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7256848 Method and apparatus of alligning liquid crystal  
In a method and apparatus of aligning liquid crystal, a first ion beam is formed. The first ion beam is transformed into a second ion beam having transformed cross-section. The second ion beam...
7256405 Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method  
An object of the present invention is to provide a sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method, which can reduce an edge roughness...
7253425 Method and apparatus for forming optical elements by inducing changes in the index of refraction by utilizing electron beam radiation  
The exposure of selected optical materials to large area electron beam irradiation can raise the refractive index of the optical material to allow the fabrication of waveguides, optical fibers,...
7253417 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens  
The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are...
7247867 Ion implanter and method of manufacturing semiconductor device  
An ion implanter includes a sample stage for setting a sample having a main surface, an ion generating section configured to generate a plurality of ions, the ion generating section including a...
7247865 System and method of detecting, neutralizing, and containing suspected contaminated articles  
A comprehensive system and method of rendering the mail safe for handling and for detecting and containing suspect pieces and which can be fitted or retrofitted into mail and package processing...
7247869 Particle therapy system  
A particle therapy system capable of measuring energy of a charged particle beam even during irradiation of the charged particle beam is provided. A beam delivery (irradiation) system comprises a...
7244932 Electron beam apparatus and device fabrication method using the electron beam apparatus  
The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of...
7241995 Electron microscope equipped with magnetic microprobe  
There is disclosed an electron microscope equipped with a magnetic microprobe. The microscope can apply a strong electric field to a local area on a specimen made of a magnetic material. The...
7242014 Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device  
A charged particle beam drawing equipment includes charged particle beam source, first and second shaping aperture masks with first and second opening portions for rotation adjustment, detection...
7241991 Region-of-interest based electron beam metrology  
One embodiment relates to a method for metrology using an electron beam apparatus. At least one region of interest is selected in a field of view at a magnification level. Scanning parameters are...
7242015 Patterned wafer inspection method and apparatus therefor  
An electron beam (area beam) having a fixed area is irradiated onto the surface of a semiconductor sample, and reflected electrons from the sample surface are imaged by the imaging lens, and images...
7235783 Gas blowing nozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method  
There are provided a gas blowing nozzle adapted such that, by the fact that a groove-like notch structure has been provided in a side to which a beam IB comes flying in a nozzle tip part of a gas...
7235796 Method and apparatus for the generation of anionic and neutral particulate beams and a system using same  
An apparatus for the generation of anionic and neutral particulate beams is described. The apparatus comprises a duct defined by walls having an inner surface capable of sustaining a temperature...
7235795 Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process  
A particle monitor in the process chamber of a semiconductor device manufacturing apparatus provides a measure of a flux of contaminant particles in the chamber. The flux is measured whilst process...
7235800 Electrical probing of SOI circuits  
Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching or needing to...
7230257 Electron beam exposure apparatus  
An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit...
7230243 Method and apparatus for measuring three-dimensional shape of specimen by using SEM  
The present invention relates to a method and apparatus for measuring a three-dimensional profile using a SEM, capable of accurately measuring the three-dimensional profile of even a flat surface...
7229742 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system  
Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of...
7230256 Ion doping system, ion doping method and semiconductor device  
An ion doping system includes a chamber 11 , an exhausting section 13 for exhausting gases from the chamber, an ion source 12 provided for the chamber, and an accelerating section 23 for...
7227140 Method, system and device for microscopic examination employing fib-prepared sample grasping element  
A method including, in one embodiment, severing a sample at least partially from a substrate by cutting the substrate with a focused ion beam (FIB), capturing the substrate sample by activating a...
RE39657 Sterilization by low energy electron beam  
A sterilization apparatus wherein one or more electron beam tubes are used to direct electron beams into an ambient gaseous environment to create an electron plasma cloud into which non-sterile...
7220973 Modular manipulation system for manipulating a sample under study with a microscope  
A modular manipulation system and method for using such modular manipulation system for manipulating a sample under study with a microscope are provided. According to at least one embodiment, a...
7217934 Wafer scanning device  
The wafer scanning device causes a wafer to scan in a vacuum area and includes a holder 10 to hold a wafer, a ball screw 20 to move the holder 10 to scan, a motor 50 to drive the ball screw...
RE39627 Device and method preventing ion source gases from entering reaction/collision cells in mass spectrometry  
A mass spectrometer has an ion source for producing sample ions. The ions pass through an ion interface, to a reaction/collision cell section. An ion-neutral decoupling device is provided between...
7217924 Holey mirror arrangement for dual-energy e-beam inspector  
One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam...
7214937 Electron microscope  
In order to provide an electron microscope which enables the operator to position the field-of-view easily and accurately on a target fault, the electron microscope for observing a surface or...
7214950 Transition radiation apparatus  
In one embodiment of the present invention, thermal deformation or bending of membranes in a transition radiation emitting structure can be reduced by providing flex regions in the membranes or the...
7208965 Planar view TEM sample preparation from circuit layer structures  
A method of preparing a planar view TEM sample of a planar portion of a circuit layer structure formed on a substrate. The method includes polishing the substrate circuit layer structure until a...
7208748 Programmable particle scatterer for radiation therapy beam formation  
Interposing a programmable path length of one or more materials into a particle beam modulates scattering angle and beam range in a predetermined manner to create a predetermined spread out Bragg...
7205559 Electron beam apparatus and device manufacturing method using same  
An electron beam apparatus including an electron gun for directing a plurality of primary electron beams onto a sample, an objective lens for forming an electric field to accelerate a plurality of...
7205540 Electron beam apparatus and device manufacturing method using same  
An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample,...
7205078 Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method  
A method for generating backscattering intensity with which charged particles are backscattered to a resist layer when charged particle beam is irradiated onto the resist layer which is formed on...
7202487 Apparatus for ion implantation  
Apparatus for ion implantation having an ion trap for stabilizing a beam current are disclosed. An illustrated apparatus for ion implantation includes an arc chamber to ionize an impurity to create...
7202486 Treatment planning tool for multi-energy electron beam radiotherapy  
A stand-alone calculator enables multi energy electron beam treatments with standard single beam electron beam radiotherapy equipment thereby providing improved dose profiles. By employing user...
7199382 Patient alignment system with external measurement and object coordination for radiation therapy system  
A patient alignment system for a radiation therapy system. The alignment system includes multiple external measurement devices which obtain position measurements of components of the radiation...
7199383 Method for reducing particles during ion implantation  
A method for reducing particles during ion implantation is provided. The method involves the use of an improved Faraday flag including a beam plate having thereon a beam striking zone comprising a...
7195936 Thin film processing method and system  
In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an...
7193221 Electronic optical lens barrel and production method therefor  
The present invention provides an electron optical lens column suitable for miniaturization, and provides the manufacturing method thereof. The column unit ( 1 ) comprises an inner column ( 11 )...
7189980 Methods and systems for optimizing ion implantation uniformity control  
An apparatus and method are provided for optimizing ion implantation uniformity in a workpiece, such as a semiconductor wafer, which includes an ion beam generator for generating an ion beam, a...
7189981 Electromagnetic focusing method for electron-beam lithography system  
A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for...
7183563 Irradiation apparatus  
An apparatus for irradiating surfaces includes an electron beam generator for generating a beam of electrons. The beam of electrons exits the electron beam generator through an exit window. A...
7183564 Channel spark source for generating a stable focused electron beam  
In a channel spark source triggered by gas discharge for generating a stable focused electron beam, a gas supply for a hollow cathode thereof is provided which generates in the hollow cathode a...
7173262 Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method  
A charged particle beam exposure apparatus for writing a desired pattern on a substrate using a charged particle beam. The apparatus includes a blanking unit, having a deflector capable of...
7173261 Image noise removing method in FIB/SEM complex apparatus  
In an image noise prevention method in a composite system of a scanning electron microscope (SEM) and a focused ion beam apparatus (FIB), noise generated during a blanking period of the FIB is...
7173265 Modular patient support system  
A radiation treatment system ( 100 ) for accurately delivering radiation to a targeted site within a cancer patient ( 108 ) that includes a modular patient support system and a patient positioner (...
7173264 Particle beam therapy system  
A particle beam therapy system which can surely prevent a beam from being erroneously transported to a treatment room that is not an irradiation target, and can improve safety. The particle beam...
7166854 Uniformity control multiple tilt axes, rotating wafer and variable scan velocity  
A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially untuned ion...
7166852 Treatment target positioning system  
A wireless treatment target positioning system for therapeutic radiation treatment includes a patient positioning system and a treatment target locating system. The treatment target locating system...
7164139 Wien filter with reduced chromatic aberration  
One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field...