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7375829 |
Method for inspecting an insulator with a library of optic images
A method for inspecting an insulator with a library of optic images is disclosed. The method for inspecting an insulating layer according to the present invention, comprises the steps of collecting...
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7362435 |
Method of determining initial thickness value for sample surface layer, and use of splines for fitting ellipsometric data
A method of determining a starting value for thickness of the most influential layer in a mathematical model of a sample for use in a data fitting routine, supplemented by the use of ordinary or...
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7355729 |
Apparatus and method for measuring a thickness of a substrate
An apparatus and method of measuring the thickness of a substrate. A first light is reflected from a standard sample having a known thickness. The light is concentrated through the light-focusing...
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7353141 |
Method and system for monitoring component consumption
A method for monitoring consumption of a component, including the steps of emitting a radiation beam onto a first area of the component and detecting a portion of the radiation beam that is...
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7321129 |
Deposition system and film thickness monitoring device thereof
A deposition system and film thickness monitoring device thereof. The film thickness monitoring device for monitoring thickness of a thin film coated on an optical substrate includes a laser light...
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7301149 |
Apparatus and method for determining a thickness of a deposited material
Method and apparatus for determining a thickness of a deposited material. Energy is passed through the deposited material, wherein some of the energy is transmitted. The transmitted energy is...
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7289233 |
Optical film measuring device
Light emitted from a light source ( 22 ) is used through a light projection optical system ( 23 ) to perform coaxial down-emission lighting on a measurement target ( 36 ). Light reflected by the...
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7277190 |
Measurement system with an optical measurement arrangement
The invention concerns an optical measurement arrangement, in particular for the examination of layer systems, and can include an illumination device having at least one illumination source for...
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7276719 |
Device for a goniometric examination of the optical properties of surfaces
A device for examining the optical properties of surfaces having at least one first radiation device emitting radiation at least at one first predetermined spatial angle to a surface to be...
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7253901 |
Laser-based cleaning device for film analysis tool
A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough...
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7253427 |
Automatic object plane detection system and method
An object plane detection system comprises a light source adapted to illuminate a media object to generate an image area on a photosensitive sensor. The system also comprises a detection module...
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7173270 |
Detector system for detecting a height of a particle, and lithographic apparatus and device manufacturing method including the same.
A lithographic apparatus transfers a pattern from a patterning device onto a substrate and includes a projection system to project a patterned radiation beam onto the substrate; a controllable...
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7173233 |
Counter
A lite-counting apparatus counts lites in a longitudinal array. During a traversal by the apparatus of a peripheral portion of the array, a beam of radiation is passed from at least one source to...
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7170075 |
Inspection tool with a 3D point sensor to develop a focus map
An inspection system, and process for use thereof, for inspecting semiconductors or like substrates. The inspection system includes an inspection device and an auxiliary sensor apart from the...
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7164146 |
System for detecting structural defects and features utilizing blackbody self-illumination
A system is disclosed which utilizes the substantially steady-state temperature of a coated object, in conjunction with an optical detection system, to selectively view defects and features of the...
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7075097 |
Optical path array and angular filter for translation and orientation sensing
A position sensor using a novel optical path array (OPA) element, an angle-selective spatial filter, and an imaging array is capable of measuring the translation and orientation relative to a...
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7067823 |
Micro-sample pick-up apparatus and micro-sample pick-up method
A micro-sample pick-up apparatus has a probe for picking up a micro sample, a probe holder for holding the probe, an XYZ driver mechanism for moving the probe holder in the three-dimensional...
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RE39145 |
Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
An interferometric method and apparatus for in-situ monitoring of a thin film thickness and of etch and deposition rates using a pulsed flash lamp providing a high instantaneous power pulse and...
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7054480 |
System and method for process variation monitor
A method to extend the process monitoring capabilities of a semiconductor wafer optical inspection system so as to be able to detect low-resolution effects of process variations over the surface of...
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7049572 |
Optical sensor and method of operation thereof
An optical detector is disclosed, which is adapted to measure the opacity of media. The detector comprises a light means and a light sensor, arranged so as to have a media path there between. The...
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7030402 |
Optical distance measuring device and printing apparatus using the same
An optical distance measuring device has an objective lens that condenses light from a light emission element to irradiate a measuring object and to form on the measuring object a light spot having...
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6958484 |
Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy
A multi-point detection method and system for analyzing a composition within an examination area. The system simultaneously acquires multi-dimensional distributions (e.g., two- or three-dimensional...
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6940592 |
Calibration as well as measurement on the same workpiece during fabrication
Two more measurements are made on the same workpiece, during fabrication. Each measurement may be made employing a different process. The measurements are used together to determine a property of...
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6912056 |
Apparatus and method for measuring each thickness of a multilayer stacked on a substrate
In an apparatus and a method of measuring a thickness of a multilayer on a substrate, a spectrum of reflected light reflected from the substrate is measured. A plurality of recipe data, each...
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6911662 |
Chemical-mechanical polishing apparatus and method for controlling the same
In a chemical-mechanical polishing apparatus and a method for controlling the same, a table of an initial thickness of a layer to be polished concerning a detected light quantity of an endpoint...
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6903358 |
Paper thickness detecting device
Embodiments of the present invention relate to an apparatus (i.e. an automatic teller machine) comprising an optical sensor. The optical sensor is configured to detect thickness of paper....
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6885466 |
Method for measuring thickness of oxide film
In a process of manufacturing a semiconductor device, after a gate oxide film is formed, the thickness of the gate oxide film is measured by measuring an exposure period defined from a time at...
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6849859 |
Fabrication of precision optics using an imbedded reference surface
The figure of a substrate is very precisely measured and a figured-correcting layer is provided on the substrate. The thickness of the figure-correcting layer is locally measured and compared to...
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6847443 |
System and method for multi-wavelength, narrow-bandwidth detection of surface defects
A system and method for detecting defects in surface structures, such as those formed on semiconductor wafers. A light source, preferably a strobe light, provides illumination that is separated by...
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6825938 |
Film thickness measuring method and step measuring method
A film thickness measuring method comprises projecting white light onto a wafer with a film to be measured and sensing a first reflected light intensity from the wafer, determining the first...
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6806971 |
Method and apparatus for process control in semiconductor manufacture
An optical system is presented for use in a measurement system for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a...
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6806969 |
Optical measurement for measuring a small space through a transparent surface
The invention provides a system and method for reliably and accurately measuring the gap between two materials when the depth of gap is less than the smallest distance that an optical thickness...
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6801326 |
Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects
A method is presented for optical control of the quality of a process of chemical mechanical planarization (CMP) performed by a polishing tool applied to an article having a patterned area. The...
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6794668 |
Method and apparatus for print media detection
Print media thickness and transmissivity is determined using transmissive light. The light is beamed onto a reflective and absorptive surface. A profile is generated and stored for each...
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6784445 |
Apparatus for monitoring intentional or unavoidable layer depositions and method
The apparatus allows monitoring layer depositions in a process chamber. The apparatus has a light source, a sensor element, and at least one light detector. The sensor element is suitably...
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6781111 |
Paper processing apparatus
Includes a sensor section ( 240 ) which irradiates light onto paper that is being conveyed and which detects a quantity of light transmitted through the paper, and a type-of-money judging section (...
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6762838 |
Method and apparatus for production line screening
The use of an intensity spectrum as a fingerprint to determine the layer structure of a semiconductor wafer product or partial product, thereby to determine the routing history of the product...
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6762427 |
Object surface characterization using optical triangulaton and a single camera
Electromagnetic radiation is directed from an optical grating in a regular array of beams in rows and columns toward a target object surface; and the reflected beams are focused through a lens to...
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6757069 |
Laser non-contact thickness measurement system
A system and a method for measuring a thickness of a workpiece. The workpiece has first and second sides, wherein the first side defines a first angular orientation. A first laser triangulation...
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6734417 |
Displacement measurement system and sheet feed system incorporating the same
A displacement measurement system and a sheet feed system incorporating the same are described. The displacement measurement system includes a support arm, a roller, and an optical encoder. The...
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6726319 |
Method for inspecting surface of semiconductor wafer
Particles adherent to a semiconductor wafer surface, and defects such as SFs, mounds, and dislocations present near the semiconductor wafer surface can be accurately divided according to their...
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6693275 |
Method and apparatus for inspecting blow molded containers
A method and apparatus ( 16 ) for inspecting the thickness of conveyed blow molded containers ( 18 ) utilizes a laser source ( 22 ) for directing a laser beam ( 24 ) upwardly from the exterior of...
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6671059 |
Method and system for determining a thickness of a layer
The present invention relates to a method of determining a thickness of at least one layer on at least one semiconductor wafer ( 12 ), comprising the steps of: projecting a first laser pulse ( 14 )...
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6657217 |
Probe for sensing movement in a compressor system
A probe is used to detect axial movement of a rotating part such as a shaft. The probe includes a probe tube portion that protrudes into an annular groove on the rotating part. When the rotating...
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6653649 |
Optical measurement and inspection method and apparatus having enhanced optical path difference detection
An optical measurement and inspection method and apparatus having enhanced path length detection uses a Fabry-Perot cavity to increase the phase detection sensitivity for light reflected from...
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6608689 |
Combination thin-film stress and thickness measurement device
A composite metrology tool, measures basic optical parameters of thin films (e.g., thickness, index of refraction, and birefringence) and stress (e.g., wafer displacements, such as bow and warp)....
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6596993 |
Method of automatically correcting magnification and non-linearity of scanning electron microscope
A method of automatically correcting magnification and/or non linearity of scanning electron microscope has the steps of loading a reference material in the microscope, inputting a pitch of the...
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6590221 |
On-line measuring system for measuring substrate thickness and the method thereof
An on-line measuring system for measuring a thickness of a transferred substrate includes a first image detector, a second image detector, an elevator, and a display device. After the first image...
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6585344 |
Systems and methods for automatically detecting a number of remaining sheets of print media
Printing systems and methods of operating printing systems are described. In but one embodiment, a printer comprises one or more processors, a print media tray for supporting a supply of print...
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6555836 |
Method and apparatus for inspecting bumps and determining height from a regular reflection region
A method of inspecting bumps provided on a surface of an object to be inspected includes the steps of: (a) irradiating a first irradiation beam on said object in an oblique direction and (b)...
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