method for fabricating a capacitor of a semiconductor device. The semiconductor device includes: a bit line structure formed on a substrate and including stacked...
7332404 Method of fabricating capacitor having metal electrode  
In a method of fabricating a capacitor, an interlayer insulating layer is formed on a semiconductor substrate. A contact plug penetrating the interlayer insulating layer is formed. An oxidation...
7320911 Methods of forming pluralities of capacitors  
A method of forming a plurality of capacitors includes providing a plurality of capacitor electrodes comprising sidewalls. The plurality of capacitor electrodes are supported at least in part with...
7312130 Methods of forming capacitor structures including L-shaped cavities  
Methods of forming capacitor structures may include forming an insulating layer on a substrate, forming a first capacitor electrode on the insulating layer, forming a capacitor dielectric layer on...
7300841 Capacitor and method of manufacturing the same  
A capacitor includes a cylindrical storage electrode formed on a substrate. A ring-shaped stabilizing member encloses an upper portion of the storage electrode to structurally support the storage...
7291538 Semiconductor memory device and manufacturing method of the same  
In this semiconductor memory device, a potential clamping region having no insulation layer formed therein is provided in an insulation layer. More specifically, the potential clamping region is...
7288454 Methods of forming capacitors for semiconductor memory devices and resulting semiconductor memory devices  
Methods of forming capacitors include forming a first mold layer and a second mold layer on a substrate, forming storage electrodes through the mold layers, the storage electrodes arranged in rows...
7285462 Semiconductor memory device with trench-type stacked cell capacitors and method for manufacturing the same  
A DRAM is provided that can reduce the parasitic capacitance between trench-type stacked cell capacitors in a memory cell region and suppress malfunction caused by noise. The trench-type stacked...
7282131 Methods of electrochemically treating semiconductor substrates  
The invention includes methods of electrochemically treating semiconductor substrates. The invention includes a method of electroplating a substance. A substrate having defined first and second...
7274059 Capacitor constructions  
The invention includes methods of forming rugged electrically conductive surfaces. In one method, a layer is formed across a substrate and subsequently at least partially dissociated to form gaps...
7273778 Method of electroplating a substance over a semiconductor substrate  
The invention includes methods of electrochemically treating semiconductor substrates. The invention includes a method of electroplating a substance. A substrate having defined first and second...
7268382 DRAM cells  
The invention includes a method of forming a rugged semiconductor-containing surface. A first semiconductor layer is formed over a substrate, and a second semiconductor layer is formed over the...
7268380 Semiconductor device and method of manufacturing the same  
The present invention provides a method of increasing designing freedom of a position to form a capacitor, and increasing a capacitance value thereof. When forming a first contact, a tungsten plug...
7268034 Methods of forming pluralities of capacitors, and integrated circuitry  
A method of forming a plurality of capacitors includes providing a plurality of capacitor electrodes comprising sidewalls. The plurality of capacitor electrodes are supported at least in part with...
7259414 Integrated circuit, its fabrication process and memory cell incorporating such a circuit  
This integrated circuit comprises a capacitor ( 23 ) formed above a substrate ( 1 ) inside a first cavity in a dielectric and comprising a first electrode, a second electrode, a thin dielectric...
7253052 Method for forming a storage cell capacitor compatible with high dielectric constant materials  
Described are integrated circuit electrodes and method for fabricating an electrode, which include, in an embodiment forming a silicon, first portion of the electrode in a lower region of a...
7247902 Semiconductor device and method of manufacturing the same  
A semiconductor device comprises a first metal layer, which comprises a buried metal layer connected to a diffusion layer within a substrate or to a lower-layer wiring. A first metal wiring layer,...
7247537 Semiconductor device including an improved capacitor and method for manufacturing the same  
In a semiconductor device according to embodiments of the invention, a capacitor includes a storage electrode having a cylindrical storage conductive layer pattern and connecting members formed on...
7244655 Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film  
A method of manufacturing a semiconductor device is provided that can suppress impurity concentration reduction in a doped channel region arising from formation of a gate insulating film. With a...
7238609 Method for fabricating semiconductor device  
A method for fabricating a semiconductor device has the steps of forming a conductive film on a substrate, forming an insulating film such that the conductive film is covered with the insulating...
7238585 Method of forming a storage electrode of a semiconductor device  
In a storage electrode of a semiconductor device, and a method of forming the same, the storage electrode includes an outer cylinder including a first outer cylindrical portion having a first outer...
7227215 Semiconductor device having a capacitor with a stepped cylindrical structure and method of manufacturing same  
According to some embodiments, a capacitor includes a storage conductive pattern, a storage electrode having a complementary member enclosing a storage conductive pattern so as to complement an...
7226845 Semiconductor constructions, and methods of forming capacitor devices  
The invention includes semiconductor constructions, and also includes methods of forming pluralities of capacitor devices. An exemplary method of the invention includes forming conductive storage...
7226837 Semiconductor device and method for fabricating the same  
A semiconductor device comprises: a lower contact electrode 1 ; an adhesion improving layer 3 formed on the lower contact electrode 1 ; and a capacitor including a lower electrode 4 in a...
7224015 Method for making a stack of capacitors, in particular for dynamic random access memory [DRAM]  
The invention concerns a method which consists in forming on a substrate ( 1 ) coated with a dielectric material layer ( 3 ) provided with a window ( 3 a ), a stack of successive layers alternately...
7208368 Methods of forming spaced conductive regions, and methods of forming capacitor constructions  
The invention includes a method of forming spaced conductive regions. A construction is formed which includes a first electrically conductive material over a semiconductor substrate. The...
7205219 Methods of forming integrated circuits devices having pad contact plugs in the cell array and peripheral circuit regions of the integrated circuit substrate  
Integrated circuit devices, for example, dynamic random access memory (DRAM) devices, are provided including an integrated circuit substrate having a cell array region and a peripheral circuit...
7199005 Methods of forming pluralities of capacitors  
The invention comprises methods of forming pluralities of capacitors. In one implementation, metal is formed over individual capacitor storage node locations on a substrate. A patterned masking...
7199004 Method of forming capacitor of semiconductor device  
Disclosed is a method of forming a capacitor of a semiconductor device which can secure a desired leakage current characteristic while securing a desired charging capacitance. The inventive method...
7199003 Method of manufacturing capacitor of semiconductor device by simplifying process of forming dielectric layer and apparatus therefor  
In a method of manufacturing a capacitor of a semiconductor device and an apparatus therefor, dielectric layers are deposited using only a source gas without a reactant gas and a curing process is...
7192862 Semiconductor device and method of manufacturing the same  
A manufacturing method of a semiconductor device comprises the steps of forming an etching stop insulating film ( 18 ) that covers at least side surfaces of a wiring ( 16 ) in a first region ( 2 )...
7186593 Methods of fabricating integrated circuit devices having fuse structures including buffer layers  
An integrated circuit device is provided including an integrated circuit substrate having a fuse region. A window layer is provided on the integrated circuit substrate that defines a fuse region....
7179716 Method of forming a metal-containing layer over selected regions of a semiconductor substrate  
The invention includes methods of electrochemically treating semiconductor substrates. The invention includes a method of electroplating a substance. A substrate having defined first and second...
7179361 Method of forming a mass over a semiconductor substrate  
The invention includes methods of electrochemically treating semiconductor substrates. The invention includes a method of electroplating a substance. A substrate having defined first and second...
7170127 Semiconductor device and fabricating method thereof  
The present invention provides a semiconductor device and fabricating method thereof, by which capacitance is enhanced by increasing an effective area of a lower electrode of a capacitor. The...
7161204 DRAM capacitor structure with increased electrode support for preventing process damage and exposed electrode surface for increasing capacitor area  
A method for fabricating a high-density array of crown capacitors with increased capacitance while reducing process damage to the bottom electrodes is achieved. The process is particularly useful...
7158401 Methods for machine detection of at least one aspect of an object, methods for machine identification of a person, and methods of forming electronic systems  
Electronic systems including Si/Ge substrates. The electronic systems can include data storage devices and/or logic devices having active regions extending into a crystalline Si/Ge material. An...
7157764 Semiconductor device having isolation pattern in interlayer insulating layer between capacitor contact plugs and methods of fabricating the same  
A semiconductor device having an isolation pattern inside an interlayer insulating layer between capacitor contact plugs and methods of fabrication the same: The semiconductor device includes an...
7153707 Method for forming a storage cell capacitor compatible with high dielectric constant materials  
An integrated circuit structure includes a digit line and an electrode adapted to be part of a storage cell capacitor and includes a barrier layer interposed between a conductive plug and an...
7151039 Method of forming oxide layer using atomic layer deposition method and method of forming capacitor of semiconductor device using the same  
In a method of forming an oxide layer using an atomic layer deposition and a method of forming a capacitor of a semiconductor device using the same, a precursor including an amino functional group...