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7629221 |
Method for forming capacitor of semiconductor device
Disclosed is a method for forming a capacitor of a semiconductor device. In such a method, a mold insulating layer is formed on an insulating interlayer provided with a storage node plug, and the...
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7602002 |
Semiconductor device with DRAM portion having capacitor-over-bit-line structure and logic portion
The present invention provides a semiconductor device comprising: a semiconductor substrate having a DRAM portion and a Logic portion; a first transistor in said DRAM portion; a second transistor...
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7598559 |
Semiconductor storage device, manufacturing method therefor, and portable electronic equipment
A semiconductor storage device has a semiconductor layer having a first conductivity type region and two second conductivity type regions separated from each other by the first conductivity type...
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7592661 |
CMOS embedded high voltage transistor
A circuit having a high voltage, drain-extended (DE) metal-oxide-semiconductor (MOS) transistor and method for fabricating the same are provided. Generally, the circuit includes an n-channel (NMOS)...
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7576381 |
Memory structure and fabricating method thereof
A memory structure including a substrate, a first dielectric layer, a first conducting layer, a second conducting layer, a second dielectric layer, a spacer and a doped region is provided. The...
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7573087 |
Interconnect line selectively isolated from an underlying contact plug
A means for selectively electrically connecting an electrical interconnect line, such as a bit line of a memory cell, with an associated contact stud and electrically isolating the interconnect...
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7557399 |
Metal-insulator-metal capacitors
A metal-insulator-metal (MIM) capacitor is provided. The bottom electrode of the MIM capacitor is electrically connected to a connection node. The connection node may be, for example, a contact...
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7547937 |
Semiconductor memory device and method for manufacturing the same
A semiconductor memory device includes a first word-line, a first non-inverted bit-line, a first inverted bit-line, a first global interconnection layer, a first memory capacitor having a first...
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7544988 |
Semiconductor integrated circuit device and a method of manufacturing the same
The memory cell transistor includes, in a first well region, a pair of memory electrodes, one of which serves as source electrode and the other serves as drain electrode and a channel region...
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7541633 |
Phase-change RAM and method for fabricating the same
A PRAM and a fabricating method thereof are provided. The PRAM includes a transistor and a data storage capability. The data storage capability is connected to the transistor. The data storage...
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7541239 |
Selective spacer formation on transistors of different classes on the same device
A method of selectively forming a spacer on a first class of transistors and devices formed by such methods. The method can include depositing a conformal first deposition layer on a substrate with...
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7521746 |
Ferroelectric random access memories (FRAMS) having lower electrodes respectively self-aligned to node conductive layer patterns and methods of forming the same
A ferroelectric random access memory (FRAM) includes a semiconductor substrate and an interlayer insulating layer on the substrate. A diffusion preventive layer is on the interlayer insulating...
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7518181 |
Semiconductor memory device and methods of manufacturing and operating the same
A semiconductor memory device and methods of manufacturing and operating the same may be provided. The semiconductor memory device may include a substrate, at least a pair of fins protruding from...
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7518175 |
Semiconductor memory device and method for fabricating the same
The present invention relates to a semiconductor memory device and a method for fabricating the same. The semiconductor memory device, including: a plurality of gate structures formed on a...
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7511328 |
Semiconductor device having raised cell landing pad and method of fabricating the same
A semiconductor device and method of manufacturing the same having pad extending parts, the semiconductor device includes an isolation layer that defines an active region and a gate electrode which...
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7508022 |
Semiconductor device including a TCAM having a storage element formed with a DRAM
In order to improve the discharging speed of potential from a match line, a semiconductor device includes a capacitor, a memory transistor having a source/drain region connected to a storage node...
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7485915 |
Semiconductor device and method having capacitor and capacitor insulating film that includes preset metal element
A semiconductor device includes a capacitor which includes a capacitor insulating film at least including a first insulating film and a ferroelectric film formed in contact with the first...
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7474002 |
Semiconductor device having dielectric film having aperture portion
In the semiconductor device having a structure in which a plurality of layers are built-up by layers made of different materials or layers including various formed patterns, it is an object to...
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7473652 |
Organic polymers, electronic devices, and methods
Organic polymers for use in electronic devices, wherein the polymer includes repeat units of the formula:
wherein: each R 1 is independently H, an aryl group, Cl, Br, I, or an organic group...
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7459741 |
Semiconductor memory device
A semiconductor memory device excellent in data holding characteristics even when a cell area is reduced is disclosed. According to one aspect of the present invention, a semiconductor memory...
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7456459 |
Design of low inductance embedded capacitor layer connections
The present invention discloses capacitors having via connections and electrodes designed such that they provide a low inductance path, thus reducing needed capacitance, while enabling the use of...
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7453116 |
Semiconductor memory device and method of fabricating the same
A silicon nitride film for storing electric charge is formed on a semiconductor substrate while placing a tunnel oxide film in between, and the silicon nitride film is then subjected to hydrogen...
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7427793 |
Sacrificial self-aligned interconnect structure
A sacrificial, self-aligned polysilicon interconnect structure is formed in a region of insulating material to the side of an active region location and underlying a semiconductor device of a...
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7420237 |
Capacitor element
A capacitor element is provided which is composed of a lower electrode, an upper electrode formed in opposing relation to the lower electrode, and a capacitor dielectric film made of a...
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7414297 |
Capacitor constructions
The invention includes methods of forming rugged electrically conductive surfaces. In one method, a layer is formed across a substrate and subsequently at least partially dissociated to form gaps...
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7411836 |
Method of operating non-volatile memory
A method of operating a non-volatile memory comprising a substrate, a gate, a charge-trapping layer, a source region and a drain region is provided. The charge-trapping layer close to the source...
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7408218 |
Semiconductor device having plural dram memory cells and a logic circuit
A memory cell capacitor (C 3 ) of a DRAM is formed by use of a MIM capacitor which uses as its electrode a metal wiring line of the same layer (M 3 ) as metal wiring lines within a logic circuit...
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7405439 |
Memory cell structure and semiconductor memory device
A memory cell structure comprises a first memory capacitor that is arranged in a first local area, and includes a first lower electrode, a first upper electrode, and a first dielectric oxide film...
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7382014 |
Semiconductor device with capacitor suppressing leak current
A semiconductor device with a capacitor includes a lower electrode, a dielectric and an upper electrode on the dielectric layer. The dielectric layer including more than one polycrystalline...
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7378739 |
Capacitor and light emitting display using the same
A capacitor including a polysilicon layer doped with impurities to be conductive, a first dielectric layer formed on the polysilicon layer, a first conductive layer formed on the first dielectric...
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7375376 |
Semiconductor display device and method of manufacturing the same
A semiconductor display device with an interlayer insulating film in which surface levelness is ensured with a limited film formation time, heat treatment for removing moisture does not take long,...
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7355236 |
Non-volatile floating gate memory cells with polysilicon storage dots and fabrication methods thereof
Non-volatile floating gate memory cells with polysilicon storage dots and fabrication methods thereof. The non-volatile floating gate memory cell comprises a semiconductor substrate of a first...
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7339222 |
Method for determining wordline critical dimension in a memory array and related structure
According to one exemplary embodiment, a method for fabricating a memory array includes forming a number of trenches in a substrate, where the trenches determine a number of wordline regions in the...
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7329918 |
Semiconductor memory device including storage nodes and resistors and method of manufacturing the same
A semiconductor memory device according to embodiments of the invention includes storage nodes and resistors. A method of manufacturing the semiconductor memory device according to some embodiments...
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7323708 |
Phase change memory devices having phase change area in porous dielectric layer
A phase change memory device includes a lower electrode and a porous dielectric layer having fine pores on the lower electrode. A phase change layer is provided in the fine pores of the porous...
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7321150 |
Semiconductor device precursor structures to a double-sided capacitor or a contact
A method of forming a double-sided capacitor using at least one sacrificial structure, such as a sacrificial liner or a sacrificial plug. A sacrificial liner is formed along sidewalls of at least...
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7319254 |
Semiconductor memory device having resistor and method of fabricating the same
A semiconductor device having resistors in a peripheral area and fabrication method thereof are provided. A mold layer is formed on a semiconductor substrate. The mold layer is patterned to form...
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7294880 |
Semiconductor non-volatile memory cell with a plurality of charge storage regions
For providing a cheap semiconductor memory device with improving reliability by level of a cell, in the place of escaping from defects on memory cells electrically, through such as ECC, and further...
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7295461 |
Memory device with a self-assembled polymer film and method of making the same
A memory device with multi-bit memory cells and method of making the same uses self-assembly to provide polymer memory cells on the contacts to a transistor array. Employing self-assembly produces...
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7288806 |
DRAM arrays
The invention includes memory arrays, and methods which can be utilized for forming memory arrays. A patterned etch stop can be used during memory array fabrication, with the etch stop covering...
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7285813 |
Metal-insulator-metal capacitor and method for manufacturing the same
A capacitor has a lower electrode formed on an insulation layer, a dielectric layer formed on the lower electrode, an upper electrode layer formed on the dielectric layer, and a first protection...
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7259416 |
Semiconductor device having a conductive plug
There is provided a semiconductor device that comprises a first impurity diffusion region formed on a silicon substrate (semiconductor substrate), a first interlayer insulating film (first...
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7253069 |
Method for manufacturing silicon-on-insulator wafer
A method for manufacturing a SOI wafer includes a step of heat-treating a wafer in a furnace to form an SOI wafer including a silicon support, an insulating layer containing oxide, and a...
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7250650 |
Field-effect transistor structure and associated semiconductor memory cell
A field-effect transistor (FET) structure and method of formation thereof is presented. The FET structure includes first and second source/drain regions formed in a semiconductor substrate to...
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7247901 |
Method for forming 1 TRAM cell and structure formed thereby
A single transistor random access memory cell has an MOS well, a transfer gate of the transistor and a storage capacitor having a storage node in the well that becomes an inversion layer at a...
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7244982 |
Semiconductor device using a conductive film and method of manufacturing the same
A semiconductor device has a capacitive element including a first conductive film formed on the bottom and wall surfaces of an opening formed in an insulating film on a substrate, a dielectric film...
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7230293 |
Storage nodes of a semiconductor memory
A semiconductor memory device is provided, including a substrate and storage nodes formed on the substrate from a silicon oxide layer, the layer having been substantially removed by wet etching the...
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7211856 |
Resistive memory for low-voltage applications
Memory cells having two electrodes and a layer arranged in between and including an active material which contains hexakisbenzylthiobenzene, dichlorodicyano-p-benzoquinone and optionally a polymer...
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7211513 |
Process for chemical vapor desposition of a nitrogen-doped titanium oxide coating
Nitrogen doped titanium oxide coatings on a hot glass substrate are prepared by providing a uniform vaporized reactant mixture containing a titanium compound, a nitrogen compound and an...
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7208788 |
Semiconductor device and manufacturing method thereof
A semiconductor device and a manufacturing method thereof in which the peripheral length of an aperture and the mechanical strength of cylinders in a cell can be increased without changing the...
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