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8178872 |
Molecular device, imaging device, photosensor, and electronic apparatus
A molecular device includes a gold electrode, cytochrome c552 or a derivative or variant thereof immobilized on the gold electrode, and an electron transfer protein coupled to the cytochrome c552...
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8178884 |
Thin film transistor including compound semiconductor oxide, method of manufacturing the same and flat panel display device having the same
A thin film transistor, a method of manufacturing the thin film transistor, and a flat panel display device including the thin film transistor. The thin film transistor includes: a gate electrode...
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8174049 |
Semiconductor device and method of fabricating the same
A semiconductor device according to one embodiment includes: a semiconductor substrate having first and second regions; a first transistor comprising a first gate insulating film and a first gate...
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8164095 |
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST*** Semiconductor device wherein a property of a first semiconductor layer is different from a property of a second semiconductor layer
It is an object to provide a semiconductor device which has a large size and operates at high speed. A top gate transistor which includes a semiconductor layer of single-crystal and a bottom gate...
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8124975 |
Display device with multi-gate TFTs of a pixel region having different relative areas of gate regions with respect to channel regions of the TFTs
Provided is a display device capable of suppressing generation of optical leakage current as well as increase in capacitance in a case where a plurality of thin film transistors (TFTs) including a...
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8124976 |
Semiconductor device and method of manufacturing the same
The present invention provides a semiconductor device including SRAM cell units each including a data holding section made up of a pair of driving transistors and a pair of load transistors, a data...
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8124977 |
Localized compressive strained semiconductor
One aspect of the present subject matter relates to a method for forming strained semiconductor film. According to an embodiment of the method, a crystalline semiconductor bridge is formed over a...
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8115209 |
Dual gate layout for thin film transistor
A dual gate layout of a thin film transistor of liquid crystal display to alleviate dark current leakage is disclosed. The layout includes (1) a polysilicon on a substrate having a L-shaped or a...
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8115210 |
Semiconductor display device
A semiconductor display device with an interlayer insulating film in which surface levelness is ensured with a limited film formation time, heat treatment for removing moisture does not take long,...
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8106449 |
Semiconductor device
To achieve a stable reading operation in a memory cell having a gain-cell structure, a write transistor is configured, which has a source and a drain that are formed on the insulating layer, a...
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8101953 |
Thin film transistor having a plurality of carbon nanotubes
A thin film transistor includes a source electrode, a drain electrode, a semiconducting layer, and a gate electrode. The drain electrode is spaced from the source electrode. The semiconducting...
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8101947 |
System and method for manufacturing a thin-film device
A thin-film device includes a plurality of circuit components defining an operational region of the thin-film device, an unpatterned channel portion (108, 340) disposed on the plurality of circuit...
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8089069 |
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST*** Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
A thin film transistor (TFT) includes a substrate, a semiconductor layer disposed on the substrate and crystallized using a metal catalyst, a gate insulating layer disposed on the semiconductor...
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8067772 |
Semiconductor device and manufacturing method thereof
An object is to provide a semiconductor device with improved reliability and for which a defect due to an end portion of a semiconductor layer provided in an island-shape is prevented, and a...
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8063405 |
Display device and manufacturing method thereof, and semiconductor device and manufacturing method thereof
A display device includes source/drain electrodes on a substrate, a pixel electrode, an insulating partition wall layer, a channel-region semiconductor layer. The source/drain electrodes and the...
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8053779 |
Thin film transistor panel, method of fabricating the same, and organic light emitting display device including the same
Provided are a thin film transistor (TFT) panel, a method of fabricating the same, and an organic light emitting display device (OLED) including the same. The TFT panel has a TFT region and a...
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8053290 |
Manufacturing method of semiconductor device
Ni silicide is formed through simple steps. After forming a semiconductor film over a substrate, a Ni film is deposited over the semiconductor film while heating the substrate, thereby forming Ni...
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8044403 |
Display device
An integrated circuit, which is configured such that a MOS transistor and a bipolar transistor are integrated at the same time, is formed on an insulating substrate which includes a display device....
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8035106 |
Electronic device, constituted by using thin-film transistors
An integrated circuit, which is configured such that a MOS transistor and a bipolar transistor are integrated at the same time, is formed on an insulating substrate which includes a display device....
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8035105 |
Solid state image pickup device and method of producing solid state image pickup device
Forming a back-illuminated type CMOS image sensor, includes process for formation of a registration mark on the wiring side of a silicon substrate during formation of an active region or a gate...
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8008137 |
Method for fabricating 1T-DRAM on bulk silicon
An integrated circuit includes a bulk technology integrated circuit (bulk IC) including a bulk silicon layer and complementary MOSFET (CMOS) transistors fabricated thereon. The integrated circuit...
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7989899 |
Transistor, inverter including the same and methods of manufacturing transistor and inverter
A transistor, an inverter including the transistor, and methods of manufacturing the inverter and the transistor. A gate insulating layer of the transistor has a charge trap region. A threshold...
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7968884 |
Semiconductor device and manufacturing method thereof
A semiconductor device manufactured utilizing an SOI substrate, in which defects due to an end portion of an island-shaped silicon layer are prevented and the reliability is improved, and a...
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7964873 |
Thin film transistor array panel and manufacturing method thereof
A thin film transistor array panel is provided, which includes: a substrate; a first polysilicon member that is formed on the substrate and includes an intrinsic region, at least one first...
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7964916 |
Method for fabrication of a semiconductor device and structure
A method for fabrication of 3D semiconductor devices utilizing a layer transfer and steps for forming transistors on top of a pre-fabricated semiconductor device comprising transistors formed on...
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7964900 |
Semiconductor device with semi-insulating substrate portions
A semiconductor substrate includes semi-insulating portions beneath openings in a patterned hardmask film formed over a semiconductor substructure to a thickness sufficient to prevent charged...
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7952097 |
Semiconductor device and method of fabricating the same
A method for improving the reliability and yield of a thin film transistor by controlling the crystallinity thereof. The method comprises the steps of forming a gate electrode on an island...
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7952101 |
Light emitting device and method of manufacturing the same
The present invention has an object of providing a light emitting device including an OLED formed on a plastic substrate, which can prevent the degradation due to penetration of moisture or oxygen....
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7928445 |
Semiconductor MOS transistor device
A disclosed semiconductor device includes a MOS transistor that causes no problems concerning the formation of a thick gate insulating film and that is applicable to high withstand voltage devices....
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7928438 |
Semiconductor thin film and semiconductor device
After an amorphous semiconductor thin film is crystallized by utilizing a catalyst element, the catalyst element is removed by performing a heat treatment in an atmosphere containing a halogen...
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7923779 |
Semiconductor device and method of manufacturing the same
The present invention relates to a semiconductor device including a circuit composed of thin film transistors having a novel GOLD (Gate-Overlapped LDD (Lightly Doped Drain)) structure. The thin...
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7923781 |
Semiconductor device and method for manufacturing the same
It is an object to achieve high performance of a semiconductor integrated circuit depending on not only a microfabrication technique but also another way and to achieve low power consumption of a...
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7919777 |
Bottom gate thin film transistor and method of manufacturing the same
A method of manufacturing a bottom gate thin film transistor (“TFT”) in which a polycrystalline channel region having a large grain size is formed relatively simply and easily. The method of man...
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7911005 |
Dram having deeper source drain region than that of an logic region
A semiconductor device having a DRAM region and a logic region embedded together therein, including a first transistor formed in a DRAM region, and having a first source/drain region containing...
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7910933 |
Dual gate layout for thin film transistor
A dual gate layout of a thin film transistor of liquid crystal display to alleviate dark current leakage is disclosed. The layout includes (1) a polysilicon on a substrate having a L-shaped or a...
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7906779 |
Thin film transistor and method of manufacturing the same
A thin film transistor includes a polysilicon layer formed over a substrate having a channel region, a source region and a drain region, a conductive layer formed in an upper layer of the...
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7893437 |
Semiconductor device and manufacturing method thereof
A semiconductor device and method of manufacturing the same are disclosed. An example semiconductor device includes a semiconductor substrate having a first well, a first source electrode, a drain...
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7893532 |
External contact material for external contacts of a semiconductor device and method of making the same
An external contact material for external contacts of a semiconductor device and a method for producing the same are described. The external contact material includes a lead-free solder material....
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7884367 |
Semiconductor device and manufacturing method thereof, SOI substrate and display device using the same, and manufacturing method of the SOI substrate
A polycrystalline Si thin film and a single crystal Si thin film are formed on an SiO2 film deposited on an insulating substrate. A polycrystalline Si layer is grown by thermally crystallizing an...
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7880206 |
CMOS image sensor with asymmetric well structure of source follower
Provided is a CMOS image sensor with an asymmetric well structure of a source follower. The CMOS image sensor includes: a well disposed in an active region of a substrate; a drive transistor having...
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7861406 |
Method of forming CMOS transistors with dual-metal silicide formed through the contact openings
Methods and associated structures of forming a microelectronic device are described. Those methods may include amorphizing at least one contact area of a source/drain region of a transistor...
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7863621 |
Thin film transistor
A thin film transistor includes a semiconductor layer formed on a polycrystalline silicon layer crystallized by a super grain silicon (SGS) crystallization method. The thin film transistor is...
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7863162 |
Semiconductor device and manufacturing method thereof
A manufacturing method of a semiconductor device in which the oxygen and carbon concentrations are reduced at the interface of each layer making up the semiconductor multilayer film. A first...
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7858964 |
Semiconductor device formed in a recrystallized layer
A semiconductor device includes a substrate that includes a first layer and a recrystallized layer on the first layer. The first layer has a first intrinsic stress and the recrystallized layer has...
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7838346 |
Manufacturing method of semiconductor device
Ni silicide is formed through simple steps. After forming a semiconductor film over a substrate, a Ni film is deposited over the semiconductor film while heating the substrate, thereby forming Ni...
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7829953 |
Semiconductor device and method of fabricating the same
A semiconductor device includes a semiconductor substrate including an NMOS region and a PMOS region, a gate insulating layer formed on the semiconductor substrate, an NMOS gate formed on the gate...
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7821008 |
Semiconductor device and manufacturing method thereof
A catalytic element is added to an amorphous semiconductor film and heat treatment is conducted therefor to produce a crystalline semiconductor film with good quality, a TFT (semiconductor device)...
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7821138 |
Semiconductor device with an improved operating property
The semiconductor comprises an n-channel transistor forming region and a p-channel transistor forming region, which are disposed while being sectioned by an element isolation region. The stress...
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7808001 |
Method for fabricating semiconductor device and semiconductor device
An n-channel MOS transistor and a p-channel MOS transistor are formed on a semiconductor substrate 100. The p-channel MOS transistor includes a gate electrode 102a, a first offset sidewall 103a...
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7791077 |
Electronic device, display device, interface circuit and differential amplification device, which are constituted by using thin-film transistors
An integrated circuit, which is configured such that a MOS transistor and a bipolar transistor are integrated at the same time, is formed on an insulating substrate which includes a display device....
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