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7391039 |
Semiconductor processing method and system
A secondary electron image generated by an electron beam is detected by a secondary electron/secondary ion detector while a silicon substrate is etched by a focused ion beam from a back surface of...
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7391038 |
Technique for isocentric ion beam scanning
A technique for isocentric ion beam scanning is disclosed. In one particular exemplary embodiment, the technique may be realized by an apparatus for isocentric ion beam scanning. The apparatus may...
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7391036 |
Sample surface inspection apparatus and method
The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the...
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7391033 |
Skew-oriented multiple electron beam apparatus and method
One embodiment described relates to a multiple electron beam apparatus. Multiple columns are arranged in a row configured to generate multiple electron beams. A mechanism is included for...
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7388215 |
Pattern drawing method, stamper manufacturing method, and pattern drawing apparatus
A pattern drawing method capable of drawing a pattern such that opposite ends of a formation region on an inner periphery side and an outer periphery side are substantially linearly formed. A...
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7388214 |
Charged-particle beam exposure apparatus and method
A charged particle beam exposure apparatus which splits a charged-particle beam from a charged-particle beam source into a plurality of charged-particle beams by a plurality of apertures formed in...
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7388213 |
Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation
We have developed a method of registration of a particle beam to internal alignment targets present within photoresist areas which are to be imaged. The method does not affect the photoresist, so...
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7385212 |
Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus
A light source unit of EUV light is provided as a light source unit comprising a plasma light source for emitting EUV light, a collective mirror which has a reflecting surface of an ellipsoid of...
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7385208 |
Systems and methods for implant dosage control
A system for implantation dosage control. A first interface receives scan position information. A second interface receives beam current information specifying a first beam current value between...
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7385194 |
Charged particle beam application system
An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to measure...
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7385183 |
Substrate processing apparatus using neutralized beam and method thereof
In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle;...
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7381943 |
Neutral particle beam processing apparatus
The present invention relates to a neutral particle beam processing apparatus. More specifically, the present invention relates to a neutral particle beam processing apparatus comprising a plasma...
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7378668 |
Method and apparatus for applying charged particle beam
In a charged particle beam applying apparatus such as an electron beams lithography system, there is a technology that facilitates positional adjustment of a crossover and improves throughput of...
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7377228 |
System for and method of gas cluster ion beam processing
System and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components. Larger GCIB current transport is enabled by low energy...
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7375356 |
Electron-beam exposure system
An electron-beam exposure system includes: density-per-area map generating means configured to divide a certain area on which an electron beam is irradiated into meshes, to figure out a ratio of an...
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7375355 |
Ribbon beam ion implanter cluster tool
An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are...
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7375353 |
Lithographic apparatus and device manufacturing method
An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus....
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7375352 |
Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
In order to make it possible to improve throughput of AFM scratch processing, enable correction of small defects in clear defect correction with a high degree of precision, and enable correction in...
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7375351 |
Micro-column electron beam apparatus
Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens module can be fixed, mounted in a central portion of the base; an electron...
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7375328 |
Charged particle beam apparatus and contamination removal method therefor
A charged particle beam apparatus comprising a preparatory evacuation chamber ( 15 in FIG. 1 A) into which a sample ( 12 ) is conveyed and which is preliminarily evacuated, an ultraviolet...
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7375327 |
Method and device for measuring quantity of wear
A method and device to accurately obtain very small quantity of wear of the order of nanometers of a protective film on the surface of a sliding member. A quantity of wear on the surface of a...
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7375323 |
Electron beam apparatus with aberration corrector
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a...
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7372690 |
Substrate holder which is self-adjusting for substrate deformation
A wafer chuck is designed to allow the substrate to thermally deform during charged particle beam lithography. The wafer chuck includes a compliant layer disposed over an chuck body. During...
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7372283 |
Probe navigation method and device and defect inspection device
A probe navigation method, a navigation device, and a defect inspection device wherein in a charged particle beam system provided with probes for electrical characteristics evaluation, probing can...
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7372052 |
Electron beam method and apparatus for reducing or patterning the birefringence of halogenated optical materials
A controlled electron beam and heat will decrease the birefringence of a halogenated optical material under tensile stress. The electron beam and heat irradiation will occur in a chamber under near...
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7372049 |
Lithographic apparatus including a cleaning device and method for cleaning an optical element
An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication...
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7372047 |
Charged particle system and a method for measuring image magnification
A charged particle beam apparatus capable of automatically measuring an image magnification error of an apparatus and capable of automatically calibrating the image magnification in high precision...
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7368744 |
Photon sieve for optical systems in micro-lithography
The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color...
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7368742 |
Arrangement and method for metering target material for the generation of short-wavelength electromagnetic radiation
The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X...
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7368735 |
Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method
Drawing-data creating method includes selecting charged beam drawing-apparatus dividing drawing area into main fields, subfields and unit fields (U-fields), dividing design data (D-data)...
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7368733 |
Contamination barrier and lithographic apparatus comprising same
A rotatable contamination barrier for use with an EUV radiation system is disclosed. The contamination barrier has a blade structure configured to trap contaminant material coming from a radiation...
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7368731 |
Method and apparatus which enable high resolution particle beam profile measurement
The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five...
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7368713 |
Method and apparatus for inspecting semiconductor device
A method and apparatus for inspecting a wafer during a semiconductor device fabrication process. The apparatus performs, only via observation from the wafer's top surface, inspection and...
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7365345 |
Lithographic apparatus, radiation system and filter system
A filter system for filtering debris particles out of a predetermined cross-section of the radiation emitted by a radiation source of a lithographic apparatus includes a first set of foils and a...
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7365324 |
Testing apparatus using charged particles and device manufacturing method using the testing apparatus
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover...
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7365320 |
Methods and systems for process monitoring using x-ray emission
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that analyze...
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7362416 |
Exposure apparatus, evaluation method and device fabrication method
An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source part that includes a generating mechanism for generating a plasma, a condenser...
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7361915 |
Beam current stabilization utilizing gas feed control loop
One or more aspects of the present invention pertain to stabilizing the current or density of an ion beam within an ion implantation system by selectively adjusting a lone parameter of feed gas...
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7361914 |
Means to establish orientation of ion beam to wafer and correct angle errors
One or more aspects of the present invention pertain to a measurement component that facilitates determining a relative orientation between an ion beam and a workpiece. The measurement component is...
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7361913 |
Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control
An ion implanter includes a source of a stationary, planar ion beam, a set of beamline components that steer the ion beam along a normal beam path as determined by first operating parameter values,...
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7361910 |
Movable stage apparatus
A movable stage apparatus includes a reticle stage on which a reflecting reticle is to be mounted, in which when a space is divided by a plane including a reflection surface of the reticle, a guide...
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7361909 |
Method and apparatus for correcting drift during automated FIB processing
A method and apparatus for correcting drift of the beam irradiation position during automated FIB (focused ion beam) processing with a reference image-setting unit, an image read-in unit for...
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7361898 |
Scanning electron microscope and CD measurement calibration standard specimen
A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the...
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7361897 |
Imaging apparatus for high probe currents
An imaging apparatus is provided, comprising a first lens, a Wien filter having a first opening and a second opening, and further comprising a 2*m-pole element, m≧2, and a second lens, wherein...
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7358510 |
Ion implanter with variable scan frequency
An ion implanter includes an ion beam generator configured to generate an ion beam, a scanner configured to scan the ion beam in at least one direction at a scan frequency, and a controller. The...
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7358508 |
Ion implanter with contaminant collecting surface
An ion implanter includes an ion source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to...
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7358495 |
Standard reference for metrology and calibration method of electron-beam metrology system using the same
An electron-beam metrology system includes a specimen stage to mount a specimen on which a device pattern is formed, electron optics to radiate the device pattern with an electron-beam, a secondary...
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7358493 |
Method and apparatus for automated beam optimization in a scanning electron microscope
A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM)....
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7358491 |
Method and apparatus for the depth-resolved characterization of a layer of a carrier
The present invention relates to a method for the depth-resolved characterization of a layer of a carrier. This involves firstly producing a cutout in the layer of the carrier with a sidewall and...
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7356240 |
Processing method of polymer crystal, processing system of polymer crystal, and observation system of polymer crystal
The ultraviolet short-pulse laser light emitted from the ultraviolet short-pulse laser light source 1 is focused on and caused to irradiate a macromolecular crystal 8 contained in a sample...
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