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7619926 |
NAND flash memory with fixed charge
A string of nonvolatile memory cells connected in series includes fixed charges located between floating gates and the underlying substrate surface. Such a fixed charge affects distribution of...
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7619287 |
Method of forming a low capacitance semiconductor device and structure therefor
In one embodiment a transistor is formed with a gate structure having an opening in the gate structure. An insulator is formed on at least sidewalls of the opening and a conductor is formed on the...
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7619279 |
Three dimensional flash cell
A floating gate memory cell includes isolation regions between adjacent cells, and a staggered pattern of columns of cells. Word lines are formed parallel to control gate structures.
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7619275 |
Process for forming an electronic device including discontinuous storage elements
A process for forming an electronic device can include forming a trench within a substrate, wherein the trench includes a wall and a bottom. The process can also include including forming a portion...
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7619274 |
Nonvolatile semiconductor memory device and method of manufacturing the same
A nonvolatile semiconductor memory device includes a floating gate electrode which is selectively formed on a main surface of a first conductivity type with a first gate insulating film interposed...
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7618863 |
Method of fabricating flash memory device with increased coupling ratio
A method of fabricating a flash memory which increases a coupling ratio between a floating gate and a control gate in a cell. The method comprises sequentially forming a tunnel oxide film, and...
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7618861 |
Method of manufacturing non-volatile memory device using multiple element isolation regions and perpendicular extensive device regions
Separate first and second floating gates for attracting carriers transferring in a transistor structure having a channel region and first and second main electrode regions into charge storage films...
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7615819 |
Semiconductor device
A semiconductor device includes a semiconductor substrate, an insulating film formed above an upper surface of the substrate and including a contact hole penetrating the insulating film, a wiring...
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7615818 |
Semiconductor device and method of manufacturing the same
The semiconductor device of the present invention includes a semiconductor substrate, a plurality of floating gate electrodes formed in a memory cell forming region of the semiconductor substrate,...
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7615447 |
Composite charge storage structure formation in non-volatile memory using etch stop technologies
Semiconductor-based non-volatile memory that includes memory cells with composite charge storage elements is fabricated using an etch stop layer during formation of at least a portion of the...
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7615446 |
Charge trap flash memory device, fabrication method thereof, and write/read operation control method thereof
In one aspect, a charge trap flash memory device is provided which includes a semiconductor substrate, source and drain regions which are spaced apart in an active region of the semiconductor...
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7612402 |
Nonvolatile memory semiconductor device and manufacturing method thereof
To provide a nonvolatile memory having an excellent data holding property and a technique for manufacturing the memory, a polycrystalline silicon film 7 and an insulating film 8 are...
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7612401 |
Non-volatile memory cell
A semiconductor device comprises a semiconductor substrate, and a non-volatile memory cell provided on the semiconductor substrate, the non-volatile memory cell comprising a tunnel insulating film...
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7608883 |
Transistor for non volatile memory devices having a carbon nanotube channel and electrically floating quantum dots in its gate dielectric
A transistor is described having a source electrode and a drain electrode. The transistor has at least one semiconducting carbon nanotube that is electrically coupled between the source and drain...
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7608882 |
Split-gate non-volatile memory
A split-gate non-volatile memory cell is described, including a substrate, a charge-trapping layer on the substrate, a split gate on the charge-trapping layer, and a source/drain in the substrate...
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7605473 |
Nonvolatile memory devices
Methods of fabricating nonvolatile memory devices are provided. An isolation layer is formed on a substrate. The substrate has a memory region and a well contact region and the isolation layer...
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7605421 |
Non-volatile semiconductor memory element and method of manufacturing the same, and semiconductor integrated circuit device including the non-volatile semiconductor memory element
A non-volatile semiconductor memory element includes: a semiconductor region of a first conductivity type formed in a plate-like form on a semiconductor substrate; a first insulating film formed on...
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7605044 |
Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device including at least one step of: forming a transistor on and/or over a semiconductor substrate; forming silicide on and/or overa gate electrode and a...
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7602030 |
Hafnium tantalum oxide dielectrics
A dielectric layer containing a hafnium tantalum oxide film and a method of fabricating such a dielectric layer produce a dielectric layer for use in a variety of electronic devices. Embodiments...
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7602005 |
Memory devices including spacer-shaped electrodes on pedestals and methods of manufacturing the same
A NOR flash memory device includes a substrate having trenches that extend in a first direction and stepped portions that are arranged between the trenches. A bit region having a linear shape...
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7602004 |
Semiconductor device and methods for forming the same
A semiconductor device includes a first transistor and a second transistor formed on a substrate. Each of the first transistor and the second transistor has a first source region, first drain...
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7601589 |
Method of manufacturing flash memory device
The invention provides a method of manufacturing a flash memory device. Nitride film spacers are formed on sidewalls of protruded isolation films. A recess is formed in a semiconductor substrate by...
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7598564 |
Non-volatile memory devices and methods of forming non-volatile memory devices
A non-volatile memory device including a barrier spacer that serves to protect a control gate, including a metal layer, from damage that may result from exposure to a cleaning solution and/or...
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7598563 |
Memory device and method for manufacturing the same
A split gate (flash) EEPROM cell and a method for manufacturing the same is disclosed, in which a control gate and a floating gate are formed in a vertical structure, to minimize a size of the...
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7598562 |
Semiconductor device and method of manufacturing the same
A semiconductor device including a semiconductor substrate; an element isolation region having a trench filled with an insulating film defined on the semiconductor substrate; a memory cell...
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7598561 |
NOR flash memory
Semiconductor memory array and process of fabrication in which a plurality of bit line diffusions are formed in a substrate, and memory cells formed in pairs between the bit line diffusions, with...
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7595528 |
Nano-enabled memory devices and anisotropic charge carrying arrays
Methods and apparatuses for nanoenabled memory devices and anisotropic charge carrying arrays are described. In an aspect, a memory device includes a substrate, a source region of the substrate,...
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7592664 |
Nonvolatile memory structure and method of forming the same
Example embodiments are directed to a method of forming a nonvolatile memory structure and a nonvolatile memory structure including a plurality of charge storage patterns, wherein an electrical...
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7592663 |
Flash memory device utilizing nanocrystals embedded in polymer
A flash memory device with a nanoscale floating gate and a method of manufacturing thereof are disclosed. At least one embodiment of the present invention provides a much simpler and easier method...
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7592662 |
Semiconductor device and semiconductor system
A semiconductor device includes a semiconductor substrate, a first and second semiconductor regions formed on the semiconductor substrate insulated and separated from each other, a gate dielectric...
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7592221 |
Semiconductor memory device and manufacturing method thereof
Disclosed is a semiconductor memory device including a plurality of diffusion regions, select gates, word lines, and common diffusion regions. The plurality of diffusion regions are extended in the...
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7589374 |
Semiconductor device and related fabrication method
Embodiments of the invention provide a semiconductor device and a related method of fabricating a semiconductor device. In one embodiment, the invention provides a semiconductor device comprising a...
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7589372 |
Nonvolatile memory device and method for fabricating the same
A nonvolatile memory device and a method for fabricating the same decreases power consumption and prevents contamination of an insulating layer. The nonvolatile memory device includes a...
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7589371 |
Semiconductor device and fabrication method therefor
The present invention provides semiconductor device and a fabrication method therefor. The semiconductor device includes trenches ( 11 ) formed in a semiconductor substrate ( 10 ), first ONO films...
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7586145 |
EEPROM flash memory device with jagged edge floating gate
An EEPROM flash memory device having a floating gate electrode enabling a reduced erase voltage and method for forming the same, the floating gate electrode including an outer edge portion...
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7586144 |
Memory device with high dielectric constant gate dielectrics and metal floating gates
A memory cell transistor includes a high dielectric constant tunnel insulator, a metal floating gate, and a high dielectric constant inter-gate insulator comprising a metal oxide formed over a...
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7586135 |
Multilevel integrated circuit devices and methods of forming the same
Semiconductor devices including a plurality of semiconductor layers. A plurality of transistors are on each of the semiconductor layers. The transistors include gate lines and have source regions...
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7585725 |
Use of dilute steam ambient for improvement of flash devices
The present invention provides a flash memory integrated circuit and a method for fabricating the same. The method includes etching a gate stack that includes an initial oxide layer directly in...
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7585724 |
FLASH memory device and method of manufacture
A FLASH memory device is provided including a plurality of first floating gates formed over a gate oxide layer formed over a substrate, the first group of floating gates being formed using a...
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7583534 |
Memory utilizing oxide-conductor nanolaminates
One floating gate transistor embodiment includes a first source/drain region, a second source/drain region, and a channel region therebetween. A floating gate is separated from the channel region...
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7582926 |
Semiconductor storage device, its manufacturing method and operating method, and portable electronic apparatus
The present invention provides a semiconductor storage device having: a first conductivity type region formed in a semiconductor layer; a second conductivity type region formed in the semiconductor...
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7582530 |
Managing floating gate-to-floating gate spacing to support scalability
Formation techniques are utilized to increase the space or distance between floating gates of a memory array of floating gate transistors. In at least some embodiments, floating gates are first...
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7580279 |
Flash memory cells with reduced distances between cell elements
An anti-reflective coating (ARC) is formed over the various layers involved in a cell fabrication process. The ARC is selectively etched such that the edges of the etched areas of the ARC slope...
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7576440 |
Semiconductor chip having bond pads and multi-chip package
A semiconductor chip comprises a semiconductor substrate having integrated circuits formed on a cell region and a peripheral circuit region adjacent to each other. A bond pad-wiring pattern is...
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7575972 |
Method of manufacturing nonvolatile memory device
A method of manufacturing a nonvolatile memory device is disclosed. The method includes the steps of forming a tunnel oxide layer, a first conductive layer for a floating gate, and a hard mask...
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7573095 |
Memory cells with improved program/erase windows
A semiconductor structure includes a memory cell in a first region and a logic MOS device in a second region of a semiconductor substrate. The memory cell includes a first gate electrode over the...
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7573090 |
Nonvolatile semiconductor memory device and manufacturing method thereof
A nonvolatile semiconductor memory device is provided in such a manner that a semiconductor layer is formed over a substrate, a charge accumulating layer is formed over the semiconductor layer with...
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7573089 |
Non-volatile memory device
Non-volatile memory devices and a method of manufacturing the same, wherein data storage of two bits per cell is enabled and the devices can pass the limit in terms of layout, whereby channel...
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7570521 |
Low power flash memory devices
A buried bipolar junction is provided in a floating gate transistor flash memory device. During a write operation electrons are injected into a surface depletion region of the memory cell...
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7569880 |
Non-volatile electromechanical field effect devices and circuits using same and methods of forming same
Under one aspect, a field effect device includes a gate, a source, and a drain, with a conductive channel between the source and the drain; and a nanotube switch having a corresponding control...
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