Sign up


Match Document Document Title
8242460 Ultraviolet treatment apparatus  
A process module for treating a dielectric film and, in particular, a process module for exposing, for example, a low dielectric constant (low-k) dielectric film to ultraviolet (UV) radiation is...
8237132 Method and apparatus for reducing down time of a lithography system  
An apparatus includes a radiation source that emits a radiation beam that causes substantially all of a quantity of material to evaporate; and structure having first and second surface portions, a...
8237133 Energy sources for curing in an imprint lithography system  
Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an...
8232538 Method and apparatus of halogen removal using optimal ozone and UV exposure  
A method and apparatus for removing halogen residue from a processed wafer is provided. A wafer is transferred into a processing tool where it is processed in a manner that leaves halogen residue...
8232537 Radiation source, lithographic apparatus and device manufacturing method  
A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a...
8227778 Semiconductor exposure device using extreme ultra violet radiation  
The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided...
8227779 Gas discharge source for generating EUV-radiation  
The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (110,120), of which a first electrode body...
8227770 EUV illumination system  
An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV...
8227769 Curing of photo-curable printing plates with flat tops or round tops  
An apparatus for curing a printing plate made of or having photo-curable material, a method of curing such a printing plate, and a printing plate cured by the method. One embodiment of the method...
8227777 Method and apparatus for operating an electrical discharge device  
The present invention relates to a method of operating an electrical discharge device (12) comprising at least one first electrode (14) and at least one second electrode (16) at a distance...
8217374 Projection optical system and projection-type image display apparatus  
There is a need for providing a projection optical system that is appropriate for maintaining high resolution with low distortion, miniaturizing a reflector, decreasing the number of reflectors,...
8217375 Integrated pod optical bench design  
In an integrated gimbal and High-Powered Multiband Laser (HPMBL) for use in an infrared countermeasure apparatus in a pod mounted on an aircraft, the improvement comprises an optical bench that...
8212228 Extreme ultra violet light source apparatus  
An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical...
8203127 Terahertz radiation device using polar semiconductor materials and method of generating terahertz radiation  
A method and device for generating terahertz radiation comprising a plurality of layers of polar crystal material operative to emit terahertz radiation; the plurality of layers comprising transport...
8203126 Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation  
Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV...
8198615 Gas management system for a laser-produced-plasma EUV light source  
Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g....
8198613 Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device  
The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a...
8198612 Systems and methods for heating an EUV collector mirror  
As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating...
8198611 Laser beam formatting module and method for fabricating semiconductor dies using same  
According to one exemplary embodiment, a laser beam formatting module for use in a lithographic system to fabricate a semiconductor wafer comprises an aperture plate having, for example, a circular...
8198614 Terahertz wave generator and method of generating high-power terahertz waves using the same  
The present invention relates to a terahertz wave generator and a method of generating high-power terahertz waves using the terahertz wave generator. The terahertz wave generator includes a hollow...
8193514 Apparatus and method for curing surface coated materials  
The invention is directed to an apparatus and methods for curing a surface that is coated with a curable resin, such as an ultraviolet light-curable surface coating. The method involves directing...
8193515 Sports ball sterilizer  
A system for sterilizing a sports ball comprises a housing; a door for the housing for opening and closing the housing and for permitting manual location of a ball in the housing; a sterilizing...
8182094 Light source unit and image projection apparatus having the same  
A light source unit and an image projection apparatus are provided. The light source unit includes: a light source part including a light source and a reflective member which reflects light emitted...
8185350 Systems and methods for operational verification of a missile approach warning system  
A coupler that generates and emits a simulated missile signature for assessing the operational capability of a missile approach warning system. The coupler may be directly attached to the system by...
8173986 Laser-heated infrared source  
Described are infrared light sources and methods for generating infrared radiation. The infrared light source includes a source of laser radiation, a target and an enclosure. The target is...
8173984 Extreme ultraviolet light source apparatus  
An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV...
8173975 Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation  
A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of...
8173985 Beam transport system for extreme ultraviolet light source  
An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target...
8164077 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element  
An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating...
8164076 Extreme ultraviolet light source apparatus and method of generating extreme ultraviolet light  
An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse...
8158961 Ophthalmic lens case equipped with an ultraviolet light source  
A container (101) for contact lenses is provided which comprises a chamber (105) adapted to store an ophthalmic lens in a fluid medium, a window for viewing a lens disposed in the chamber, and a UV...
8158960 Laser produced plasma EUV light source  
A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation...
8158956 Photoactivatable paint curing device and method  
A device and method for curing photoactivatable paint coatings. An exemplary device may include a light chamber housing supported by a frame and undercarriage, the wall portions of the light...
8158959 Extreme ultraviolet light source apparatus  
An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a...
8153999 Terahertz wave generating device and apparatus using the same  
Provided is a terahertz wave optical device that can be used as a terahertz wave generating device including: an optical switch portion for generating a carrier abruptly by irradiation with...
8153998 Temperature radiator  
A temperature radiator, which comprises an emission surface emitting a thermal radiation, is provided with a radiation converter to which a laser beam is irradiated. The radiation converter...
8154000 Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources  
The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for...
8148699 Fluid treatment system  
The present invention relates to a fluid treatment system comprising: an inlet; an outlet; and a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone has...
8143606 Extreme ultra violet light source device  
An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light...
8142052 Medical light solidifying device  
A medical light solidifying device includes a housing box, a rotary work table, a lighting source reflection body, and an LED lighting source set. The rotary work table is rotatably located in the...
8138487 System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber  
A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to...
8134132 Exposure device having an array of light emitting diodes  
A device and method for exposing light sensitive substrates to a concentrated light source. The device is suitable for curing substances such as photosensitive sensitive inks, adhesives, and...
8134136 Ex-situ removal of deposition on an optical element  
A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an...
8129700 Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source  
Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by...
8129702 Radiation system with contamination barrier  
A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination...
8125333 Methods, systems and apparatus for monochromatic UV light sterilization  
The present disclosure provides for methods, systems and apparatus for monochromatic UV light sterilization of container systems and/or container-packaged products. More particularly, the present...
8115900 Lithographic apparatus and device manufacturing method  
A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected...
8101931 RF screen assembly for microwave powered UV lamps  
An RF screen for microwave powered UV lamp systems is provided. The RF screen is formed of a single sheet of conductive material in which a mesh pattern has been formed. The screen includes a...
8101130 Gas ionization source  
A gas ionizer includes a photocatalyst activated with an electric field to emit electrons. The photocatalyst is also illuminated with an ultraviolet light source. The ionized gas is passed through...
8101930 Method of increasing the operation lifetime of a collector optics arranged in an irradiation device  
The present invention relates to a method of increasing the operation lifetime of an optical collector unit (33)) arranged in an irradiation device. The irradiation device at least comprises a...