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7619277 |
Flash memory with a trench common source line
A flash memory includes substrate, control gates, trenches, source regions, isolation structures, drain regions, a common source line, floating gates, tunneling dielectric layers, and dielectric...
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7618894 |
Multi-step selective etching for cross-point memory
Multi-step selective etching. Etching an unmasked region associated with each layer of a plurality of layers, the plurality of layers comprising a stack, wherein the unmasked region of each of the...
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7617591 |
Method for fabricating embedded thin film resistors of printed circuit board
A method for fabricating the embedded thin film resistors of a printed circuit board is provided. The embedded thin film resistors are formed using a resistor layer built in the printed circuit...
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7612404 |
Semiconductor device
A semiconductor device includes semiconductor substrate, isolation insulating film, nonvolatile memory cells, each of the cells including tunnel insulating film, FG electrode, CG electrode,...
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7608883 |
Transistor for non volatile memory devices having a carbon nanotube channel and electrically floating quantum dots in its gate dielectric
A transistor is described having a source electrode and a drain electrode. The transistor has at least one semiconducting carbon nanotube that is electrically coupled between the source and drain...
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7602008 |
Split gate non-volatile memory devices and methods of forming the same
Non-volatile memory devices and methods for fabricating non-volatile memory devices are disclosed. More specifically, split gate memory devices are provided having frameworks that provide increased...
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7595528 |
Nano-enabled memory devices and anisotropic charge carrying arrays
Methods and apparatuses for nanoenabled memory devices and anisotropic charge carrying arrays are described. In an aspect, a memory device includes a substrate, a source region of the substrate,...
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7592665 |
Non-volatile memory devices having floating gates
A nonvolatile memory device may include a substrate having a cell region, and a cell device isolation layer on the cell region of the substrate to define a cell active region. A floating gate may...
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7589387 |
SONOS type two-bit FinFET flash memory cell
A 2-bit FinFET flash memory cell capable of storing 2 bits and a method of forming the same are provided. The memory cell includes a semiconductor fin on a top surface of a substrate, a gate...
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7589376 |
Electrically erasable programmable read-only memory (EEPROM) device and methods of fabricating the same
An EEPROM device includes a device isolation layer disposed at a predetermined region of a semiconductor substrate to define active regions, a pair of control gates crossing the device isolation...
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7589373 |
Semiconductor device
The present invention provides a semiconductor device, which includes a substrate and a sensing memory device. The substrate includes a metal-oxide-semiconductor transistor having a gate. The...
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7586145 |
EEPROM flash memory device with jagged edge floating gate
An EEPROM flash memory device having a floating gate electrode enabling a reduced erase voltage and method for forming the same, the floating gate electrode including an outer edge portion...
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7582930 |
Non-volatile memory and method for manufacturing non-volatile memory
A coupling oxide film is formed on a silicon substrate, a polysilicon film is further formed thereupon, and a low-temperature oxide film is deposited to a thickness of 10 nm, for example. Next, a...
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7582928 |
Nonvolatile semiconductor memory device and its manufacturing method
A non-volatile semiconductor memory device, which is intended to prevent data destruction by movements of electric charges between floating gates and thereby improve the reliability, includes...
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7576385 |
Method for improving erase saturation in non-volatile memory devices and devices obtained thereof
Non-volatile memory devices are disclosed. In a first example non-volatile memory device, programming and erasing of the memory device is performed through the same insulating barrier without the...
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7573095 |
Memory cells with improved program/erase windows
A semiconductor structure includes a memory cell in a first region and a logic MOS device in a second region of a semiconductor substrate. The memory cell includes a first gate electrode over the...
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7573093 |
Non-volatile two-transistor programmable logic cell and array layout
A two-transistor non-volatile memory cell is formed in a semiconductor body. A memory-transistor well is disposed within the semiconductor body. A switch-transistor well is disposed within the...
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7573091 |
Semiconductor device and method of manufacturing the same
The present invention relates to a semiconductor device that includes a semiconductor substrate ( 10 ) having source/drain diffusion regions ( 14 ) formed therein and control gates ( 20 ) formed...
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7573089 |
Non-volatile memory device
Non-volatile memory devices and a method of manufacturing the same, wherein data storage of two bits per cell is enabled and the devices can pass the limit in terms of layout, whereby channel...
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7569882 |
Non-volatile multibit memory cell and method of manufacturing thereof
One embodiment of the invention comprises a first semiconductor structure in electrical contact with a first contact region, a second semiconductor structure in electrical contact with a second...
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7566930 |
Nonvolatile memory device and method for fabricating the same
A nonvolatile (e.g., flash) memory device includes a substrate having a plurality of isolation areas and active areas; a trench formed on the isolation area; a first electrode layer formed on an...
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7566927 |
Flash memory device
A flash memory device may include a memory cell array having a plurality of word lines, bit lines, and memory cells. Each memory cell may be arranged at an intersection of a corresponding word line...
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7560769 |
Non-volatile memory cell device and methods
A method of fabricating a memory cell including forming nanodots over a first dielectric layer and forming a second dielectric layer over the nanodots, where the second dielectric layer encases the...
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7560394 |
Nanodots formed on silicon oxide and method of manufacturing the same
A nanodot material including nanodots formed on silicon oxide, and a method of manufacturing the same, is provided. The nanodot material includes a substrate, a silicon oxide layer, and a plurality...
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7558119 |
Operating method of P-channel non-volatile memory
A P-channel non-volatile memory is described. The P-channel non-volatile memory includes a substrate, a first memory cell, and second memory cell. An N-well is disposed over the substrate, and the...
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7550800 |
Method and apparatus transporting charges in semiconductor device and semiconductor memory device
A conductor-filter system, a conductor-insulator system, and a charge-injection system are provided. The conductor-filter system provides band-pass filtering function, charge-filtering function,...
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7544991 |
Non-volatile memory device and methods of manufacturing and operating the same
A non-volatile memory device and methods of manufacturing and operating the same are provided. In a method of manufacturing a non-volatile memory device, a substrate having a stepped portion that...
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7538376 |
Semiconductor integrated circuit device including a semiconductor device having a stable threshold characteristic
A semiconductor integrated circuit device includes a substrate, a nonvolatile memory device formed in a memory cell region of the substrate, and a semiconductor device formed in a device region of...
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7531411 |
Apparatus and method for a non-volatile memory structure comprising a multi-layer silicon-rich, silicon nitride trapping layer
A non-volatile memory structure comprises a trapping layer that includes a plurality of silicon-rich, silicon nitride layers. Each of the plurality of silicon-rich, silicon nitride layers can trap...
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7528438 |
Non-volatile memory including assist gate
A non-volatile memory is provided. An assist gate structure is formed on a substrate such that the width at the bottom of the assist gate structure is greater than the width at the top of the...
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7525148 |
Nonvolatile memory device
A nonvolatile memory device and a method of manufacturing the same are provided. An insulation layer having a high etching rate as compared with a pad oxide layer is formed as a buffer layer...
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7521764 |
One-time programmable memory device
A one-time programmable, dual-bit memory device comprises one MOS storage transistor having a semiconductor substrate, first and second active regions formed under the surface of the substrate...
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7518180 |
Nonvolatile semiconductor memory device and method for fabricating the same
A nonvolatile semiconductor memory device includes: a gate dielectric made of a multilayer dielectric that is formed on a substrate and discretely accumulates charges; a gate electrode formed on...
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7518179 |
Virtual ground memory array and method therefor
A virtual ground memory array (VGA) is formed by a storage layer over a substrate with a conductive layer over the storage layer. The conductive layer is opened according to a patterned photoresist...
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7514744 |
Semiconductor device including carrier accumulation layers
A semiconductor device includes a gate structure on a channel region of a semiconductor substrate adjacent to a source/drain region therein and a surface insulation layer directly on the...
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7511334 |
Twin-ONO-type SONOS memory
A twin-ONO-type SONOS memory includes a semiconductor substrate having a source region, a drain region and a channel region between the source and drain regions, twin silicon oxide-silicon...
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7508050 |
Negative differential resistance diode and SRAM utilizing such device
A negative differential resistance (NDR) diode and a memory cell incorporating that NDR diode are provided. The NDR diode comprises a p-type germanium region in contact with an n-type germanium...
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7504663 |
Semiconductor device with a floating gate electrode that includes a plurality of particles
The present invention provides a semiconductor device capable of being mass-produced and a manufacturing method of the semiconductor device. The present invention also provides a semiconductor...
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7501682 |
Nonvolatile memory device, method of fabricating the same, and organic lighting emitting diode display device including the same
A nonvolatile memory device may include a substrate, a semiconductor layer on the substrate, and including a source region, a drain region having a relatively shallower impurity injection region...
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7498632 |
Saddle type flash memory device and fabrication method thereof
The present invention relates to a nano-scale flash memory device having a saddle structure, and a fabrication method thereof. Particularly, the invention relates to a highly integrated,...
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7498631 |
Sensing memory device
A sensing memory device disposed on a substrate is provided, which includes a first conductive layer, a second conductive layer and a charge trapping layer. The second conductive layer covers the...
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7492002 |
Non-volatile memory device with a select gate electrode and a control gate electrode formed on a floating gate
A non-volatile memory device includes a floating gate formed on a substrate with a gate insulation layer interposed therebetween, a tunnel insulation layer formed on the floating gate, a select...
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7492001 |
High K stack for non-volatile memory
A memory device may include a source region and a drain region formed in a substrate and a channel region formed in the substrate between the source and drain regions. The memory device may further...
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7485526 |
Floating-gate structure with dielectric component
Floating-gate memory cells having a floating gate with a conductive portion and a dielectric portion facilitate increased levels of charge trapping sites within the floating gate. The conductive...
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7482653 |
Non-volatile memory with carbon nanotubes
Floating-gate memory cells having carbon nanotubes interposed between the substrate and the tunnel dielectric layer facilitate ballistic injection of charge into the floating gate. The carbon...
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7482651 |
Enhanced multi-bit non-volatile memory device with resonant tunnel barrier
A non-volatile memory cell uses a resonant tunnel barrier that has an amorphous silicon and/or amorphous germanium layer between two layers of either HfSiON or LaAlO 3 . A charge trapping layer is...
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7482619 |
Charge trap memory device comprising composite of nanoparticles and method of fabricating the charge trap memory device
Provided are a charge trap memory device including a substrate and a gate structure including a charge trapping layer formed of a composite of nanoparticles, and a method of manufacturing the...
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7473961 |
Non-volatile memory device and method of fabricating the same
A non-volatile memory device having improved electrical characteristics and a method of fabricating the non-volatile memory device are provided. The non-volatile memory device includes a gate...
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7470949 |
Bidirectional nonvolatile memory cell having charge trapping layer in trench and an array of such memory cells, and method of manufacturing
A nonvolatile memory cell has a charge trapping layer for the storage of charges thereon. The cell is a bidirectional cell in a substrate of a first conductivity. The cell has two spaced apart...
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7470947 |
Semiconductor memory and fabrication method for the same
A semiconductor memory includes memory cell transistors comprising a tunnel insulating film, a floating gate electrode, a first insulating film, a control gate electrode, and a first metal salicide...
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