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8183544 |
Correcting substrate for charged particle beam lithography apparatus
A correcting substrate for a charged particle beam lithography apparatus includes a substrate body using a low thermal expansion material having a thermal expansion lower than that of a silicon...
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8183543 |
Multi-beam source
A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of...
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8183545 |
Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing
There is provided a charged particle beam writing apparatus in which data processing is optimized by automatically dividing process regions on which parallel distributed processing is performed. A...
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8183546 |
Ion implantation through laser fields
Ions are generated and directed toward a workpiece. A laser source generates a laser that is projected above the workpiece in a line. As the laser is generated, a fraction of the ions are blocked...
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8178856 |
Charged particle beam writing apparatus and method thereof
A charged particle beam writing apparatus includes a charge amount distribution calculation unit configured to calculate a charge amount distribution which is charged by irradiation of a charged...
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8178855 |
Variable spatial beam modulator
For use with an irradiation system including a radiation source operable to produce a radiation beam towards a target, a beam modulator including a flexible, deformable container at least partially...
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8173335 |
Beam ablation lithography
Provided are beam ablation lithography methods capable of removing and manipulating material at the nanoscale. Also provided are nanoscale devices, nanogap field effect transistors, nano-wires,...
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8173978 |
Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n×m matrix. A voltage ...
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8173977 |
Laser irradiation apparatus and laser irradiation method
It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method that increase energy intensity distribution in a region having low energy intensity...
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8168961 |
Charged particle beam masking for laser ablation micromachining
An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A...
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8168962 |
Method and apparatus for uniformly implanting a wafer with an ion beam
Initially, an ion beam is formed as an elongated shape incident on a wafer, where the shape has a length along a first axis longer than a diameter of the wafer, and a width along a second axis...
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8168960 |
Method for the production of a sample for electron microscopy
A probe (1) for electron microscopy is cut from a solid material. A sample surface (3) is configured on the same, which is treated with an ion beam (J) at a predetermined angle of incidence such...
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8153996 |
Pattern forming apparatus and pattern forming method
A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target...
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8148702 |
Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns
The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in...
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8143602 |
High-volume manufacturing massive e-beam maskless lithography system
The present disclosure provides a maskless lithography apparatus. The apparatus includes a plurality of writing chambers, each including: a wafer stage operable to secure a wafer to be written and...
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8134135 |
Multiple beam charged particle optical system
The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size...
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8129698 |
Charged-particle beam writing method and charged-particle beam writing apparatus
A pattern density distribution and a dose distribution calculated using the pattern density distribution are multiplied by each other to calculate an exposure distribution. A fogging electron...
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8115183 |
Method for maskless particle-beam exposure
For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern...
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8101928 |
Deflection signal compensation for charged particle beam
Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals...
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8097847 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles,...
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8089044 |
Method for correcting astigmatism in electron emission spectromicroscopy imaging
A method for correcting astigmatism of an electronic optical column of an electron emission spectromicroscope, comprising the steps of: forming a reference structure on a surface of a sample...
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8089051 |
Electron reflector with multiple reflective modes
One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is...
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8080809 |
Charged particle beam writing apparatus and method thereof
A charged particle beam writing apparatus includes a unit emitting a charged particle beam, a stage on which a target workpiece to be written is placed, a unit correcting a reference position of a...
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8080814 |
Method for improving implant uniformity during photoresist outgassing
A method and apparatus is provided for improving implant uniformity of an ion beam experiencing pressure increase along the beam line. The method comprises generating a main scan waveform that...
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8076656 |
Writing apparatus and writing data conversion method
A writing apparatus includes a storage unit configured to store writing data, an acquiring unit configured to acquire information on a pattern defined based on the writing data, a selecting unit...
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8076641 |
Method and device for producing an image
The invention relates to a method and to a device (1) for producing an image of an object (5) by means of a particle beam. According to the method and in the device (1), the particle beam is...
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8076649 |
Charged particle beam writing apparatus and optical axis deviation correcting method for charged particle beam
A charged particle beam writing apparatus includes a stage on which a target object is placed; an emitting unit configured to emit a charged particle beam to the stage side; a blocking unit...
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8071943 |
Mask inspection apparatus and image creation method
Provided is a mask inspection apparatus including: emitting unit for emitting electron beams onto a sample; electron detecting unit for detecting the quantity of electrons produced, by the emission...
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8067752 |
Semiconductor testing method and semiconductor tester
A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment...
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8049191 |
Method of transferring pattern of reticle, computer readable storage medium, and method of manufacturing device
A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second...
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8049189 |
Charged particle system
A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a...
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8049190 |
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
When writing the shapes of elements of a fine pattern on a substrate by microscopically vibrating the electron beam back and forth in a radial direction of the substrate or in a direction...
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8049192 |
Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter
An ion beam blocking array configured to provide a mechanical means for adjusting the beam current profile of an ion ribbon beam by blocking the beam current at one or more locations across the...
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8043652 |
Method and apparatus for aligning patterns on a substrate
A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that...
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8044372 |
Laser apparatus, laser irradiation method, semiconductor manufacturing method, semiconductor device, and electronic equipment
Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a...
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8030626 |
Apparatus and method for charged-particle beam writing
An average write speed M is calculated by averaging write speeds for blocks of a tentative block size La, and write speed variation σ of the blocks with respect to the average write speed M is ...
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8030620 |
System and method for nano-pantography
A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a...
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8030625 |
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a...
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8026495 |
Charged particle beam exposure system
A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers...
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8022376 |
Method for manufacturing semiconductor device or photomask
A method for manufacturing a semiconductor device or a photomask by exposing a pattern while scanning a plurality of deflection regions determined depending on a deflection width of an exposure...
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8017295 |
Laser induced thermal imaging apparatus and laser induced thermal imaging method and organic light emitting display device using the same
A laser induced thermal imaging (LITI) apparatus, an LITI method, and an organic light emitting display (OLED) device. An LITI apparatus for forming a light emitting layer of an OLED device...
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8013315 |
Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same
A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from...
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8008636 |
Ion implantation with diminished scanning field effects
Ion implantation systems and scanning systems are provided, in which a focus adjustment component is provided to adjust a focal property of an ion beam to diminish zero field effects of the scanner...
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8008631 |
Method of acquiring offset deflection amount for shaped beam and lithography apparatus
A method of acquiring an offset deflection amount for a shaped beam, includes forming reference images of first and second figures which can be shaped by first and second aperture plates placed on...
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8003300 |
Methods for fabricating complex micro and nanoscale structures and electronic devices and components made by the same
This invention provides processing steps, methods and materials strategies for making patterns of structures for electronic, optical and optoelectronic devices. Processing methods of the present...
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8003940 |
Tool-to-tool matching control method and its system for scanning electron microscope
A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning...
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8003952 |
Integrated deflectors for beam alignment and blanking in charged particle columns
A charged particle beam column package includes an assembly (e.g., comprising a plurality of layers, which can have a component coupled to one of the layers), and at least one deflector between an...
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7989777 |
Method for inspecting settling time of deflection amplifier, and method for judging failure of deflection amplifier
A method for inspecting a settling time of a deflection amplifier includes setting a settling time, performing shooting a plurality of times alternately to project two patterns of different types...
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7985958 |
Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program
According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section...
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7985957 |
Methods for concealing surface defects
Methods for removing random or uncontrolled surface defects from a work piece surface are provided, by applying a plurality of induced controlled defects over the random defects to alter the...
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