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Match Document Document Title
7312463 Projection optical system, exposure apparatus, and exposure method  
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging...
7312462 Illumination system having a nested collector for annular illumination of an exit pupil  
There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a...
7312449 Electron beam system and method of manufacturing devices using the system  
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for...
7309870 Projection optical system, exposure apparatus, and exposure method  
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging...
7309869 Lithographic apparatus, device manufacturing method and radiation system  
A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured...
7307263 Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap  
A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system...
7307253 Scanning electron microscope  
In a scanning electron microscope having the function of observing an attentional object on a specimen, an error in an in-focus position can be corrected at high speeds. When moving the field of...
7304320 Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device  
A charged beam exposure apparatus includes: a first shaping aperture provided with a plurality of rectangular openings which are different from each other in at least one of area and shape thereof;...
7304318 System and method for maskless lithography using an array of sources and an array of focusing elements  
A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an...
7301623 Transferring, buffering and measuring a substrate in a metrology system  
A chuck that clamps a substrate to the top surface using, e.g., a vacuum, electrostatic force, or other appropriate means, includes a plurality of lift pins that can raise the substrate off the top...
7301159 Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same  
A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with...
7297966 Utilizing an integrated plasmon detector to measure a metal deposit roughness on a semiconductor surface  
A method for monitoring the surface roughness of a metal, comprises impinging a laser beam onto the surface of a metal layer to induce the formation of a plasmon therein, and monitoring a current...
7297965 Method and apparatus for sample formation and microanalysis in a vacuum chamber  
Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron...
7297948 Column simultaneously focusing a particle beam and an optical beam  
The invention concerns a column for producing a focused particle beam comprising: a device ( 100 ) focusing particles including an output electrode ( 130 ) with an output hole ( 131 ) for allowing...
7297947 Apparatus and method for evaluating cross section of specimen  
An apparatus for evaluating a cross section of a specimen in a specimen chamber, wherein the apparatus includes a specimen stage for placing the specimen, a temperature regulation unit for...
7294844 Lithographic apparatus, device manufacturing method, and device manufactured thereby  
A lithographic apparatus is presented that provides versatile processing time and accuracy selection. The apparatus includes a substrate holder configured to hold a substrate; a radiation system...
7291850 Lithographic apparatus and device manufacturing method  
A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon...
7289657 Method of inspecting photo-mask  
Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask...
7288774 Transverse magnetic field voltage isolator  
An SEM wherein the entire imaging apparatus of the SEM is supported on air bearings. A multi-stage differentially pumped vacuum seal area provides a localized vacuum zone for wafer examination. A...
7288763 Method of measurement accuracy improvement by control of pattern shrinkage  
A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the...
7286206 Exposure apparatus  
An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a...
7285792 Scratch repairing processing method and scanning probe microscope (SPM) used therefor  
A sample to be processed is disposed within a processing cell which contains a liquid. Scratch processing using a scanning probe microscope is performed within the liquid so that chips or shavings...
7285780 Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system  
With a detector system for the specimen chamber of a scanning electron microscope, signals are simultaneously detected in transmission which signals correspond to a light field contrast and a dark...
7283201 Devices and methods for sensing secure attachment of an object onto a chuck  
Stage devices are disclosed for holding an object such as a reticle for use in microlithography. An exemplary stage device includes a movable object-holder that holds the object. At least one...
7282725 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask  
A manufacturing apparatus of a semiconductor device is disclosed, which comprises an implantation source which applies particles or an electromagnetic wave into an implantation region of a...
7282702 Ion neutralizer  
An ion neutralizer enhances a heat transfer rate between a reflecting plate and a frame while preventing the reflecting plate from being bent due to thermal deformation. The ion neutralizer...
7279690 Lithographic apparatus and device manufacturing method  
A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas...
7276714 Advanced pattern definition for particle-beam processing  
In a pattern definition device for use in a particle-beam processing apparatus a plurality of apertures ( 21 ) are arranged within a pattern definition field (pf) wherein the positions of the...
7276710 Light source unit and exposure apparatus having the same  
A light source unit supplies the light radiated from the plasma, and includes a stabilizer for reducing a fluctuation of a position of the light radiated from the plasma.
7276709 System and method for electron-beam lithography  
To achieve high-resolution lithography, the temperature of a sample is controlled with heater wires during electron-beam lithography, the adverse effect of a magnetic field induced by the heater...
7276707 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus  
A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the...
7271400 Methods, apparatus, and systems involving ion beam generation  
A high-perveance steady state deuterium ion gun was developed using a magnetic-index resonator in an Inductive Coupling Radio Frequency (ICRF) configuration. This approach made it feasible to...
7271399 Manipulator assembly in ion implanter  
A manipulator assembly in an ion implanter comprises a ground electrode, a first suppression electrode located on a first side of the ground electrode facing an ion source device for producing ion...
7268357 Immersion lithography apparatus and method  
Disclosed is an immersion lithography system comprising a liquid crystal media. The liquid crystal is positioned between an objective lens and a substrate stage. A liquid crystal controller having...
7266802 Drawing apparatus and drawing method  
A drawing apparatus, for forming a desired drawing pattern by drawing the pattern directly on a drawing target surface using a drawing engine equipped with a plurality of drawing devices arranged...
7265366 Lithographic apparatus and device manufacturing method  
A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and...
7265364 Level sensor for lithographic apparatus  
A level sensor for a lithographic projection apparatus includes a light source configured to direct light onto a substrate to be measured, a detector configured to detect light reflected from the...
7262423 Radiation system and lithographic apparatus  
A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV...
7262422 Use of supercritical fluid to dry wafer and clean lens in immersion lithography  
Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an...
7262408 Process and apparatus for modifying a surface in a work region  
An apparatus and process for manufacturing changes of a substrate in a work region which is 100×100×100 microns or smaller is described. The apparatus uses a plasma source adjacent to the work...
7259373 Apparatus and method for controlled particle beam manufacturing  
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream...
7256407 Lithographic projection apparatus and reflector assembly for use therein  
A lithographic projection apparatus includes reflector assembly, a foil trap, and a housing that is constructed and arranged to contain the reflector assembly and the foil trap. The reflector...
7256405 Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method  
An object of the present invention is to provide a sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method, which can reduce an edge roughness...
7253424 Method of implanting a substrate and an ion implanter for performing the method  
An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround...
7253417 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens  
The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are...
7251012 Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris  
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning...
7250620 EUV lithography filter  
Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The filter comprises a nanotube material layer sandwiched by two...
7250617 Ion beam neutral detection  
An ion beam neutral detector system, an ion implanter system including the detector system and a method of detecting ion beam neutrals that ensures an ion implant is meeting contamination...
7250616 Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method  
A temperature adjustment apparatus for adjusting the temperature of an optical member includes a first radiation mechanism, with a first radiation member, that transfers the radiation heat between...
7248667 Illumination system with a grating element  
An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged...
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