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7547899 |
Charged beam dump and particle attractor
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end...
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7547884 |
Pattern defect inspection method and apparatus thereof
In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam....
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7547900 |
Techniques for providing a ribbon-shaped gas cluster ion beam
Techniques for providing a ribbon-shaped gas cluster ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for providing a ribbon-shaped gas...
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7547898 |
Particulate prevention in ion implantation
A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror...
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7544959 |
In situ surface contamination removal for ion implanting
Methods and apparatus that introduce, within the ion implant chamber or an isolated chamber in communication therewith, the capability to remove contaminants and oxide surface layers on a wafer...
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7544951 |
Electron gun assembly
A device which employs an electron beam, for performing a desired function, includes an electron gun for generating the electron beam. The electron gun includes a barrel shaped rotatable structure...
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7544957 |
Non-uniform ion implantation
A method includes receiving an input signal representative of a desired two-dimensional non-uniform dose pattern for a front surface of a workpiece, driving the workpiece relative to an ion beam to...
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7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam
An ion beam irradiating apparatus has: a beam profile monitor 14 which measures a beam current density distribution in y direction of an ion beam 4 in the vicinity of a target 8; movable...
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7538333 |
Contactless charge measurement of product wafers and control of corona generation and deposition
Systems and methods for determining a property of a specimen are provided. The specimen may be a product wafer. The method may include biasing a focused spot on the specimen. The method may also...
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7538332 |
Method of Z-lift electrostatic nanolithography
The method of the present invention utilizes atomic force microscopy techniques (AFM) for the reversible formation of nanoscale polymeric features by localized heating and mechanical deformation,...
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7535013 |
Extreme UV radiation exposure tool and extreme UV radiation source device
To effectively eliminate radiation outside the band with a wavelength of 13.5 nm which has adverse effects on exposure without reducing the intensity of the EUV radiation with a wavelength of 13.5...
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7535001 |
Method and system for focusing a charged particle beam
A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample...
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7532309 |
Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging...
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7531816 |
Vacuum conveying apparatus and charged particle beam equipment with the same
A charged particle beam examination equipment for examining and measuring a semiconductor wafer, comprising a wafer exchange portion for exchanging an unexamined wafer and an examiner wafer with...
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7531792 |
Analyzing chamber including a leakage ion beam detector and mass analyzer including the same
In an analyzing chamber for a mass analyzer, a body of the analyzing chamber may include an inlet through which an ion beam enters and an outlet through which the ion beam leaves. A shielding...
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7531796 |
Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods
Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing...
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7528387 |
Methods and systems for characterising and optimising immersion lithographic processing
A method is provided for characterizing an immersion lithography process of a device using an immersion liquid. In order to study pre-soak and post-soak effects on the image performance of an...
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7528393 |
Charged particle beam processing apparatus
A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage...
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7528967 |
Optical characteristic measuring apparatus and measuring method using light reflected from object to be measured
A measurement-purpose light source generates a measurement light used for measuring an optical characteristic of an object to be measured, and the measurement light includes a component in a...
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7528395 |
Radiation source, lithographic apparatus and device manufacturing method
A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to...
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7528390 |
Broad beam ion implantation architecture
An ion implantation system for providing a mass analyzed ribbon beam that comprises an ion beam source that includes a plasma source and an extraction component, wherein the extraction component is...
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7528389 |
Profile adjustment in plasma ion implanter
A method and apparatus are directed to providing a dopant profile adjustment solution in plasma doping systems for meeting both concentration and junction depth requirements. Bias ramping and bias...
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7528391 |
Techniques for reducing contamination during ion implantation
Techniques for reducing contamination during ion implantation is disclosed. In one particular exemplary embodiment, the techniques may be realized by an apparatus for reducing contamination during...
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7528386 |
Submicron particle removal
A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface,...
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7525635 |
Contamination barrier and lithographic apparatus
A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an...
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7525106 |
Exposure apparatus, pressure control method for the same, and device manufacturing method
An exposure apparatus exposes a substrate in a vacuum atmosphere through an optical system. The apparatus includes a partition which separates a first space including at least part of the optical...
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7521688 |
Charged-particle beam instrument
A charged-particle beam instrument is offered which can cancel out deflection aberrations arising from a first deflector or oblique incidence on the surface of a workpiece without (i) increasing...
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7521689 |
Deflector for equipment of electron beam lithography and equipment of electron beam lithography
A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron...
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7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same
A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is...
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7521693 |
Ion sources, systems and methods
Ion sources, systems and methods are disclosed.
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7518132 |
Light source apparatus, exposure apparatus and device fabrication method
A light source apparatus for generating a plasma and supplying a light irradiated from the plasma to an optical system, said light source apparatus includes a chamber for accommodating a region...
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7518135 |
Reducing fast ions in a plasma radiation source
A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates...
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7518127 |
Sub-wavelength imaging and irradiation with entangled particles
A method and apparatus for using one particle out of N particles for irradiating or investigating a target are provided. A radiation source with N incoherent emitters emits a radiation, and...
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7518124 |
Monatomic dopant ion source and method
Monotomic dopant ions for ion implantation are supplied from vapour of a species containing plural atoms of the desired dopant. The vapour is fed to a plasma chamber and a plasma produced in the...
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7518130 |
Ion beam blocking component and ion beam blocking device having the same
An ion beam blocking component suitable for blocking an ion beam generated by an ion source of an ion implanter is provided. The blocking component includes a front plate, a back plate, and a...
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7518128 |
Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a...
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7515986 |
Methods and systems for controlling and adjusting heat distribution over a part bed
Methods and systems for controlling and adjusting heat distribution over a part bed are disclosed. In one embodiment, a technique for providing a calibrated heat distribution over a part bed...
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7511288 |
Ion implantation device
To provide an ion implantation device which suppresses diffusion of an ion beam, can finely control a scanning waveform and can obtain a large scanning angle of about 10°. In the ion implantation...
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7511287 |
Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases
A contamination mitigation or surface modification system for ion implantation processes includes a gas source, a controller, a valve, and a process chamber. The gas source provides delivery of a...
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7507960 |
Apparatus and method for controlled particle beam manufacturing
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream...
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7507976 |
Lithographic apparatus, beam delivery systems, prisms and device manufacturing method
A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output...
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7507978 |
Beam line architecture for ion implanter
A parallelizing component of an ion implantation system comprises two angled dipole magnets that mirror one another and serve to bend an ion beam traversing therethrough to have a substantially...
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7507977 |
System and method of ion beam control in response to a beam glitch
The present invention is directed to a switch circuit and method to quickly enable or disable the ion beam to a wafer within an ion implantation system. The beam control technique may be applied to...
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7504623 |
Device and method for milling of material using ions
A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both...
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7504645 |
Method of forming pattern writing data by using charged particle beam
A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes...
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7504624 |
Charged particle beam device
A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a...
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7504643 |
Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical...
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7501618 |
Deformation method of nanometer scale material using particle beam and nano tool thereby
The present invention relates to a deformation method of nanometer-scale material using a particle beam and a nano-tool thereby. The deformation method of the nanometer-scale material using the...
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7501641 |
Dual hemispherical collectors
A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a...
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7498590 |
Scan pattern for an ion implanter
An ion implanter includes an ion beam generator configured to generate an ion beam and direct the ion beam towards a workpiece, wherein relative motion between the ion beam and the workpiece...
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