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6521902 |
Process for minimizing electrostatic damage and pole tip recession of magnetoresistive magnetic recording head during pole tip trimming by focused ion beam milling
The improved method for trimming a magnetic head utilizing a FIB tool includes a step of aligning the FIB tool milling boxes without imaging critical pole tip components and structure. The method...
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6509573 |
Apparatus and method for controlling a radiation device
An arrangement and a method for controlling a radiation device, in particular for heavy ion therapy, are described. The arrangement comprises a chain of circuit modules ( 11-17 ), each circuit...
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6504163 |
Electron beam irradiation process and an object irradiated with an electron beam
A process of accelerating electrons with a voltage applied thereto in a vacuum, guiding the accelerated electrons into a normal-pressure atmosphere, and irradiating the electron beam (EB) onto an...
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6501082 |
Plasma deposition apparatus and method with controller
A controlled plasma deposition system and method are provided including a vacuum vessel. An electron adding mass spectrometer is connected to a vacuum vessel for carrying out a gas treatment for a...
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6498444 |
Computer-aided tuning of charged particle accelerators
Systems and methods for tuning a charged particle accelerator ( 40 ) are described. An accelerator tuning system ( 44 ) includes a graphical user interface ( 110 ) that guides a tuning technician (...
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6495842 |
Implantation of the radioactive 32P atoms
In an apparatus for the doping of vessel supports (stents) with radioactive and non-radioactive atoms comprising an electron-cyclotron-ion-source (ECRIS) with an arrangement for extracting an ion...
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6492645 |
System for, and method of, irradiating articles to sterilize the articles
A first robotic assembly transfers articles from carriers on a transport mechanism at a loading area to a first load conveyor. The conveyor transfers the articles to a process conveyor which moves...
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6486480 |
Plasma formed ion beam projection lithography system
A plasma-formed ion-beam projection lithography (IPL) system eliminates the acceleration stage between the ion source and stencil mask of a conventional IPL system. Instead a much thicker mask is...
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6486481 |
Vibratory table apparatus and associated equipment and methods for radiation treatment of polymeric materials
Apparatus and a method for treating polymeric material, such as polytetrafluoroethylene, with radiation. The polytetrafluoroethylene is moved under an electron beam in an even and consistent depth...
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6486482 |
Irradiation equipment
An arrangement and a method for irradiation of products by charged particles. The arrangement comprises a particle acceleration device and a radiation chamber, in which the products are irradiated...
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6483263 |
Automated system for conditioning a linear accelerator
A method and system for automatically conditioning a linear accelerator is disclosed. The method and system comprise the steps of measuring the global variables of the accelerator and evaluating a...
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6479831 |
Process for the irradiation of strand-shaped irradiated material, and an irradiating device for the performance of the said process
In a process for the irradiation of strand-shaped irradiated material ( 19; 19 a-e ), in particular cable insulation or sheathing ( 31 ) capable of being cross-linked by irradiation, or tubes,...
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6476387 |
Method and apparatus for observing or processing and analyzing using a charged beam
In a method for observing or processing and analyzing the surface of a sample by irradiating a charged beam on the sample covered at least partially by an insulator film, an ultraviolet light is...
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6475432 |
Carrier and support for work pieces
A device for use in carrying and supporting a work piece before, during, and after a treatment process. The device can be used for both shipping and treating the work piece, and the device will not...
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6476403 |
Gantry with an ion-optical system
The present invention is drawn to a gantry for an ion-optical system comprising an ion source and three bending magnets for deflecting an ion beam about an axis of rotation. A plurality of...
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6472834 |
Accelerator and medical system and operating method of the same
The accelerator is a cyclic type accelerator having deflection electromagnets and four-pole electromagnets for making a charged particle beam circulate, a multi-pole electromagnet for generating a...
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6468471 |
System for, and method of, irradiating opposite sides of articles with optimal amounts of cumulative irradiation
Opposite sides of an article are irradiated to sterilize the article. The cumulative irradiation should be above a first value, and below a second value greater than the first value, at all of the...
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6465797 |
Electron beam illumination apparatus, electron beam exposure apparatus, and device manufacturing method
The electron emission surface of an electron source is formed to have an effective irradiation area and a restricted irradiation area the electron emission efficiencies of which differ from each...
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6462490 |
Method and apparatus for controlling circular accelerator
A control method and apparatus of a circular accelerator can adjust a timing of emitting a charged particle beam in the circular accelerator. Generation of a clock pulse having a fixed period is...
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6459089 |
Single accelerator/two-treatment vault system
A particle accelerator ( 10 ) is disposed between a first shielded processing chamber ( 12 )and a second shielded processing chamber ( 14 ). The accelerator selectively feeds a higher energy (e.g.,...
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6456019 |
Real time measurement of leakage current in high voltage electron guns
A method and a apparatus are provided for operating an E-beam system including an E-beam source for generating an E-beam directed along a column axis and an electrode aligned with the column axis...
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6455332 |
Methodology to mitigate electron beam induced charge dissipation on polysilicon fine patterning
A method of making and using a reference wafer and a metrology system to calibrate tools in a photolithographic system. The reference wafer includes a silicon substrate, a dielectric or insulating...
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6437513 |
Ionization chamber for ion beams and method for monitoring the intensity of an ion beam
The invention relates to an ionization chamber for ion beams and to a method of monitoring the intensity of an ion therapy beam by way of such an ionization chamber. For that purpose, the...
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6437353 |
Particle-optical apparatus and process for the particle-optical production of microstructures
The invention relates to a particle-optical apparatus for particle-optical mask projection. According to the invention, an energy filter is used, by which particles which are inelastically...
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6433349 |
Charged-particle beam irradiation method and system
A charged-particle beam irradiation system for an affected part in which while a charged-particle beam ejected from an accelerator is scanned by an electromagnet onto the affected part, each layer...
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6429445 |
Electron beam irradiating apparatus having cathode plate formed of non-metal conductive material
An electron beam irradiating apparatus adopting a cathode plate including a non-metal conductive material. The electron beam irradiating apparatus includes a chamber having an opening at the top...
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6429608 |
Direct injection accelerator method and system
An electron beam accelerator system includes a high power switching device coupled between the direct current voltage source and the pulse forming network. A pulse control circuit is connected to...
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6429444 |
Real time monitoring of electron beam radiation dose
An accelerator ( 10 ) generates an electron beam that is swept ( 16 ) up and down to form an electron beam ( 22 ). A conveyor ( 32 ) moves items ( 30 ) through the electron beam for irradiation...
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6429440 |
Lithography apparatus having a dynamically variable illumination beam
A lithographic apparatus, e.g. using an electron beam, to expose a radiation sensitive layer on a substrate to the pattern on a mask comprising pattern areas and opaque supports. The apparatus uses...
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6417516 |
Electron beam lithographing method and apparatus thereof
An electron beam lithographing method for exposing and lithographing a desired pattern with an electron beam includes the steps of forming a plurality of accuracy evaluation patterns and a desired...
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6414323 |
Charged particle beam apparatus and method of controlling charged particle beam
There is here disclosed charged particle beam apparatus in which reactant floating in vacuum can efficiently be removed by simple structure. The charged particle beam apparatus of the present...
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6414330 |
Method and apparatus for applying electron radiation to subcutaneous cells
Uniform electron irradiation of tissue over a large solid angle is accomplished by directing an electron beam of selectively variable energy and intensity through a hollow needle to emerge in the...
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6410929 |
Electron beam irradiation apparatus
An electron beam irradiation apparatus has an electron accelerator for accelerating electrons emitted from an electron beam source to irradiate a target, and a power supply for supplying power of...
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6407399 |
Uniformity correction for large area electron source
The invention pertains to electron exposure equipment useful for exposing, treating and processing coatings and other materials by a cold cathode gas discharge electron source having a broad...
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6407492 |
Electron beam accelerator
An electron accelerator includes a vacuum chamber having an electron beam exit window. The exit window is formed of metallic foil bonded in metal to metal contact with the vacuum chamber to provide...
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6403967 |
Magnet system for an ion beam implantation system using high perveance beams
An apparatus for ion implantation using high perveance beams is disclosed. The apparatus includes a dipole magnet apparatus that provides an adjustment to a cross-beam magnetic dipole field in an...
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6400090 |
Electron emitters for lithography tools
The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. A mesh grid is applied to...
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6396065 |
Radioactive ray irradiating apparatus
In projecting radioactive rays for sanitizing food or the like, an irradiating condition which attains a uniform dose of radioactive rays for the entire objects to be exposed is automatically...
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6376137 |
Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector
Charged-particle-beam microlithography apparatus and methods are disclosed that achieve correction of positioning errors of one or both the reticle stage and wafer stage using a deflector. The...
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6366641 |
Reducing dark current in a standing wave linear accelerator
Systems and methods for reducing dark current levels in a standing wave linear accelerator without sacrificing operating performance are described. In a radiation mode, the standing wave linear...
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6354438 |
Focused ion beam apparatus for forming thin-film magnetic recording heads
This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a...
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6355383 |
Electron-beam exposure system, a mask for electron-beam exposure and a method for electron-beam exposure
This invention provides a scattering-angle limiting type of electron-beam exposure system having a mask comprising a scattering region and a limiting aperture which limits the amount of scattered...
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6352799 |
Charged-particle-beam pattern-transfer methods and apparatus including beam-drift measurement and correction, and device manufacturing methods comprising same
Charged-particle-beam microlithography methods and apparatus are disclosed that employ a segmented reticle and provide high-accuracy pattern transfer even under conditions of drift of the charged...
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6353922 |
Automatic generation of one dimensional data compaction commands for electron beam lithography
A method, and a system for employing the method, for compacting the amount of memory required to store a two dimensional array of exposure spot shapes in a numerically controlled (NC) electron beam...
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6344115 |
Pattern forming method using charged particle beam process and charged particle beam processing system
A pattern forming method using an improved charged particle beam process, and a charged particle beam processing system prevent effectively the corrosion of a workpiece by a reactive gas adsorbed...
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RE37537 |
Method and apparatus for altering material
Methods and apparatus for thermally altering the near surface characteristics of a material are described. In particular, a repetitively pulsed ion beam system comprising a high energy pulsed power...
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6337486 |
Electron beam drawing process and electron beam drawing apparatus
An electron beam drawing process of high throughput, coping with the changes in static distortion and dynamic distortion of a lower layer exposure apparatus or an optical reduction exposure...
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6335535 |
Method for implanting negative hydrogen ion and implanting apparatus
A method for implanting negative hydrogen ions includes the following steps. Plasma containing hydrogen is generated. Negative hydrogen ions are generated in the plasma. An electric field is formed...
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6331713 |
Movable ion source assembly
An ion source assembly 10 is disclosed, the assembly comprising a source sub assembly having an ion source 20, an extraction electrode 40 and an electrically insulating high voltage bushing 60 to...
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6329664 |
Ion implantation apparatus for wafers
An ion implantation apparatus is provided which does not require dummy wafers and which is capable of reducing the manufacturing cost and increasing the throughput. The ion implantation apparatus...
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