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7592610 |
Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of...
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7592611 |
Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam
A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location...
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7592598 |
Illumination system particularly for microlithography
There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm....
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7589328 |
Gas field ION source for multiple applications
A focused ion beam device is described. The device includes an ion beam column including an enclosure for housing an emitter with an emitter area for generating ions, a first gas inlet adapted to...
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7589332 |
Via-hole processing method
In a via-hole formation method of forming a via-hole reaching a bonding pad, in a substrate of a wafer in which a plurality of devices are formed on a surface of the substrate and the bonding pad...
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7586111 |
Ion implanter having combined hybrid and double mechanical scan architecture
A system and method are provided for implanting ions into a workpiece in a plurality of operating ranges. A desired dosage of ions is provided, and a spot ion beam is formed from an ion source and...
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7586109 |
Technique for improving the performance and extending the lifetime of an ion source with gas dilution
A technique improving the performance and extending the lifetime of an ion source with gas dilution is disclosed. In one particular exemplary embodiment, the technique may be realized as a method...
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7586108 |
Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector
The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a...
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7586113 |
EUV illumination system
An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV...
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7582884 |
Charged particle beam exposure method and charged particle beam exposure device
When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block...
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7583834 |
Laser etched fiducials in roll-roll display
The present invention relates to a method of aligning comprising providing a support, applying a transparent layer, patterning at least the transparent layer to produce a pattern and an alignment...
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7582883 |
Method of scanning a substrate in an ion implanter
This invention relates to a method of scanning a substrate through an ion beam in an ion implanter to provide uniform dosing of the substrate. The method comprises causing relative motion between...
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7582881 |
Lithographic apparatus and device manufacturing method
A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon...
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7579591 |
Method and apparatus for analyzing sample
Method and apparatus for performing sample analysis using both the WDS and an energy-dispersive X-ray spectrometer (EDS). The analysis starts with irradiating the sample with an electron beam....
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7580110 |
Exposure apparatus and exposure method
An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting...
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7579606 |
Method and system for logic design for cell projection particle beam lithography
A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library,...
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7576339 |
Ion implantation apparatus and method for obtaining non-uniform ion implantation energy
An ion implantation apparatus includes an ion beam source for generating an ion beam; an implantation energy controller disposed on a path of the ion beam for controlling the ion implantation...
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7576340 |
Focused ion beam processing method
There is provided a focused ion beam processing method in which damage to a workpiece is minimized when the surface of the workpiece is irradiated and processed with an ion beam. The method...
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7576341 |
Lithography systems and methods for operating the same
A lithography system and method for operating the same. The lithography system may include a cathode adapted to emit an electron beam, a beam-homogenizing structure, capable of increasing at least...
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7576337 |
Power supply for an ion implantation system
A power supply system for an ion implantation system. In one particular exemplary embodiment, the system may be realized as a power supply system that includes a low frequency power inverter, a...
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7576343 |
Method and apparatus for generating laser produced plasma
The present invention provides a method of delivering solid material at a position far enough from any surrounding solid with high enough target density without scattering debris to the...
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7573047 |
Wafer holder and sample producing apparatus using it
A wafer holder includes: a frame-shaped holder main body which has an opening at its center and carries a wafer on its upper surface; guide members which contact the outer periphery of the wafer...
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7573050 |
Column simultaneously focusing a particle beam and an optical beam
Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a...
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7573051 |
Ion beam guide tube
The present invention relates to a guide tube for an ion beam in an ion implanter located adjacent a semiconductor wafer. Such guide tubes are provided to confine charged particles used for wafer...
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7573052 |
Exposure apparatus, exposure method, and device manufacturing method
A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is...
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7569834 |
High resolution charged particle projection lens array using magnetic elements
A charged particle optic apparatus for improvement in resolution of an electrostatic, multi-beam column is disclosed. The charged particle optic apparatus includes an electrostatic lens array...
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7569833 |
Apparatus for generating a plurality of beamlets
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging...
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7566871 |
Method and apparatus for pattern inspection
Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image...
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7566887 |
Method of reducing particle contamination for ion implanters
The present invention is directed to a beam control circuit and method used to minimize particle contamination in an ion implantation system by reducing the duty factor of the ion beam. In one...
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7566888 |
Method and system for treating an interior surface of a workpiece using a charged particle beam
A method and system of treating an interior surface on an internal cavity of a workpiece using a charged particle beam. A beam deflector surface of a beam deflector is placed within the internal...
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7566886 |
Throughput enhancement for scanned beam ion implanters
An ion implantation system that optimizes productivity that includes an ion generator configured to implant ions into a workpiece by scanning the ions along an axis in a first direction, a movable...
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7566891 |
Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors
Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV...
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7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
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7564049 |
Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method
A pattern drawing system includes a beam irradiating mechanism which irradiates electrically charged beams on a film to be drawn, a coefficient calculating section which calculates a backward...
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7564042 |
Ion beam apparatus having plasma sheath controller
An ion beam apparatus includes a plasma chamber with a grid assembly installed at one end of the plasma chamber and a plasma sheath controller disposed between the plasma chamber and the grid...
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7560367 |
Method for thermal processing with a RTP process using temperature spaces in radiation equilibrium
In this invention, a wafer is placed and kept in the low-temperature region at the bottom of a temperature space that is in a state of radiation equilibrium and that is formed inside chamber by a...
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7560692 |
Method of TEM sample preparation for electron holography for semiconductor devices
A high quality electron microscopy sample suitable for electron holography is prepared by forming markers filled with TEOS oxide and by repeatedly applying multiple coats of an adhesive followed by...
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7560712 |
Ion implanter with etch prevention member(s)
An apparatus and method of doping ions into a substrate are disclosed and include a process chamber having an inner space in which an ion implantation process is performed, a support unit...
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7557366 |
Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
An apparatus for producing radiation by an electrically operated discharge has a first electrode, a second electrode. and a capacitor bank. The electrodes are configured at a distance from each...
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7557511 |
Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma
A pulsed electron ablation (PEA) utilizes a source of a high power density electron beam which includes a cathode plasma supplying electrons for generation of the electron beam and an anode plasma...
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7554107 |
Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus
A charged particle beam writing method includes measuring a topography of a backside of a substrate without an influence of a gravity sag, calculating a first positional deviation amount of a...
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7554102 |
Optical coating equipment and ultraviolet irradiative device
An optical coating equipment, which includes a delivery device, a coater head, and an ultraviolet irradiative device. The delivery device delivers a film. A liquid coating is coated on the film by...
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7554648 |
Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle
Blind devices and related methods for lithography systems are described. An exemplary system has a vacuum chamber with first and second chamber portions. In a member between the chambers is defined...
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7554082 |
Pattern observation apparatus, pattern observation method, method of manufacturing semiconductor device, and program
A pattern observation apparatus includes: a defect position information input unit which downloads defect position information for a pattern, the defect position information having been detected by...
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7554106 |
Partial ion implantation apparatus and method using bundled beam
An ion implantation apparatus comprises an ion beam source for generating an initial ion beam, a bundled ion beam generator adapted to change the initial ion beam into a bundled ion beam based on a...
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7554108 |
Forming a semiconductor device feature using acquired parameters
In one embodiment, a controller coupled to a focused ion beam tool can execute instructions to acquire parameters for a feature of a semiconductor device, determine a data array using the...
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7550751 |
Ion beam scanning control methods and systems for ion implantation uniformity
One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam...
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7550740 |
Focused ION beam apparatus
A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope...
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7550747 |
Parallel electron beam lithography stamp (PEBLS)
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed and patterned for use as a lithographic stamp. The spacing and/or arrangement of the nanotips...
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7547899 |
Charged beam dump and particle attractor
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end...
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