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6825480 Charged particle beam apparatus and automatic astigmatism adjustment method  
According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged...
6825468 Fine stencil structure correction device  
A fine stencil structure correction device has a charged particle beam microscope lens-barrel which scans and corrects shapes of defect portions of a fine stencil structure sample using an etching...
6822977 Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser  
A lithography laser system for incorporating with a semiconductor processing system includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, multiple...
6822249 Radioactive electron emitting microchannel plate  
The present invention relates to a radioactive electron emitting microchannel plate. More particularly, to a radioactive electron generating microchannel plate comprising (a) a pair of parallel...
6822248 Spatial phase locking with shaped electron beam lithography  
Fine positioning of a shaped or patterned charged particle beam without use of intrusive fiducial marks is achieved by providing a dithered shadow pattern, preferably in the form of a grid, within...
6822247 Ion irradiation system  
An ion irradiation system has a leader and a trailer at its beam line, and at least one non-beam-breaking beam-current measuring instrument is prepared between the leader and the trailer. The...
6822245 Ion beam apparatus and sample processing method  
For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for...
6822241 Emitter device with focusing columns  
An emitter device including a focusing array with plural focusing columns to focus emissions from one or more emitters onto a target medium. Relative movement between the target medium and the...
6821693 Method for adjusting a multilevel phase-shifting mask or reticle  
A method for adjusting (aligning) a multilevel phase-shifting mask or a multilevel phase-shifting reticle with the aid of at least one alignment mark provided on the mask or the reticle includes...
6818912 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby  
A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic...
6818910 Writing methodology to reduce write time, and system for performing same  
The present invention is generally directed to various reticle writing methodologies to reduce write time, and a system for performing same. In one illustrative embodiment, the method comprises...
6818909 Ion sources for ion implantation apparatus  
The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant...
6818908 Device and method for optical processing for processing inorganic transparent material by optical patterning  
Discloses a photo machining apparatus and a photo-fabrication method to perform two-dimensional or three-dimensional fabrication of an inorganic transparent material with a precision of 10 nm. Soft...
6816302 Pattern generator  
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus comprises a...
6816233 Mask having pattern areas whose transmission factors are different from each other  
A projection exposure apparatus having an exposure mode for exposing a mask to transfer a pattern image of the mask onto a photosensitive substrate. The apparatus includes a light source for...
6815697 Ion beam charge neutralizer and method therefor  
In an ion beam line having a mechanism for scanning an ion beam by an electric field or a magnetic field or in an ion beam line having a mechanism for forming a sheet-like or a ribbon-like ion...
6815695 Simplified reticle stage removal system for an electron beam system  
A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or...
6815693 Charged-particle-beam microlithography apparatus and methods including proximity-effect correction  
Methods are disclosed for correcting proximity effects as affected by varying magnitudes of beam blur occurring at different respective locations in an image of a reticle subfield as projected onto...
6815681 Electron beam lithography apparatus using a patterned emitter  
An electron beam lithography apparatus, which uses a patterned emitter, includes a pyroelectric plate emitter that emits electrons using a patterned metal thin layer formed on the pyroelectric...
6815678 Raster electron microscope  
The invention relates to a raster electron microscope having a specimen chamber and a detector for electrons mounted in the specimen chamber. The raster electron microscope also includes a specimen...
6815675 Method and system for e-beam scanning  
The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to...
6813004 Exposure method, exposure apparatus and making method of the apparatus, and device and manufacturing method of the device  
A main controller sets an exposure control target value according to the transmittance of an optical system measured by means of a sensor prior to exposure or estimated by predetermined...
6812472 Non-magnetic robotic manipulators for moving objects relative to a charged-particle-beam optical system  
In the context of charged-particle-beam (CPB) microlithography systems, robotic manipulators are disclosed for conveying objects such as reticles and substrates simultaneously with performing...
6804288 Electron beam exposure apparatus and electron beam deflection apparatus  
An electron beam exposure apparatus for exposing a pattern to a wafer by a plurality of electron beams, comprising an electron beam generating section for generating a plurality of electron beams,...
6803588 Apparatus and method for rapid photo-thermal surfaces treatment  
An apparatus for surface treating a semiconductor wafer includes a surface treatment chamber and a source of radiation. The semiconductor wafer disposed inside the chamber is illuminated with...
6803584 Electron beam control device  
An electron beam control device controls an electron beam for use, such as an electron beam exposure device and the like, wherein a track of an electron beam is not adversely Influenced by the...
6800863 Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same  
A method for monitoring an ion implanter includes positioning a substrate behind an interceptor for intercepting a portion of an ion beam to be irradiated toward the substrate, irradiating a first...
6800861 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system  
A mirror projection system for use in a step-and-scan lithographic projection apparatus, in which a mask pattern ( 15 ) is repetitively scan-imaged on a number of areas of a substrate ( 20 ) by...
6797969 Multi-column FIB for nanofabrication applications  
A multi-gun FIB system for nanofabrication provides increased throughput at reduced cost while maintaining resolution. Multiple guns are maintained in modular gun chambers that can be vacuum...
6797967 Method and system for dose control during an ion implantation process  
A method is presented for compensating for the effects of charge neutralization in calculating the ‘true’ ion dose, i.e., the dose assuming no changes of charge state of ions during an...
6797965 Charged particle beam apparatus, pattern measuring method, and pattern drawing method  
A charged particle beam apparatus includes a charged particle source which generates a charged particle beam, a condenser lens which converges the charged particle beam, a deflector which deflects...
6795166 Illuminator, exposure apparatus, and method for fabricating device using the same  
In a projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting the pattern onto a wafer with a projection...
6794665 Electron beam drawing apparatus  
An electron beam drawing apparatus has a sample chamber having a bottom plate, a side wall, and a top plate. Pillar members are disposed at four corners of the sample chamber and a frame is fixed...
6794664 Umbilical cord facilities connection for an ion beam implanter  
An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum implantation chamber wherein a workpiece is positioned to intersect the ion beam...
6794660 Long stroke mover for a stage assembly  
A stage assembly ( 10 ) for moving and positioning a device ( 26 ) includes a guide base ( 12 ), a stage ( 14 ), a stage bearing assembly ( 18 ), a control system ( 22 ), and a Y mover ( 68 ). The...
6791096 Process conditions change monitoring systems that use electron beams, and related monitoring methods  
In order to accurately monitor changes in exposure conditions (changes in exposure level and focus) at a product wafer level during lithography, changes in exposure conditions can be calculated by...
6791094 Method and apparatus for determining beam parallelism and direction  
A method and apparatus for determining a direction or parallelism of a beam. The beam can be any type of beam, including uncharged or charged particle beams or electromagnetic radiation beams. The...
6787783 Apparatus and techniques for scanning electron beam based chip repair  
A method and apparatus for editing an integrated circuit by bombarding a feature in need of editing with either a low-energy or high-energy electron beam in the presence of a gas whereby low energy...
6787780 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device  
An electron beam exposure apparatus for exposing a wafer includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and a lens-intensity...
6787768 Method and apparatus for tool and tip design for nanomachining and measurement  
A single-body structure is presented for use as a tool tip for making modifications and/or collecting measurements on a target object. The single-body structure comprises a first end portion, a...
6785615 Method and structure for detection of electromechanical problems using variance statistics in an E-beam lithography device  
An apparatus and method for detection of electromechanical and mechanical errors in an electron beam device is provided. First the existing subfield is divided into a gridlike structure where each...
6784442 Exposure apparatus, control method thereof, and device manufacturing method  
This invention provides a multi-charged-particle beam exposure apparatus capable of easily correcting at a high precision the electron-optic characteristics of each column which constitutes an...
6784427 Samples for transmission electron microscopy  
TEM samples are cut from a solid state material with length (l) and width (b) and with a front-side sample surface ( 7 ) onto which a curable adhesive of the flowable type is applied for fixing a...
6784426 Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method  
An electron beam irradiation apparatus which irradiates an electron beam to an object for easily detecting a defect of a backscattered electron detector, including: an electron beam generating...
6781670 Immersion lithography  
Apparatus, methods, and systems for immersion lithography. In one implementation, a hemispherical lens element is positioned near a target surface covered by photoresist. An immersion liquid is...
6781140 Method of and machine for pattern writing by an electron beam  
A method of writing a pattern on the surface of a substrate by an electron beam is provided comprising exposing the substrate surface to an electron beam controlled to progressively describe the...
6781139 Load lock vacuum conductance limiting aperture  
An apparatus in combination with a load lock of an ion implanter comprises a cover adjacent an isolation valve slot of the load lock. The cover defines an aperture generally conforming to the size...
6777699 Methods, apparatus, and systems involving ion beam generation  
A high-perveance steady state deuterium ion gun was developed using a magnetic-index resonator in an Inductive Coupling Radio Frequency (ICRF) configuration. This approach made it feasible to...
6777698 Electron beam exposure apparatus exposing method using an electron beam  
In order to provide an electron beam exposure apparatus and an exposing method using an electron beam that realizes highly precise pattern exposure, an axis difference generated by the variable...
6777696 Deflecting acceleration/deceleration gap  
An accelerating structure and related method for accelerating/decelerating ions of an ion beam are disclosed. The structure and related method are suitable for use in selectively implanting ions...
Matches 501 - 550 out of 2246 < 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 >