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6894435 |
Method and device for rastering source redundancy
A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a...
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6891174 |
Method and system for ion beam containment using photoelectrons in an ion beam guide
Ion implantation systems and beam containment apparatus therefor are provided in which a photoelectron source and a photon source are provided along a beam path. The photon source, such as a UV...
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6891177 |
Ion beam scanner system and operating method
The invention relates to an ion beam scanning system having an ion source device, an ion acceleration system and an ion beam guidance system comprising an ion beam outlet window for a converging...
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6888146 |
Maskless micro-ion-beam reduction lithography system
A maskless micro-ion-beam reduction lithography system is a system for projecting patterns onto a resist layer on a wafer with feature size down to below 100 nm. The MMRL system operates without a...
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6881968 |
Electron beam exposure apparatus, electron beam exposure method, semiconductor device manufacturing method, and electron beam shape measuring method
An electron beam exposure apparatus for exposing a wafer by an electron beam, including: an electron beam generation section for generating the electron beam; an electron beam shaping member with a...
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6881966 |
Hybrid magnetic/electrostatic deflector for ion implantation systems
A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam....
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6881969 |
Electron beam treatment device
An electron beam treatment device is provided for treating a substance located in a processing chamber which includes electron beam tubes arranged such that electron beam windows project into the...
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6877344 |
Preparation of optical fiber
An optical fiber is prepared by applying a liquid electron beam-curable resin composition to a bare optical fiber or a coated optical fiber having a primary or secondary coating on a bare optical...
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6872942 |
High-speed inspection of flat substrates with underlying visible topology
One embodiment disclosed relates to a method for inspecting a substrate. The method includes exposing the substrate to an incident beam, inducing relative motion between the incident beam and the...
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6873123 |
Device and method for regulating intensity of beam extracted from a particle accelerator
The invention concerns a device ( 10 ) for regulating the intensity of a beam extracted from a particle accelerator, such as a cyclotron, used for example for protontherapy, said particles being...
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6872959 |
Thermoelectron generating source and ion beam radiating apparatus with the same
A thermoelectron generating source including a facial main cathode for emitting thermoelectrons by being heated from behind, a filament for heating the main cathode from behind to emit the...
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6870161 |
Apparatus for processing and observing a sample
An apparatus for processing and observing a sample has a sample stage for supporting a sample at a preselected location thereof, a focused ion beam irradiation system for irradiating the sample...
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6870171 |
Exposure apparatus
An electron beam exposure apparatus which exposes a wafer ( 118 ) by using a plurality of electron beams corrects the positional error of the electron beams by using multi-deflector arrays ( 105,...
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6870174 |
Electron beam tube and window for electron beam extraction
An object of the present invention is to provide to an electron beam tube and electron beam extraction window capable of generating high output electron beam by effectively releasing heat generated...
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6863018 |
Ion plating device and ion plating method
In ion plating in which a substrate is held on a substrate holder placed in an evacuated vacuum chamber and plasma is generated in the vacuum chamber to be formed into a film, a bias voltage...
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6861187 |
Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system
Methods and devices are disclosed for evaluating the imaging performance of a charged-particle-beam (CPB) microlithography system. An embodiment of such a device includes a knife-edged pattern...
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6858845 |
Scanning electron microscope
A scanning electron microscope has an electron gun for producing an electron beam, a specimen holder holding the specimen, an objective lens for sharply focusing the beam onto the specimen, and a...
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6859741 |
Device and method for adapting the size of an ion beam spot in the domain of tumor irradiation
The invention relates to an apparatus and to a method for adapting the size of an ion beam spot in tumor irradiation. For that purpose, the apparatus has a raster scanning device composed of raster...
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6855942 |
Apparatus for pre-acceleration of ion beams used in a heavy ion beam applications system
The present invention relates to an apparatus for pre-acceleration of ions and optimized matching of beam parameters used in a heavy ion application comprising a radio frequency quadruple...
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6855926 |
Instrument and method for combined surface topography and spectroscopic analysis
A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip ( 12 ); and a sample carrier ( 58 ) which supports a sample ( 10 ) so that a...
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6855481 |
Apparatus and a method for forming a pattern using a crystal structure of material
The present invention relates generally to an apparatus and a method for forming a pattern, and in particular, to an apparatus and a method for forming a pattern for the formation of quantum dots...
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6852990 |
Electrostatic discharge depolarization using high density plasma
A method for electrostatic discharge depolarization is implemented. The buildup of charge on tool structures in fabrication tools for semiconductor processing may be expected to be of concern...
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6852989 |
Positioning system for use in lithographic apparatus
A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a...
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6849858 |
Apparatus and method for forming alignment layers
An object of the present invention is to provide an apparatus and method for ensuring a uniform orientation of liquid crystal molecules of an alignment layer by irradiation with ion beams. An...
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6844557 |
System for, and method of, irradiating opposite sides of an article
An accelerator directs an electron beam to a scanner which operates under microprocessor control to convert the beam into two (2) sets of spaced electron beamlets. A magnetic lens deflects the sets...
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6844688 |
Multi-watt THz generator
Stable THz radiation in the multi-watt range, upwards of 2 watts and even up to 100 watts, is produced through the acceleration of electrons in bunches less than about 500 femtoseconds in length as...
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6841789 |
Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
An apparatus for surface modification of a polymer, metal and ceramic material using an ion beam (IB) is disclosed, which is capable of supplying and controlling a voltage ( 220 ) applied to a...
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6841777 |
Electron diffraction system for use in production environment and for high pressure deposition techniques
An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter ( 5 ), a first deflection stage ( 6 a, b ) for radiating an...
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6838683 |
Focused ion beam microlathe
An apparatus for customizing focused ion beam (FIB) probes is described. Prior to taking probe measurements, the probe tips are milled with a beam of gallium ions on a microlathe platform. A motor...
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6835511 |
Methods and apparatus for detecting and correcting reticle deformations in microlithography
Microlithography methods and apparatus are disclosed that allow reticle deformations to be measured and corrected quickly and accurately. Multiple alignment marks (comprising a “first set” and...
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6835943 |
Electron-beam lithography
A device for electron-beam lithography wherein very small pits can be written, using a small beam intensity, by exposing each pit several times during writing. A row of electron beams is arranged...
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6833954 |
Lithographic method for manufacturing a mask used in the fabrication of a fiber Bragg grating
The invention reduces the effects of stitching errors from re-scaling or re-positioning in the fabrication of fiber Bragg gratings or the mask used in such fabrication. A first embodiment of the...
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6833551 |
Electron beam irradiation apparatus
An electron beam irradiation apparatus includes an electron beam system for directing electrons into an irradiation zone. The electron beam system and the irradiation zone are configured for...
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6833552 |
System and method for implanting a wafer with an ion beam
A method is provided for uniformly implanting a wafer with an ion beam. The wafer is generally of the type with a surface area in the form of a disk with a diameter and center. The ion beam is...
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6831284 |
Large area source for uniform electron beam generation
An electron beam apparatus that includes a vacuum chamber, a large-area cathode disposed in the vacuum chamber, and a first power supply connected to the cathode. The first power supply is...
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6831282 |
Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus
Methods and devices are disclosed for evaluating the imaging performance of a charged-particle-beam (CPB) micro lithography apparatus. A measurement mark is situated at an object plane, a...
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6828572 |
Ion beam incident angle detector for ion implant systems
The present invention facilitates semiconductor device fabrication by monitoring and correcting angular errors during ion implantation procedures via an incident ion beam angle detector....
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6828573 |
Electron beam lithography system
An object of this invention is to provide an electron beam lithography system capable of rapidly creating an accurate exposure map for proximity effect correction. The inventive system creates the...
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6828571 |
Apparatus and methods of controlling surface charge and focus
One embodiment disclosed relates to a method of setting a surface charge of an area on a substrate to a desired level. The substrate is held on a stage, and a stage bias voltage applied to the...
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6825468 |
Fine stencil structure correction device
A fine stencil structure correction device has a charged particle beam microscope lens-barrel which scans and corrects shapes of defect portions of a fine stencil structure sample using an etching...
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6826254 |
Radiation applying apparatus
An x-ray treatment apparatus includes an x-ray generating device, a head unit, a manipulator and a microwave source. The x-ray generating device produces x-rays, by letting electrons, which have...
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6821693 |
Method for adjusting a multilevel phase-shifting mask or reticle
A method for adjusting (aligning) a multilevel phase-shifting mask or a multilevel phase-shifting reticle with the aid of at least one alignment mark provided on the mask or the reticle includes...
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6822246 |
Ribbon electron beam for inspection system
Apparatus configurations are disclosed for generating a ribbon-like beam that impinges onto a target specimen as an elongated spot. The elongated spot has a first dimension that is substantially...
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6818910 |
Writing methodology to reduce write time, and system for performing same
The present invention is generally directed to various reticle writing methodologies to reduce write time, and a system for performing same. In one illustrative embodiment, the method comprises...
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6815681 |
Electron beam lithography apparatus using a patterned emitter
An electron beam lithography apparatus, which uses a patterned emitter, includes a pyroelectric plate emitter that emits electrons using a patterned metal thin layer formed on the pyroelectric...
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6815697 |
Ion beam charge neutralizer and method therefor
In an ion beam line having a mechanism for scanning an ion beam by an electric field or a magnetic field or in an ion beam line having a mechanism for forming a sheet-like or a ribbon-like ion...
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6815693 |
Charged-particle-beam microlithography apparatus and methods including proximity-effect correction
Methods are disclosed for correcting proximity effects as affected by varying magnitudes of beam blur occurring at different respective locations in an image of a reticle subfield as projected onto...
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6815695 |
Simplified reticle stage removal system for an electron beam system
A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or...
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6809325 |
Apparatus for generating and selecting ions used in a heavy ion cancer therapy facility
The present invention relates to an apparatus for generating, extracting and selecting ions used in a heavy ion cancer therapy facility. The apparatus comprises an independent first (ECRIS 1 ) and...
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6803584 |
Electron beam control device
An electron beam control device controls an electron beam for use, such as an electron beam exposure device and the like, wherein a track of an electron beam is not adversely Influenced by the...
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