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7633061 |
Method and apparatus for measuring pattern dimensions
It is difficult for a material having low resistance to electron beam irradiation to obtain an electron microscopic image having a high S/N ratio. A conventional image smoothing process can improve...
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7633063 |
Charged particle beam apparatus
A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state...
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7629593 |
Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method
A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap...
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7629596 |
Method of producing 3-D mold, method of producing finely processed product, method of producing fine-pattern molded product, 3-D mold, finely processed product, fine-pattern molded product and optical component
To provide production methods for a 3-D mold, a finely processed product, and a fine pattern molded product in which the depth and the line width can be formed with high precision, a 3-D mold, a...
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7626163 |
Defect review method and device for semiconductor device
A defect review method and device of the invention solves the previous problem of a long inspection time that is caused by the increase of a process-margin-narrow pattern as a result of the size...
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7626185 |
Patterning compositions, masks, and methods
Electromagnetic radiation sensitive mask materials are provided. The mask materials are chosen such a first percentage of electromagnetic radiation at a first wavelength is transmitted through the...
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7622724 |
High voltage insulator for preventing instability in an ion implanter due to triple-junction breakdown
A high voltage insulator for preventing instability in an ion implanter due to triple junction breakdown is described. In one embodiment, there is an apparatus for preventing triple junction...
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7619230 |
Charged particle beam writing method and apparatus and readable storage medium
A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a...
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7618751 |
RET for optical maskless lithography
The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.
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7612337 |
Focused ion beam system and a method of sample preparation and observation
A focused ion beam system capable of acquiring surface structure information, internal structure information, and internal composition information about a sample simultaneously from the same field...
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7608845 |
Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary...
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7608844 |
Charged particle beam drawing apparatus
In the present invention, vector data developing unit, ends separating unit, overlap removing unit and bitmapped data generating unit are sequentially connected in order to make pipeline...
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7608528 |
Substrate cover, and charged particle beam writing apparatus and method
A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a...
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7605385 |
Electro-less discharge extreme ultraviolet light source
An electrode-less discharge source of extreme ultraviolet (EUV) radiation ( 10 ) efficiently assembles a hot, dense, uniform, axially stable plasma column ( 5 ) with magnetic pressure and inductive...
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7605383 |
Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium
A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern...
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7601968 |
Charged particle beam writing method and apparatus
A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an...
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7598499 |
Charged-particle exposure apparatus
In a particle-beam projection processing apparatus a target ( 41 ) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system ( 103 ) to image a...
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7598504 |
Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in...
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7595496 |
Optimized correction of wafer thermal deformations in a lithographic process
A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern...
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7592612 |
Method and apparatus for surface potential reflection electron mask lithography
A method (and structure) for controlling a beam used to generate a pattern on a target surface includes generating a beam of charged particles and directing the beam to a mask surface and causing...
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7592611 |
Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam
A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location...
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7592604 |
Charged particle beam apparatus
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 ...
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7592598 |
Illumination system particularly for microlithography
There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm....
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7589335 |
Charged-particle beam pattern writing method and apparatus and software program for use therein
A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere...
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7590280 |
Position detection apparatus and exposure apparatus
An exposure apparatus for exposing an object to light. The apparatus includes a camera which captures an image of a mark on the object to obtain image data corresponding to the image, an extraction...
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7589332 |
Via-hole processing method
In a via-hole formation method of forming a via-hole reaching a bonding pad, in a substrate of a wafer in which a plurality of devices are formed on a surface of the substrate and the bonding pad...
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7589334 |
Ion beam delivery equipment and an ion beam delivery method
The invention is intended to increase the number of patients treatable using one wheel having a thickness varied in the rotating direction to change energy of an ion beam passing the wheel. Ion...
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7590966 |
Data path for high performance pattern generator
A method and system for a high-speed datapath for a high-performance pattern generator such as an analog SLM for generating the image is disclosed. The data path has provisions for completely...
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7586103 |
High refractive index fluids for immersion lithography
Provided are compositions suitable for use as immersion liquids in immersion lithography, and immersion lithography processes and apparatus for using the compositions.
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7582884 |
Charged particle beam exposure method and charged particle beam exposure device
When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block...
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7582883 |
Method of scanning a substrate in an ion implanter
This invention relates to a method of scanning a substrate through an ion beam in an ion implanter to provide uniform dosing of the substrate. The method comprises causing relative motion between...
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7582886 |
Gantry for medical particle therapy facility
A particle therapy gantry for delivering a particle beam to a patient includes a beam tube having a curvature defining a particle beam path and a plurality of fixed field magnets sequentially...
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7580110 |
Exposure apparatus and exposure method
An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting...
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7579604 |
Beam stop and beam tuning methods
A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the...
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7579606 |
Method and system for logic design for cell projection particle beam lithography
A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library,...
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7576341 |
Lithography systems and methods for operating the same
A lithography system and method for operating the same. The lithography system may include a cathode adapted to emit an electron beam, a beam-homogenizing structure, capable of increasing at least...
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7576337 |
Power supply for an ion implantation system
A power supply system for an ion implantation system. In one particular exemplary embodiment, the system may be realized as a power supply system that includes a low frequency power inverter, a...
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7573052 |
Exposure apparatus, exposure method, and device manufacturing method
A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is...
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7569842 |
Method for correcting electron beam exposure data
First, electron beam exposure data identifiable for each type of pattern of a semiconductor device is inputted (S 601 ). Then, electron beam exposure data on a first type of pattern is not...
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7569307 |
Laser mask and crystallization method using the same
A laser mask includes a mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are...
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7566886 |
Throughput enhancement for scanned beam ion implanters
An ion implantation system that optimizes productivity that includes an ion generator configured to implant ions into a workpiece by scanning the ions along an axis in a first direction, a movable...
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7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
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7564049 |
Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method
A pattern drawing system includes a beam irradiating mechanism which irradiates electrically charged beams on a film to be drawn, a coefficient calculating section which calculates a backward...
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7560713 |
Correction lens system for a particle beam projection device
A correction lens system for a particle beam projection device with at least a first magnetic lens and a second magnetic lens is disclosed. A plurality of correction lens pairs is arranged between...
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7557364 |
Charge neutralizing device
Disclosed is a charge neutralizing device which is capable of being applied to a substrate 13 having a large area and in which electrons having low energy of 5 eV or less, and preferably 2 eV,...
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7554107 |
Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus
A charged particle beam writing method includes measuring a topography of a backside of a substrate without an influence of a gravity sag, calculating a first positional deviation amount of a...
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7554094 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet...
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7554108 |
Forming a semiconductor device feature using acquired parameters
In one embodiment, a controller coupled to a focused ion beam tool can execute instructions to acquire parameters for a feature of a semiconductor device, determine a data array using the...
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7550740 |
Focused ION beam apparatus
A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope...
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7550747 |
Parallel electron beam lithography stamp (PEBLS)
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed and patterned for use as a lithographic stamp. The spacing and/or arrangement of the nanotips...
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