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7358508 |
Ion implanter with contaminant collecting surface
An ion implanter includes an ion source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to...
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7358493 |
Method and apparatus for automated beam optimization in a scanning electron microscope
A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM)....
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7356240 |
Processing method of polymer crystal, processing system of polymer crystal, and observation system of polymer crystal
The ultraviolet short-pulse laser light emitted from the ultraviolet short-pulse laser light source 1 is focused on and caused to irradiate a macromolecular crystal 8 contained in a sample...
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7355187 |
Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate
An apparatus which exposes a substrate to radiant energy includes a unit which holds a first mask having a pattern which includes a pattern of a target mark, a unit which projects a pattern of...
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7355192 |
Adjustable suspension assembly for a collimating lattice
According to one aspect of the invention a plasma-based substrate processing apparatus comprises a collimator holding device, which efficiently and accurately positions a collimator over a...
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7352842 |
X-ray generator and exposure apparatus having the same
An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light...
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7351968 |
Multi-pixel electron emission die-to-die inspection
One embodiment disclosed is a method of detecting defects in objects. A selected surface area of an object is inspected with a multi-pixel electron microscope, and first set of data is generated...
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7351971 |
Charged-particle beam instrument and method of detection
A charged-particle beam instrument and method are offered which can inspect side and rear surfaces of the outer periphery of a specimen. The instrument has a source of the charged-particle beam and...
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7351986 |
Method and apparatus for reducing cross contamination of species during ion implantation
A wafer support for an ion implanter includes a wafer holder and a support arm for the holder in the implant chamber. A portion of the support arm adjacent the wafer holder is at least...
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7351988 |
Beam allocation apparatus and beam allocation method for medical particle accelerators
The invention relates to a beam allocation apparatus ( 21 ) for medical particle accelerators and also to a beam allocation method. This beam allocation apparatus ( 21 ) should manage a plurality...
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7348129 |
Electron beam processing method and apparatus
An organic material film formed on a surface of an object to be processed is cured by electron beams irradiated thereon through a hydrocarbon radical generating gas. By employing the electron beams...
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7345289 |
Sample support prepared by semiconductor silicon process technique
A sample support of the present invention is prepared such that a silicon substrate is used as a raw material, the thickness structure having a shape and a thickness of 10 μm or less is prepared...
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7345290 |
Lens array for electron beam lithography tool
A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a...
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7342241 |
Method and apparatus for electron-beam lithography
The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric...
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7342239 |
Ion implanation method and device using thereof
An ion implantation method and device for forming an ion implantation area in a predetermined area of a substrate is provided. The method comprises the following steps. First, an ion beam is...
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7341393 |
Mechanism for sealing
A mechanism for connecting first and second members through a sealing member sandwiched therebetween includes a position adjustment portion which adjusts a position of the first member in a...
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7342238 |
Systems, control subsystems, and methods for projecting an electron beam onto a specimen
Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The...
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7339179 |
Technique for providing a segmented electrostatic lens in an ion implanter
A technique for providing a segmented electrostatic lens in an ion implanter is disclosed. In one particular exemplary embodiment, the technique may be realized as an electrostatic lens for use in...
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7332731 |
Radiation system and lithographic apparatus
A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a...
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7329883 |
Electron beam lithography device and drawing method using electron beams
In an electron beam lithography apparatus, when a plotting pattern is an isolated fine pattern, an exposure energy upon plotting lacks. In the prior art set forth above, dimension dependent...
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7329884 |
Exposure apparatus and exposure method
An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting...
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7326940 |
Exposure apparatus, exposure method and semiconductor device production method
An exposure method and a semiconductor device production method that control a rise in temperature of a mask irradiated by a charged particle beam. A displacement of the position of a pattern...
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7326942 |
Ion beam system and machining method
There is a machining method which shortens a cross-section forming time by an ion beam, a machining method which shortens a machining time for separating a micro sample from a wafer, and an ion...
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7323698 |
Thermally insulated thermophoretic plate
A subsystem for an exposure apparatus has a thermophoretic plate and at least one shielding layer covering a first surface of the thermophoretic plate. The at least one shielding layer controls...
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7323821 |
Device for generating and/or influencing electromagnetic radiation from a plasma
A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects...
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7321126 |
Collector with fastening devices for fastening mirror shells
There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength...
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RE40009 |
Methods and apparatus for adjusting beam parallelism in ion implanters
Methods and apparatus for implanting ions in a workpiece, such as a semiconductor wafer, include generating an ion beam, measuring parallelism of the ion beam, adjusting the ion beam for a desired...
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7319509 |
Attenuator for attenuating wavelengths unequal to a used wavelength
There is provided an attenuator for attenuating electromagnetic radiation of wavelengths Unequal to a used wavelength, including a grating element having i) grating grooves that produce a grating...
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7319316 |
Apparatus for measuring a set of electrical characteristics in a plasma
A probe apparatus configured to measure a set of electrical characteristics in a plasma processing chamber, the plasma processing chamber including a set of plasma chamber surfaces configured to be...
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7317523 |
Method for calibrating a metrology tool and a system
A method for calibrating a metrology tool, the method includes: determining a relationship between an upper portion of a milled reference structural element and between a lower portion of the...
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7315033 |
Method and apparatus for reducing biological contamination in an immersion lithography system
Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting...
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7312449 |
Electron beam system and method of manufacturing devices using the system
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for...
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7312462 |
Illumination system having a nested collector for annular illumination of an exit pupil
There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a...
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7307263 |
Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system...
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7304318 |
System and method for maskless lithography using an array of sources and an array of focusing elements
A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an...
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7304320 |
Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device
A charged beam exposure apparatus includes: a first shaping aperture provided with a plurality of rectangular openings which are different from each other in at least one of area and shape thereof;...
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7301623 |
Transferring, buffering and measuring a substrate in a metrology system
A chuck that clamps a substrate to the top surface using, e.g., a vacuum, electrostatic force, or other appropriate means, includes a plurality of lift pins that can raise the substrate off the top...
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7301159 |
Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same
A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with...
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7297966 |
Utilizing an integrated plasmon detector to measure a metal deposit roughness on a semiconductor surface
A method for monitoring the surface roughness of a metal, comprises impinging a laser beam onto the surface of a metal layer to induce the formation of a plasmon therein, and monitoring a current...
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7297947 |
Apparatus and method for evaluating cross section of specimen
An apparatus for evaluating a cross section of a specimen in a specimen chamber, wherein the apparatus includes a specimen stage for placing the specimen, a temperature regulation unit for...
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7297965 |
Method and apparatus for sample formation and microanalysis in a vacuum chamber
Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron...
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7291850 |
Lithographic apparatus and device manufacturing method
A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon...
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7289657 |
Method of inspecting photo-mask
Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask...
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7288763 |
Method of measurement accuracy improvement by control of pattern shrinkage
A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the...
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7288774 |
Transverse magnetic field voltage isolator
An SEM wherein the entire imaging apparatus of the SEM is supported on air bearings. A multi-stage differentially pumped vacuum seal area provides a localized vacuum zone for wafer examination. A...
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7285792 |
Scratch repairing processing method and scanning probe microscope (SPM) used therefor
A sample to be processed is disposed within a processing cell which contains a liquid. Scratch processing using a scanning probe microscope is performed within the liquid so that chips or shavings...
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7285780 |
Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system
With a detector system for the specimen chamber of a scanning electron microscope, signals are simultaneously detected in transmission which signals correspond to a light field contrast and a dark...
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7282725 |
Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask
A manufacturing apparatus of a semiconductor device is disclosed, which comprises an implantation source which applies particles or an electromagnetic wave into an implantation region of a...
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7282702 |
Ion neutralizer
An ion neutralizer enhances a heat transfer rate between a reflecting plate and a frame while preventing the reflecting plate from being bent due to thermal deformation. The ion neutralizer...
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7283201 |
Devices and methods for sensing secure attachment of an object onto a chuck
Stage devices are disclosed for holding an object such as a reticle for use in microlithography. An exemplary stage device includes a movable object-holder that holds the object. At least one...
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