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8183558 |
Compound semiconductor device with T-shaped gate electrode
A compound semiconductor device includes a compound semiconductor substrate; epitaxially grown layers formed over the compound semiconductor substrate and including a channel layer and a resistance...
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8183556 |
Extreme high mobility CMOS logic
A CMOS device includes a PMOS transistor with a first quantum well structure and an NMOS device with a second quantum well structure. The PMOS and NMOS transistors are formed on a substrate.
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8178866 |
Optoelectronic memory device and method for manufacturing and measuring the same
The present invention provides an optoelectronic memory device, the method for manufacturing and evaluating the same. The optoelectronic memory device according to the present invention includes a...
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8159287 |
Transistor device and method
A field-effect transistor device, including: a semiconductor heterostructure comprising, in a vertically stacked configuration, a semiconductor gate layer between semiconductor source and drain...
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8154012 |
Thin film transistor
A thin film transistor includes a source electrode, a drain electrode, a semiconducting layer, and a gate electrode. The drain electrode is spaced from the source electrode. The semiconducting...
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8154011 |
Thin film transistor
A thin film transistor includes a source electrode, a drain electrode, a semiconductor layer, a channel and a gate electrode. The drain electrode is spaced from the source electrode. The gate...
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8148715 |
Solid state charge qubit device
This invention concerns a quantum device, suitable for quantum computing, based on dopant atoms located in a solid semiconductor or insulator substrate. In further aspects the device is scaled up....
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8148796 |
Solar cell and manufacturing method thereof
Disclosed are a solar cell and a manufacturing method thereof. The solar cell in accordance with an embodiment of the present invention includes: a substrate having a plurality of holes formed on...
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8143658 |
Charge storage nanostructure
The present invention relates to a nanostructured device for charge storage. In particular the invention relates to a charge storage device that can be used for memory applications. According to...
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8143616 |
Making a structure
A structure includes a surface and a non-equilibrium two-dimensional semiconductor micro structure on the surface.
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8138491 |
Self-aligned nanotube field effect transistor
A self-aligned carbon-nanotube field effect transistor semiconductor device comprises a carbon-nanotube deposited on a substrate, a source and a drain formed at a first end and a second end of the...
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8138501 |
Switching element and manufacturing method thereof
Disclosed is a switching element provided with a gate dielectric film and an active layer disposed in contact with the gate dielectric film. The active layer includes carbon nanotubes, and the gate...
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8124961 |
Single electron transistor
A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the...
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8119488 |
Scalable quantum well device and method for manufacturing the same
A quantum well device and a method for manufacturing the same are disclosed. In one aspect, the device includes a quantum well region overlying a substrate, a gate region overlying a portion of the...
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8120015 |
Resonant structure comprising wire and resonant tunneling transistor
A resonant structure is provided, including a first terminal, a second terminal which faces the first terminal, a wire unit which connects the first terminal and the second terminal, a third...
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8106510 |
Nano-tube thermal interface structure
A semiconductor structure having: an electrically and thermally conductive layer disposed on one surface of the semiconductor structure; an electrically and thermally conductive heat sink; a...
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8106383 |
Self-aligned graphene transistor
A graphene field effect transistor includes a gate stack, the gate stack including a seed layer, a gate oxide formed over the seed layer, and a gate metal formed over the gate oxide; an insulating...
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8106382 |
Field effect transistor
A source electrode 105 which is connected to a portion of at least one semiconductor nanostructure 103 among a plurality of semiconductor nanostructures, a drain electrode 106 connected to another...
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8106424 |
Field effect transistor with a heterostructure
A field effect transistor with a heterostructure includes a strained monocrystalline semiconductor layer formed on a carrier material, which has a relaxed monocrystalline semiconductor layer made...
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8101984 |
Spin injector
A spin injector for use in a microelectronic device such as a field effect transistor (FET) is disclosed. The spin injector includes an array of ferromagnetic elements disposed within a...
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8097515 |
Self-aligned contacts for nanowire field effect transistors
A method for forming a nanowire field effect transistor (FET) device includes forming a nanowire over a semiconductor substrate, forming a gate structure around a portion of the nanowire, forming a...
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8093584 |
Self-aligned replacement metal gate process for QWFET devices
A self-aligned replacement metal gate QWFET device comprises a III-V quantum well layer formed on a substrate, a III-V barrier layer formed on the quantum well layer, a III-V etch stop layer formed...
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8093644 |
Multiwalled carbon nanotube memory device
A carbon nanotube based memory device comprises a set of three concentric carbon nanotubes having different diameters. The diameters of the three concentric carbon nanotubes are selected such that...
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8084308 |
Single gate inverter nanowire mesh
Nanowire-based devices are provided. In one aspect, a field-effect transistor (FET) inverter is provided. The FET inverter includes a plurality of device layers oriented vertically in a stack, each...
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8053760 |
Thin film transistor
A thin film transistor includes a source electrode, a drain electrode, a semiconducting layer, and a gate electrode. The drain electrode is spaced from the source electrode. The semiconducting...
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8044391 |
Thin film transistor and method of fabricating the same
A thin film transistor includes a multi-coaxial silicon nanowire unit including a plurality of coaxial silicon nanowires on a substrate, the multi-coaxial silicon nanowire unit including a central...
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8039334 |
Shared gate for conventional planar device and horizontal CNT
A semiconductor structure in which a planar semiconductor device and a horizontal carbon nanotube transistor have a shared gate and a method of fabricating the same are provided in the present...
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8026504 |
Semiconductor device and method of forming the same
A semiconductor device and a method of forming the same are provided. The method includes preparing a semiconductor substrate. Insulating layers may be sequentially formed on the semiconductor...
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8026508 |
Semiconductor device and method of fabricating the same
Provided are a semiconductor device and a method of fabricating the same. The semiconductor device includes: a single electron box including a first quantum dot, a charge storage gate on the first...
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8026509 |
Tunnel field effect transistor and method of manufacturing same
A TFET includes a source region (110, 210), a drain region (120, 220), a channel region (130, 230) between the source region and the drain region, and a gate region (140, 240) adjacent to the...
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8022393 |
Lithographic process using a nanowire mask, and nanoscale devices fabricated using the process
The disclosure pertains to a method for making a nanoscale filed effect transistor structure on a semiconductor substrate. The method comprises disposing a mask on a semiconductor upper layer of a...
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8017934 |
Carbon nanotube based integrated semiconductor circuit
Gate electrodes are formed on a semiconducting carbon nanotube, followed by deposition and patterning of a hole-inducing material layer and an electron inducing material layer on the carbon...
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8017933 |
Compositionally-graded quantum-well channels for semiconductor devices
A compositionally-graded quantum well channel for a semiconductor device is described. A semiconductor device includes a semiconductor hetero-structure disposed above a substrate and having a...
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8013324 |
Structurally stabilized semiconductor nanowire
In one embodiment, a semiconductor nanowire having a monotonically increasing width with distance from a middle portion toward adjoining semiconductor pads is provided. A semiconductor link portion...
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8013321 |
Composite comprising array of needle-like crystal, method for producing the same, photovoltaic conversion element, light emitting element, and capacitor
A composite of a base and an array of needle-like crystals formed on the surface of the base is provided, in which the base side and the opposite side to the base with respect to the array can be...
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8013320 |
Nitride semiconductor device and method for fabricating the same
A nitride semiconductor device includes a semiconductor stacked structure which is formed of a nitride semiconductor having a first principal surface and a second principal surface opposed to the...
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8008649 |
Incorporating gate control over a resonant tunneling structure in CMOS to reduce off-state current leakage, supply voltage and power consumption
A semiconductor device and method for fabricating a semiconductor device incorporating gate control over a resonant tunneling structure. The semiconductor device includes a source terminal, a gate...
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8008650 |
Transistor with nanotube structure exhibiting N-type semiconductor-like characteristics
An object of the present invention is to provide a new n-type transistor, different from the prior art, using a channel having a nanotube-shaped structure, and having n-type semiconductive...
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7999248 |
Ultrahigh density patterning of conducting media
A nanoscale device and a method for creating and erasing of nanoscale conducting regions at the interface between two insulating oxides SrTiO3 and LaAlO3 is provided. The method uses the tip of a...
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7989800 |
Nanowire field effect junction diode
A nanowire field effect junction diode constructed on an insulating transparent substrate that allows form(s) of radiation such as visual light, ultraviolet radiation; or infrared radiation to...
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7973305 |
Thin film transistor
A thin film transistor includes a source electrode, a drain electrode, a semiconducting layer, and a gate electrode. The drain electrode is spaced from the source electrode. The semiconducting...
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7964489 |
Semiconductor device
A semiconductor device includes: a p-channel MIS transistor including: a first insulating layer formed on a semiconductor region between a source region and a drain region, and containing at least...
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7955932 |
Single electron transistor and method of manufacturing the same
A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the...
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7955881 |
Method of fabricating quantum well structure
In the method of fabricating a quantum well structure which includes a well layer and a barrier layer, the well layer is grown at a first temperature on a sapphire substrate. The well layer...
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7952088 |
Semiconducting device having graphene channel
The present invention, in one embodiment, provides a semiconductor device including a substrate having an dielectric layer; at least one graphene layer overlying the dielectric layer; a back gate...
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7947971 |
Quantum well MOSFET channels having uni-axial strain caused by metal source/drains, and conformal regrowth source/drains
Embodiments described include straining transistor quantum well (QW) channel regions with metal source/drains, and conformal regrowth source/drains to impart a uni-axial strain in a MOS channel...
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7928426 |
Forming a non-planar transistor having a quantum well channel
In one embodiment, the present invention includes an apparatus having a substrate, a buried oxide layer formed on the substrate, a silicon on insulator (SOI) core formed on the buried oxide layer,...
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7928427 |
Semiconductor device with group III-V channel and group IV source-drain and method for manufacturing the same
The present invention is related to a semiconductor device with group III-V channel and group IV source-drain and a method for manufacturing the same. Particularly, the energy level density and...
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7923753 |
Field effect transistor having Ohmic electrode in a recess
The contact resistance between an Ohmic electrode and an electron transit layer is reduced compared with a case in which the Ohmic electrode is provided to a depth less than the heterointerface. As...
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7915608 |
Scalable quantum well device and method for manufacturing the same
A quantum well device and a method for manufacturing the same are disclosed. In one aspect, the device includes a quantum well region overlying a substrate, a gate region overlying a portion of the...
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