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4887142 |
Monolithically integrated semiconductor device containing bipolar junction transistors, CMOS and DMOS transistors and low leakage diodes and a method for its fabrication
Disclosed is a monolithic integrated semiconductor device which may contain specimens of seven different circuit components; namely: lateral N-MOS and lateral P-MOS transistors (CMOS), vertical...
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4887141 |
Saturation limiting system for a vertical, isolated collector PNP transistor and monolithically integrated structure thereof
The structure of a vertical PNP transistor with isolated collector is modified by forming a P-type diffusion outside the perimeter of a sinker collector diffusion to form an auxiliary collector...
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4864379 |
Bipolar transistor with field shields
A bipolar transistor includes a substrate of semiconductor material having an expitaxial body of the semiconductor material on a surface thereof. The semiconductor body has a major surface. A...
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4829360 |
Monolithic integrated semiconductor means to reduce power dissipation of a parasitic transistor
A semiconductor means is integrated monolithically on a substrate and comprises at least one power diode (3), its cathode being at a higher potential (6) than the potential (5) of the substrate....
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4812891 |
Bipolar lateral pass-transistor for CMOS circuits
A bipolar lateral pass-transistor is disclosed for use in MOS integrated circuits. The transistor includes a semiconductor substrate of a first conductivity type covered by an epitaxial layer, a...
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4807009 |
Lateral transistor
In a lateral transistor having a first semiconductor region of one conductivity type, and an emitter region and a collector region both having the opposite conductivity type and disposed in the...
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4803526 |
Schottky gate field effect transistor and manufacturing method
In a GaAs field effect transistor of the invention, a gate layer is formed on a semi-insulative substrate. The gate layer is made of a conductive material forming a Schottky junction between the...
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4786961 |
Bipolar transistor with transient suppressor
An integrated circuit includes a substrate of one conductivity type silicon and an epitaxial layer of the opposite conductivity type silicon on a surface of the substrate. An emitter region of the...
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4694321 |
Semiconductor device having bipolar transistor and integrated injection logic
A semiconductor integrated circuit device incorporating bipolar transistors and IILs comprises respective buried layers in a substrate and active regions. A buried layer formed in the IIL region...
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4652900 |
NPN transistor with P/N closed loop in contact with collector electrode
A semiconductor device capable of suppressing the influence of a parasitic pnp transistor caused when an npn transistor operates in saturation range in such a way that a p-type impurity region is...
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4641171 |
Monolithically integrated semiconductor power device
A monolithic semiconductor device including an integrated control circuit and a pair of power transistors in a Darlington configuration integrated in the same chip solves the problem of ON-OFF...
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4581547 |
Integrated circuit that eliminates latch-up and analog signal error due to current injected from the substrate
A method is disclosed for eliminating latch-up and analog signal errors in power circuits having a vertical output transistor structure wherein a P-type chip substrate serves as a collector of a...
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4561096 |
Buried semiconductor laser avoiding thyristor action
In order to prevent the output characteristic of a semiconductor laser from being saturated at higher temperatures due to the thyristor effect of a combination of the semiconductor layers thereof,...
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4520448 |
Method of characterizing reliability in bipolar semiconductor devices
This invention concerns a method of characterizing the reliability in bipolar semiconductor devices having reliability detracting leakage current due to a parasitic FET transistor between the...
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4496849 |
Power transistor protection from substrate injection
A PN junction-isolated bipolar integrated circuit having a power transistor protected from delay in turn-off by a parasitic substrate injection. Protection is obtained by interposing an additional...
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4466011 |
Device for protection against leakage currents in integrated circuits
In a bipolar integrated circuit, wherein the elementary components are formed in islands of an N-type epitaxial layer surrounded by P-type isolation walls, a protection against leakage currents is...
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4303932 |
Lateral transistor free of parisitics
For the sake of an increased operational security and a reduction of substrate currents of an intergrated semiconductor circuit with a lateral transistor and a pn insulation, a protective zone...
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4276556 |
Semiconductor device
A semiconductor device including a diode and a bipolar transistor which are connected to each other and formed in an isolated area of a semiconductor layer has a diffused region formed between a...
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4246594 |
Low crosstalk type switching matrix of monolithic semiconductor device
The switching matrix with a plurality of individual lateral type PNPN type switching elements is disposed on a one chip silicon. The chip includes a double layered substrate having a thin P type...
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4211941 |
Integrated circuitry including low-leakage capacitance
An integrated-circuit MOS capacitor has a first doped semiconductive region forming one of its plates. This first semiconductor region is electrically isolated from the semiconductor substrate by a...
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4117507 |
Diode formed in integrated-circuit structure
An IC chip with a substrate 10 of one conductivity type (P), overlain by an epitaxially grown layer 12 of the opposite conductivity type (N), includes a diode formed in part by a region 16 of that...
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4082571 |
Process for suppressing parasitic components utilizing ion implantation prior to epitaxial deposition
A process for suppressing parasitic components, in particular parasitic diodes and transistors, in integrated circuits which have, in particular, inversely operated transistors, in which a...
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T969010 |
Monolithically integrated semiconductor structure containing at least two devices in a common zone and technique for preventing parasitic transistor action
to prevent a parasitic lateral transistor or thyristor effect in an integrated structure including a transistor and a further device sharing one common zone, a doped region which is more highly...
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4027325 |
Integrated full wave diode bridge rectifier
A full wave rectifying junction-diode bridge rectifier is formed in an integrated silicon circuit. One of the two bridge output terminals is ohmically connected to the bulk doped silicon body so...
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4014718 |
Method of making integrated circuits free from the formation of a parasitic PNPN thyristor
In order to prevent the formation of a parasitic PNPN thyristor in an integrated circuit having at least one NPN transistor, a layer of semiconductor material of a conductivity type opposite that...
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3999215 |
Integrated semiconductor device comprising multi-layer circuit element and short-circuit means
An integrated circuit having multi-layer transistors which are separated from each other by means of tub-shaped or dish-shaped isolation zones. The isolation zones are of a conductivity type...
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3992232 |
Method of manufacturing semiconductor device having oxide isolation structure and guard ring
In a method of manufacturing a semiconductor device, wherein an element forming a region of one conductivity type isolated by an oxide layer is disposed on a semiconductor substrate of the opposite...
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3990092 |
Resistance element for semiconductor integrated circuit
A semiconductor integrated circuit contains a resistance element, wherein a low resistance region of a first conductivity type, employed for a circuit resistance, is formed within a high resistance...
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3987478 |
Composite type semiconductor and preparation thereof
A composite type semiconductor is disclosed which comprises a semiconductor substrate having one conductive type. A plurality of semiconductor elements are formed by selective diffusion on a first...
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3931634 |
Junction-isolated monolithic integrated circuit device with means for preventing parasitic transistor action
A junction-isolated monolithic integrated circuit device has its component elements connected in a circuit configuration such that at least one of the isolation PN junctions may be forward-biased...
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3890634 |
Transistor circuit
A lateral region detects the saturation condition and provides overflow negative feedback or a trigger preparation voltage.
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3878551 |
Semiconductor integrated circuits having improved electrical isolation characteristics
Semiconductor integrated circuits having improved electrical isolation characteristics include a monocrystalline semiconductor substrate and a layer of epitaxial semiconductor material overlying at...
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3869321 |
METHOD FOR FABRICATING PRECISION LAYER SILICON-OVER-OXIDE SEMICONDUCTOR STRUCTURE
Semiconductor structure having a support structure with a layer of single crystal material carried by the support structure and a layer of epitaxially grown single crystal semiconductor material...
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3812521 |
BONDING PAD SUBSTRUCTURE FOR INTEGRATED CIRCUITS
A bonding pad substructure in a semiconductor device prevents injection of minority carriers into the substrate during negative overvoltages applied to the bonding pad. An N-type isolated region is...
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3742317 |
SCHOTTKY BARRIER DIODE
Anisotropic etching is employed in the fabrication of a Schottky barrier diode to provide a recessed geometry having a guard ring of reduced area, thereby avoiding the objectionable degree of...
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3697784 |
SEMICONDUCTOR INTEGRATED CIRCUITS
An integrated circuit eliminates the feedback effect of spurious signals between a push-pull transistor pair in separate islands and a third transistor in a third island by locating the third...
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3676714 |
SEMICONDUCTOR DEVICE
A p-n junction isolated integrated circuit bipolar transistor with means to prevent parasitic transistor action between the base of the transistor and the substrate due to accidental forward bias...
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3653988 |
METHOD OF FORMING MONOLITHIC SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES
This method of fabricating junction-isolated semiconductor integrated circuit devices eliminates the photolithographic masking operation associated with a base diffusion by performing a...
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3649887 |
AC LINE OPERATION OF MONOLITHIC CIRCUIT
An integrated circuit chip is disclosed which can be coupled directly to and operated from a source of AC potential. To prevent conduction between the substrate and epitaxial layer of the chip...
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3648128 |
AN INTEGRATED COMPLEMENTARY TRANSISTOR CIRCUIT CHIP WITH POLYCRYSTALLINE CONTACT TO BURIED COLLECTOR REGIONS
An integrated semiconductor device having a monocrystalline semiconductor substrate of one conductivity type, a diffused layer in the substrate of the opposite conductivity type, a vapor deposited...
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3590345 |
DOUBLE WALL PN JUNCTION ISOLATION FOR MONOLITHIC INTEGRATED CIRCUIT COMPONENTS
Described is a system for electrically isolating discrete components of a monolithic integrated circuit one from the other by a pair of spaced diffused walls of the same conductivity type as the...
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3582727 |
HIGH VOLTAGE INTEGRATED CIRCUIT INCLUDING AN INVERSION CHANNEL
A body of semiconductor material has an isolation region of P-type conductivity which surrounds a plurality of zones of N-type conductivity. An insulating layer is disposed on the surface of the...
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3395320 |
Isolation technique for integrated circuit structure
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3341755 |
Switching transistor structure and method of making the same
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3564434 |
Title is not available
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