Matches 451 - 500 out of 2156 < 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 >
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6785615 Method and structure for detection of electromechanical problems using variance statistics in an E-beam lithography device  
An apparatus and method for detection of electromechanical and mechanical errors in an electron beam device is provided. First the existing subfield is divided into a gridlike structure where each...
6784442 Exposure apparatus, control method thereof, and device manufacturing method  
This invention provides a multi-charged-particle beam exposure apparatus capable of easily correcting at a high precision the electron-optic characteristics of each column which constitutes an...
6784427 Samples for transmission electron microscopy  
TEM samples are cut from a solid state material with length (l) and width (b) and with a front-side sample surface ( 7 ) onto which a curable adhesive of the flowable type is applied for fixing a...
6784426 Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method  
An electron beam irradiation apparatus which irradiates an electron beam to an object for easily detecting a defect of a backscattered electron detector, including: an electron beam generating...
6781670 Immersion lithography  
Apparatus, methods, and systems for immersion lithography. In one implementation, a hemispherical lens element is positioned near a target surface covered by photoresist. An immersion liquid is...
6781140 Method of and machine for pattern writing by an electron beam  
A method of writing a pattern on the surface of a substrate by an electron beam is provided comprising exposing the substrate surface to an electron beam controlled to progressively describe the...
6781139 Load lock vacuum conductance limiting aperture  
An apparatus in combination with a load lock of an ion implanter comprises a cover adjacent an isolation valve slot of the load lock. The cover defines an aperture generally conforming to the size...
6777699 Methods, apparatus, and systems involving ion beam generation  
A high-perveance steady state deuterium ion gun was developed using a magnetic-index resonator in an Inductive Coupling Radio Frequency (ICRF) configuration. This approach made it feasible to...
6777698 Electron beam exposure apparatus exposing method using an electron beam  
In order to provide an electron beam exposure apparatus and an exposing method using an electron beam that realizes highly precise pattern exposure, an axis difference generated by the variable...
6777696 Deflecting acceleration/deceleration gap  
An accelerating structure and related method for accelerating/decelerating ions of an ion beam are disclosed. The structure and related method are suitable for use in selectively implanting ions...
6777694 Electron beam exposure system and electron lens  
An electron beam exposure system for exposing a pattern on a wafer using a plurality of electron beams, comprising a section for generating a plurality of electron beams, an electron lens section...
6777693 Lithographic method using ultra-fine probe needle  
A lithographic method using an ultra-fine probe needle in which a base end of a nanotube is fastened to a holder with the tip end of the nanotube protruded from the holder. The tip end of the thus...
6777688 Rotational stage for high speed, large area scanning in focused beam systems  
A mechanical scanning stage for high speed image acquisition in a focused beam system. The mechanical scanning stage preferably is a combination of four stages. A first stage provides linear...
6774990 Method to inspect patterns with high resolution photoemission  
Inspecting a patterned surface using photoemission of electrons includes selecting materials of the patterned surface, selecting a light source to produce a difference in yield of photoelectrons...
6774380 Variably shaped beam EB writing system  
A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first...
6774378 Method of tuning electrostatic quadrupole electrodes of an ion beam implanter  
The present invention concerns a method of tuning a plurality of electrostatic quadrupoles used for focusing an ion beam implanter. The steps of the method include: classifying the plurality of...
6774374 Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatuses  
A reference frame provided in a vacuum chamber is supported by support pillars extending through and isolated from the vacuum chamber walls to isolate the reference frame from vibrations in the...
6771091 Method and system for elevated temperature measurement with probes designed for room temperature measurement  
Techniques for measuring a contact potential difference of a sample at an elevated temperature using a probe designed for room temperature measurement are disclosed. In such measurements, probe...
6770895 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool  
A system and method are used to isolate a first gas from a second gas using a third gas. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted...
6770894 Illumination system with field mirrors for producing uniform scanning energy  
This invention relates to an illumination system for scanning lithography with wavelengths ≦193 nm, particularly EUV lithography, for the illumination of a slit. The illumination system includes...
6770890 Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same  
Stage devices are disclosed that achieve high positioning and movement accuracy while producing substantially reduced outwardly extending stray magnetic fields. The stage devices are especially...
6770887 Aberration-corrected charged-particle optical apparatus  
Aberration-corrected charged-particle optical apparatus improving the resolution of charged-particle optical systems by eliminating or minimizing optical aberrations. The apparatus comprises a...
6770874 Gas cluster ion beam size diagnostics and workpiece processing  
The invention provides methods and apparatus for measuring the distribution of cluster ion sizes in a gas cluster ion beam (GCIB) and for determining the mass distribution and mass flow of cluster...
6768124 Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same  
Due to its lack of appreciable thickness, the reticle used in charged-particle-beam (CPB) microlithography is prone to bending and flexing, causing instability in reticle axial height position...
6768121 Ion source having replaceable and sputterable solid source material  
An ion source ( 10 ) for an ion implanter is provided, comprising: (i) an ionization chamber ( 14 ) defined at least partially by chamber walls ( 12 ), and having an inlet ( 45 ) into which a...
6768117 Immersion lens with magnetic shield for charged particle beam system  
An immersion lens for a charged particle beam lithography system includes a magnetically floating shield that limits a deflection magnetic field from creating eddy currents in electrically...
6768112 Substrate inspection system and method for controlling same  
A substrate inspection system includes: a charged particle beam irradiation part; an electron image detecting part; a mapping projecting part which projects the secondary and/or reflected charge...
6768110 Ion beam milling system and method for electron microscopy specimen preparation  
An ion beam milling system and method for electron microscopy specimen preparation is provided and is useful for the preparation for analysis by either TEM or SEM of semiconductors, metals, alloys,...
6765647 Exposure method and device  
An exposure method, wherein a defocus quantity on the surface of a substrate to be exposed with respect to an image plane of a projection optical system is detected highly accurately even during...
6765218 Lithographic projection apparatus with positioning system for use with reflectors  
In a lithographic projection apparatus the positions and/or orientations of reflective optical elements is dynamically controlled. The position of a reflective optical element such as a mirror in...
6765217 Charged-particle-beam mapping projection-optical systems and methods for adjusting same  
Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an...
6764796 Maskless photolithography using plasma displays  
The present invention is a maskless photolithography system and method using a plasma display for creating two-dimensional and three-dimensional structures. Advantageously, the invention does not...
6763316 Method for measurement of beam emittance in a charged particle transport system  
A method determines ion beam emittance, i.e., the beam current density based on position and angle, in a charged particle transport system. The emittance is determined from variations in the...
6762422 Analyzer/observer  
On a sample base 1 disposed within a vacuum container is provided a scale S( 1 ). . . S(N), where in an actual distance of the sample base is monitored by observing the scale trough an optical...
6762412 Optical apparatus, exposure apparatus using the same, and gas introduction method  
The optical apparatus of the present invention comprises; an optical member such as a lens; a casing containing the optical member; a gas supply device that supplies gas at a predetermined flow...
6762136 Method for rapid thermal processing of substrates  
A technique is described for a very rapid thermal treatment of a substrate used to make semiconductor devices. The substrate is subjected to a very hot gas stream such as can be produced from an...
6760400 Exposing method and semiconductor device fabricated by the exposing method  
In an exposing method reflecting synchrotron radiation, having a critical wavelength of 8.46 Å, emitted from a radiation generator (SR device) having a deflecting magnetic field of 4.5 T and...
6759666 Method and apparatus for charged particle beam exposure  
A plurality of circuit patterns are written by a small number of charged particle beams with a high dimension controllability without using a mask. A desired charge quantity is irradiated on a...
6757051 Projection optical system, manufacturing method thereof, and projection exposure apparatus  
A projection optical system forms an image of an object in a first plane onto a second plane. The projection optical system has an optical element group including at least one refractive member and...
6756599 Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same  
A particle-optical apparatus for changing trajectories of charged particles of a divergent particle beam oriented along a longitudinal axis is proposed, comprising: an inner electrode arrangement...
6753947 Lithography system and method for device manufacture  
A lithography system and method for cost-effective device manufacture that can employ a continuous lithography mode of operation is disclosed, wherein exposure fields are formed with single pulses...
6753538 Electron beam processing  
A method and apparatus for electron beam processing using an electron beam activated gas to etch or deposit material. The invention is particularly suitable for repairing defects in lithography...
6750571 Magnetically shielded linear motors, and stage apparatus comprising same  
Stage apparatus are disclosed that provide high-accuracy positioning and movements of a stage platform, while generating reduced stray magnetic-field fluctuations and perturbations. The stage...
6750464 Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detector  
Alignment-mark patterns are disclosed that are defined on stencil reticles and that can be transferred lithographically from the reticle to a sensitized substrate using charged-particle-beam...
6750460 System and method for adjusting the properties of a device by GCIB processing  
A system and method of precisely adjusting the properties of a device using a gas cluster ion beam (GCIB) are described. Use of the invention permits the precise removal or addition of small...
6747282 Lithographic apparatus, device manufacturing method, and device manufactured thereby  
One example of a lithographic projection apparatus includes an image sensing device configured and arranged to measure a pattern in a patterned projection beam. The image sensing device includes a...
6744058 Geometric compensation method for charged particle beam irradiation  
A charged particle beam method for irradiating an array of sub-regions within an areal region within a substrate with a series of shots of a charged particle beam provides that a sequencing of...
6744057 Convergent charged particle beam apparatus and inspection method using same  
A convergent charged particle beam apparatus and method of detecting an electron beam image of a specimen in which a converged electron beam is irradiated and scanned over a surface of a specimen...
6740895 Method and apparatus for emission lithography using patterned emitter  
A method and apparatus for emission lithography using a patterned emitter wherein, in the apparatus for emission lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a...
6740894 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor  
An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion...
Matches 451 - 500 out of 2156 < 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 >