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7595471 |
Auto focusing of a workpiece using an array detector each with a detector identification
Provided is a method and system for auto focusing a workpiece in the Z-axis using a position sensitive focus detector. A focus detection beam is measured using a focus detector, the focus detector...
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7566893 |
Best focus detection method, exposure method, and exposure apparatus
An aerial image of a measurement mark arranged on a measurement mask is conformed to a center in an X-axis direction of a slit arranged on a Z tilt stage. While illuminating the measurement mark...
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7531821 |
Imprint apparatus and imprint method including dual movable image pick-up device
An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first...
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7495779 |
Level detection apparatus
A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target...
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7492452 |
Defect inspection method and system
An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of...
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7482611 |
Lithographic apparatus and device manufacturing method
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The...
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7466414 |
Position detection apparatus and method
A position detection method of detecting a position of a detection mark. The method includes a matching step of calculating a value of a correlation using a template for an image including the...
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7459710 |
Lithographic apparatus, method for calibrating and device manufacturing method
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot...
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7459709 |
Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method
An optical image is formed in a radiation-sensitive layer ( 5 ), by a number of sub-illuminations, in each of which an array of light valves ( 21 - 25 ) and a corresponding array ( 40 ) of...
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7446873 |
Reflective alignment grating
A wafer may be aligned with an imaging plate including an alignment grating with a pitch P. A pupil filter in the pupil plane of the optical system may be used so that the periodicity of the...
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7439531 |
Alignment systems and methods for lithographic systems
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining...
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7435984 |
Imaging optical system and exposure apparatus
An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical...
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7420194 |
Lithographic apparatus and substrate edge seal
A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the...
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7398733 |
Inline measurement and closed loop control method in printing machines
Spectral, densitometric, or color measured values are detected on sheet printing materials during the printing process in a sheet-fed printing press. The measured values are determined on sheets as...
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7394523 |
Exposure apparatus and method of controlling exposure apparatus
An exposure apparatus generates an interlock signal to stop an exposure process when defocus is detected in real time. Leveling data for at least one wafer, and a predetermined threshold value are...
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7382446 |
Aberration measuring method
Disclosed is a method of measuring aberration of a projection optical system, that includes an illuminating step for illuminating a reticle by use of light from a light source and through an...
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7369214 |
Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors
A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled...
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7355157 |
Laser beam processing machine employing two beam spots having arcuate portions for forming a substantially rectangular combined spot
Disclosed herein is a beam processing machine comprising laser beam application device for applying a laser beam to a workpiece, which device includes a laser beam oscillator and a condenser for...
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7332733 |
System and method to correct for field curvature of multi lens array
Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface, shaped such that focal points of the focusing elements lie closer to a...
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7326945 |
Dose transfer standard detector for a lithography tool
A dose transfer standard detector measures radiation intensity and dose in a lithography tool. The lithography tool may be an Extreme Ultraviolet lithography (EUVL) tool. The dose transfer standard...
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7317197 |
Method of detecting tightly adhering state, tight adhesion control method and method of and apparatus for near field exposure
A tightly adhering state between an elastically deformable first substrate deformed and made to tightly adhere to an elastically undeformable second substrate is detected by way of displacement of...
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7307707 |
Method and system for measuring the imaging quality of an optical imaging system
An object pattern is imaged by an imaging system onto the image plane of the imaging system at a location where a reference pattern suited to the object pattern is situated in order to measure the...
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7307262 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a...
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7301163 |
Lateral shift measurement using an optical technique
Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive...
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7301137 |
Cantilever light detectors having a mechanical cantilever to mechanically respond to illuminated light
An apparatus includes a chamber, an electro-mechanical driver, a window, and a mechanical cantilever. The chamber has an interior in which the mechanical cantilever is located. The mechanical...
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7298482 |
Exposure apparatus and aligning method
An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing...
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7297972 |
Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as a metrology target
Various methods and systems measure, determine, or align a position of a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be...
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7297969 |
Web marking and inspection system
A method and apparatus for use with a web of material having a web length dimension and a web surface, the method for placing mark sequences on the web surface every X distance along the web length...
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7297911 |
Lithographic apparatus, illumination system, illumination controller and control method
A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system includes a pulsed source of radiation and a controller to control an...
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7288779 |
Method for position determination, method for overlay optimization, and lithographic projection apparatus
A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a...
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7276717 |
Measuring apparatus, exposure apparatus and device manufacturing method
A measuring apparatus for measuring optical performance of a target optical system to be measured includes an optical unit for splitting light from a light source into measuring light and reference...
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7268360 |
Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
Techniques for determining wafer stage grid and yaw in a projection imaging tool are described. The techniques include exposing an overlay reticle onto a substrate having a recording media, thereby...
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7253891 |
Method and apparatus for simultaneous 2-D and topographical inspection
Apparatus for sensing information regarding a surface including a first plurality of optical elements arranged to acquire two dimensional information about a surface, a second plurality of optical...
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7247843 |
Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns
An apparatus and method measures the gap between one substantially planar object, such as a mask, and a second planar object, such as a substrate. A gapping mark is used for measuring a gap between...
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7230706 |
Position detection method and apparatus, and exposure method and apparatus
A position detection apparatus for detecting a position of an object to be observed, including a position detection system, and an evaluation unit for measuring by the position detection system...
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7230675 |
Lithographic apparatus, device manufacturing method and device manufactured therewith
The invention relates to a lithographic apparatus, a device manufacturing method and a device thus manufactured. The lithographic apparatus is of the scanning type, in which a target portion of a...
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7211815 |
Method of achieving CD linearity control for full-chip CPL manufacturing
A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the...
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7205531 |
Sample information measuring method and scanning confocal microscope
When irradiating a sample with light from a light source through an object lens, discretely changing a relative position between a beam condensing position of the object lens and the sample in an...
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7193231 |
Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby
An optical element is placed in the alignment beam during alignment. The optical element serves to focus the alignment beam onto the substrate alignment mark when it is at a different focal length...
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7190456 |
Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same
An apparatus for determining positions of a plurality of regions formed on a substrate based on positions of a plurality of sample regions sampled from the plurality of regions. The apparatus...
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7184181 |
Scanning module capable of finely tuning the optical length
A scanning module capable of finely tuning the optical length comprises a lamp tube, a base, a photosensitive substrate, and an adjustment unit. The lamp tube provides a required light source for a...
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7183566 |
Lithographic apparatus for manufacturing a device
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot...
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7173716 |
Alignment apparatus, exposure apparatus using the same, and method of manufacturing devices
An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a...
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7148973 |
Position detecting method and apparatus, exposure apparatus and device manufacturing method
A method of determining relative position between a reflective reticle and a substrate includes a detection step of detecting relative position between a transmissive reference mark on a reticle...
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7141813 |
Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus
An exposure apparatus for exposing a substrate moving in a scan direction to light directed via an original. The apparatus includes a projection optical system configured to image a pattern of the...
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7136165 |
Substrate alignment apparatus and method, and exposure apparatus
A substrate alignment apparatus which aligns and fixes a substrate on a substrate stage includes a chucking pad fixed on the substrate stage to chuck and fix the substrate, a moving unit which...
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7130018 |
Catoptric projection optical system, exposure apparatus and device fabrication method
A catoptric projection optical system for projecting a reduced size of a pattern on an object surface onto an image surface includes eight mirrors and forms an intermediate image between the sixth...
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7127810 |
Method of manufacturing electronic device including aligning first substrate, second substrate and mask, and transferring object from first substrate to second substrate, including irradiating object on first substrate with light through mask
A method of manufacturing an electronic device includes providing a mask substrate, a first substrate on which an object to be transferred is formed, and a second substrate to which the object is...
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7126666 |
Lithographic apparatus, device manufacturing method and device manufactured thereby
A lithographic projection apparatus includes a passive magnetic bearing configured to provide support between a first and second part of the lithographic apparatus and allow both parts to be...
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7122817 |
Lateral shift measurement using an optical technique
Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive...
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