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9040935 Blanking apparatus, drawing apparatus, and method of manufacturing article  
The present invention provides a blanking apparatus comprising a plurality of blankers configured to respectively blank a plurality of beams with respect to a target position on an object, and a...
9034665 Tool configuration and method for extreme ultra-violet (EUV) patterning with a deformable reflective surface  
Some embodiments of the present disclosure relate to a tool configuration and method for EUV patterning with a deformable reflective surface comprising a mirror or reticle. A radiation source...
9029810 Using wafer geometry to improve scanner correction effectiveness for overlay control  
Systems and methods for providing improved scanner corrections are disclosed. Scanner corrections provided in accordance with the present disclosure may be referred to as wafer geometry aware...
9012875 Inspection method and an inspection system exhibiting speckle reduction characteristics  
A method and an inspection system that exhibiting speckle reduction characteristics includes a light source arranged to generate input light pulses, and diffuser-free speckle reduction optics that...
9012873 Treatment planning system, device for calculating a scanning path and particle therapy system  
In a particle therapy treatment planning system for creating treatment plan data, the movement of a target (patient's affected area) is extracted from plural tomography images of the target, and...
9006691 Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block  
A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in...
9001387 Drawing apparatus, data processing method, and method of manufacturing article that transform partially overlapping regions using different transformation rules  
A drawing apparatus performs drawing on a first partial region and a second partial region. The first and second partial regions having an overlap region in which the first and second partial...
8993985 Drawing apparatus and method of manufacturing article  
The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality...
8981321 Charged-particle beam exposure apparatus and method of manufacturing article  
A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate...
8975601 Method and apparatus for electron beam lithography  
A method of manufacturing a wafer with an integrated circuit (IC) layout includes receiving a first plurality of pixels, wherein each of the pixels corresponds to a portion of the IC layout and...
8975599 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus  
The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a...
8969836 Method and apparatus for electron beam lithography  
A system using an energy beam to expose patterns on a wafer includes first mirror elements, a multiplexer element, and second mirror elements. The first and second mirror elements are dynamically...
8969837 Multi charged particle beam writing method, and multi charged particle beam writing apparatus  
A multi charged particle beam writing method includes dividing a maximum irradiation time per a shot into a digit number of first irradiation time periods, each of which is calculated by...
8952343 System and method for automated cyclotron procedures  
Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization...
8933425 Apparatus and methods for aberration correction in electron beam based system  
One embodiment relates to an apparatus for aberration correction in an electron beam lithography system. An inner electrode surrounds a pattern generating device, and there is at least one outer...
8933421 Halo monitor in rotatable gantry for particle beam positioning  
A particle beam therapy system including an accelerator for making a beam of charged particles available, a beam guiding unit supplying the beam to a treatment location starting from the...
8927946 System and method for layer-wise proton beam current variation  
Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment...
8927947 Systems and methods providing electron beam writing to a medium  
A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The...
8927948 Particle beam system and method for operating the same  
A particle beam system includes a charged particle beam source, a beam blanking module connectable to a data network, a focusing lens, a first beam deflection module connectable to the data...
8927945 Drawing apparatus and method of manufacturing article by controlling drawing on shot region side of boundary of shot regions  
A drawing apparatus performs drawing, with an array of charged particle beams, on shot regions arrayed on a substrate in a direction in parallel and with intervention of step movement of the...
8921758 Modulation device and charged particle multi-beamlet lithography system using the same  
The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning...
8918746 Cut mask aware contact enclosure rule for grating and cut patterning solution  
Methodologies and an apparatus enabling a selection of design rules to improve a density of features of an IC design are disclosed. Embodiments include: determining a feature overlapping a grating...
8916837 Charged particle lithography system with intermediate chamber  
A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a source for generating a charged particle beam, a first chamber housing the source, a...
8907306 Multi charged particle beam writing apparatus and multi charged particle beam writing method  
In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form...
8907300 System and method for plasma control using boundary electrode  
An ion source may include a chamber configured to house a plasma comprising ions to be directed to a substrate and an extraction power supply configured to apply an extraction terminal voltage to...
8901519 Quick regulation of the range of high-energy ion beams for precision irradiation of moving target volumes  
The invention concerns a device and a process for adjusting the range of an ion beam, in particular for irradiation in tumor therapy. For this purpose, first the reference position of a target...
8890095 Reliability in a maskless lithography system  
A maskless lithography system for transferring a pattern onto a surface of a target. At least one beamlet optical unit generates a plurality of beamlets. At least one measuring unit measures...
8890096 Measuring/inspecting apparatus and measuring/inspecting method enabling blanking control of electron beam  
Technique capable of achieving shortening of settling time, which is caused by ringing, etc. of a blanking control signal is provided. A measuring/inspecting apparatus is configured to have a main...
8890069 Method for detecting defect of substrate  
A method for detecting defects includes irradiating at least one electron beam into a first region of a substrate, irradiating at least one electron beam into a second region electrically...
8890093 Charged particle beam apparatus and method for forming observation image  
A focused ion beam apparatus includes a lens interferometer configured to detect a relative position of an ion beam column and a sample. An image forming section includes an irradiation position...
8884254 Charged particle beam writing apparatus  
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of...
8884224 Charged particle beam imaging assembly and imaging method thereof  
A method for enhancing the quality of a charged particle microscopic image of a sample is disclosed. The image is formed by a charged particle beam imaging system. The method comprising: scanning,...
8878143 Electron beam lithography device and lithographic method  
A high-accuracy and high-speed lithographic pattern is acquired by forming a square lattice matrix beam group with an interval which is an integral multiple of a beam size in a two-dimensional...
8872141 Charged particle beam writing apparatus and charged particle beam writing method  
A apparatus according to an embodiment includes a unit to generate first blocks in a writing region in which at least one of writing groups respectively using different base doses is to be...
8872139 Settling time acquisition method  
A settling time acquisition method includes writing at least one reference pattern formed by at least one shot of a charged particle beam, writing an evaluation pattern, which has been formed by...
8859983 Method of and system for exposing a target  
The invention relates to a method of exposing a target by means of a plurality of beamlets. First, a plurality of beamlets is provided. The beamlets are arranged in an array. Furthermore, a target...
8859997 Charged particle beam writing apparatus and charged particle beam writing method  
A charged particle beam writing apparatus includes an unit to measure height positions of a substrate, an unit to input a position dependent height distribution obtained by converting each...
8852849 Electron beam lithography system and method for improving throughput  
An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension;...
8852831 Device for manufacturing a surface using character projection lithography with variable magnification  
A device for charged particle beam lithography is disclosed which includes an inputting device, a character projection stencil and a reducing lens. The inputting device reads a set of shots, where...
8835881 Drift correction method and pattern writing data generation method  
A writing area of a sample is divided into a plurality of stripes having a width corresponding to an area density of a pattern to be written on the sample with a charged-particle beam. The writing...
8835868 Multi charged particle beam writing apparatus  
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which...
8829465 Charged particle beam lens having a particular support electrically insulating first and second electrodes from each other  
A charged particle beam lens includes a first electrode including a surface having at least one aperture and a second electrode including a surface having at least one aperture. A support...
8816276 Electron beam writing apparatus and electron beam writing method  
An electron beam writing apparatus comprising a XY stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an...
8803108 Method for acquiring settling time  
A method for acquiring a settling time according to an embodiment, includes writing a plurality of first patterns, arranged in positions apart from each other by a deflection movement amount, by...
8803111 Sample preparation apparatus and sample preparation method  
Provided is an apparatus for preparing a sample including: a sample stage that supports a sample; a focused ion beam column that applies a focused ion beam to the same sample and processes the...
8796650 Charged particle beam drawing method and apparatus  
A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle...
8796651 Method and apparatus for specimen fabrication  
A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of...
8796645 Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display  
An exposure apparatus for a photoalignment process includes; a first photomask including a plurality of transmission parts; and a second photomask including a plurality of transmission parts,...
8796648 Treatment planning system, device for calculating a scanning path and particle therapy system  
In a particle therapy treatment planning system for creating treatment plan data, the movement of a target (patient's affected area) is extracted from plural tomography images of the target, and...
8790498 Method and device for ion beam processing of surfaces  
A method and device for ion beam processing of surfaces of a substrate positions the substrate to face an ion beam, and a new technologically-defined pattern of properties is established....