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7372048 |
Source multiplexing in lithography
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a...
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7368743 |
Device for detecting fluorescent trace material
A fluorescent trace material is provided within at least a portion of an electrical contact or interrupter assembly component, or a cavity defined therein. At least a portion of the fluorescent...
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7368730 |
Weathering apparatus with UV radiation sources and radiation sensors containing a double-calibrated UV sensor
Weathering apparatus with UV radiation sources and radiation sensors containing a double-calibrated UV sensor A weathering apparatus has one or more UV radiation sources ( 2 ) and one or more first...
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7367138 |
Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles
Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a...
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7368733 |
Contamination barrier and lithographic apparatus comprising same
A rotatable contamination barrier for use with an EUV radiation system is disclosed. The contamination barrier has a blade structure configured to trap contaminant material coming from a radiation...
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7368742 |
Arrangement and method for metering target material for the generation of short-wavelength electromagnetic radiation
The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X...
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7368744 |
Photon sieve for optical systems in micro-lithography
The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color...
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7368741 |
Extreme ultraviolet light source
The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber....
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7365351 |
Systems for protecting internal components of a EUV light source from plasma-generated debris
Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of...
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7365349 |
EUV light source collector lifetime improvements
An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with...
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7365350 |
Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma
The invention is directed to a method and arrangements for the suppression of debris in short-wavelength radiation sources based on a plasma, particularly for EUV sources for semiconductor...
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7361917 |
Far-infrared generator for thermotherapy and method of far-infrared irradiation
The present invention relates to a far-infrared ray generator, which is suitable for warming a human body partially or as a whole, and an object of the present invention is to effectively warm a...
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7361916 |
Coupled nano-resonating energy emitting structures
A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating...
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7361918 |
High repetition rate laser produced plasma EUV light source
An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a...
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7355190 |
Debris mitigation device
Numerous embodiments of a debris mitigation device are disclosed. One embodiment of the claimed subject matter may comprise a debris mitigation device for use in photolithography processes. In one...
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7355191 |
Systems and methods for cleaning a chamber window of an EUV light source
Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside...
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7348581 |
UV light-emitting diodes as a radiation source in a device for the artificial weathering of samples
The usual xenon radiation source in conventional weathering testers is replaced by UV light-emitting diodes (LEDs) ( 6 ). These can be used to provide a good approximation of the UV component of...
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7348582 |
Light source apparatus and exposure apparatus having the same
A light source apparatus for irradiating a laser light onto a target, for generating plasma, and for producing light from the plasma, said light source apparatus includes a first detection part for...
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7348583 |
Wavelength stabilized light source
An apparatus for producing wavelength stabilized electromagnetic radiation is provided, the apparatus comprising a broadband semiconductor radiation source configured to produce broadband...
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7345414 |
Lamp for night vision system
An electric lamp assembly 10 for emitting near infrared radiation includes a reflector housing 20 and a lamp vessel 24 positioned within the reflector housing. A source of illumination 28 ...
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7339181 |
High flux, high energy photon source
A high energy photon source for generating EUV radiation comprises a nozzle emitting a supersonic stream of source material, a laser or electrical/magnetic pre-ionization mechanism and a laser or...
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7335900 |
Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch...
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7335901 |
Method of calibrating light delivery systems, light delivery systems and radiometer for use therewith
A light delivery device ( 10 ) having a light source ( 12 ) and a variable aperture unit ( 18 ) is temporarily connected by a light guide ( 24; 24, 26 ) to a radiometer ( 38 ) for detecting...
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7332731 |
Radiation system and lithographic apparatus
A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a...
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7329886 |
EUV illumination system having a plurality of light sources for illuminating an optical element
There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and...
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7326944 |
Collapsible irradiation device
An irradiation device includes a base part, a support longitudinally extending from the base part and enclosing an angle with a vertical axis, and a housing that includes a central axis, at least...
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7323663 |
Multi-purpose oven using infrared heating for reduced cooking time
An oven using radiant heat at infrared wavelengths optimized for producing rapid and uniform cooking of a wide variety of foods. The infrared oven toasts, bakes, broils, and re-heats food at a much...
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7323701 |
Gas discharge lamp
A gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation has at least two electrodes for providing a radiaton-emitting plasma in the intervening...
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7323694 |
Fluid treatment system and radiation source module for use therein
A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source...
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7323703 |
EUV light source
An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell...
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7319230 |
Disinfection and decontamination using ultraviolet light
An apparatus and method for disinfecting a cryostat is provided. The cryostat disinfecting device comprises an ultraviolet emitter, a pulsed power control system, a mirrored cover and a safety...
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7317196 |
LPP EUV light source
An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation...
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7315036 |
Multifunction multi-spectrum signalling device
A multifunction multi-spectrum signalling device comprising at least one source of electromagnetic radiation such as an LED which emits radiation according to predefined or programmable user...
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7315037 |
Infrared identification device
An infrared identification device includes a light emitting panel member that receives light from an infrared light source for conduction within the panel member and emission from a light emitting...
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7309871 |
Collector for EUV light source
An apparatus/method may comprise, a multi-layer reflecting coating forming an EUV reflective surface which may comprise an inter-diffusion barrier layer which may comprise a carbide selected from...
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7307263 |
Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system...
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7297968 |
Debris collector for EUV light generator
A debris collector for EUV light generators is disclosed which enables to improve durabilities of optical units in a chamber including a collector mirror, to keep the vacuum degree in the chamber,...
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7294595 |
Silica glass
A silica glass containing from 3 to 10 mass % of TiO 2 , which has a coefficient of thermal expansion from 0 to 100° C., i.e. CTE 0 to 100 , of 0±300 ppb/° C. and an internal transmittance per...
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7291846 |
Apparatus for and method of treating a fluid
Apparatus and a method for treating a fluid. The apparatus includes a fluid passageway, at least one source of irradiation, and curved reflecting troughs for reflecting irradiation onto the fluid...
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7291852 |
Lighting system, point source lights therefor and methods of making the same
A lighting system comprising at least one lighting assembly, the lighting assembly comprising at least one ultraviolet light source, means for separately controlling ultraviolet light source and a...
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7291853 |
Discharge produced plasma EUV light source
An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a...
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7291851 |
Infrared source modulation and system using same
A method of modulating an infrared radiation (IR) source that includes applying a time-varying, periodic voltage signal to the IR source, measuring a parameter of the voltage signal, and adjusting...
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7288777 |
Collector for EUV light source
An apparatus/method is disclosed that may comprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation...
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7288778 |
Collector for EUV light source
It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to...
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7285129 |
High efficiency tanning apparatus
Tanning apparatuses and methods of operating tanning apparatuses for high efficiency use. In an embodiment, a tanning apparatus including a tanning lamp is operated by delivering a first input...
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7282728 |
Modular fixture
There is disclosed an electric discharge lamp fixture and a process of assembling a modular germicidal system. The electric discharge lamp fixture may be attached to and receive substantial...
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7279692 |
Micromechanical infrared source
A device for generating infrared radiation includes at least one heating element and at least one radiating element for irradiating the infrared radiation. The heating element is a micromechanical,...
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7279690 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas...
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7274030 |
Apparatus for the temporally stable generation of EUV radiation by means of a laser-induced plasma
The invention is directed to an apparatus for generating soft x-radiation, particularly EUV radiation, by laser-induced plasma. The object of the invention, to find a novel possibility for...
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7271401 |
Extreme ultra violet light source device
An EUV light source device for protecting a collection mirror from debris that is considered harmful to a mirror coating. The EUV light source device includes: a chamber in which extreme ultra...
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