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8183659 |
Integrated circuits having interconnects and heat dissipators based on nanostructures
The present invention provides for nanostructures grown on a conducting or insulating substrate, and a method of making the same. The nanostructures grown according to the claimed method are...
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8164092 |
PIN structures including intrinsic gallium arsenide, devices incorporating the same, and related methods
Provided herein are PIN structures including a layer of amorphous n-type silicon, a layer of intrinsic GaAs disposed over the layer of amorphous n-type silicon, and a layer of amorphous p-type...
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8154024 |
Field effect transistor using amorphous oxide film as channel layer, manufacturing method of field effect transistor using amorphous oxide film as channel layer, and manufacturing method of amorphous oxide film
An amorphous oxide containing hydrogen (or deuterium) is applied to a channel layer of a transistor. Accordingly, a thin film transistor having superior TFT properties can be realized, the superior...
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8044445 |
Photoelectric conversion device and method of manufacturing the same
A photoelectric conversion device includes a thin film transistor that is placed on a substrate, a photodiode that is connected to a drain electrode of the thin film transistor and includes an...
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8026535 |
Thin film transistor and organic electroluminescence display using the same
In a thin film transistor, a semiconductor layer containing Si and Ge is applied, a Ge concentration of this semiconductor layer is high at the side of the insulating substrate, and crystalline...
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8013424 |
Semiconductor device and method of fabricating the same
A semiconductor device according to an embodiment includes: a semiconductor substrate; a gate electrode formed on the semiconductor substrate via a gate insulating film; a channel region formed in...
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7999250 |
Silicon-germanium-carbon semiconductor structure
In accordance with one or more embodiments, a semiconductor structure includes a semiconductor substrate, a first semiconductor material over the semiconductor substrate, and a second semiconductor...
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7993947 |
Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates
Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The...
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7973384 |
Phase change memory cell including multiple phase change material portions
A memory cell includes a first electrode, a second electrode, and a first portion of phase-change material contacting the first electrode. The memory cell includes a second portion of phase-change...
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7960646 |
Silicon-based thin-film photoelectric converter and method of manufacturing the same
In order to improve photoelectric conversion properties of a silicon-based thin-film photoelectric converter to which a conductive SiOx layer is inserted to obtain an optical confinement effect,...
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7956361 |
Field effect transistor using amorphous oxide film as channel layer, manufacturing method of field effect transistor using amorphous oxide film as channel layer, and manufacturing method of amorphous oxide film
An amorphous oxide containing hydrogen (or deuterium) is applied to a channel layer of a transistor. Accordingly, a thin film transistor having superior TFT properties can be realized, the superior...
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7935582 |
Field effect transistor using amorphous oxide film as channel layer, manufacturing method of field effect transistor using amorphous oxide film as channel layer, and manufacturing method of amorphous oxide film
An amorphous oxide containing hydrogen (or deuterium) is applied to a channel layer of a transistor. Accordingly, a thin film transistor having superior TFT properties can be realized, the superior...
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7915520 |
Photoelectric conversion device and manufacturing method thereof
A photoelectric conversion device comprising: a pin-type photoelectric conversion layer constituted of a p-type semiconductor layer, an i-type semiconductor layer and an n-type semiconductor layer,...
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7884354 |
Germanium on insulator (GOI) semiconductor substrates
Germanium on insulator (GOI) semiconductor substrates are generally described. In one example, a GOI semiconductor substrate comprises a semiconductor substrate comprising an insulative surface...
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7872259 |
Light-emitting device
An object of the present invention is to provide a new light-emitting device with the use of an amorphous oxide. The light-emitting device has a light-emitting layer existing between first and...
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7863518 |
Photovoltaic device
A photovoltaic device capable of improving output characteristics is provided. This photovoltaic device comprises a crystalline semiconductor member, a substantially intrinsic first amorphous...
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7855127 |
Method for manufacturing semiconductor substrate
A method for manufacturing a semiconductor substrate including: epitaxially growing a silicon germanium (SiGe) film on a silicon (Si) substrate by a chemical vapor deposition method; subjecting a...
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7855384 |
SIC semiconductor device and method for manufacturing the same
A SiC semiconductor device includes: a SiC substrate having a drain layer, a drift layer and a source layer stacked in this order; multiple trenches penetrating the source layer and reaching the...
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7847180 |
Nanostructure and photovoltaic cell implementing same
A photovoltaic nanostructure according to one embodiment of the present invention includes an electrically conductive nanocable coupled to a first electrode, a second electrode extending along at...
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7791106 |
Gallium nitride material structures including substrates and methods associated with the same
Gallium nitride material-based semiconductor structures are provided. In some embodiments, the structures include a composite substrate over which a gallium nitride material region is formed. The...
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7791074 |
Field effect transistor using amorphous oxide film as channel layer, manufacturing method of field effect transistor using amorphous oxide film as channel layer, and manufacturing method of amorphous oxide film
An amorphous oxide containing hydrogen (or deuterium) is applied to a channel layer of a transistor. Accordingly, a thin film transistor having superior TFT properties can be realized, the superior...
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7777291 |
Integrated circuits having interconnects and heat dissipators based on nanostructures
The present invention provides for nanostructures grown on a conducting or insulating substrate, and a method of making the same. The nanostructures grown according to the claimed method are...
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7750338 |
Dual-SiGe epitaxy for MOS devices
A semiconductor includes a semiconductor substrate, a gate stack on the semiconductor substrate, and a stressor having at least a portion in the semiconductor substrate and adjacent to the gate...
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7741639 |
Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light...
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7693360 |
Optoelectronic hybrid integrated module and light input/output apparatus having the same as component
On the back surface of a transparent plate having a light extracting part for outputting lights to the outside, an electrode for wiring, and an electrode for an electromagnetic shield, an optical...
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7525131 |
Photoelectric surface and photodetector
Disclosed is a photoelectric surface including: a first group III nitride semiconductor layer that produces photoelectrons according to incidence of ultraviolet rays; and a second group III nitride...
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7518212 |
Graded GexSe100-x concentration in PCRAM
The present invention provides a design for a PCRAM element which incorporates multiple metal-containing germanium-selenide glass layers of diverse stoichiometries. The present invention also...
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7492988 |
Ultra-compact planar AWG circuits and systems
Planar AWG circuits and systems are disclosed that use air trench bends to increase planar circuit compactness.
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7482616 |
Semiconductor devices having phase change memory cells, electronic systems employing the same and methods of fabricating the same
In one embodiment, a phase-change memory device has an oxidation barrier layer to protect against memory cell contamination or oxidation and a method of manufacturing the same. In one embodiment, a...
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7420207 |
Photo-detecting device and related method of formation
A photo-detecting device includes a buried doping layer of a first conductivity type and disposed at an upper portion of a silicon substrate. A first silicon epitaxial layer of first conductivity...
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7361420 |
Structure, magnetic recording medium, and method of producing the same
To provide a filmy structure of a nanometer size having a phase-separated structure effective for the case where a compound can be formed between two kinds of materials. A structure constituted by...
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7335950 |
Semiconductor device and method of making thereof
To provide a thin film transistor having a low OFF characteristic and to provide P-channel type and N-channel type thin film transistors where a difference in characteristics of the P-channel type...
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7303949 |
High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture
A semiconductor device and method of manufacturing a semiconductor device. The semiconductor device includes channels for a pFET and an nFET. A SiGe layer is selectively grown in the source and...
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7271333 |
Apparatus and method of production of thin film photovoltaic modules
The present invention relates to light-weight thin-film photovoltaic cells, methods for making cells, modules made from cells, and methods for making modules from cells. The invention teaches a...
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7214971 |
Semiconductor light-receiving device
A semiconductor light-receiving device has a substrate including upper, middle and lower regions in its front side. A p-type layer on the lower region has a top surface including a portion on a...
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7202511 |
Near-infrared visible light photon counter
Electromagnetic energy is detected with high efficiency in the spectral range having wavelengths of about 1–2 microns by coupling an absorber layer having high quantum efficiency in the spectral r...
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7176504 |
SiGe MOSFET with an erosion preventing Six1Gey1 layer
A semiconductor device is provided. The semiconductor device comprises a substrate, a gate structure, a spacer, a SixGey layer and a SixGey protection layer. The gate structure is deposited on the...
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7164150 |
Photovoltaic device and manufacturing method thereof
In a photovoltaic device of the present invention, junction characteristics are improved by enhancing interface characteristics between a crystalline silicon semiconductor and an amorphous silicon...
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7157349 |
Method of manufacturing a semiconductor device with field isolation regions consisting of grooves filled with isolation material
A method of manufacturing a semiconductor device comprising a silicon body (1) having a surface (4) provided with field isolation regions (2) enclosing active regions (3). In this method, on the...
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7138668 |
Heterojunction diode with reduced leakage current
An aspect of the present invention provides a semiconductor device that includes a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity...
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7015507 |
Thin film transistor and method of fabricating the same
Provided is a non-single-crystal germanium thin film transistor having a gate insulating film capable of reducing the interface state density between an active layer and the gate insulating film....
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6960789 |
Layout of a thin film transistor and the forming method thereof
A transistor that at least has one of the following characteristics: First, the gate electrode is located outside the gate line, such that the whole transistor is located outside the gate line....
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6951689 |
Substrate with transparent conductive layer, and photovoltaic element
The present invention provides a substrate with a transparent conductive layer comprising at least one layer stacked on a supporting substrate, wherein the surface of the transparent conductive...
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6940089 |
Semiconductor device structure
A method of fabricating a semiconductor structure. According to one aspect of the invention, on a first semiconductor substrate, a first compositionally graded Si1-xGex buffer is deposited where...
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6921914 |
Process for producing semiconductor article using graded epitaxial growth
A process for producing monocrystalline semiconductor layers. In an exemplary embodiment, a graded Si1-xGex (x increases from 0 to y) is deposited on a first silicon substrate, followed by...
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6872972 |
Method for forming silicon film with changing grain size by thermal process
Roughly described, a silicon layer transitions from polysilicon at one surface to amorphous silicon at the opposite surface. The transition can be monotonic, and can be either continuous or it can...
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6856002 |
Graded GexSe100-x concentration in PCRAM
The present invention provides a design for a PCRAM element which incorporates multiple metal-containing germanium-selenide glass layers of diverse stoichiometries. The present invention also...
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6838695 |
CMOS device structure with improved PFET gate electrode
A semiconductor device structure includes a substrate, a dielectric layer disposed on the substrate, first and second stacks disposed on the dielectric layer. The first stack includes a first...
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6787793 |
Strained Si device with first SiGe layer with higher Ge concentration being relaxed to have substantially same lattice constant as second SiGe layer with lower Ge concentration
A semiconductor device comprises a first Si1−αGeα film, a first cap film, a second Si1−βGeβ film (β<α≦1) and a second cap film formed in this order on a substrate whose surface is formed of s...
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6759712 |
Semiconductor-on-insulator thin film transistor constructions
The invention includes SOI thin film transistor constructions, memory devices, computer systems, and methods of forming various structures, devices and systems. The structures typically comprise a...
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