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7110297 |
Semiconductor storage device and mobile electronic apparatus
A semiconductor storage device is provided, which comprises a memory array comprising memory elements. Each memory element comprises a gate electrode, a channel region, first and second diffusion...
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7109547 |
Non-volatile semiconductor memory device having memory cell array suitable for high density and high integration
First and second semiconductor regions are formed apart from each other on a semiconductor body. A stacked gate is formed on the semiconductor body between the first and second semiconductor...
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7105406 |
Self aligned non-volatile memory cell and process for fabrication
Floating gate structures are disclosed that have a projection that extends away from the surface of a substrate. This projection may provide the floating gate with increased surface area for...
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7105888 |
Nonvolatile semiconductor memory device and method of manufacturing same
A first insulating layer, a second insulating layer, a third insulating layer, a first conductive layer, and an oxidation inhibitor film are successively deposited on a surface of a semiconductor...
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7102190 |
Flash memory cell with a unique split programming channel and reading channel
A structure for flash memory cells is disclosed, Isolation regions are formed in a semiconductor region separating cells and also separating programming bit line channel regions of a cell from...
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7098504 |
Nonvolatile semiconductor storage device and production method therefor
There is provided a nonvolatile semiconductor storage device less subject to variances of electric characteristics among memory cells. A floating gate electrode provided on a substrate is made of...
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7095075 |
Apparatus and method for split transistor memory having improved endurance
The present invention includes floating gate transistor structures used in non-volatile memory devices such as flash memory devices. In one embodiment, a system includes a CPU and a memory device...
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7095074 |
Semiconductor device with reduced memory leakage current
Defects in element forming regions on which memory cells of a non-volatile memory are formed are to be diminished to reduce leakage current. End portions of element forming regions with...
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7095085 |
Nonvolatile semiconductor memory device and method for manufacturing the same
A nonvolatile semiconductor memory device includes erasable and programmable memory cell transistors, a selection transistor, a peripheral transistor, first post-oxidation films each provided on a...
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7095077 |
Semiconductor memory having two charge storage sections
A semiconductor memory includes: a p-type semiconductor (p-type semiconductor film on a substrate, a p-type well region in a semiconductor substrate, or an insulator); a gate insulating film formed...
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7091549 |
Programmable memory devices supported by semiconductor substrates
The invention includes a memory device supported by a semiconductor substrate and comprising in ascending order from the substrate: a floating gate, a dielectric material, a layer consisting...
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7087489 |
Method of fabricating trap type nonvolatile memory device
A method of forming a trap type nonvolatile memory device is disclosed. The method includes forming a cell gate insulating layer on a semiconductor substrate. The semiconductor substrate includes a...
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7087953 |
Unified non-volatile memory device and method for integrating NOR and NAND-type flash memory and EEPROM device on a single substrate
A method for making a unified non-volatile memory (NVM) comprised of a NOR-type flash memory, a NAND-type flash memory, and a 3-transistor EEPROM integrated on the same chip is achieved. This...
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7087950 |
Flash memory cell, flash memory device and manufacturing method thereof
The present invention relates to a flash memory cell comprising a silicon substrate having an active region comprising a channel region and source-/drain-regions, the active region comprising a...
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7084452 |
Semiconductor device having one-time programmable ROM and method of fabricating the same
A semiconductor device with a one-time programmable (OTP) ROM disposed over a semiconductor substrate including a memory cell area and a peripheral circuit area includes a MOS transistor and an OTP...
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7084440 |
Integrated circuit layout and a semiconductor device manufactured using the same
An integrated circuit layout and a semiconductor device manufactured using the same are provided. According to one embodiment, a semiconductor device has a substrate and a plurality of bar type...
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7081651 |
Non-volatile memory device with protruding charge storage layer and method of fabricating the same
A non-volatile memory device includes a tunnel oxide layer, a charge storage layer, a blocking insulating layer, and a gate electrode that are sequentially stacked, as well as an impurity diffusion...
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7081381 |
Flash memory cell and the method of making separate sidewall oxidation
A process and product for making integrated circuits with dense logic and/or linear regions and dense memory regions is disclosed. On a common substrate, a dual hard mask process separately forms...
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7078769 |
Nonvolatile memory and manufacturing method thereof
Memory elements, switching elements, and peripheral circuits to constitute a nonvolatile memory are integrally formed on a substrate by using TFTs. Since semiconductor active layers of memory...
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7078349 |
Method to form self-aligned floating gate to diffusion structures in flash
A self-aligned conductive region to active region structure is disclosed in which parallel active regions of a semiconductor region of a substrate, which extends to a surface, are separated by STI...
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7078776 |
Low threshold voltage semiconductor device
A semiconductor device has a first semiconductor region formed in a semiconductor substrate and having a first conductivity type due to first-conductivity-type active impurities contained in the...
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7075139 |
Method of manufacturing semiconductor device
Described is a semiconductor device having a silicon oxide (SiO 2 ) film into which nitrogen atoms, in a range between approximately 2×10 20 atoms/cm 3 or more and 2×10 21 atoms/cm 3 or less,...
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7075142 |
Cell arrays of memory devices having extended source strapping regions
A cell array of a flash memory device includes extended source strapping regions. The cell array includes a device isolation layer and active regions. The device isolation layer is formed in a...
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7075820 |
Semiconductor memory device for dynamically storing data with channel body of transistor used as storage node
A semiconductor memory device includes a plurality of MIS transistors arranged at intersections of first word lines and bit lines formed on an SOI substrate and each configuring a memory cell. Each...
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7075143 |
Apparatus and method for high sensitivity read operation
A nonvolatile semiconductor memory device enabling a high sensitivity read operation by a low voltage, provided with a gate insulating film comprised of a bottom insulating film, a charge storing...
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7071512 |
Non-volatile semiconductor memory device
A non-volatile semiconductor memory device includes a substrate, a first insulating film formed on the substrate, a second insulating film formed on the first insulating film, a plurality of...
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7072223 |
Asymmetric band-gap engineered nonvolatile memory device
Systems and methods are provided for nonvolatile memory devices that incorporate a band-gap engineered gate stack with asymmetric tunnel barriers. One embodiment of a memory device includes first...
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7067873 |
Charge trapping device
A silicon based semiconductor device and method uses charge trapping to alter a density of carriers available in a channel of a field effect transistor (FET) for conduction. The charge trapping...
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7064377 |
Flash memory cell with buried floating gate and method for operating such a flash memory cell
A programmable read-only memory cell and method of operating the programmable read-only memory cell. In one embodiment, the programmable read-only memory cell comprises a floating gate arranged in...
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7064375 |
Semiconductor memory device having a gate electrode and a diffusion layer and a manufacturing method thereof
A semiconductor memory device, including a first memory cell having a first gate electrode, a first diffusion layer, and a second diffusion layer; a first contact layer connected to the first...
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7061069 |
Semiconductor device having two-layered charge storage electrode
A first insulation film, a first conductor film, and a cap are sequentially formed on a semiconductor substrate. The first insulation film, the first conductor film, and the cap, and the substrate...
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7061046 |
Non-volatile semiconductor memory device
Bitline conductor tracks are arranged parallel to one another and electrically insulated from a substrate provided with a basic doping. A memory layer sequence, especially a charge-trapping layer...
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7057230 |
Nonvolatile semiconductor memory device employing transistors having different gate withstand voltages for enhanced reading speed
A semiconductor device includes a plurality of nonvolatile memory cells ( 1 ). Each of the nonvolatile memory cells comprises a MOS type first transistor section ( 3 ) used for information storage,...
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7057228 |
Memory array with byte-alterable capability
This invention provides a memory array and it support signals and a method for byte access for programming, erasing and reading memory cells. The advantage of this array and method is the ability...
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7053437 |
Semiconductor memory device, semiconductor device and methods of manufacturing them, portable electronic equipment, and IC card
A semiconductor memory device including memory cells, each memory cell including: a gate insulating film formed on a semiconductor substrate; a gate electrode formed on the gate insulating film; a...
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7053438 |
Fabrication of gate dielectric in nonvolatile memories in which a memory cell has multiple floating gates
In fabrication of a nonvolatile memory cell having two floating gates, one or more peripheral transistor gates are formed from the same layer ( 140 ) as the select gate. The gate dielectric ( 130 )...
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7049651 |
Charge-trapping memory device including high permittivity strips
The charge-trapping layer comprises two strips above the source and drain junctions. The thicknesses of the charge-trapping layer and the gate dielectric are chosen to facilitate...
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7049652 |
Pillar cell flash memory technology
An array of a pillar-type nonvolatile memory cells ( 803 ) has each memory cell isolated from adjacent memory cells by a trench ( 810 ). Each memory cell is formed by a stacking process layers on a...
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7046552 |
Flash memory with enhanced program and erase coupling and process of fabricating the same
Self-aligned split-gate flash memory cell array and process of fabrication in which erase and select gates are positioned on opposite sides of stacked floating and control gates, with source...
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7045845 |
Self-aligned vertical gate semiconductor device
A transistor ( 10 ) is formed in a semiconductor substrate ( 12 ) whose top surface ( 48 ) is formed with a pedestal structure ( 24 ). A conductive material ( 40 ) is disposed along a side surface...
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7045418 |
Semiconductor device including a dielectric layer having a gettering material located therein and a method of manufacture therefor
The present invention provides a semiconductor device ( 200 ), a method of manufacture therefor and an integrated circuit including the same. In one embodiment of the invention, the semiconductor...
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7042043 |
Programmable array logic or memory devices with asymmetrical tunnel barriers
Structures and methods for programmable array type logic and/or memory devices with asymmetrical low tunnel barrier intergate insulators are provided. The programmable array type logic and/or...
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7037782 |
Semiconductor memory having storage cells storing multiple bits and a method of manufacturing the same
A multiple-bit cell transistor includes a P type silicon substrate, a gate insulation layer, a pair of N type source/drain regions, a pair of tunnel insulation layers, and a pair of floating gates....
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7038291 |
Semiconductor device and method of fabricating the same
Provided is a semiconductor device and a method of fabricating the semiconductor device, in which electric characteristics of a gate insulating film thereof in the vicinity of an element isolation...
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7034355 |
Nonvolatile semiconductor storage and its manufacturing method
To achieve a higher operating speed, higher reliability, and lower power consumption by reducing the thickness of an inter-poly silicon insulator film between a floating gate and a control gate of...
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7034354 |
Semiconductor structure with lining layer partially etched on sidewall of the gate
A semiconductor structure with partially etched gate and method of fabricating the same. A semiconductor structure with a single-sided or dual-sided partially etched gate comprises a gate...
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7030020 |
Method to shrink cell size in a split gate flash
A new method to form MOS gates in an integrated circuit device is achieved. The method comprises forming a dielectric layer overlying a substrate. A polysilicon layer is formed overlying the...
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7026682 |
Non-volatile memory device with enlarged trapping layer
Methods for making a nonvolatile memory device, such as an NROM device that has an oxide-nitride-oxide layer beneath at least one word line structure, are disclosed. The oxide-nitride-oxide layer...
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7026681 |
Flash memory device and fabrication process thereof, method of forming a dielectric film
A fabrication process of a flash memory device includes microwave excitation of high-density plasma in a mixed gas of Kr and an oxidizing gas or a nitriding gas. The resultant atomic state oxygen...
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7026685 |
Semiconductor devices having a non-volatile memory transistor and methods for manufacturing the same
Semiconductor devices including a non-volatile memory transistor and methods for manufacturing such semiconductor devices are described. One semiconductor device may include a silicon substrate ...
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