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7622349 |
Floating gate non-volatile memory and method thereof
A method is provided which includes forming a first gate overlying a major surface of an electronic device substrate and forming a second gate overlying and spaced apart from the first gate. The...
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7602069 |
Micro electronic component with electrically accessible metallic clusters
A micro electronic component, preferably in the form of an electronic memory, includes the use of clusters as an electronic memory. Also disclosed as part of the present invention is a method for...
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7602008 |
Split gate non-volatile memory devices and methods of forming the same
Non-volatile memory devices and methods for fabricating non-volatile memory devices are disclosed. More specifically, split gate memory devices are provided having frameworks that provide increased...
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7586145 |
EEPROM flash memory device with jagged edge floating gate
An EEPROM flash memory device having a floating gate electrode enabling a reduced erase voltage and method for forming the same, the floating gate electrode including an outer edge portion...
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7585755 |
Method of fabricating non-volatile memory device
A method of fabricating a non-volatile memory device according to example embodiments may include forming a semiconductor layer on a substrate. A plurality of lower charge storing layers may be...
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7585724 |
FLASH memory device and method of manufacture
A FLASH memory device is provided including a plurality of first floating gates formed over a gate oxide layer formed over a substrate, the first group of floating gates being formed using a...
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7573092 |
Nonvolatile semiconductor memory device having element isolating region of trench type
Disclosure is semiconductor device of a selective gate region, comprising a semiconductor layer, a first insulating film formed on the semiconductor layer, a first electrode layer formed on the...
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7569882 |
Non-volatile multibit memory cell and method of manufacturing thereof
One embodiment of the invention comprises a first semiconductor structure in electrical contact with a first contact region, a second semiconductor structure in electrical contact with a second...
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7560346 |
Semiconductor device and method of manufacturing the same
A semiconductor device includes: a first FET that is formed with first unit FETs each having a first finger electrode and a second finger electrode provided on either side of a gate finger...
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7554840 |
Semiconductor device and fabrication thereof
A memory device is disclosed. A floating gate is disposed overlying a substrate. A tunneling dielectric layer is interposed between the floating gate and the substrate. An inter poly dielectric...
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7547941 |
NAND non-volatile two-bit memory and fabrication method
A NAND non-volatile two-bit memory cell comprises a cell stack and two select stacks disposed on an active area of a substrate. Each select stack is respectively disposed on a side of the cell...
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7528438 |
Non-volatile memory including assist gate
A non-volatile memory is provided. An assist gate structure is formed on a substrate such that the width at the bottom of the assist gate structure is greater than the width at the top of the...
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7521750 |
Semiconductor device having multi-bit nonvolatile memory cell and methods of fabricating the same
A nonvolatile semiconductor device includes a pair of multi-bit nonvolatile memory unit cells. Each unit cell includes a grid type semiconductor body in which a plurality of parallel semiconductor...
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7501678 |
Nonvolatile semiconductor memory device
A nonvolatile semiconductor memory device includes a semiconductor substrate. Active regions are formed on the surface of the substrate, separated from one another by element separating regions and...
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7501677 |
SONOS memory with inversion bit-lines
A SONOS memory cell, formed within a semiconductor substrate, includes a bottom dielectric disposed on the semiconductor substrate, a charge trapping material disposed on the bottom dielectric, and...
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7498630 |
Nonvolatile semiconductor memory
A nonvolatile semiconductor memory which is configured to include a plurality of word lines disposed in a row direction; a plurality of bit lines disposed in a column direction perpendicular to the...
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7495281 |
Non-volatile memory device and methods of forming and operating the same
In a non-volatile memory device and methods of forming and operating the same, one memory transistor includes sidewall selection gates covering both sidewalls of a floating gate when the floating...
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7492002 |
Non-volatile memory device with a select gate electrode and a control gate electrode formed on a floating gate
A non-volatile memory device includes a floating gate formed on a substrate with a gate insulation layer interposed therebetween, a tunnel insulation layer formed on the floating gate, a select...
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7492000 |
Self-aligned split-gate nonvolatile memory structure and a method of making the same
Provided are non-volatile split-gate memory cells having self-aligned floating gate and the control gate structures and exemplary processes for manufacturing such memory cells that provide improved...
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7491999 |
Non-volatile memory cells utilizing substrate trenches
Several embodiments of flash EEPROM split-channel cell arrays are described that position the channels of cell select transistors along sidewalls of trenches in the substrate, thereby reducing the...
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7449746 |
EEPROM with split gate source side injection
Novel memory cells utilize source-side injection, allowing very small programming currents. If desired, to-be-programmed cells are programmed simultaneously while not requiring an unacceptably...
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7449744 |
Non-volatile electrically alterable memory cell and use thereof in multi-function memory array
A multi-function memory array that includes a DRAM distributed in several DRAM sectors, a Flash EEPROM distributed in several Flash EEPROM sectors, a data bus interconnecting the DRAM sectors and...
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7449742 |
Memory device with active layer of dendrimeric material
The present memory device includes first and second electrodes, a passive layer between the first and second electrodes; and an active layer between the first and second electrodes, the active...
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7442988 |
Semiconductor devices and methods of fabricating the same
Disclosed is a semiconductor device and method of fabricating the same. The device is disposed on a substrate, including a fin constructed with first and second sidewalls, a first gate line formed...
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7442985 |
Semiconductor memory device having memory cell section and peripheral circuit section and method of manufacturing the same
An element isolating region for separating an element region of a semiconductor layer is formed in a peripheral circuit section of a semiconductor memory device, and a first conductive layer is...
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RE40486 |
Self-aligned non-volatile memory cell
Disclosed is a self-aligned non-volatile memory cell including a small sidewall spacer electrically coupled and being located next to a main floating gate region. Both the small sidewall spacer and...
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7391078 |
Non-volatile memory and manufacturing and operating method thereof
A non-volatile memory is provided. A substrate having a plurality of trenches and a plurality of select gates is provided. The trenches are arranged in parallel and extend in a first direction....
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7382015 |
Semiconductor device including an element isolation portion having a recess
A non-volatile semiconductor memory device, which is intended to prevent data destruction by movements of electric charges between floating gates and thereby improve the reliability, includes...
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7369436 |
Vertical NAND flash memory device
Memory devices, arrays, and strings are included that facilitate the use of vertical floating gate memory cells in NAND architecture memory strings, arrays, and devices. NAND Flash memory strings,...
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7355237 |
Shield plate for limiting cross coupling between floating gates
A memory system is disclosed that includes a set of non-volatile storage elements. Each of said non-volatile storage elements includes source/drain regions at opposite sides of a channel in a...
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7339230 |
Structure and method for making high density mosfet circuits with different height contact lines
Embodiments herein present a structure, method, etc. for making high density MOSFET circuits with different height contact lines. The MOSFET circuits include a contact line, a first gate layer...
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7323740 |
Single chip data processing device with embedded nonvolatile memory and method thereof
A device is described comprising a substrate of a first conductivity type having a first dopant concentration, a first well formed in the substrate, a second well of the first conductivity type...
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7315057 |
Split gate non-volatile memory devices and methods of forming same
Non-volatile memory devices and methods for fabricating non-volatile memory devices are disclosed. More specifically, split gate memory devices are provided having frameworks that provide increased...
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7312495 |
Split gate multi-bit memory cell
A multi-bit memory cell ( 200 ) with a control gate ( 220 ) for controlling a middle portion of a channel region ( 208 ) provides improved operation including faster programming at smaller voltages...
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7307882 |
Non-volatile memory
A non-volatile memory having a gate structure, a pair of storage units and two assist gates is provided. The gate structure is disposed on the substrate. The storage units are disposed on the...
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7300745 |
Use of pedestals to fabricate contact openings
Nonvolatile memory wordlines ( 160 ) are formed as sidewall spacers on sidewalls of control gate structures ( 280 ). Each control gate structure may contain floating and control gates ( 120, 140 ),...
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7285816 |
Content addressable matrix memory cell
A CAM memory cell integrated on a semiconductor substrate includes a plurality of floating gate memory cells, matrix-organized in rows, called word lines, and columns, called bit lines. The cells...
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7265411 |
Non-volatile memory having multiple gate structure
In one embodiment, a semiconductor device comprises an insulated floating gate disposed on a semiconductor substrate, an insulated program gate formed at least on a side surface of the floating...
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7253069 |
Method for manufacturing silicon-on-insulator wafer
A method for manufacturing a SOI wafer includes a step of heat-treating a wafer in a furnace to form an SOI wafer including a silicon support, an insulating layer containing oxide, and a...
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7250652 |
Nonvolatile semiconductor memory device including an assistant gate formed in a trench
A nonvolatile semiconductor memory device includes a substrate, a central structure, a second gate insulating film, a floating gate, and a control gate. The substrate has a trench. The central...
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7244984 |
Nonvolatile semiconductor memory including two memory cell columns sharing a single bit line
This nonvolatile semiconductor memory includes: a first and a second memory cell column having memory cell transistors connected in series with a floating gate and a first and a second control gate...
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7242051 |
Split gate NAND flash memory structure and array, method of programming, erasing and reading thereof, and method of manufacturing
A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type in the...
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7227219 |
Charge trapping memory cell and fabrication method
A memory cell patterned as a trench transistor is provided with a first gate electrode ( 4 ) as auxiliary gate for source-side injection and a second gate electrode ( 5 ) electrically insulated...
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7224019 |
Semiconductor device and method of manufacture thereof
A semiconductor device comprises a semiconductor substrate, an electrically rewritable semiconductor memory cell provided on the semiconductor substrate, the memory cell comprising an island...
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7220671 |
Organometallic precursors for the chemical phase deposition of metal films in interconnect applications
Chemical phase deposition processes utilizing organometallic precursors to form thin films are herein described. The organometallic precursors may include a single metal center or multiple metal...
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7214579 |
Self-aligned 2-bit “double poly CMP” flash memory cell
Fabrication of a memory cell, the cell including a first floating gate stack (A), a second floating gate stack (B) and an intermediate access gate (AG), the floating gate stacks (A, B) including a...
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7211857 |
Non-volatile semiconductor memory device
A non-volatile semiconductor memory device includes a semiconductor substrate, an insulating film formed on the semiconductor substrate, a plurality of memory cells formed on the semiconductor...
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7208794 |
High-density NROM-FINFET
Semiconductor memory having memory cells, each including first and second conductively-doped contact regions and a channel region arranged between the latter, formed in a web-like rib made of...
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7205601 |
FinFET split gate EEPROM structure and method of its fabrication
A FinFET split gate EEPROM structure includes a semiconductor substrate and an elongated semiconductor fin extending above the substrate. A control gate straddles the fin, the fin's sides and a...
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7199424 |
Scalable flash EEPROM memory cell with notched floating gate and graded source region
An memory device, and method of making same, that includes source and drain regions defining a channel region therebetween. A select gate is formed over and insulated from a first portion of the...
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