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6838686 |
Alignment method and exposure apparatus using the method
A method for aligning existing layers formed prior to a new layer and the new layer in forming the new layer on a wafer 4 , wherein a microscope 6 as a first measurement condition and a...
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6832517 |
Optical level detector
In an apparatus for monitoring any deviation of a planar surface from its desired position, a light source and a light detector are positioned so that when the surface is at the desired position a...
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6831285 |
Lithographic apparatus, magnetic support for use therein, device manufacturing method, and device manufactured thereby
A lithographic apparatus includes a support that provides a magnetic force in a first direction between a first part and a second part of the apparatus. The support comprises first, second and...
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6813574 |
Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor
Patterned layers in an integrated circuit (IC) or other device are aligned in conjunction with the detection of the topology of the layers. The topology can be used to determine the location of a...
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6803592 |
Position detection method and position detector, exposure method and exposure apparatus, and device and device manufacturing method
A parameter calculation unit statistically calculates the estimations and their certainty of a predetermined number of parameters, which uniquely specify any position on an object, for each of a...
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6801650 |
Mechanism and method for controlling focal point position of UV light and apparatus and method for inspection
A method and apparatus for controlling the focal position of the UV light for auto-focussing the converged UV light, and a method and apparatus and for inspecting a device, such as a semiconductor...
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6791098 |
Multi-input, multi-output motion control for lithography system
A multi-input, multi-output vibration control system for a lithography system. The system provides an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics...
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6787789 |
Method of measuring aberration of a projection system of a lithographic apparatus, device manufacturing method, and device manufactured thereby
A method of determining aberration of a projection system according to one embodiment of the invention includes using a test pattern to pattern a projection beam of radiation, using the projection...
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6753947 |
Lithography system and method for device manufacture
A lithography system and method for cost-effective device manufacture that can employ a continuous lithography mode of operation is disclosed, wherein exposure fields are formed with single pulses...
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6753524 |
Inspection system and inspection process for wafer with circuit using charged-particle beam
In a method for inspecting positions and types of defects on wafers with circuit patterns in a semiconductor manufacturing process, inspection is made regardless of the types and materials of...
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6730925 |
Method and apparatus for projection exposure and device manufacturing method
An exposure method is provided so that the dividend regions defined on a wafer are successively exposed using pulses of laser light emitted from an excimer laser light source in such a way that...
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6731376 |
System and method for reducing colinearity effects in manufacturing microdevices
Systems and methods for reducing colinearity effects in the formation of microdevices are disclosed. A mask with at least one column of microdevice cells is illuminated with pulses of radiation...
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6730920 |
Abbe arm calibration system for use in lithographic apparatus
In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The...
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6725123 |
Method and appliance for detecting, identifying and relocating defects in a material strip
The invention relates to a device and a method for detecting, identifying and relocating defects in a material strip of great length. In order to enable defects to be relocated reliably and quickly...
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6713747 |
Light exposure apparatus
A scanning exposure apparatus and method uses an optical member to change an intensity distribution of exposure light in an illumination region.
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6714302 |
Aligning method, aligner, and device manufacturing method
A wafer having a plurality of areas is subjected to multiple exposures or a stitching exposure with a plurality of mask patterns being interchanged. A plurality of wafers are sequentially exposed...
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6714281 |
Exposure apparatus and device manufacturing method
An exposure apparatus or a device manufacturing method, wherein a focus measuring device measures a best focus position upon projecting and exposing, through a projection optical system, a pattern...
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6677601 |
Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
In a method of detecting a position of a position detection grating mark formed with a small step structure on a surface of a flat object, an illumination light beam is irradiated on the grating...
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6659006 |
Tension control device for a printing press
A tension control device for a printing press having an adjustment roller, with a web of the press passing from a supply roll of the web to the adjustment roller. Means are provided for measuring...
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6657215 |
Apparatus for determining exposure conditions, method for determining exposure conditions and process apparatus
In an apparatus for determining the exposure conditions, a developed pattern is converted into an optical information formed by exposing a plurality of different positions of a substrate at...
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6653650 |
Streamlined method and apparatus for aligning a sensor to an aircraft
An apparatus for sensing mis-alignment between an aircraft inertial reference frame and a reference frame of an attached sensor is disclosed. The apparatus includes a first laser mounted on the...
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6653944 |
Semiconductor wafer transport pod equipped with cover latch indicator
A pod for transporting a cassette of semiconductor wafers that is equipped with a cover latch indicator is described. The pod is constructed by a base, a cover, a latch means and an indicator...
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6649923 |
Positional deviation detecting method and device manufacturing method using the same
A method of detecting a relative positional deviation between first and second objects by use of a first alignment mark provided on the first object and a second alignment mark provided on the...
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6646279 |
Apparatus for exposing a face of a printed circuit panel
An apparatus for exposing a light sensitive surface (e.g., a printed circuit board) to light. An optical processor subsystem, which includes a reflector and an integrator-collimator assembly,...
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6640716 |
Imaging print media
A method and apparatus for imaging material. A section of a medium is photographed with a first camera having a first field of view. The medium is advanced along a feed direction and the section is...
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6633363 |
Scanning exposure apparatus and method
A scanning exposure apparatus and method for synchronously moving a mask and a substrate with respect to an exposing radiation flux to project an image of a mask pattern on the mask onto the...
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6633050 |
Virtual gauging system for use in lithographic processing
A virtual gauging system for use in a lithographic process is described that includes means for gauging a region at a surface of a wafer when the region is located away from an axis of illumination...
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6633390 |
Focus measurement in projection exposure apparatus
A method of detecting focus information about an image projecting optical system includes performing mark projection through the optical system, and, based on illumination lights having different...
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6627909 |
Apparatus for optimizing adjustment of disc head slider curvature
An apparatus for adjusting curvature of a disc head slider having a bearing surface is provided. The apparatus includes a light source and an apparatus for controlling the light source. The light...
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6622625 |
Medium detecting method and device, and printer
A reference medium is scanned both with a medium sensor ( 44 ) capable of detecting a low-transmittance printing medium with high accuracy and with a medium sensor ( 45 ) capable of detecting a...
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6624898 |
Wafer supporting plate
A wafer supporting plate suitable for supporting a wafer during a semiconductor-forming process. In particular, the present invention relates to a wafer supporting plate capable of sensing the...
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6624433 |
Method and apparatus for positioning substrate and the like
A positioning method and apparatus for positioning a substrate on a substrate stage which is movable in a predetermined direction (Y direction). In the positioning method, a relationship between a...
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6621061 |
Exposure method and device manufacturing method using the same
Disclosed is an exposure method, an exposure apparatus and a device manufacturing method, in which transmission factors of almost all optical systems, including a projection optical system, can be...
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6606146 |
Stage device, exposure apparatus incorporating the stage device, and method of using the same
A stage device, usable in, e.g., an exposure apparatus, can include an inexpensive passive type vibration control pad system, while avoiding problems such as contact between stationary and movable...
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6600166 |
Scanning exposure method
Disclosed is a scanning exposure method, in which, when a pattern formed on a mask is transferred onto a wafer via an optical projection, the projecting region of the mask is limited by a slit, and...
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6590658 |
Optical alignment system
An optical alignment system is provided for aligning an optical module of the type which is suitable for use in an optical device. The system includes a reference base having a registration feature...
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6582978 |
Position detection mark and position detection method
An exposure substrate includes a position detection mark having a recessed or projecting portion formed on the substrate with a difference h in depth. The difference h in depth of the recessed or...
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6566157 |
Alignment marks and method of forming the same
Alignment marks and a method of forming the alignment marks are provided. The method includes the steps of forming a first alignment mark in an alignment mark forming area on the substrate, forming...
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6563128 |
Base stabilization system
A system that provides a base stabilization system for controlling motion of a controlled structure. The system includes a ground structure such as the floor of a fabrication facility and the...
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6563127 |
Optical proximity correction with rectangular contact
An optical proximity correction method for producing a rectangular contact. The method includes representing the rectangular contact pattern required by an integrated circuit by a pair of connected...
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6559464 |
Optical system active alignment process including alignment structure attach, position search, and deformation
Mounting and alignment structures for optical components allow optical components to be connected to an optical bench and then subsequently aligned, i.e., either passively or actively, in a...
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6545284 |
Face position detection method and apparatus, and exposure method and exposure apparatus, a production method for an exposure apparatus and a production method for a semiconductor device
The invention provides a face position detection method and a face position detection apparatus which can perform detection of the face position of a substrate with high precision, even when a...
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6541750 |
Modification of a projection imaging system with a non-circular aperture and a method thereof
A imaging tool for use with a mask with features oriented along at least an x-axis or a y-axis where the x-axis extends in directions substantially perpendicular to the directions of the y-axis....
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6538260 |
Position measuring method, and semiconductor device manufacturing method and apparatus using the same
A position measuring method for measuring a position of a mark formed on an object, includes detecting a mark waveform obtainable from the mark, acquiring a difference between the detected mark...
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6539331 |
Microscopic feature dimension measurement system
A measurement tool connects to an automatic inspection machine for measuring microscopic characteristics of features on a photographic mask. Widths of densely packed lines are measured for features...
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6538740 |
Adjusting method for position detecting apparatus
An adjusting method capable of accurately forming a mark for measuring optical characteristics of an optical system, such as an alignment sensor of an exposure system to be used in manufacturing...
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6539326 |
Position detecting system for projection exposure apparatus
A position detecting method for detecting a position of a surface of an object. The method includes a first step for detecting registration of the object surface with a predetermined plane with...
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6529262 |
System and method for performing lithography on a substrate
Disclosed is a method, system, and lense system for performing lithography on a substrate. The system includes a unique lense system for nonplanar substrates. The lense system includes a first...
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6522385 |
Air shower head of photolithography equipment for directing air towards a wafer stage
An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the...
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6517983 |
Aberration estimating mask pattern
A projection aligner of the present invention, in which ultraviolet light emitted from a lamp housing is split by a fly-eye lens into a large number of point light sources which are independent of...
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