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6924489 |
Device for reducing the impact of distortions in a microscope
This invention relates to a device for reducing the impact of undesired distortions when studying a sample in an electron microscope, wherein said sample is arranged to be mounted on a...
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6920368 |
Method and device for correcting proximity effects
The present invention relates to a method for determining the precompensated pattern of exposure doses of an electron beam required per pattern position to obtain a desired pattern in a coating on...
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6919574 |
Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method
An electron beam exposure apparatus for exposing a wafer by an electron beam incorporates a circuit structure for conducting a scan test to self-diagnose the electrical connections. The electron...
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6919573 |
Method and apparatus for recycling gases used in a lithography tool
A system and method are used to recycle gases in a lithography tool. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a...
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6917046 |
Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method
A positioning apparatus includes a first stage, capable of moving in a first direction and a second direction which is orthogonal to the first direction, a second stage, arranged on the first stage...
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6917043 |
Individually addressable cathodes with integrated focusing stack or detectors
Systems and method are described for addressable field emission array (AFEA) chips. A plurality of individually addressable cathodes are integrated with an electrostatic focusing stack and/or a...
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6917047 |
Methods and apparatuses for off-axis lithographic illumination
Methods and apparatuses for shaping an illumination pattern for off-axis lithography are disclosed. A disclosed apparatus includes a first and second reflecting objective. The first reflecting...
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6917048 |
Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus
Methods and devices are disclosed for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus. Based on the...
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6917411 |
Method for optimizing printing of an alternating phase shift mask having a phase shift error
Optimizing printing of an image from an alternating phase shifting mask having a phase shift error is accomplished using off-axis illumination. By simulating the image using varying off-axis...
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6914249 |
Particle-optical apparatus, electron microscopy system and electron lithography system
A particle-optical apparatus is provided for directing a beam of charged particles on an object plane or to image the object plane with the beam onto an image plane or intermediate image plane. The...
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6914244 |
Ion beam milling system and method for electron microscopy specimen preparation
An ion beam milling system and method for electron microscopy specimen preparation is provided and is useful for the preparation for analysis by either TEM or SEM of semiconductors, metals, alloys,...
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6911661 |
Electron beam exposure apparatus
An electron beam exposure apparatus, which exposes patterns on a wafer by an electron beam, includes an electron beam producing unit which produces the electron beam and an electron beam shaping...
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6911656 |
Rotational stage for high speed, large area scanning in focused beam systems
A mechanical scanning stage for high speed image acquisition in a focused beam system. The mechanical scanning stage preferably is a combination of four stages. A first stage provides linear...
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6909930 |
Method and system for monitoring a semiconductor device manufacturing process
To realize a method for detecting variations in conditions (drift of the exposure and drift of the focus) in exposure equipment at a product wafer level in lithography process, the process is...
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6909588 |
Substrate holder for retaining a substrate within a processing chamber
A wafer chuck is designed to allow the substrate to thermally deform during charged particle beam lithography. The wafer chuck includes a compliant layer disposed over an chuck body. During...
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6908255 |
Remote clamping mechanism via vacuum feedthrough
A clamping flexure for use in a vacuum employs a spring-loaded shaft that pulls an object being supported against a support piece, including a mechanism, passing through the vacuum vessel, for...
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6909103 |
Ion irradiation of a target at very high and very low kinetic ion energies
A particle-beam exposure apparatus ( 1 ) for irradiating a target ( 41 ) by means of a beam ( 2 ) of energetic electrically charged particles comprises: an illumination system ( 101 ) for...
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6906336 |
Methods for reducing blur and variation in blur in projected images produced by charged-particle-beam microlithography
Exposure methods are disclosed for use in charged-particle-beam microlithography and that yield decreased blur and variation in blur within individual exposure fields (subfields) of a pattern. Blur...
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6903354 |
Extreme ultraviolet transition oscillator
Systems and techniques to generate extreme ultraviolet (EUV) illumination. An EUV system includes first layers, and second layers interleaved with the first layers, where the first layers and the...
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6903345 |
Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method
An electron optical system has a plurality of electron lenses. The system includes a first electron optical system array having electrodes with a plurality of rectangular apertures, and a second...
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6903800 |
Film-processing method and film-processing apparatus
A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to...
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6903350 |
Ion beam scanning systems and methods for improved ion implantation uniformity
Ion implantation systems and scanning systems therefor are provided, in which focus adjustment apparatus is provided to dynamically adjust a focal property of an ion beam to compensate for at least...
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6903336 |
Polarity exchanger and ion implanter having the same
A polarity exchanger and ion implanter include a stripping canal for passing an ion beam therethrough, a gas supply unit for providing a stripping gas into the stripping canal to change a polarity...
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6903355 |
Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method
An electron beam exposure apparatus for exposing a pattern accurately even if the current of the electron beam is high. The electron beam exposure apparatus 100 includes a mask 30 with a first...
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6903348 |
Wafer holding apparatus for ion implanting system
An ion implanting system and a wafer holding apparatus therefor are provided. The ion implanting system includes x- and y-axis rotating parts; first and second angle measuring circuits; and a...
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6900445 |
Irradiation apparatus
Polymeric article irradiation apparatus comprising a radiation source and a carousel, the carousel including drive means and a plurality of carriers for polymeric articles, each carrier being...
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6900443 |
Charged particle beam device for inspecting or structuring a specimen
The invention provides a charged particle beam device ( 1 ) to inspect or structure a specimen ( 3 ) comprising a charged particle beam source ( 5 ) to generate a charged particle beam ( 7 ), a...
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6900447 |
Focused ion beam system with coaxial scanning electron microscope
A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the...
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6897456 |
Differential pumping system and exposure apparatus
A differential pumping system includes a first chamber for storing a light source that emits light, a second chamber that receives light from the first chamber, and a vacuum pump, provided between...
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6894295 |
Electron beam proximity exposure apparatus and mask unit therefor
In an electron beam proximity exposure apparatus comprising an electron beam source, which emits a collimated electron beam, a mask substrate on which a plurality of masks with apertures are...
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6894293 |
System for recycling gases used in a lithography tool
A system and method are used to isolate a first gas from a second gas using a third gas. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted...
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6891172 |
Differential pumping system and exposure apparatus
A differential pumping system includes a first chamber for storing a light source that emits pulsed light, a first exhaust unit for exhausting said first chamber, a second chamber being connectible...
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6891927 |
Light generation apparatus, exposure apparatus, and device manufacturing method
A light generation apparatus is capable of widely changing the intensity of generated light. The light generation apparatus includes an X-ray source, a high-voltage generation circuit, and a CPU....
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6888150 |
Method for defect and conductivity engineering of a conducting nanoscaled structure
The invention relates to a method for defect and conductivity engineering of an individual part in a conducting nanoscaled structure by generating heat-induced migration, melting, sputtering and/or...
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6888618 |
Exposure apparatus and exposure method
A scan type exposure apparatus wherein a pattern of an original is lithographically transferred to a substrate sequentially while the original and the substrate are scanningly moved relative to...
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6888149 |
Focused ion beam apparatus
A method for correcting drifts in beam irradiation position in a focused ion beam apparatus is disclosed. A linear line pattern is formed on a sample by linearly irradiating a focused ion beam at a...
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6885012 |
Convergent charged particle beam apparatus and inspection method using same
A convergent charged particle beam apparatus includes an electron beam system which emits a converged electron beam, a vacuum chamber which is connected to the electron beam system, and a stage...
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6881968 |
Electron beam exposure apparatus, electron beam exposure method, semiconductor device manufacturing method, and electron beam shape measuring method
An electron beam exposure apparatus for exposing a wafer by an electron beam, including: an electron beam generation section for generating the electron beam; an electron beam shaping member with a...
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6881966 |
Hybrid magnetic/electrostatic deflector for ion implantation systems
A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam....
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6881963 |
Vibration control of an object
An apparatus for controlling motion of an object includes a first actuator for moving the object, an elastic-motion measuring unit for measuring elastic motion of the object, and a control unit for...
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6881965 |
Multi-foil optic
The invention provides a miniaturized multi-foil object for use in a laboratory environment and other practical applications that require small or portable and/or disposable high energy radiation...
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6878950 |
Method of reducing heat-induced distortion of photomasks during lithography
The present invention relates generally to methods, apparatus and materials to reduce or minimize the heating of a substrate (and associated distortions of the photomask) caused by electron-beam...
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6875987 |
Substrate holding unit, exposure apparatus, and device manufacturing method
On an upper surface of a main body configuring a holder main body, a plurality of pins and a rim portion which upper end surface is set at almost the same height with a surface formed by the tip...
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6872958 |
Platform positioning system
A system for precisely positioning and moving a platform relative to a support structure is disclosed herein. The platform is particularly suitable for carrying wafers. Charged particle optics can...
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6872959 |
Thermoelectron generating source and ion beam radiating apparatus with the same
A thermoelectron generating source including a facial main cathode for emitting thermoelectrons by being heated from behind, a filament for heating the main cathode from behind to emit the...
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6870173 |
Electron-beam focusing apparatus and electron-beam projection lithography system employing the same
An electron-beam focusing apparatus for controlling a path of electron beams emitted from an electron-beam emitter in an electron-beam projection lithography (EPL) system includes top and bottom...
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6870161 |
Apparatus for processing and observing a sample
An apparatus for processing and observing a sample has a sample stage for supporting a sample at a preselected location thereof, a focused ion beam irradiation system for irradiating the sample...
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6870952 |
Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same
The Xray irradiation device 1 issues Xrays to board mark 7 and projects the image of the board mark 7 on the fluorescence screen 3 , the fluorescence face 39 of which visibly displays the...
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6870171 |
Exposure apparatus
An electron beam exposure apparatus which exposes a wafer ( 118 ) by using a plurality of electron beams corrects the positional error of the electron beams by using multi-deflector arrays ( 105,...
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6870169 |
Method and apparatus for analyzing composition of defects
In order to be able to detect an irradiation position of an electron beam matching a defect position and conduct composition analysis of a defect with high precision and high efficiency, in the...
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