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7122817 |
Lateral shift measurement using an optical technique
Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive...
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7113257 |
Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus
An assembly according to an embodiment of the invention includes a sensor for determining at least one of tilt and height of a surface of a substrate in a lithographic apparatus. The substrate is...
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7112813 |
Device inspection method and apparatus using an asymmetric marker
A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be...
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7113256 |
Lithographic apparatus and device manufacturing method with feed-forward focus control
A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a first support structure configured to support a patterning device, a second support that...
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7110084 |
Illumination optical system and exposure apparatus
Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art,...
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7109508 |
Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
An exposure apparatus and method in which a mark on an object is illuminated, and plural pairs of two diffractive beams of same order are generated and directed to different reference gratings to...
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7102730 |
Exposure device
A light beam emitted from a light source passes through a spatial light modulation device, at which a plurality of unit elements for respectively modulating incident light beam are...
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7095480 |
Cooling apparatus
A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature...
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7092068 |
Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device
A reticle includes a first mask portion including a first opaque portion, first and second exposure monitor patterns provided within first and second window portions in the first opaque portion,...
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7081944 |
Lithographic projection apparatus and device manufacturing method utilizing two arrays of focusing elements
A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection...
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7073924 |
Projection exposure apparatus with line width calculator controlled diaphragm unit
A projection exposure apparatus includes a diaphragm controlling unit controlling one or more of an diaphragm, an iris diaphragm, and a relay lens system. In addition, the projection exposure...
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7075651 |
Image forming characteristics measuring method, image forming characteristics adjusting method, exposure method and apparatus, program and storage medium, and device manufacturing method
When actual measurement data of a wavefront aberration of a projection optical system is input, a main controller calculates a targeted image forming characteristic of the projection optical system...
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7072024 |
Lithographic projection method and apparatus
A lithographic projection apparatus for successively projecting a pattern on wafers by preliminarily determining locations of surface points of each wafer before it is illuminated in a projection...
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7069104 |
Management system, management apparatus, management method, and device manufacturing method
A management system including an acquisition device for acquiring actual processing results obtained by operating an industrial device with a set parameter value and another parameter value, and an...
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7057707 |
Method and device for adjusting an alignment microscope by means of a reflective alignment mask
The present invention provides for a method for adjusting an alignment microscope. In the method of the present invention an alignment mask is used in which the one side comprises at least one...
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7053390 |
Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
In an exposure apparatus and method, an object is exposed through a projection optical system with an exposure beam irradiated on a mask. An illumination system illuminates a mark on the object and...
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7049617 |
Thickness measurement in an exposure device for exposure of a film with a hologram mask, exposure method and semiconductor device manufacturing method
In an exposure device 100 having a vertically movable stage device 120, and which performs exposure by projecting a pattern recorded on a hologram mask 130 onto a substrate to be exposed 110...
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7050149 |
Exposure apparatus and exposure method
An exposure apparatus able to maintain reflectances of mirrors and transmittances of lenses and to maintain initial performance over a long period by using exposure light of a wavelength of the...
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7049577 |
Semiconductor handler interface auto alignment
A test cell for use in a semiconductor manufacturing operation allowing alignment of semiconductor devices to be tested to a test station. The test cell is well suited for testing semiconductor...
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7049618 |
Virtual gauging method for use in lithographic processing
A virtual gauging method for use in a lithographic process includes gauging a region at a surface of a wafer when the region is located away from an axis of illumination producing wafer surface...
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7046413 |
System and method for dose control in a lithographic system
A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to...
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7041996 |
Method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby
While the alignment beam is focused on a mark on the substrate table, the substrate table is moved substantially perpendicularly to the alignment beam. If the image of the mark moves relative to a...
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7023523 |
Exposure system and exposure method
Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the...
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7022969 |
LED measuring device
A device for measuring the output of an LED with a detector under different distance conditions without requiring the movement of either the LED or the detector. An exemplary embodiment of the...
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RE39024 |
Exposure apparatus having catadioptric projection optical system
To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plant. A light beam from an...
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7015456 |
Exposure apparatus that acquires information regarding a polarization state of light from a light source
A polarization state detecting system includes a first dividing device for dividing incident light into two light beams having the same polarization state as the incident light, a detector for...
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7012270 |
Photolithography system having multiple adjustable light sources
The invention relates to a device for photolithography of integrated circuits, at least comprising base plate, precision working table, optical head array; the optical head array adopts a...
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7002665 |
Lithography simulation method, mask pattern correction method, and substrate topography correction method
An aspect of the present invention provides simulation that includes dividing a surface of a substrate onto which light that is focused at an aperture angle by a projection lens is shone into a...
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6998629 |
Reticle position detection system
A reticle position detection system which detects an abnormal position of a reticle in order to prevent damage to the reticle by a reticle fork or pre-alignment unit used to orient the reticle for...
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6989920 |
System and method for dose control in a lithographic system
A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to...
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6987556 |
Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby
Alignment to buried marks is carried out by using electromagnetic radiation to induce waves in the layers covering the buried layer. The acoustic or thermal waves cause reflectivity changes and...
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6984836 |
System and method for monitoring the topography of a wafer surface during lithographic processing
A system for monitoring wafer surface topography during a lithographic process is described that includes projection optics that illuminate a portion of the wafer surface. The system further...
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6984838 |
Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus
An exposure apparatus has a surface position detection apparatus for measuring the surface position of a measurement area on the surface of a wafer. The surface position detection apparatus scans a...
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6979833 |
System for monitoring the topography of a wafer surface during lithographic processing
A system for monitoring wafer surface topography during a lithographic process is described that includes means for capturing wafer position and surface data at a first time when a wafer is at a...
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6974963 |
Substrate inspecting device, coating/developing device and substrate inspecting method
When a base film of a substrate is formed, for instance, on a scribe line of a wafer, a quadrangular first inspection pattern is formed in advance, and when a resist pattern is formed, a second...
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6970004 |
Apparatus for inspecting defects of devices and method of inspecting defects
Disconnection defects, short-circuit defects and the like in wiring patterns of submicron sizes within TEGs (a square of 1 to 2.5 mm for each) numerously arranged in a large chip (a square of 20 to...
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6965114 |
Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer
Methods and apparatus for alignment of masks and wafers in charged-particle-beam (CPB) pattern-transfer use optical position sensors to determine the positions of a mask or a mask stage with...
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6956640 |
Light energy detecting apparatus for exposure condition control in semiconductor manufacturing apparatus
A light energy inspecting apparatus provides an optimum exposure condition in photolithographic apparatus by sensing the energy levels of light passing through the aperture of a diaphragm. The...
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6954275 |
Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here...
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6906785 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
A method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes measuring a first set of leveling data...
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6903346 |
Stage assembly having a follower assembly
A stage assembly ( 10 ) for moving and positioning a device ( 26 ) includes a device stage ( 14 ), a stage mover assembly ( 16 ), and a follower assembly ( 18 ). The stage mover assembly ( 16 )...
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6900887 |
Method and system for measuring stray light
A method and system for measuring stray light for use in an exposure apparatus uses an image sensor to be disposed at a wafer level in the exposure apparatus. The stray light is measured by...
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6897464 |
Active optical component alignment system and method
An alignment system and method is disclosed, the alignment system and method provide for alignment of at least one component to an optical signal using a neural controller circuit. The neural...
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6894261 |
Position measuring system for use in lithographic apparatus
A position measuring apparatus includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose...
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6894763 |
Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same
A mask stage RS 1 and a substrate stage WS 1 are synchronously moved, and a mask stage RS 2 and a substrate stage RS 2 are synchronously moved, in a state in which a mask on the mask stage RS 1...
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6884554 |
Semiconductor wafer tilt compensation by wafer rotation and wafer tilt averaging
Compensating for semiconductor wafer tilt by rotating the semiconductor wafer and averaging the resulting semiconductor wafer tilts detected is disclosed. The semiconductor wafer has an...
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6875992 |
Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method
A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose...
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6876946 |
Alignment method and apparatus therefor
A method of transferring a pattern of a mask onto shot areas on a substrate determines two sets of parameters in a single model equation. The parameters in one of the two sets relate to arrangement...
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6872961 |
Vibration control utilizing signal detrending
A motion control system for reducing vibration in moving components. The system includes a position control drive and a vibration control drive. At least one position sensor is used to provide...
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6842224 |
Exposure method and apparatus
An exposure method illuminates a mask that forms a desired pattern and an auxiliary pattern smaller than the desired pattern, and projects light from the mask onto an object to be exposed via a...
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