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7453074 |
Ion implanter with ionization chamber electrode design
An ion implanter includes an ion source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to...
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7453059 |
Technique for monitoring and controlling a plasma process
A time-of-flight ion sensor for monitoring ion species in a plasma includes a housing. A drift tube is positioned in the housing. An extractor electrode is positioned in the housing at a first end...
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7453072 |
Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
Certain film deposition and selective etching technology may involve scanning of a charged particle beam along with a deposition gas and etching gas, respectively. In conventional methods,...
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7449699 |
Method and apparatus for creating a topography at a surface
Methods and apparatus whereby an optical interferometer is utilized to monitor and provide feedback control to an integrated energetic particle column, to create desired topographies, including the...
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7449700 |
Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device
An electron beam exposure apparatus has a first shaping aperture having a plurality of rectangular openings, each having sizes different from each other and shaping a beam shape of an electron...
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7446325 |
Reflector for generating a neutral beam and substrate processing apparatus including the same
Example embodiments of the present invention provide a reflector for generating a neutral beam and a substrate processing apparatus including the same. The reflector may include at least one...
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7442944 |
Ion beam implant current, spot width and position tuning
An ion beam tuning method, system and program product for tuning an ion implanter system are disclosed. The invention obtains an ion beam profile of the ion beam by, for example, scanning the ion...
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7442924 |
Repetitive circumferential milling for sample preparation
A method of sample extraction entails making multiple, overlapping cuts using a beam, such as a focused ion beam, to create a trench around a sample, and then undercutting the sample to free it....
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7439525 |
Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus
A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system,...
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7439502 |
Electron beam apparatus and device production method using the electron beam apparatus
The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of...
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7435978 |
System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device
A system for correcting a charged particle beam lithography condition including: an error calculation unit configured to calculate an error in an illumination position of a charged particle beam,...
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7435973 |
Material processing system and method
A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a...
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7435977 |
Ion beam angle measurement systems and methods for ion implantation systems
Angle of incidence measurements along an axis of ion implantation are obtained by employing positive and negative slot structures. The positive slot structures have entrance openings, exit...
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7435956 |
Apparatus and method for inspection and testing of flat panel display substrates
A charged particle optical system for testing, imaging or inspecting substrates comprises: a charged particle optical assembly configured to produce a line of charged particle beams equally spaced...
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7435960 |
Charged particle beam apparatus
A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for...
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7432513 |
Gas shower, lithographic apparatus and use of a gas shower
A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical...
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7429740 |
Electric-magnetic field-generating element and assembling method for same
An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some...
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7427764 |
Laser crystallization apparatus and laser crystallization method
A laser crystallization apparatus which capable of correcting both shift in imaging position caused by thermal lens effect of the imaging optical system and shift due to flatness of the substrate...
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7427765 |
Electron beam column for writing shaped electron beams
An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a...
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7425713 |
Synchronous raster scanning lithographic system
A multi-beam synchronous raster scanning lithography system includes a processor that generates electrical signals representing a desired exposure pattern at an output. A multi-beam source of...
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7425715 |
Digital parallel electron beam lithography stamp
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed for use as a lithographic stamp. Crosswire addressing is used to generate electron emission...
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7425714 |
Measurement method of electron beam current, electron beam writing system and electron beam detector
A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of...
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7423266 |
Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus
In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image...
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7423275 |
Erosion mitigation for collector optics using electric and magnetic fields
A magnetic and/or electric field may be generated around collector optics in an EUV lithography system to deflect debris particles from the reflective surfaces of the optics. The magnetic and/or...
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7420188 |
Exposure method and apparatus for immersion lithography
A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography...
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7420190 |
Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device
A length measurement pattern is used for forming a contact and a via on a diffusion layer and on a lower layer interconnect, respectively, with a photoresist. The length measurement pattern...
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7420191 |
Discharge radiation source, in particular UV radiation
The invention concerns a radiation source, comprising an anode ( 2 ), a cathode ( 3 ), an electric discharge gap ( 4 ) between the anode ( 2 ) and the cathode ( 3 ) and a gas input conduit ( 30 )...
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7417241 |
Ion implantation method and method for manufacturing semiconductor device
An object of the present invention is to provide an ion implantation method for shortening a down time of an ion implantation apparatus after exposure of a chamber and for improving throughput and...
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7417234 |
Spatial-phase locking of energy beams for determining two-dimensional location and beam shape
A method or system of spatial-phase locking a beam used in maskless lithography provides a fiducial grid with a single spatial-period, the fiducial grid being rotated at an angle with respect to a...
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7417242 |
Method of measuring ion beam position
A system, apparatus, and method for determining position and two angles of incidence of an ion beam to a surface of a workpiece is provided. A measurement apparatus having an elongate first and...
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7417236 |
Sheet beam-type testing apparatus
An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam...
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7414240 |
Particle remover, exposure apparatus having the same, and device manufacturing method
A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting...
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7414251 |
Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting...
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7411651 |
PSM alignment method and device
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern,...
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7411201 |
Projection objective for a microlithographic projection exposure apparatus
A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of...
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7405416 |
Method and apparatus for EUV plasma source target delivery
An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a...
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7405809 |
Illumination system particularly for microlithography
An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of...
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7405414 |
Method and apparatus for patterning a workpiece
The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle...
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7405413 |
Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation
The invention is directed to an arrangement for providing target material for the generation of short-wavelength electromagnetic radiation, in particular EUV radiation. It is the object of the...
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7402821 |
Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase
An improved HE LINAC-based ion implantation system is disclosed utilizing direct digital synthesis (DDS) techniques to obtain precise frequency and phase control and automated electrode voltage...
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7400699 |
Illumination system with raster elements of different sizes
There is provided an illumination system for lithography with wavelengths of ≦193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first...
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7399979 |
Exposure method, exposure apparatus, and method for producing device
An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also...
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7400383 |
Environmental control in a reticle SMIF pod
The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled...
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7397056 |
Lithographic apparatus, contaminant trap, and device manufacturing method
A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The...
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7397045 |
Exposure apparatus and method thereof
An exposure apparatus includes a loading device, a first energy-producing device, and a second energy-producing device. The loading device comprises a plurality of supporting elements, supporting a...
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7397538 |
Radiation system and lithographic apparatus
The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet...
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7397047 |
Technique for tuning an ion implanter system
A technique for tuning an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for tuning an ion implanter system having multiple...
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7397049 |
Determining ion beam parallelism using refraction method
A system, method and program product for determining parallelism of an ion beam using a refraction method, are disclosed. One embodiment includes determining a first test position of the ion beam...
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7394067 |
Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems
Systems and methods for reducing alteration of a specimen during by charged particle based and other measurements systems are provided. One system configured to reduce alteration of a specimen...
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7394078 |
Technique for ion beam angle spread control for advanced applications
A technique for ion beam angle spread control for advance applications is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread...
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